Bi-directional read/program non-volatile floating gate memory cell and array thereof, and method of formation
    52.
    发明授权
    Bi-directional read/program non-volatile floating gate memory cell and array thereof, and method of formation 有权
    双向读/写非易失性浮栅存储单元及其阵列及其形成方法

    公开(公告)号:US07151021B2

    公开(公告)日:2006-12-19

    申请号:US11111244

    申请日:2005-04-20

    IPC分类号: H01L21/8238

    摘要: A bi-directional read/program non-volatile memory cell and array is capable of achieving high density. Each memory cell has two spaced floating gates for storage of charges thereon. The cell has spaced apart source/drain regions with a channel therebetween, with the channel having three portions. One of the floating gate is over a first portion; another floating gate is over a second portion, and a gate electrode controls the conduction of the channel in the third portion between the first and second portions. A control gate is connected to each of the source/drain regions, and is also capacitively coupled to the floating gate. The cell programs by hot channel electron injection, and erases by Fowler-Nordheim tunneling of electrons from the floating gate to the gate electrode. Bi-directional read permits the cell to be programmed to store bits, with one bit in each floating gate.

    摘要翻译: 双向读/写非易失性存储单元和阵列能够实现高密度。 每个存储单元具有两个间隔开的浮动栅极,用于在其上存储电荷。 电池具有间隔开的源极/漏极区域,其间具有沟道,沟道具有三个部分。 浮动门之一在第一部分之上; 另一个浮栅位于第二部分之上,栅电极控制第一和第二部分之间的第三部分中的沟道的导通。 控制栅极连接到每个源极/漏极区域,并且还电容耦合到浮动栅极。 通过热通道电子注入的电池程序,并通过Fowler-Nordheim将电子从浮动栅极隧穿到栅电极而擦除。 双向读取允许将单元编程为存储位,每个浮动栅极中有一位。

    Differential non-volatile content addressable memory cell and array using phase changing resistor storage elements
    53.
    发明授权
    Differential non-volatile content addressable memory cell and array using phase changing resistor storage elements 有权
    差分非易失性内容可寻址存储单元和阵列使用相变电阻存储元件

    公开(公告)号:US07050316B1

    公开(公告)日:2006-05-23

    申请号:US10797207

    申请日:2004-03-09

    IPC分类号: G11C15/00

    CPC分类号: G11C15/046 G11C13/0004

    摘要: A differential sensing content addressable memory cell without any word lines connected to the cells in the same row comprises a first bit line for supplying a first bit. A first storage element has a first phase change resistor for storing a first stored bit, which is connected in series with a first diode. The first storage element is connected to the first bit line. A second bit line supplies a second bit, with the second bit being an inverse of the first bit. A second storage element has a second phase change resistor for storing a second stored bit, which is connected in series with a second diode. The second storage element is connected to the second bit line. A match line is connected to the first and second storage elements for indicating whether a match occurred between the first bit and the first stored bit, and between the second bit and the second stored bit

    摘要翻译: 差分感测内容可寻址存储单元,没有连接到同一行中的单元的任何字线包括用于提供第一位的第一位线。 第一存储元件具有第一相变电阻器,用于存储与第一二极管串联连接的第一存储位。 第一存储元件连接到第一位线。 第二位线提供第二位,第二位是第一位的倒数。 第二存储元件具有用于存储与第二二极管串联连接的第二存储位的第二相变电阻器。 第二存储元件连接到第二位线。 匹配线连接到第一和第二存储元件,用于指示在第一位和第一存储位之间以及第二位和第二存储位之间是否发生匹配

    Stacked gate memory cell with erase to gate, array, and method of manufacturing
    54.
    发明申请
    Stacked gate memory cell with erase to gate, array, and method of manufacturing 有权
    具有擦除到栅极,阵列和制造方法的堆叠栅极存储单元

    公开(公告)号:US20060091449A1

    公开(公告)日:2006-05-04

    申请号:US11303567

    申请日:2005-12-15

    IPC分类号: H01L29/788

    摘要: A stacked gate nonvolatile memory floating gate device has a control gate. Programming of the cell in the array is accomplished by hot channel electron injection from the drain to the floating gate. Erasure occurs by Fowler-Nordheim tunneling of electrons from the floating gate to the control gate. Finally, to increase the density, each cell can be made in a trench.

