公开(公告)号：US09703024B2

公开(公告)日：2017-07-11

申请号：US15346884

申请日：2016-11-09

Applicant: Intermolecular Inc. ,  Guardian Industries Corp.

Inventor： Guizhen Zhang ,  Brent Boyce ,  Jeremy Cheng ,  Guowen Ding ,  Muhammad Imran ,  Daniel Schweigert ,  Yongli Xu

IPC: G02B5/20 ,  C03C17/36 ,  C03C23/00 ,  C23C14/08 ,  C23C14/14 ,  C23C14/22 ,  E06B9/24 ,  G02B5/26

CPC classification number: G02B5/208 ,  B29D11/00865 ,  C03C17/36 ,  C03C17/3626 ,  C03C17/3639 ,  C03C17/3644 ,  C03C17/366 ,  C03C17/3681 ,  C03C23/007 ,  C03C2217/43 ,  C03C2217/48 ,  C03C2218/154 ,  C23C14/083 ,  C23C14/085 ,  C23C14/14 ,  C23C14/22 ,  E06B9/24 ,  E06B2009/2417 ,  E06B2009/2464 ,  G02B5/26 ,  G02F1/091 ,  G02F2001/094 ,  Y10T428/24975 ,  Y10T428/265

Abstract: Disclosed herein are systems, methods, and apparatus for forming low emissivity panels that may include a substrate and a reflective layer formed over the substrate. The low emissivity panels may further include a top dielectric layer formed over the reflective layer such that the reflective layer is formed between the top dielectric layer and the substrate. The top dielectric layer may include a ternary metal oxide, such as zinc tin aluminum oxide. The top dielectric layer may also include aluminum. The concentration of aluminum may be between about 1 atomic % and 15 atomic % or between about 2 atomic % and 10 atomic %. An atomic ratio of zinc to tin in the top dielectric layer may be between about 0.67 and about 1.5 or between about 0.9 and about 1.1.

公开(公告)号：US09499899B2

公开(公告)日：2016-11-22

申请号：US14139350

申请日：2013-12-23

Applicant: INTERMOLECULAR INC. ,  Guardian Industries Corp.

Inventor： Guizhen Zhang ,  Brent Boyce ,  Jeremy Cheng ,  Guowen Ding ,  Muhammad Imran ,  Minh Huu Le ,  Daniel Schweigert ,  Yongli Xu

IPC: C23C14/08 ,  C03C17/36 ,  G02B5/26 ,  E06B9/24 ,  G02F1/09 ,  B29D11/00 ,  C23C14/14

CPC classification number: G02B5/208 ,  B29D11/00865 ,  C03C17/36 ,  C03C17/3626 ,  C03C17/3639 ,  C03C17/3644 ,  C03C17/366 ,  C03C17/3681 ,  C03C23/007 ,  C03C2217/43 ,  C03C2217/48 ,  C03C2218/154 ,  C23C14/083 ,  C23C14/085 ,  C23C14/14 ,  C23C14/22 ,  E06B9/24 ,  E06B2009/2417 ,  E06B2009/2464 ,  G02B5/26 ,  G02F1/091 ,  G02F2001/094 ,  Y10T428/24975 ,  Y10T428/265

Abstract: Disclosed herein are systems, methods, and apparatus for forming low emissivity panels that may include a substrate and a reflective layer formed over the substrate. The low emissivity panels may further include a top dielectric layer formed over the reflective layer such that the reflective layer is formed between the top dielectric layer and the substrate. The top dielectric layer may include a ternary metal oxide, such as zinc tin aluminum oxide. The top dielectric layer may also include aluminum. The concentration of aluminum may be between about 1 atomic % and 15 atomic % or between about 2 atomic % and 10 atomic %. An atomic ratio of zinc to tin in the top dielectric layer may be between about 0.67 and about 1.5 or between about 0.9 and about 1.1.

