公开(公告)号：US08587863B2

公开(公告)日：2013-11-19

申请号：US13568232

申请日：2012-08-07

申请人： Osamu Wakabayashi ,  Takashi Onose

发明人： Osamu Wakabayashi ,  Takashi Onose

IPC分类号： G02F1/35 ,  G02F2/02 ,  H01S3/04

CPC分类号： H01S3/2251 ,  G02F1/353 ,  G02F2001/3505 ,  G02F2001/3546 ,  G02F2203/60 ,  H01S3/0092 ,  H01S3/0401 ,  H01S3/1625 ,  H01S3/1636 ,  H01S3/2316 ,  H01S3/2325 ,  H01S3/2375

摘要： A wavelength conversion device may include a wavelength conversion element that converts an entering first laser beam into a second laser beam by wavelength conversion, and a cooling mechanism that cools the wavelength conversion element from at least one surface of the wavelength conversion element.

摘要翻译： 波长转换装置可以包括通过波长转换将进入的第一激光束转换成第二激光束的波长转换元件，以及从波长转换元件的至少一个表面冷却波长转换元件的冷却机构。

公开(公告)号：US08536551B2

公开(公告)日：2013-09-17

申请号：US12482796

申请日：2009-06-11

申请人： Masato Moriya ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Takashi Suganuma ,  Akira Endo ,  Akira Sumitani

发明人： Masato Moriya ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Takashi Suganuma ,  Akira Endo ,  Akira Sumitani

IPC分类号： G21K5/00

CPC分类号： G21K5/04 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70858 ,  G03F7/70941 ,  G21K1/10 ,  H05G2/005 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.

摘要翻译： 一种使用能够获得高光谱纯度的EUV光的光谱纯度滤光片的极紫外光源装置。 该装置包括一个室; 用于提供目标材料的目标供应单元; 使用包含二氧化碳气体的激光气体作为激光介质的激光激光器，用于向目标材料施加激光以产生等离子体; 用于收集和输出从等离子体辐射的极紫外光的收集器反射镜; 以及设置在极紫外光的光路中的光谱纯度滤光片，用于透射极紫外光并反射激光束，光谱纯度滤光器包括具有导电性的网格，并且形成为具有间距不大的孔 超过由驱动器激光器施加的激光束的最短波长的一半。

公开(公告)号：US20130208742A1

公开(公告)日：2013-08-15

申请号：US13817818

申请日：2012-02-17

申请人： Hakaru Mizoguchi ,  Takashi Suganuma ,  Hideo Hoshino ,  Osamu Wakabayashi

发明人： Hakaru Mizoguchi ,  Takashi Suganuma ,  Hideo Hoshino ,  Osamu Wakabayashi

IPC分类号： H01S3/10

CPC分类号： H01S3/0071 ,  H01S3/0014 ,  H01S3/10061 ,  H01S3/1305 ,  H05G2/008

摘要： An optical device may include: an optical module disposed in a beam delivery path of a laser beam; a beam adjusting unit disposed in the beam delivery path for adjusting the beam delivery path of the laser beam; a measuring unit disposed in the beam delivery path for detecting the beam delivery path; and a control unit for controlling the beam adjusting unit based on a detection result of the beam delivery path of the laser beam detected by the measuring unit.

摘要翻译： 光学装置可以包括：设置在激光束的光束输送路径中的光学模块; 设置在所述光束传送路径中用于调节所述激光束的光束传送路径的光束调节单元; 设置在所述光束传送路径中用于检测所述光束传送路径的测量单元; 以及控制单元，用于基于由测量单元检测到的激光束的光束传递路径的检测结果来控制光束调节单元。