    摘要翻译: 堆叠式非易失性存储器浮栅器件具有控制栅极。 通过从漏极到浮动栅极的热通道电子注入来实现阵列中的单元的编程。 擦除由Fowler-Nordheim发生,电子从浮动栅极隧道到控制门。 最后,为了增加密度,可以在沟槽中制造每个单元。

    Isolation-less, contact-less array of nonvolatile memory cells each having a floating gate for storage of charges, and methods of manufacturing, and operating therefor
    55.
    发明申请
    Isolation-less, contact-less array of nonvolatile memory cells each having a floating gate for storage of charges, and methods of manufacturing, and operating therefor 有权
    非易失性存储单元的无隔离阵列,每个非易失性存储单元均具有用于存储电荷的浮动栅极,以及制造方法和操作方法

    公开(公告)号:US20050224861A1

    公开(公告)日:2005-10-13

    申请号:US10822944

    申请日:2004-04-12

    摘要: An isolation-less, contact-less nonvolatile memory array has a plurality of memory cells each with a floating gate for the storage of charges thereon, arranged in a plurality of rows and columns. Each memory cell can be of a number of different types. All the bit lines and source lines of the various embodiments are buried and are contact-less. In a first embodiment, each cell can be represented by a stacked gate floating gate transistor coupled to a separate assist transistor. The entire array can be planar; or in a preferred embodiment each of the floating gate transistors is in a trench; or each of the assist transistors is in a trench. In a second embodiment, each cell can be represented by a stacked gate floating gate transistor with the transistor in a trench. In a third embodiment, each cell can be represented by two stacked gate floating gate transistors coupled to a separate assist transistor, positioned between the two stacked gate floating gate transistors. The entire array can be planar; or in a preferred embodiment each of the floating gate transistors is in a trench; or each of the assist transistors is in a trench. Novel methods to manufacture the arrays and methods to program, erase, and read each of these embodiments of the memory cells is disclosed.

    摘要翻译: 无隔离的非接触式非易失性存储器阵列具有多个存储单元,每个存储单元具有用于在其上存储电荷的浮动栅极,其布置成多个行和列。 每个存储单元可以是多种不同的类型。 各种实施例的所有位线和源极线被掩埋并且是无接触的。 在第一实施例中,每个单元可以由耦合到单独的辅助晶体管的堆叠栅极浮栅晶体管表示。 整个阵列可以是平面的; 或者在优选实施例中,每个浮栅晶体管处于沟槽中; 或者每个辅助晶体管处于沟槽中。 在第二实施例中,每个单元可以由晶体管在沟槽中的层叠栅极浮栅晶体管表示。 在第三实施例中,每个单元可以由耦合到位于两个堆叠的栅极浮置栅极晶体管之间的单独的辅助晶体管的两个堆叠的栅极浮栅晶体管表示。 整个阵列可以是平面的; 或者在优选实施例中,每个浮栅晶体管处于沟槽中; 或者每个辅助晶体管处于沟槽中。 公开了制造阵列的新方法和编程,擦除和读取存储器单元的这些实施例的每一个的方法。

    Non-volatile floating gate memory cell with floating gates formed in cavities, and array thereof, and method of formation
    56.
    发明授权
    Non-volatile floating gate memory cell with floating gates formed in cavities, and array thereof, and method of formation 有权
    具有形成在空腔中的浮动栅极的非易失性浮动栅极存储单元及其阵列,以及形成方法

    公开(公告)号:US06913975B2

    公开(公告)日:2005-07-05

    申请号:US10885923

    申请日:2004-07-06

    摘要: A non-volatile memory cell has a single crystalline semiconductive material, such as single crystalline silicon, of a first conductivity type. A first and a second region each of a second conductivity type, different from the first conductivity type, spaced apart from one another is formed in the semiconductive material. A channel region, having a first portion, and a second portion, connects the first and second regions for the conduction of charges. A dielectric is on the channel region. A floating gate, which can be conductive or non-conductive, is on the dielectric, spaced apart from the first portion of the channel region. The first portion of the channel region is adjacent to the first region, with the first floating gate having generally a triangular shape. The floating gate is formed in a cavity. A gate electrode is capacitively coupled to the first floating gate, and is spaced apart from the second portion of the channel region. The second portion of the channel region is between the first portion and the second region. A bi-directional non-volatile memory cell has two floating gates each formed in a cavity. A method of making the non-volatile memory cell and the array are also disclosed.

    摘要翻译: 非易失性存储单元具有第一导电类型的单结晶硅单晶硅。 在半导体材料中形成有彼此间隔开的与第一导电类型不同的第二导电类型的第一和第二区域。 具有第一部分的通道区域和第二部分连接用于电荷传导的第一和第二区域。 电介质在沟道区上。 可以是导电或非导电的浮动栅极位于电介质上,与沟道区的第一部分间隔开。 沟道区域的第一部分与第一区域相邻,第一浮栅具有大致三角形形状。 浮动门形成在空腔中。 栅极电极电容耦合到第一浮动栅极,并且与沟道区域的第二部分间隔开。 沟道区域的第二部分在第一部分和第二区域之间。 双向非易失性存储单元具有分别形成在空腔中的两个浮动栅极。 还公开了制造非易失性存储单元和阵列的方法。