Abstract translation: 本文公开了用于形成低辐射率面板的系统，方法和装置，其可以包括衬底和形成在衬底上的反射层。 低发射率面板还可以包括在反射层上形成的顶部电介质层，使得反射层形成在顶部电介质层和衬底之间。 顶部介电层可以包括三元金属氧化物，例如锌锡氧化铝。 顶部电介质层也可以包括铝。 铝的浓度可以在约1原子％至15原子％之间或约2原子％至10原子％之间。 顶部电介质层中锌与锡的原子比可以在约0.67至约1.5之间或约0.9至约1.1之间。

公开(公告)号：US09481924B2

公开(公告)日：2016-11-01

申请号：US14293126

申请日：2014-06-02

Applicant: Intermolecular Inc.

Inventor： Guowen Ding ,  Tong Ju ,  Minh Huu Le ,  Daniel Schweigert ,  Guizhen Zhang

IPC: B32B15/04 ,  B32B17/06 ,  C23C14/02 ,  C23C14/06 ,  C03C17/00

CPC classification number: C23C14/024 ,  C03C17/00 ,  C03C17/36 ,  C03C17/3639 ,  C03C17/3652 ,  C03C17/366 ,  C03C17/3681 ,  C23C14/0652 ,  Y10T428/26

Abstract: Methods, and coated panels fabricated from the methods, are disclosed to form multiple coatings, (e.g., one or more infrared reflective layers), with minimal color change before and after heat treatments. For example, by adding appropriate seed layers between the IR reflective layers and the base oxide layers, the color performance can be maintained regardless of high temperature processes. The optical filler layers can include a metal oxide layer. In some embodiments, the seed layer can include nickel, titanium, and niobium, forming a nickel titanium niobium alloy such as NiTiNb.

公开(公告)号：US09394198B2

公开(公告)日：2016-07-19

申请号：US14097463

申请日：2013-12-05

Applicant: Intermolecular, Inc.

Inventor： Guowen Ding ,  Minh Huu Le

IPC: C03C17/34 ,  B05D7/00

CPC classification number: C03C17/3435 ,  B05D7/56 ,  B05D7/58 ,  C03C17/3411 ,  C03C17/3441 ,  C03C2217/78 ,  C03C2218/328 ,  Y10T428/30

Abstract: Embodiments provided herein describe abrasion resistant glass coatings and methods for forming abrasion resistant glass coatings. A glass body is provided. An abrasion resistant layer is formed above the glass body. The abrasion resistant layer includes an amorphous carbon. A pull-up layer is formed above the abrasion resistant layer. A protective layer is formed above the pull-up layer. The protective layer may include a titanium-based nitride. The pull-up lay may include tungsten oxide, zirconium oxide, manganese oxide, molybdenum oxide, titanium oxide, or a combination thereof.

Abstract translation: 本文提供的实施方案描述了耐磨玻璃涂层和用于形成耐磨玻璃涂层的方法。 提供玻璃体。 在玻璃体的上方形成耐磨层。 耐磨层包括无定形碳。 在耐磨层上形成上拉层。 在上拉层上形成保护层。 保护层可以包括钛基氮化物。 上拉层可以包括氧化钨，氧化锆，氧化锰，氧化钼，氧化钛或其组合。

公开(公告)号：US09365450B2

公开(公告)日：2016-06-14

申请号：US13728042

申请日：2012-12-27

Applicant: Intermolecular Inc. ,  Guardian Industries Corp.

Inventor： Guowen Ding ,  Brent Boyce ,  Muhammad Imran ,  Minh Huu Le ,  Zhi-Wen Sun ,  Yu Wang ,  Yongli Xu

IPC: C03C17/36

CPC classification number: C03C17/36 ,  C03C17/3618 ,  C03C17/3644 ,  C03C17/366 ,  C03C17/3681 ,  C03C2217/734 ,  Y10T428/24975

Abstract: Low emissivity coated panels can be fabricated using a base layer having a low refractive index layer on a high refractive index layer. The low refractive index layer can have refractive index less than 1.5, and can include MgF2, CaF2, SiO2, or BO. The high refractive index layer can have refractive index greater than 2.3, and can include TiOx, NbOx, or BiOx. The multilayer base structure can allow color tuning with enhanced transmission, for example, as compared to similar structures having single layer base layer.

