公开(公告)号：US08366991B2

公开(公告)日：2013-02-05

申请号：US12883729

申请日：2010-09-16

申请人： Koji Yamada ,  Masahiko Ogino ,  Nobuyasu Ezawa ,  Hiroshi Inoue

发明人： Koji Yamada ,  Masahiko Ogino ,  Nobuyasu Ezawa ,  Hiroshi Inoue

IPC分类号： C21B7/00

CPC分类号： C22B9/16 ,  C22B11/02 ,  C22B11/021 ,  C22B11/026 ,  C22B15/0054 ,  Y02P10/214

摘要： An apparatus for recovering platinum group elements comprises a furnace body having an interior space substantially shot off from external air, a material charging port and an exhaust port provided in an upper half of the furnace body, at least two fluid discharge ports provided in a lower half of the furnace body at different height levels. a material charging chute connected to the material charging port. an exhaust unit connected to the exhaust port; and electrodes for passing electric current through and heating material charged into the furnace. The material charging chute is equipped with a vertical two stage shutter so as to maintain airtightness when material is charged into the interior space of the furnace.

摘要翻译： 用于回收铂族元件的装置包括：炉体，其具有基本上从外部空气射出的内部空间;设置在炉体上半部的材料加料口和排气口，设置在下部的至少两个流体排出口 一半的炉体在不同的高度水平。 材料充电槽连接到材料充电口。 连接到排气口的排气单元; 以及用于使电流通过并加热到炉中的材料的电极。 材料装料槽装备有一个垂直的两级挡板，以便当材料装入炉子的内部空间时保持气密性。

公开(公告)号：US20130001835A1

公开(公告)日：2013-01-03

申请号：US13603455

申请日：2012-09-05

申请人： Satoshi ISHII ,  Masahiko OGINO ,  Noritake SHIZAWA ,  Kyoichi MORI ,  Akihiro MIYAUCHI

发明人： Satoshi ISHII ,  Masahiko OGINO ,  Noritake SHIZAWA ,  Kyoichi MORI ,  Akihiro MIYAUCHI

IPC分类号： B29C43/32

CPC分类号： B29C59/022 ,  B29C35/02 ,  B29C35/0888 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： An object of the present invention is to provide a stamper for transferring fine pattern and a method for manufacturing the stamper, the stamper has a fine structure layer to improve a continuous transferring property of the resinous stamper, and to allow accurate and continuous transferring. In order to achieve the above object, the present invention provides a stamper for transferring fine pattern, including: a fine structure layer on a supporting substrate, in which the fine structure layer is a polymer of a resinous compound whose principal component is silsesquioxane derivative having a plurality of polymerizable functional groups.

摘要翻译： 本发明的目的是提供一种用于转印精细图案的压模和用于制造压模的方法，压模具有精细的结构层，以提高树脂压模的连续转印性能，并允许精确和连续的转印。 为了实现上述目的，本发明提供了一种用于转印精细图案的压模，包括：支撑基板上的精细结构层，其中精细结构层是主成分为倍半硅氧烷衍生物的树脂化合物的聚合物， 多个聚合性官能团。

公开(公告)号：US20120321738A1

公开(公告)日：2012-12-20

申请号：US13581169

申请日：2011-02-16

申请人： Satoshi Ishii ,  Masahiko Ogino ,  Noritake Shizawa ,  Kyoichi Mori ,  Akihiro Miyauchi

发明人： Satoshi Ishii ,  Masahiko Ogino ,  Noritake Shizawa ,  Kyoichi Mori ,  Akihiro Miyauchi

IPC分类号： B29C59/16 ,  B29C59/02

CPC分类号： G11B5/855 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0757

摘要： A micro-pattern transferring stamper includes a supporting base material and a microstructure layer formed on the supporting base material, the microstructure layer is a polymer of a resin composition that mainly contains a silsesquioxane derivative containing a plurality of polymerizable functional groups, and one or plural kinds of monomer elements containing a plurality of polymerizable functional groups.