    Semiconductor memory array of floating gate memory cells with buried floating gate
    57.
    发明授权
    Semiconductor memory array of floating gate memory cells with buried floating gate 有权
    具有埋置浮栅的浮动存储单元半导体存储器阵列

    公开(公告)号:US06906379B2

    公开(公告)日:2005-06-14

    申请号:US10653015

    申请日:2003-08-28

    摘要: An array of floating gate memory cells, and a method of making same, where each pair of memory cells includes a pair of trenches formed into a surface of a semiconductor substrate, with a strip of the substrate disposed therebetween, a source region formed in the substrate strip, a pair of drain regions, a pair of channel regions each extending between the source region and one of the drain regions, a pair of floating gates each disposed in one of the trenches, and a pair of control gates. Each channel region has a first portion disposed in the substrate strip and extending along one of the trenches, a second portion extending underneath the one trench, a third portion extending along the one trench, and a fourth portion extending along the substrate surface and under one of the control gates.

    摘要翻译: 一种浮动栅极存储单元的阵列及其制造方法,其中每对存储单元包括形成在半导体衬底的表面中的一对沟槽,其中衬底的条带设置在其间,源区域形成在 衬底条,一对漏极区,一对沟道区,每个沟道区各自在源极区和漏极区之一之间延伸;一对浮置栅极,分别设置在一个沟槽中,以及一对控制栅极。 每个通道区域具有设置在衬底条中并沿​​其中一个沟槽延伸的第一部分,在一个沟槽下面延伸的第二部分,沿该沟槽延伸的第三部分,以及沿衬底表面延伸的第四部分 的控制门。

    Self aligned method of forming a semiconductor memory array of floating gate memory cells, and a memory array made thereby

    公开(公告)号:US06593177B2

    公开(公告)日:2003-07-15

    申请号:US09972179

    申请日:2001-10-05

    申请人: Dana Lee

    发明人: Dana Lee

    IPC分类号: H01L2964

    CPC分类号: H01L27/11521 H01L27/115

    摘要: A self aligned method of forming a semiconductor memory array of floating gate memory cells in a semiconductor substrate has a plurality of spaced apart isolation regions on the substrate substantially parallel to one another. An active region is between each pair of adjacent isolation regions. The active and isolation regions are formed in parallel and in the column direction. In the row direction, strips of spaced apart silicon nitride are formed. A source line plug is formed between adjacent pairs of silicon nitride and is in contact with a first region in the active regions, and the isolation regions. The strips of silicon nitride are removed and isotropically etched. In addition, the materials beneath the silicon nitride are also isotropically etched. Polysilicon spacers are then formed in the row direction parallel to the source line plug and adjacent to the floating gates. A second region is formed between adjacent, spaced apart, control gates. A bit line is formed in the bit line direction contacting the second region in the space between the control gates.

    Self-aligned non-volatile random access memory cell and process to make the same
    59.
    发明授权
    Self-aligned non-volatile random access memory cell and process to make the same 有权
    自对准非易失性随机存取存储器单元和过程相同

    公开(公告)号:US06525371B2

    公开(公告)日:2003-02-25

    申请号:US09401622

    申请日:1999-09-22

    IPC分类号: H01L29788

    摘要: A self aligned method of forming a semiconductor memory array of floating gate memory cells in a semiconductor substrate has a plurality of spaced apart isolation regions on the substrate substantially parallel to one another. An active region is between each pair of adjacent isolation regions. The active and isolation regions are formed in parallel and in the column direction. In the row direction, strips of spaced apart silicon nitride are formed. A source line plug is formed between adjacent pairs of silicon nitride and is in contact with a first region in the active regions, and the isolation regions. The strips of silicon nitride are removed and isotropically etched. In addition, the materials beneath the silicon nitride are also isotropically etched. Polysilicon spacers are then formed in the row direction parallel to the source line plug and adjacent to the floating gates to form connected control gates. A second region is formed between adjacent, spaced apart, control gates. A bit line is formed in the bit line direction contacting the second region in the space between the control gates.

    摘要翻译: 在半导体衬底中形成浮动栅极存储单元的半导体存储器阵列的自对准方法在基板上具有基本上彼此平行的多个间隔开的隔离区域。 有源区域位于每对相邻隔离区域之间。 活性隔离区域和平行区域形成为平行且在列方向。 在行方向上,形成间隔开的氮化硅的条。 源极线插塞形成在相邻的氮化硅对之间并且与有源区域中的第一区域以及隔离区域接触。 去除氮化硅条并进行各向同性蚀刻。 此外,氮化硅下方的材料也被各向同性地蚀刻。 然后在平行于源极线插塞并与浮动栅极相邻的行方向上形成多晶硅间隔物,以形成连接的控制栅极。 第二区域形成在相邻的间隔开的控制门之间。 在与控制栅极之间的空间中的第二区域接触的位线方向上形成位线。