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    RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS
    51.
    发明申请
    RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS 有权
    电阻修饰组合物和图案形成工艺

    公开(公告)号：US20100297563A1

    公开(公告)日：2010-11-25

    申请号：US12785930

    申请日：2010-05-24

    申请人： Takeru Watanabe ,  Kazuhiro Katayama ,  Masashi Iio ,  Jun Hatakeyama ,  Tsunehiro Nishi ,  Takeshi Kinsho

    发明人： Takeru Watanabe ,  Kazuhiro Katayama ,  Masashi Iio ,  Jun Hatakeyama ,  Tsunehiro Nishi ,  Takeshi Kinsho

    IPC分类号： G03F7/20

    CPC分类号： G03F7/0035 ,  G03F7/40 ,  H01L21/0273

    摘要： A patterning process includes (1) coating a first positive resist composition onto a substrate, baking, exposing, post-exposure baking, and alkali developing to form a first resist pattern, (2) coating a resist-modifying composition onto the first resist pattern and heating to effect modifying treatment, and (3) coating a second positive resist composition, baking, exposing, post-exposure baking, and alkali developing to form a second resist pattern. The resist modifying composition comprises a base resin comprising recurring units having formula (1) wherein A1 is alkylene, R1 is H or methyl, R2 is alkyl or bond together to form a nitrogen-containing heterocycle, and an alcohol-based solvent.

    摘要翻译： 图案化工艺包括（1）将第一正性抗蚀剂组合物涂覆在基材上，烘烤，曝光，曝光后烘烤和碱显影以形成第一抗蚀剂图案，（2）将抗蚀剂改性组合物涂覆到第一抗蚀剂图案上 加热进行改性处理，（3）涂布第二正性抗蚀剂组合物，烘烤，曝光，曝光后烘烤和碱显影以形成第二抗蚀剂图案。 抗蚀剂改性组合物包括含有式（1）的重复单元的基础树脂，其中A1是亚烷基，R1是H或甲基，R2是烷基或键合在一起形成含氮杂环，和醇类溶剂。

    POLYMERIZABLE FLUORINATED ESTER COMPOUNDS AND THEIR PREPARING PROCESSES
    55.
    发明申请
    POLYMERIZABLE FLUORINATED ESTER COMPOUNDS AND THEIR PREPARING PROCESSES 有权
    可聚合氟化酯化合物及其制备方法

    公开(公告)号：US20070249858A1

    公开(公告)日：2007-10-25

    申请号：US10958373

    申请日：2004-10-06

    申请人： Takeshi Kinsho ,  Takeru Watanabe

    发明人： Takeshi Kinsho ,  Takeru Watanabe

    IPC分类号： C07C69/52

    CPC分类号： C07C67/29 ,  C07C29/40 ,  C07C45/512 ,  C07C49/172 ,  C07C49/173 ,  C07C49/245 ,  C07C67/14 ,  C07C69/653 ,  C07C2601/14 ,  C07C2603/74 ,  C07F7/1804 ,  C07C35/52 ,  C07C35/48 ,  C07C33/46 ,  C07C31/42

    摘要： Polymerizable fluorinated ester compounds having formulae (1) and (2) are novel wherein R1 is H, methyl or trifluoromethyl, R2 and R3 are H or a monovalent hydrocarbon group, R2 and R3 may form a ring, R4 is H, OH or a monovalent hydrocarbon group, and R5 is an acid labile group. They are useful as monomers to produce polymers for the manufacture of radiation-sensitive resist compositions which have high transparency to radiation having a wavelength of up to 500 nm and exhibit good development properties due to the presence of phenol-like acidic hydroxyl groups.

    摘要翻译： 具有式（1）和（2）的可聚合的氟化酯化合物是新的，其中R 1是H，甲基或三氟甲基，R 2和R 3 >为H或一价烃基，R 2和R 3可以形成环，R 4是H，OH或单价烃 基团，R 5是酸不稳定基团。 它们可用作制备用于制造辐射敏感性抗蚀剂组合物的聚合物，其对波长高达500nm的辐射具有高透明度，并且由于存在酚样酸性羟基而表现出良好的显影性能。

    Tertiary amine compounds having an ester structure and processes for preparing same
    56.
    发明授权
    Tertiary amine compounds having an ester structure and processes for preparing same 有权
    具有酯结构的叔胺化合物及其制备方法

    公开(公告)号：US07084303B2

    公开(公告)日：2006-08-01

    申请号：US10127120

    申请日：2002-04-22

    申请人： Takeru Watanabe ,  Koji Hasegawa ,  Takeshi Kinsho ,  Jun Hatakeyama

    发明人： Takeru Watanabe ,  Koji Hasegawa ,  Takeshi Kinsho ,  Jun Hatakeyama

    IPC分类号： C07C211/00

    CPC分类号： C07D307/33 ,  C07C229/12 ,  C07C229/16 ,  C07C2601/14 ,  C07D307/12 ,  C07D309/12 ,  C07D317/24 ,  G03F7/0045 ,  G03F7/0388 ,  G03F7/0392 ,  G03F7/0397

    摘要： The present invention provides ester group-containing tertiary amine compounds of the formula (R1OCH2CH2)nN(CH2CH2CO2R2)3-n which, when used as additives in chemical amplification photolithography, can yield photoresists having a high resolution and an excellent focus margin. The present invention also provides a process comprising the step of subjecting a primary or secondary amine compound to Michael addition to an acrylic ester compound; a process comprising the steps of subjecting monoethanolamine or diethanolamine to Michael addition to an acrylic ester compound so as to form an ester group-containing amine compound and introducing a R1 group to the resultant ester group-containing amine compound; and a process comprising the step of effecting the ester exchange reaction of an ester group-containing tertiary amine with R2OH.

