Semiconductor device and fabrication methods thereof
    52.
    发明授权
    Semiconductor device and fabrication methods thereof 有权
    半导体器件及其制造方法

    公开(公告)号:US07888236B2

    公开(公告)日:2011-02-15

    申请号:US11798432

    申请日:2007-05-14

    IPC分类号: H01L21/00

    摘要: A method for packaging a semiconductor device disclosed. A substrate comprising a plurality of dies, separated by scribe line areas respectively is provided, wherein at least one layer is overlying the substrate. A portion of the layer within the scribe lines area is removed by photolithography and etching to form openings. The substrate is sawed along the scribe line areas, passing the openings. In alternative embodiment, a first substrate comprising a plurality of first dies separated by first scribe line areas respectively is provided, wherein at least one first structural layer is overlying the first substrate. The first structural layer is patterned to form first openings within the first scribe line areas. A second substrate comprising a plurality of second dies separated by second scribe line areas respectively is provided, wherein at least one second structural layer is overlying the substrate. The second structural layer is patterned to form second openings within the second scribe line areas. The first substrate and the second substrate are bonded to form a stack structure. The stack structure is cut along the first and second scribe line areas, passing the first and second openings.

    摘要翻译: 一种封装半导体器件的方法。 提供了包括分别由划线区域分隔的多个管芯的衬底,其中至少一层覆盖衬底。 通过光刻和蚀刻去除划线部分内的层的一部分以形成开口。 沿着划线区域锯切基板,通过开口。 在替代实施例中,提供了包括分别由第一划线区域分开的多个第一裸片的第一衬底,其中至少一个第一结构层覆盖在第一衬底上。 图案化第一结构层以在第一划线区域内形成第一开口。 提供了包括分别由第二划线区域分开的多个第二裸片的第二衬底,其中至少一个第二结构层覆盖在衬底上。 图案化第二结构层以在第二划线区域内形成第二开口。 第一基板和第二基板被接合以形成堆叠结构。 沿着第一和第二划线区域切割堆叠结构,使第一和第二开口通过。

    Semiconductor device and fabrication methods thereof
    53.
    发明申请
    Semiconductor device and fabrication methods thereof 有权
    半导体器件及其制造方法

    公开(公告)号:US20080286938A1

    公开(公告)日:2008-11-20

    申请号:US11798432

    申请日:2007-05-14

    IPC分类号: H01L21/30

    摘要: A method for packaging a semiconductor device disclosed. A substrate comprising a plurality of dies, separated by scribe line areas respectively is provided, wherein at least one layer is overlying the substrate. A portion of the layer within the scribe lines area is removed by photolithography and etching to form openings. The substrate is sawed along the scribe line areas, passing the openings. In alternative embodiment, a first substrate comprising a plurality of first dies separated by first scribe line areas respectively is provided, wherein at least one first structural layer is overlying the first substrate. The first structural layer is patterned to form first openings within the first scribe line areas. A second substrate comprising a plurality of second dies separated by second scribe line areas respectively is provided, wherein at least one second structural layer is overlying the substrate. The second structural layer is patterned to form second openings within the second scribe line areas. The first substrate and the second substrate are bonded to form a stack structure. The stack structure is cut along the first and second scribe line areas, passing the first and second openings.

    摘要翻译: 一种封装半导体器件的方法。 提供了包括分别由划线区域分隔的多个管芯的衬底,其中至少一层覆盖衬底。 通过光刻和蚀刻去除划线部分内的层的一部分以形成开口。 沿着划线区域锯切基板,通过开口。 在替代实施例中,提供了包括分别由第一划线区域分开的多个第一裸片的第一衬底,其中至少一个第一结构层覆盖在第一衬底上。 图案化第一结构层以在第一划线区域内形成第一开口。 提供了包括分别由第二划线区域分隔的多个第二模具的第二衬底,其中至少一个第二结构层覆盖在衬底上。 图案化第二结构层以在第二划线区域内形成第二开口。 第一基板和第二基板被接合以形成堆叠结构。 沿着第一和第二划线区域切割堆叠结构,使第一和第二开口通过。

    Method to control the pretilt angle of liquid crystal device
    57.
    发明授权
    Method to control the pretilt angle of liquid crystal device 有权
    控制液晶装置预倾角的方法

