公开(公告)号：US4456678A

公开(公告)日：1984-06-26

申请号：US481611

申请日：1983-04-04

Applicant: Kang I. Lee ,  William Jensen ,  Peter Cukor

Inventor： Kang I. Lee ,  William Jensen ,  Peter Cukor

IPC: G03F7/008 ,  G03C1/68

CPC classification number: G03F7/0045

Abstract: A negative working resist composition and medium for microlithographic recording comprises a vinyl polymer having aromatic quaternized nitrogen-containing pendant groups. The resist undergoes a transformation from high to low solubility in polar solvents such as water or low molecular weight alcohols upon exposure to electron beams, ultraviolet light, or X-rays. A method for patterning substrates by employing the resist composition is also disclosed.

Abstract translation: 负光刻胶组合物和显微光刻记录介质包括具有芳族季铵化含氮侧基的乙烯基聚合物。 抗蚀剂在暴露于电子束，紫外光或X射线时，在极性溶剂如水或低分子量醇中经历从高到低的溶解度转变。 还公开了通过使用抗蚀剂组合物来图案化衬底的方法。

公开(公告)号：US4451551A

公开(公告)日：1984-05-29

申请号：US331875

申请日：1981-12-17

Applicant: Fumio Kataoka ,  Fusaji Shoji ,  Isao Obara ,  Hitoshi Yokono ,  Tokio Isogai ,  Mitumasa Kojima

Inventor： Fumio Kataoka ,  Fusaji Shoji ,  Isao Obara ,  Hitoshi Yokono ,  Tokio Isogai ,  Mitumasa Kojima

IPC: C08K5/00 ,  C08L79/08 ,  G03F7/008 ,  G03F7/038 ,  G03C1/68

CPC classification number: G03F7/0387 ,  C08K5/0041 ,  C08L79/08 ,  G03F7/008 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S522/904

Abstract: A light- or radiation-sensitive polymer composition comprising (a) a poly(amic acid) having as a major component a repeating unit of the formula: ##STR1## (b) one or more light- or radiation-sensitive compounds having an amino group and an aromatic azide group or aromatic sulfonylazide group in one molecule, and if necessary (c) one or more photosensitizers and/or amine compounds having at least one unsaturated bonding, and/or (d) one or more compounds having at least two unsaturated bonding in one molecule, is highly sensitive to light and radiation and can give a precise relief pattern on a substrate. Further, a finally obtained polyimide film is excellent in heat resistance.

Abstract translation: 一种光或辐射敏感性聚合物组合物，其包含（a）作为主要组分的具有下式的重复单元的聚（酰胺酸）：（b）一种或多种具有氨基的光或辐射敏感性化合物 （c）一种或多种具有至少一个不饱和键的光敏剂和/或胺化合物，和/或（d）一种或多种具有至少两个不饱和键的化合物， 在一个分子中的不饱和键，对光和辐射具有高度敏感性，并且可以在基底上给出精确的浮雕图案。 此外，最终得到的聚酰亚胺膜的耐热性优异。

公开(公告)号：US4438189A

公开(公告)日：1984-03-20

申请号：US407488

申请日：1982-08-12

Applicant: Ulrich Geissler ,  Walter Herwig

Inventor： Ulrich Geissler ,  Walter Herwig

IPC: G03F7/038 ,  B23K35/22 ,  C08G59/40 ,  G03F7/004 ,  G03F7/027 ,  G03F7/032 ,  G03C1/68

CPC classification number: B23K35/224 ,  G03F7/027 ,  G03F7/032 ,  Y10S430/106 ,  Y10S430/114

Abstract: A radiation-polymerizable mixture is described comprising (a) a compound which has at least two terminal ethylenically unsaturated groups and which can form a crosslinked polymer by means of free radical initiated chain addition polymerization, (b) a polymeric binder, (c) a radiation-activatable polymerization initiator which can be activated by radiation, and (d) a compound which is thermally crosslinkable with the polymeric binder (b), with the polymerization product of compound (a) and/or with itself and which, if its crosslinking groups are epoxy groups, has at least three epoxy groups. A photopolymerizable copying material is also disclosed having a flexible transparent temporary support and a transferable thermoplastic photopolymerizable layer comprising the foregoing radiation-polymerizable mixture. The photopolymerizable layer, after photocrosslinking, can be additionally cured by thermal crosslinking and is therefore suitable for the manufacture of solder resists and high performance printing plates.