公开(公告)号：US20130099140A1

公开(公告)日：2013-04-25

申请号：US13805300

申请日：2012-03-05

申请人： Hiroaki Nakarai ,  Osamu Wakabayashi ,  Hideo Hoshino

发明人： Hiroaki Nakarai ,  Osamu Wakabayashi ,  Hideo Hoshino

IPC分类号： H01S3/00

CPC分类号： H01S3/0057 ,  H01S3/107 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/235 ,  H01S3/2375 ,  H01S3/2391 ,  H05G2/008

摘要： A laser apparatus may include a seed laser device configured to output a pulse laser beam, a pulse energy adjusting unit configured to vary pulse energy of the pulse laser beam, at least one amplifier for amplifying the pulse laser beam, at least one power source for varying an excitation intensity in the at least one amplifier, and a controller configured to control the pulse energy adjusting unit on a pulse-to-pulse basis for the pulse laser beam passing therethrough and to control the at least one power source for a group of multiple pulses of the pulse laser beam.

摘要翻译： 激光装置可以包括配置成输出脉冲激光束的种子激光装置，被配置为改变脉冲激光束的脉冲能量的脉冲能量调节单元，至少一个用于放大脉冲激光束的放大器，至少一个用于 改变所述至少一个放大器中的激发强度，以及控制器，被配置为基于脉冲到脉冲基准控制所述脉冲能量调节单元，用于脉冲激光束通过其中并且控制所述至少一个电源的一组 多脉冲脉冲激光束。

公开(公告)号：US20130050862A1

公开(公告)日：2013-02-28

申请号：US13696528

申请日：2011-12-29

申请人： Hiroshi Someya ,  Yukio Watanabe ,  Katsuhiko Wakana ,  Osamu Wakabayashi

发明人： Hiroshi Someya ,  Yukio Watanabe ,  Katsuhiko Wakana ,  Osamu Wakabayashi

IPC分类号： G02B7/182

CPC分类号： G02B7/181 ,  G02B5/0891 ,  G02B5/10 ,  G03F7/70033 ,  G03F7/70175

摘要： A mirror device may include: a mirror including a base plate, a reflective film on a first surface of the base plate, and a plurality of first protrusions on a second surface of the base plate; a plurality of support parts for respectively supporting the plurality of the first protrusions, each support part having a groove formed therein for guiding the first protrusion; and a plurality of clamps for respectively pressing the plurality of the first protrusions against the respective grooves in the plurality of the support parts.

公开(公告)号：US20120319014A1

公开(公告)日：2012-12-20

申请号：US13545786

申请日：2012-07-10

申请人： Masato Moriya ,  Osamu Wakabayashi

发明人： Masato Moriya ,  Osamu Wakabayashi

IPC分类号： H01J11/00

CPC分类号： H05G2/008 ,  H01S3/0007 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/08095 ,  H01S3/1305 ,  H01S3/1307 ,  H01S3/2232 ,  H01S3/2308 ,  H01S3/2316 ,  H05G2/003

摘要： A guide laser beam that has an optical axis and a beam diameter substantially equivalent to those of a driver pulsed laser beam is introduced into an amplification system that amplifies a laser beam that is output from a driver laser oscillator. The guide laser beam is output from a laser device as a continuous light, and is introduced into a light path of the driver pulsed laser beam via a guide laser beam introduction mirror. A sensor detects an angle (a direction) of a laser beam and a variation of a curvature of a wave front. A wave front correction controller outputs a signal to a wave front correction part based on a measured result of a sensor. The wave front correction part corrects a wave front of a laser beam to be a predetermined wave front according to an instruction from the wave front correction controller.