摘要翻译： 微图案转印模具包括支撑基材和形成在支撑基材上的微结构层，微结构层是主要包含含有多个可聚合官能团的倍半硅氧烷衍生物的树脂组合物的聚合物，以及一个或多个 含有多个聚合性官能团的单体元素种类。

公开(公告)号：US20120205838A1

公开(公告)日：2012-08-16

申请号：US13370413

申请日：2012-02-10

申请人： Ryuta WASHIYA ,  Masahiko Ogino ,  Noritake Shizawa ,  Kyoichi Mori ,  Akihiro Miyauchi

发明人： Ryuta WASHIYA ,  Masahiko Ogino ,  Noritake Shizawa ,  Kyoichi Mori ,  Akihiro Miyauchi

IPC分类号： B29C59/16

CPC分类号： G03F7/0002 ,  B29C33/3878 ,  B82Y10/00 ,  B82Y40/00

摘要： A microstructure transferring device is characterized in that the device comprises a stamper made from a first photo-curable resin composition cured with light with a first wavelength, and a light source emitting light with a second wavelength longer than the first wavelength. The microstructure is transferred to an impression receptor supplied with a second photo-curable resin composition, which is curable with light with the second wavelength emitted by the light source.

摘要翻译： 微结构转印装置的特征在于，该装置包括由用第一波长的光固化的第一光固化树脂组合物制成的压模和发射长于第一波长的第二波长的光的光源。 将微结构转移到提供有第二光固化树脂组合物的印模受体中，该第二光固化树脂组合物可用由光源发出的第二波长的光固化。

公开(公告)号：US08132505B2

公开(公告)日：2012-03-13

申请号：US11774216

申请日：2007-07-06

申请人： Kosuke Kuwabara ,  Takashi Ando ,  Masahiko Ogino ,  Hiroshi Yoshida ,  Yasuhiko Tada

发明人： Kosuke Kuwabara ,  Takashi Ando ,  Masahiko Ogino ,  Hiroshi Yoshida ,  Yasuhiko Tada

IPC分类号： B31F1/07

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G11B5/855 ,  H01L21/76817

摘要： The present invention provides an imprint apparatus transferring a surface structure of a stamper to material to be patterned by allowing the stamper come in contact with the material to be patterned. The imprint apparatus includes a holding means that holds the material to be patterned and the stamper with a distance therebetween, a pressure reduction means that reduces pressure of a chamber in which the material to be patterned and the stamper are placed, and an alignment means that aligns the stamper with the material to be patterned.

摘要翻译： 本发明提供一种压印装置，通过允许压模与待图案化的材料接触，将压模的表面结构转移到待图案化的材料。 压印装置包括保持装置，其保持要被图案化的材料和压模之间的距离;减压装置，其减小其中待图案化材料和压模放置的室的压力;以及对准装置， 将压模与待图案化的材料对准。

公开(公告)号：US08109752B2

公开(公告)日：2012-02-07

申请号：US12146489

申请日：2008-06-26

申请人： Kenya Ohashi ,  Masahiko Ogino ,  Akihiro Miyauchi

发明人： Kenya Ohashi ,  Masahiko Ogino ,  Akihiro Miyauchi

IPC分类号： B29C59/00

CPC分类号： B29C33/424 ,  B29C33/40 ,  B29C33/565 ,  B29C59/022 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10T156/1041

摘要： An imprinting stamper which can transfer a microscopic pattern to a medium bearing a convex area or local projection, with high accuracy. A convexo-concave pattern is formed on a surface of the imprinting stamper. It includes a pattern layer having the convexo-concave pattern; and a stamper backside layer arranged on a backside of the pattern layer. Young's modulus of the pattern layer is 500 MPa to 10 GPa; and Young's modulus of the stamper backside layer is smaller than Young's modulus of the pattern layer.