    公开(公告)号:US07554639B2

    公开(公告)日:2009-06-30

    申请号:US11520679

    申请日:2006-09-14

    IPC分类号: G02F1/1337

    摘要: A method to control the pretilt angle of a liquid crystal device is disclosed. The claimed invention provides two substrates and at least one vertical alignment layers, which are fabricated on one side of each substrate and are opposite to each other. Moreover, a liquid crystal layer is sandwiched between the alignment layers, and the preferred embodiment of the liquid crystal device has an Optically Compensated Birefrigence (OCB) configuration. More particularly, before the process of alignment for the liquid crystal device is performed, a pretilt angle disclosed in the present invention is adjusted since at least one vertical alignment layer is treated with a particle beam generated by plasma or ions. The pretilt angle can range between 5 and 85 degrees.

    摘要翻译: 公开了一种控制液晶装置预倾角的方法。 要求保护的发明提供了两个基板和至少一个垂直取向层,其被制造在每个基板的一侧上并且彼此相对。 此外,液晶层夹在取向层之间,液晶装置的优选实施例具有光学补偿双折射(OCB)构造。 更具体地说,在进行液晶装置的对准处理之前,调整本发明中公开的预倾角,因为至少一个垂直取向层用等离子体或离子产生的粒子束进行处理。 预倾角可以在5到85度之间。

    Method to control the pretilt angle of liquid crystal device
    59.
    发明申请
    Method to control the pretilt angle of liquid crystal device 有权
    控制液晶装置预倾角的方法

    公开(公告)号:US20070263151A1

    公开(公告)日:2007-11-15

    申请号:US11520679

    申请日:2006-09-14

    IPC分类号: G02F1/1337

    摘要: A method to control the pretilt angle of a liquid crystal device is disclosed. The claimed invention provides two substrates and at least one vertical alignment layers, which are fabricated on one side of each substrate and are opposite to each other. Moreover, a liquid crystal layer is sandwiched between the alignment layers, and the preferred embodiment of the liquid crystal device has an Optically Compensated Birefrigence (OCB) configuration. More particularly, before the process of alignment for the liquid crystal device is performed, a pretilt angle disclosed in the present invention is adjusted since at least one vertical alignment layer is treated with a particle beam generated by plasma or ions. The pretilt angle can range between 5 and 85 degrees.

    摘要翻译: 公开了一种控制液晶装置预倾角的方法。 要求保护的发明提供了两个基板和至少一个垂直取向层,其被制造在每个基板的一侧上并且彼此相对。 此外,液晶层夹在取向层之间,液晶装置的优选实施例具有光学补偿双折射(OCB)构造。 更具体地说,在进行液晶装置的对准处理之前,调整本发明中公开的预倾角,因为至少一个垂直取向层用等离子体或离子产生的粒子束进行处理。 预倾角可以在5到85度之间。

    Method for alignment of liquid crystal molecules by using hydrogen ion beam
    60.
    发明申请
    Method for alignment of liquid crystal molecules by using hydrogen ion beam 有权
    使用氢离子束对液晶分子进行取向的方法

    公开(公告)号:US20070002270A1

    公开(公告)日:2007-01-04

    申请号:US11242919

    申请日:2005-10-05

    IPC分类号: G02F1/1337

    CPC分类号: G02F1/133788

    摘要: A method that uses at least one hydrogen ion beam for alignment of liquid crystal molecules is proposed in the present invention. The method of the present invention is proposed to resolve the problems of physical destruction and surface deterioration of the alignment films caused by the conventional method using argon ions beams. The method of the present invention directly uses at least one hydrogen ion beam to impact the alignment film. Hence, the physical destruction of the alignment film is reduced. In addition, via the reaction between hydrogen ions and the alignment films, the quality of the alignment film is improved.

    摘要翻译: 在本发明中提出了使用至少一个氢离子束来对准液晶分子的方法。 提出本发明的方法,以解决由使用氩离子束的常规方法引起的取向膜的物理破坏和表面劣化的问题。 本发明的方法直接使用至少一个氢离子束来冲击取向膜。 因此,取向膜的物理破坏减小。 此外,通过氢离子和取向膜之间的反应,取向膜的质量得到改善。