Abstract translation: 描述了可辐射聚合的混合物，其包含（a）具有至少两个末端烯属不饱和基团并且可以通过自由基引发的链加成聚合形成交联聚合物的化合物，（b）聚合物粘合剂，（c） 可以通过辐射活化的可辐射活化的聚合引发剂，和（d）与聚合物粘合剂（b）可热交联的化合物与化合物（a）和/或其自身的聚合产物，并且如果其交联 基团是环氧基团，具有至少三个环氧基团。 还公开了一种可光聚合的复印材料，其具有柔性透明临时支撑体和包含上述可辐射聚合混合物的可转移热塑性可光聚合层。 光致可聚合层在光致交联之后可以通过热交联进一步固化，因此适用于制造阻焊剂和高性能印刷版。

公开(公告)号：US4431723A

公开(公告)日：1984-02-14

申请号：US304371

申请日：1981-09-21

Applicant: Stephen Proskow

Inventor： Stephen Proskow

IPC: C08F289/00 ,  C08C19/20 ,  C08F279/00 ,  C08F279/02 ,  C08F297/04 ,  C08L7/00 ,  C08L9/00 ,  C08L21/00 ,  C08L23/00 ,  C08L33/00 ,  C08L33/02 ,  C08L51/00 ,  C08L51/02 ,  C08L53/00 ,  C08L53/02 ,  C08L77/00 ,  C08L101/00 ,  G03F7/004 ,  G03F7/032 ,  G03F7/033 ,  G03C1/68

CPC classification number: G03F7/033 ,  C08C19/20 ,  C08F279/02

Abstract: Photosensitive elastomeric compositions comprising about 40 to 90 weight percent of a heat workable, carboxyl- and sulfur-containing polymer of a diene; about 2 to 50 weight percent of a nongaseous, ethylenically unsaturated compound; and about 0.001 to 10 weight percent of a radical generating system; the compositions being useful for making flexographic printing plates.

Abstract translation: 包含约40至90重量％的可热加工的含羧基和含硫聚合物的感光弹性体组合物; 约2至50重量％的非气态烯属不饱和化合物; 和约0.001至10重量％的自由基产生体系; 该组合物可用于制造柔版印刷版。

公开(公告)号：US4429034A

公开(公告)日：1984-01-31

申请号：US367678

申请日：1982-04-12

Applicant: John J. Keane ,  Richard F. Zopf

Inventor： John J. Keane ,  Richard F. Zopf

IPC: G03F7/038 ,  G03C1/68

CPC classification number: G03F7/038

Abstract: A resist film composed of a water-soluble polyvinyl alcohol, a water-soluble thermosetting polymethylol cross-linking agent and a polyaryl iodonium or sulfonium salt of a complex halogenide as catalyst, when irradiated with ultraviolet light and then heated, or when heated and irradiated with ultraviolet light, under a circuit mask, provides a latent image which is developable by water alone.

Abstract translation: 作为催化剂的复合卤化物作为催化剂的水溶性聚乙烯醇，水溶性热固性多羟甲基交联剂和聚芳基碘鎓盐或锍盐组成的抗蚀剂膜，当用紫外线照射然后加热或加热和照射时 利用紫外线，在电路掩模下，提供潜像，该潜像仅由水可显影。

公开(公告)号：US4427759A

公开(公告)日：1984-01-24

申请号：US341250

申请日：1982-01-21

Applicant: Robert R. Gruetzmacher ,  Stanley H. Munger

Inventor： Robert R. Gruetzmacher ,  Stanley H. Munger

IPC: G03F7/004 ,  G03F7/00 ,  G03F7/095 ,  G03F7/11 ,  G03F7/16 ,  G03C1/68

CPC classification number: G03F7/16 ,  G03F7/0955

Abstract: Process for preparing flexographic photopolymer elements by passing into the nip of a calender a photopolymer composition mass comprising elastomeric binder, monomeric compound, and photoinitiator and calendering the photopolymer composition either between (1) a support and multilayer cover element consisting essentially of a flexible cover film, optionally a flexible polymeric film, e.g., polyamide, and a layer of elastomeric composition which is photosensitive or becomes photosensitive during or after calendering, or between (2) two supports, one of which is removed prior to contact, e.g., by lamination or pressing, with the multilayer cover element. The flexographic photopolymer elements are useful for flexographic printing, e.g., dry-offset, letterpress printing.