摘要翻译： 一种能够以高精度将微观图案转印到具有凸区域或局部投影的介质的压印模。 在印模压模的表面上形成凹凸图案。 它包括具有凹凸图案的图案层; 以及设置在图案层的背面上的压模背面层。 图案层的杨氏模量为500MPa至10GPa; 并且压模背面层的杨氏模量小于图案层的杨氏模量。

公开(公告)号：US08083515B2

公开(公告)日：2011-12-27

申请号：US12129881

申请日：2008-05-30

申请人： Masahiko Ogino ,  Mitsuru Hasegawa ,  Kenya Ohashi ,  Akihiro Miyauchi ,  Hitoshi Suzuki ,  Toshio Haba ,  Haruo Akahoshi

发明人： Masahiko Ogino ,  Mitsuru Hasegawa ,  Kenya Ohashi ,  Akihiro Miyauchi ,  Hitoshi Suzuki ,  Toshio Haba ,  Haruo Akahoshi

IPC分类号： B29C43/46 ,  B29C59/04

CPC分类号： B29C33/3878 ,  B29C33/424 ,  C25D1/02 ,  C25D1/10 ,  Y10S425/81 ,  Y10T29/49549 ,  Y10T29/49552

摘要： The fine pattern mold comprises: that includes a roll, a buffer tube with inner peripheral surface is in contact with an outer peripheral surface of the roll, and a stamper tube in which its inner peripheral surface is in contact with an outer peripheral surface of the buffer tube and a fine concave/convex pattern is formed on its outer peripheral surface, wherein the buffer tube has a larger coefficient of linear expansion and a smaller elastic modulus than those of the stamper tube.

摘要翻译： 精细图案模具包括：包括辊，具有内周表面的缓冲管与辊的外周表面接触;以及压模管，其内周表面与所述辊的外周表面接触 在其外周面形成有缓冲管和细凹凸图案，其中缓冲管具有比压模管更大的线膨胀系数和更小的弹性模量。

公开(公告)号：US20110305787A1

公开(公告)日：2011-12-15

申请号：US13157403

申请日：2011-06-10

申请人： Satoshi ISHII ,  Masahiko Ogino ,  Noritake Shizawa ,  Kyoichi Mori ,  Akihiro Miyauchi ,  Naoaki Yamashita ,  Toshimitsu Shiraishi ,  Takashi Tarumitsu

发明人： Satoshi ISHII ,  Masahiko Ogino ,  Noritake Shizawa ,  Kyoichi Mori ,  Akihiro Miyauchi ,  Naoaki Yamashita ,  Toshimitsu Shiraishi ,  Takashi Tarumitsu

IPC分类号： B29C59/02

CPC分类号： G11B5/855 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G11B7/263

摘要： A stamper is used for the transfer of microscopic structures, the stamper including a base and a microscopic structure layer on a surface thereof, in which the microscopic structure layer has a surface layer including a polymer derived from a resin composition containing a polymerization initiator and a silsesquioxane derivative having two or more polymerizable functional groups, the microscopic structure layer has a modulus of elasticity of less than 2.0 GPa and has a thickness of 4 times or more the height of a microscopic structure formed on the surface of the microscopic structure layer.

摘要翻译： 压模用于微观结构的传递，压模在其表面上包括基底和微观结构层，其中微观结构层具有包括由含有聚合引发剂的树脂组合物衍生的聚合物的表面层和 具有两个或更多个可聚合官能团的倍半硅氧烷衍生物，微观结构层的弹性模量小于2.0GPa，并且具有在微观结构层的表面上形成的微观结构的高度的4倍以上的厚度。

公开(公告)号：US07887723B2

公开(公告)日：2011-02-15

申请号：US11623817

申请日：2007-01-17

申请人： Kenji Murao ,  Kosuke Kuwabara ,  Masahiko Ogino

发明人： Kenji Murao ,  Kosuke Kuwabara ,  Masahiko Ogino

IPC分类号： B29C65/00

CPC分类号： B81C1/0046 ,  B29C43/021 ,  B29C2043/025 ,  B81B2201/0214 ,  B81B2203/0361 ,  B81C2201/0153 ,  B82Y10/00 ,  B82Y15/00 ,  B82Y40/00 ,  G03F7/0002