Abstract translation: 可以使用在高折射率层上具有低折射率层的基底层来制造低发射率涂层面板。 低折射率层可以具有小于1.5的折射率，并且可以包括MgF 2，CaF 2，SiO 2或BO。 高折射率层可以具有大于2.3的折射率，并且可以包括TiO x，NbO x或BiO x。 与具有单层基底层的类似结构相比，多层基底结构可以允许具有增强的透射率的颜色调节。

公开(公告)号：US20160102013A1

公开(公告)日：2016-04-14

申请号：US14512644

申请日：2014-10-13

Applicant: Intermolecular Inc.

Inventor： Guizhen Zhang ,  Jeremy Cheng ,  Guowen Ding ,  Tong Ju ,  Minh Huu Le ,  Daniel Schweigert

IPC: C03C17/34 ,  G02B1/10 ,  G02B5/28 ,  C23C14/34 ,  C23C14/18 ,  C23C14/08 ,  C03C17/36 ,  C23C14/00

CPC classification number: C03C17/3411 ,  C03C17/36 ,  C03C17/3613 ,  C03C17/3618 ,  C03C17/3639 ,  C03C17/3644 ,  C03C17/366 ,  C23C14/0036 ,  C23C14/083 ,  C23C14/086 ,  C23C14/185 ,  C23C14/3464 ,  G02B1/10 ,  G02B5/208 ,  G02B5/282

Abstract: Embodiments provided herein describe low-e panels and methods for forming low-e panels. A transparent substrate is provided. A reflective layer is formed above the transparent substrate. A metal oxide layer is formed between the transparent substrate and the reflective layer. A base layer is formed between transparent substrate and the metal oxide layer. The base layer has a first refractive index. A dielectric layer is formed between the base layer and the metal oxide layer. The dielectric layer has a second refractive index.

Abstract translation: 本文提供的实施例描述了用于形成低e板的低e板和方法。 提供透明基板。 在透明基板的上方形成反射层。 在透明基板和反射层之间形成金属氧化物层。 在透明基板和金属氧化物层之间形成基层。 基层具有第一折射率。 在基底层和金属氧化物层之间形成介电层。 电介质层具有第二折射率。

公开(公告)号：US09309149B2

公开(公告)日：2016-04-12

申请号：US14144828

申请日：2013-12-31

Applicant: Intermolecular Inc.

Inventor： Guowen Ding ,  Brent Boyce ,  Jeremy Cheng ,  Jose Ferreira ,  Muhammad Imran ,  Minh Huu Le ,  Daniel Schweigert ,  Yu Wang ,  Yongli Xu ,  Guizhen Zhang

IPC: C03C17/36 ,  C03C17/34 ,  C03C25/22 ,  C23C14/08 ,  C23C14/06 ,  C23C14/00

CPC classification number: C03C17/366 ,  C03C17/3435 ,  C03C17/36 ,  C03C17/3613 ,  C03C17/3618 ,  C03C17/3626 ,  C03C17/3639 ,  C03C17/3644 ,  C03C17/3681 ,  C03C25/226 ,  C03C2218/155 ,  C23C14/0036 ,  C23C14/0652 ,  C23C14/0688 ,  C23C14/083 ,  C23C14/086

Abstract: Disclosed herein are systems, methods, and apparatus for forming a low emissivity panel. In various embodiments, a partially fabricated panel may be provided. The partially fabricated panel may include a substrate, a reflective layer formed over the substrate, and a top dielectric layer formed over the reflective layer such that the reflective layer is formed between the substrate and the top dielectric layer. The top dielectric layer may include tin having an oxidation state of +4. An interface layer may be formed over the top dielectric layer. A top diffusion layer may be formed over the interface layer. The top diffusion layer may be formed in a nitrogen plasma environment. The interface layer may substantially prevent nitrogen from the nitrogen plasma environment from reaching the top dielectric layer and changing the oxidation state of tin included in the top dielectric layer.

Abstract translation: 本文公开了用于形成低发射率面板的系统，方法和装置。 在各种实施例中，可以提供部分制造的面板。 部分制造的面板可以包括衬底，在衬底上形成的反射层，以及形成在反射层上的顶部电介质层，使得反射层形成在衬底和顶部电介质层之间。 顶部电介质层可以包括具有+4的氧化态的锡。 界面层可以形成在顶部介电层上。 可以在界面层上形成顶部扩散层。 顶部扩散层可以在氮等离子体环境中形成。 界面层可以基本上防止来自氮等离子体环境的氮到达顶部电介质层并改变顶部电介质层中包含的锡的氧化态。

公开(公告)号：US09297938B2

公开(公告)日：2016-03-29

申请号：US13715528

申请日：2012-12-14

Applicant: Intermolecular Inc.