公开(公告)号：US4399211A

公开(公告)日：1983-08-16

申请号：US203756

申请日：1980-11-03

Applicant: Syunichi Kondo ,  Akihiro Matsufuji ,  Akira Umehara ,  Toshinao Ukai ,  Akira Sato

Inventor： Syunichi Kondo ,  Akihiro Matsufuji ,  Akira Umehara ,  Toshinao Ukai ,  Akira Sato

IPC: C08F2/00 ,  C08F2/50 ,  C08F2/54 ,  G03F7/031 ,  G03C1/68

CPC classification number: G03F7/031 ,  C08F2/50 ,  Y10S430/108 ,  Y10S430/116 ,  Y10S430/117 ,  Y10S430/121 ,  Y10S430/146

Abstract: In a photopolymerizable composition comprising, as essential components, (A) a compound having at least one ethylenically unsaturated double bond capable of undergoing addition polymerization and (B) a photopolymerization initiator, the improvement which comprises that the photopolymerization initiator comprising a combination of (a) a 5-[(arenooxazol-2-ylidene)ethylidene]-2-thiohydantoin compound represented by the general formula (I) (a 5-[(substituted benzoxazol-2'-ylidene)ethylidene]-2-thiohydantoin compound) or (II) (a 5-[substituted naphthol(1,2-D)oxazol-2-ylidene)ethylidene]-2-thiohydantoin compound) and (b) a 2,4,6-substituted-1,3,5-triazine compound represented by the formula (III): ##STR1## wherein X represents a hydrogen atom, an alkyl group, a substituted alkyl group, an alkoxy group, an aryl group, a substituted aryl group, an aryloxy group, an aralkyl group or a halogen atom; R.sup.1, R.sup.2 and R.sup.3 each represents an alkyl group, a substituted alkyl group, an alkenyl group, an aryl group, a substituted aryl group or an aralkyl group, which may be the same or different; and R.sup.4, R.sup.5 and R.sup.6 each represents an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group or an aralkyl group, which may be the same or different but at least one of which represents a mono-, di- or trihalogenomethyl group.

Abstract translation: 在包含作为必要成分的（A）具有至少一个可进行加成聚合的烯属不饱和双键的化合物和（B）光聚合引发剂）的光聚合组合物中，包括光聚合引发剂包括（a ）由通式（I）表示的5 - [（异恶唑-2-亚基）亚乙基] -2-硫代乙内酰脲化合物（5 - [（取代的苯并恶唑-2'-亚基）亚乙基] -2-硫代乙内酰脲化合物）或 （II）（5- [取代萘酚（1,2-D）恶唑-2-亚基）亚乙基] -2-硫代乙内酰脲化合物）和（b）2,4,6-取代的1,3,5- （III）表示的三嗪化合物：其中X表示氢原子，烷基，取代的烷基，烷氧基，芳基 基团，取代的芳基，芳氧基，芳烷基或卤素原子; R1，R2和R3各自表示可以相同或不同的烷基，取代的烷基，烯基，芳基，取代的芳基或芳烷基; 并且R 4，R 5和R 6各自表示烷基，取代的烷基，芳基，取代的芳基或芳烷基，其可以相同或不同，但其中至少一个表示单 - ，二 - 或三卤代甲基。

公开(公告)号：US4394435A

公开(公告)日：1983-07-19

申请号：US307360

申请日：1981-10-01

Applicant: Milton Farber ,  John R. Worns

Inventor： Milton Farber ,  John R. Worns

IPC: C08L9/00 ,  C08J3/24 ,  C08J3/28 ,  C08L7/00 ,  C08L21/00 ,  C08L47/00 ,  G03F7/00 ,  G03F7/004 ,  G03F7/033 ,  G03F7/038 ,  G03C1/68

CPC classification number: G03F7/038 ,  G03F7/033 ,  Y10S430/106 ,  Y10S430/113

Abstract: A photopolymer elastomeric article designed to be used primarily in a flexographic printing system comprising: a polymer matrix made up of a mixture of syndiotactic 1,2-polybutadiene and cis-1,4-polyisoprene; a photoinitiator, which is a compound, which when irradiated, will initiate polymerization and/or crosslinking; and optionally, 0-3 phr of photopolymerizable, ethylenically unsaturated crosslinking agent, as typified by esters of acrylic or methacrylic acid.

Abstract translation: 设计用于主要用于柔性版印刷系统的光聚合物弹性体制品，包括：由间同立构1,2-聚丁二烯和顺式-1,4-聚异戊二烯的混合物组成的聚合物基质; 光引发剂，它是一种化合物，当被照射时，其将引发聚合和/或交联; 和任选的0-3phr的可光聚合的烯属不饱和交联剂，以丙烯酸或甲基丙烯酸的酯为代表。

公开(公告)号：US4394434A

公开(公告)日：1983-07-19

申请号：US282180

申请日：1980-12-08

Applicant: Robert R. Rohloff

Inventor： Robert R. Rohloff

IPC: G03F7/004 ,  H05K3/00 ,  H05K3/18 ,  G03C1/68

CPC classification number: G03F7/0047 ,  H05K3/184 ,  H05K2201/0209 ,  H05K3/0076 ,  Y10S430/106 ,  Y10S430/109 ,  Y10S430/11 ,  Y10S430/111

Abstract: Deposition of extraneous metal on the surface of an electroless or electrolytic plating resist is reduced by dispersing into the resist formulation fumed aluminum oxide microparticles.