摘要： It is an object of the present invention to provide a method which can easily and selectively modify specific sites on indentations or protrusions of indentation/protrusion structures fabricated by nano-imprinting. Pressing a mold having indentation/protrusion structures onto a polymer substrate comprising at least two layers of different chemical composition exposes the second layer, which has been covered by the outermost layer, in pillars formed as a result of the pressing. Site-specific chemical modification of the pillars can be achieved by formulating a desired chemical composition for the second layer beforehand, or by chemical modification of the exposed second layer cross-sections in the pillars.

摘要翻译： 本发明的一个目的是提供一种方法，其可以容易且选择性地改变通过纳米压印制造的压痕/突起结构的凹陷或凸起上的特定部位。 将具有凹陷/突起结构的模具压到包含至少两层不同化学组成的聚合物基材上，将由最外层覆盖的第二层暴露在由压制形成的柱中。 可以通过预先为第二层配制所需的化学组合物，或者通过化学修饰柱中暴露的第二层横截面来实现柱的特定位点的化学修饰。

公开(公告)号：US20100310773A1

公开(公告)日：2010-12-09

申请号：US12859802

申请日：2010-08-20

申请人： Hiroshi Yoshida ,  Haruo Akahoshi ,  Akihiro Miyauchi ,  Masahiko Ogino

发明人： Hiroshi Yoshida ,  Haruo Akahoshi ,  Akihiro Miyauchi ,  Masahiko Ogino

IPC分类号： B05D3/10

CPC分类号： B29C33/3842 ,  B29C33/424 ,  B81B2203/0361 ,  B81C1/00111 ,  B81C1/00206 ,  B81C99/0085 ,  B81C99/009 ,  B81C2201/034 ,  B82Y10/00 ,  B82Y40/00 ,  C23C18/1608 ,  C23C18/1651 ,  C23C18/1653 ,  C23C18/1657 ,  C23C18/1689 ,  C23C18/208 ,  C23C18/42 ,  G03F7/0002 ,  H01J1/304 ,  H01J9/025 ,  Y10T428/12389 ,  Y10T428/12993

摘要： A fine metal structure having its surface furnished with microprojections of high strength, high precision and large aspect ratio; and a process for producing the fine metal structure free of defects. There is provided a fine metal structure having its surface furnished with microprojections, characterized in that the microprojections have a minimum thickness or minimum diameter ranging from 10 nanometers to 10 micrometers and that the ratio between minimum thickness or minimum diameter (D) of microprojections and height of microprojections (H), H/D, is greater than 1. There is further provided a process for producing a fine metal structure, characterized by comprising providing a substrate having a fine rugged pattern on its surface, applying a molecular electroless plating catalyst to the surface, thereafter carrying out electroless plating to thereby form a metal layer having the rugged pattern filled, and detaching the metal layer from the substrate to thereby obtain a fine metal structure furnished with a surface having undergone reversal transfer of the above rugged pattern.

摘要翻译： 精细的金属结构，其表面具有高强度，高精度和大纵横比的微喷射体; 以及没有缺陷的金属微细结构的制造方法。 提供了具有微喷射体的表面的细金属结构，其特征在于，微喷射体具有10纳米至10微米的最小厚度或最小直径，并且微喷射体的最小厚度或最小直径（D）与高度 的微喷射体（H）H / D大于1.还提供了一种制造精细金属结构的方法，其特征在于，在其表面上提供具有细凹凸图案的基板，将分子无电镀催化剂 然后进行无电解电镀，从而形成具有凹凸图案的金属层，并将金属层与基板分离，从而获得配备有经过上述凹凸图案的反转传送的表面的精细金属结构。