Inventor： Minh Huu Le ,  Brent Boyce ,  Guowen Ding ,  Mohd Fadzli Anwar Hassan ,  Zhi-Wen Wen Sun

IPC: G02B5/20 ,  F21V9/04

CPC classification number: G02B5/208

Abstract: A method for making low emissivity panels, comprising forming a patterned layer on a transparent substrate. The patterned layers can offer different color schemes or different decorative appearance styles for the coated panels, or can offer gradable thermal efficiency through the patterned layers.

Abstract translation: 一种制造低辐射面板的方法，包括在透明基底上形成图案层。 图案化的层可以为涂覆的面板提供不同的配色方案或不同的装饰外观样式，或者可以通过图案化层提供可分级的热效率。

公开(公告)号：US20150368152A1

公开(公告)日：2015-12-24

申请号：US14312104

申请日：2014-06-23

Applicant: Intermolecular Inc.

Inventor： Tong Ju ,  Jeremy Cheng ,  Guowen Ding ,  Minh Huu Le ,  Daniel Schweigert ,  Guizhen Zhang

IPC: C03C17/34 ,  C23C14/08 ,  C23C14/22

CPC classification number: C03C17/3417 ,  C03C17/36 ,  C03C17/3618 ,  C03C17/3644 ,  C03C17/366 ,  C03C2217/211 ,  C03C2217/214 ,  C03C2217/216 ,  C03C2217/218 ,  C03C2217/29 ,  C03C2217/732 ,  C03C2217/74 ,  C03C2218/15 ,  C23C14/081 ,  C23C14/086 ,  C23C14/185 ,  C23C14/3464

Abstract: Embodiments provided herein describe low-e panels and methods for forming low-e panels. A transparent substrate is provided. A reflective layer is formed above the transparent substrate. A dielectric layer is formed between the transparent substrate and the reflective layer. The dielectric layer includes niobium, tin, and aluminum.

Abstract translation: 本文提供的实施例描述了用于形成低e板的低e板和方法。 提供透明基板。 在透明基板的上方形成反射层。 在透明基板和反射层之间形成介电层。 电介质层包括铌，锡和铝。

公开(公告)号：US09206078B2

公开(公告)日：2015-12-08

申请号：US13801635

申请日：2013-03-13

Applicant: Intermolecular Inc.

Inventor： Guizhen Zhang ,  Jeremy Cheng ,  Guowen Ding ,  Minh Huu Le ,  Daniel Schweigert ,  Yu Wang

IPC: B32B15/04 ,  B32B17/06 ,  C03C17/36 ,  C23C14/14 ,  C23C14/00 ,  C23C14/04

CPC classification number: C23C14/22 ,  C03C17/36 ,  C03C17/3605 ,  C03C17/3618 ,  C03C17/3644 ,  C03C17/3652 ,  C03C17/366 ,  C03C17/3681 ,  C23C14/0036 ,  C23C14/042 ,  C23C14/14 ,  C23C14/34 ,  G02B1/12 ,  G02B1/14 ,  Y10T428/12542 ,  Y10T428/12549 ,  Y10T428/12611 ,  Y10T428/12778 ,  Y10T428/31678

Abstract: Provided is High Productivity Combinatorial (HPC) testing methodology of semiconductor substrates, each including multiple site isolated regions. The site isolated regions are used for testing different compositions and/or structures of barrier layers disposed over silver reflectors. The tested barrier layers may include all or at least two of nickel, chromium, titanium, and aluminum. In some embodiments, the barrier layers include oxygen. This combination allows using relative thin barrier layers (e.g., 5-30 Angstroms thick) that have high transparency yet provide sufficient protection to the silver reflector. The amount of nickel in a barrier layer may be 5-10% by weight, chromium—25-30%, titanium and aluminum—30%-35% each. The barrier layer may be co-sputtered in a reactive or inert-environment using one or more targets that include all four metals. An article may include multiple silver reflectors, each having its own barrier layer.