    摘要翻译： 本发明提供了式（R 1）2 OCH 2 CH 2 N酯的含酯基的叔胺化合物 > N（CH 2 CH 2）2 CO 2 N 2 - （CH 2）3 - n - 当用作化学放大光刻中的添加剂时，可以产生具有高分辨率和优异聚焦余量的光致抗蚀剂。 本发明还提供了一种方法，其包括使伯胺或仲胺化合物与丙烯酸酯化合物进行迈克尔加成步骤; 一种方法包括以下步骤：将一乙醇胺或二乙醇胺加入到丙烯酸酯化合物中以形成含酯基的胺化合物并将R 1 O 2基团引入所得的含酯基胺 复合; 以及包括使含酯基的叔胺与R 2 OH进行酯交换反应的步骤的方法。

    Novel epoxy compounds having an alicyclic structure, polymer compounds, resist materials, and patterning methods
    58.
    发明申请
    Novel epoxy compounds having an alicyclic structure, polymer compounds, resist materials, and patterning methods 审中-公开
    具有脂环结构的新型环氧化合物，高分子化合物，抗蚀剂材料和图案化方法

    公开(公告)号：US20050142491A1

    公开(公告)日：2005-06-30

    申请号：US11057008

    申请日：2005-02-11

    申请人： Koji Hasegawa ,  Takeshi Kinsho ,  Takeru Watanabe

    发明人： Koji Hasegawa ,  Takeshi Kinsho ,  Takeru Watanabe

    IPC分类号： C08F34/00 ,  C08G61/12 ,  G03F7/039 ,  G03C1/76

    CPC分类号： G03F7/0397 ,  G03F7/0395

    摘要： Provided is a novel epoxy compound useful, in photolithography, as a monomer for preparing a photoresist material excellent in transparency and affinity to a substrate. More specifically, provided are an epoxy compound represented by the following formula (1): wherein, R1 and R2 each independently represents a hydrogen atom or a linear, branched or cyclic C1-10 alkyl group in which hydrogen atoms on one or more constituent carbon atoms thereof may be partially or entirely substituted by one or more halogen atoms, or the constituent —CH2— may be substituted by an oxygen atom, or R1 and R2 may be coupled together to form an aliphatic hydrocarbon ring; R3 represents a linear, branched or cyclic C1-10 alkyl group or a C1-15 acyl or alkoxycarbonyl group in which hydrogen atoms on one or more constituent carbon atoms thereof may be partially or entirely substituted by one or more halogen atoms; X represents CH2, oxygen or sulfur; k stands for 0 or 1; and m stands for an integer of 0 to 5; and a polymer compound having recurring units available therefrom.

    摘要翻译： 提供了一种新颖的环氧化合物，在光刻中可用作制备对基材透明性和亲和性优异的光致抗蚀剂材料的单体。 更具体地，提供由下式（1）表示的环氧化合物：其中R 1和R 2各自独立地表示氢原子或直链，支链或 其中一个或多个构成碳原子上的氢原子可以被一个或多个卤素原子部分或全部取代的环状C 1-10烷基，或者构成-CH 2 可以被氧原子取代，或者R 1和R 2可以连接在一起形成脂族烃环; R 3表示直链，支链或环状C 1-10烷基或C 1-15酰基或烷氧基羰基，其中氢原子 其一个或多个构成碳原子可以部分或全部被一个或多个卤素原子取代; X表示CH 2，氧或硫; k代表0或1; m表示0〜5的整数。 和具有可从其获得的重复单元的高分子化合物。

    Tertiary alcohol compounds having alicyclic structure
    59.
    发明授权
    Tertiary alcohol compounds having alicyclic structure 有权
    具有脂环结构的叔醇化合物

    公开(公告)号：US06774258B2

    公开(公告)日：2004-08-10

    申请号：US10012419

    申请日：2001-12-12

    申请人： Koji Hasegawa ,  Takeru Watanabe ,  Takeshi Kinsho

    发明人： Koji Hasegawa ,  Takeru Watanabe ,  Takeshi Kinsho

    IPC分类号： C07C6974

    CPC分类号： C07C69/753 ,  C07C69/608 ,  C07C2602/42 ,  C07C2603/86

    摘要： Tertiary alcohol compounds of formula (1) are novel wherein R1 and R2 are C1-10 alkyl groups which may have halogen substituents, or R1 and R2 may form an aliphatic hydrocarbon ring, Y and Z are a single bond or a divalent C1-10 organic group, and k=0 or 1. Using the tertiary alcohol compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, etching resistance and substrate adhesion.

    摘要翻译： 式（1）的叔醇化合物是新的，其中R 1和R 2是可具有卤素取代基的C 1-10烷基，或R 1和R 2可以形成脂族烃环，Y Z为单键或二价C 1-10有机基团，k = 0或1.使用叔醇化合物作为单体，得到聚合物。 包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，具有优异的灵敏度，分辨率，耐蚀刻性和基材粘合性。