Abstract translation: PCT No.PCT / US80 / 00876 Sec。 371日期1980年12月8日第 102（e）1980年12月8日日期PCT提交1980年7月15日PCT公布。 出版物WO81 / 0031000 日期：1981年2月5日。通过分散到抗蚀剂配方的热解法氧化铝微粒中，可以减少无电镀或电解电镀抗蚀剂表面上的外来金属的沉积。

公开(公告)号：US4383025A

公开(公告)日：1983-05-10

申请号：US278243

申请日：1981-06-29

Applicant: George E. Green ,  Edward Irving

Inventor： George E. Green ,  Edward Irving

IPC: C08G59/68 ,  C08G65/10 ,  C08K5/41 ,  C08L61/06 ,  G03F7/029 ,  G03C1/68

CPC classification number: G03F7/029 ,  C08G59/68 ,  C08G65/105 ,  C08K5/41 ,  C08L61/06 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/124

Abstract: Substances (I) capable of being converted into higher-molecular weight materials under the influence of a cationic catalyst, such as 1,2-epoxides, aminoplasts, vinyl monomers and prepolymers, or phenoplasts, are so converted by exposure to actinic radiation in the presence of an aryl- or aroyl- carbamoylsulfoxonium salt (II) of formula ##STR1## where p is zero or 1,q is 1 to 4,Ar denotes an aromatic group,R.sup.6 denotes --H or group --COR.sup.9 or --CONH(CO).sub.r R.sup.10,R.sup.7 denotes an alkyl, alkenyl, cycloalkyl, cycloalkylalkyl, aryl, or aralkyl group,R.sup.8 has the same meaning as R.sup.7 but may alternatively represent a dialkylamino group or, if R.sup.7 denotes alkyl, it may alternatively represent an arylamino group,R.sup.9 and R.sup.10 each denote a saturated or ethylenically unsaturated radical,r is zero or 1,t is 1, 2, or 3, andZ.sup.t- denotes a t-valent anion of a protic acid.Typical salts (II) are acetanilinodimethylsufoxonium hexafluorophosphate, benzoylcarbamoyldimethylsulfoxonium hexafluorophosphate, 3,4-dichloracetanilinodimethylsulfoxonium hexafluoroarsenate, 2,4-bis(dimethylsulfoxoniummethylcarbamoyl)-toluene dihexafluorophosphate, 4-methylacetanilinodimethylsulfoxonium chloride, and tris(acetanilinodimethylsulfoxonium) orthophosphate.When I is a polyepoxide or a resol, it may be photopolymerized by means of II and subsequently crosslinked by heating with a latent heat-curing agent.

Abstract translation: 能够在阳离子催化剂如1,2-环氧化物，氨基塑料，乙烯基单体和预聚物或酚醛树脂的影响下转化为高分子量材料的物质（I）通过暴露于光化辐射 其中p为0或1，q为1至4，Ar表示芳族基团，R6表示-H或-COR9或-CONH（CO）的芳基 - 或芳酰氨基甲酰基氧基锍盐（II） ）r R 10，R 7表示烷基，烯基，环烷基，环烷基烷基，芳基或芳烷基，R 8具有与R 7相同的含义，但也可以代表二烷基氨基，或者如果R 7表示烷基，则其也可以是芳基氨基，R 9 R 10分别表示饱和或烯属不饱和基团，r为0或1，t为1,2或3，Zt-表示质子酸的t价阴离子。 典型的盐（II）是乙酰苯胺二甲基硫onium六氟磷酸盐，苯甲酰基氨基甲酰基二甲基氧化锍六氟磷酸盐，3,4-二氯乙酰苯胺二甲基氧化锍六氟砷酸盐，2,4-双（二甲基亚砜氧基甲基氨基甲酰基） - 甲苯二氟磷酸盐，4-甲基乙酰苯胺二甲基氧化锍氯化物和三（乙酰苯胺二甲基氧化锍）正磷酸盐。 当我是聚环氧化物或甲阶酚醛树脂时，它可以通过II进行光聚合，然后通过用潜热固化剂加热交联。