摘要翻译： 具有光轴和与驱动脉冲激光束的光束直径基本相同的光束直径的引导激光束被引入到放大从驱动激光振荡器输出的激光束的放大系统中。 引导激光束作为连续光从激光装置输出，并且通过引导激光束引入反射镜被引入到驱动脉冲激光束的光路中。 传感器检测激光束的角度（方向）和波前曲率的变化。 波前校正控制器基于传感器的测量结果向波前校正部输出信号。 波前校正部根据来自波前校正控制器的指示，将激光束的波前校正为规定的波前。

公开(公告)号：US20120305809A1

公开(公告)日：2012-12-06

申请号：US13482857

申请日：2012-05-29

申请人： Masato MORIYA ,  Osamu Wakabayashi

发明人： Masato MORIYA ,  Osamu Wakabayashi

IPC分类号： G21K5/04

CPC分类号： H05G2/008 ,  H05G2/003

摘要： An apparatus for generating extreme ultraviolet light is used with a first laser device for outputting a first laser beam. The apparatus includes a second laser device for outputting a second laser beam, a beam adjusting unit for causing beam axes of the first and second laser beams to substantially coincide with each other, a chamber, a target supply unit for supplying target materials into the chamber, a laser beam focusing optical system for focusing the first laser beam on the target material for plasma generation, an optical detection system for detecting the second laser beam and light from plasma, a focus position correction mechanism for correcting a first laser beam focusing position, and a target supply position correction mechanism for correcting a target material supplying position, and a controller for the focus position correction mechanism and the target supply position correction mechanism based on the optical detection system's detection.

摘要翻译： 用于产生极紫外光的装置与用于输出第一激光束的第一激光装置一起使用。 该装置包括用于输出第二激光束的第二激光装置，用于使第一和第二激光束的光束轴线彼此基本一致的光束调节单元，用于将目标材料供应到腔室中的目标供应单元 用于将第一激光束聚焦在等离子体产生用靶材料上的激光束聚焦光学系统，用于检测第二激光束的光检测系统和来自等离子体的光，用于校正第一激光束聚焦位置的聚焦位置校正机构， 以及用于校正目标材料供给位置的目标供给位置校正机构，以及基于光学检测系统的检测的聚焦位置校正机构和目标供给位置校正机构的控制器。

公开(公告)号：US08311066B2

公开(公告)日：2012-11-13

申请号：US12713874

申请日：2010-02-26

申请人： Nowak Krzysztof ,  Takeshi Ohta ,  Osamu Wakabayashi

发明人： Nowak Krzysztof ,  Takeshi Ohta ,  Osamu Wakabayashi

IPC分类号： H01S3/098

CPC分类号： H01S3/235 ,  G03F7/70033 ,  H01S3/005 ,  H01S3/08031 ,  H01S3/1307 ,  H01S3/2232 ,  H01S3/2375 ,  H01S3/2383 ,  H01S5/0654 ,  H01S5/0687 ,  H01S5/141 ,  H01S5/4012 ,  H01S5/4025

摘要： A laser apparatus comprises an amplifier including at least one of a MOPA and a MOPO each of which amplifies a single-longitudinal or multiple-longitudinal mode laser light, an amplifiable agent of the amplifier being a molecular gas, a master oscillator constructed from a semiconductor laser being able to oscillate a single-longitudinal or multiple-longitudinal mode laser light of which wavelength is within one or more amplification lines of the amplifier; and a controller executing a wave shape control adjusting a pulse shape and/or a pulse output timing of a single-longitudinal or multiple-longitudinal mode laser light outputted from the master oscillator.

摘要翻译： 激光装置包括放大器，该放大器包括MOPA和MOPO中的至少一个，每个MOPA和MOPO均放大单纵向或多纵模激光，放大器的可分解剂是分子气体，由半导体构成的主振荡器 激光器能够振荡波长在放大器的一个或多个放大线内的单纵向或多纵模激光; 以及执行调整从主振荡器输出的单纵向或多纵模激光的脉冲形状和/或脉冲输出定时的波形控制的控制器。

公开(公告)号：US08242472B2

公开(公告)日：2012-08-14

申请号：US12612861

申请日：2009-11-05

申请人： Masato Moriya ,  Osamu Wakabayashi

发明人： Masato Moriya ,  Osamu Wakabayashi

IPC分类号： G02B5/00

CPC分类号： H05G2/008 ,  H01S3/0007 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/08095 ,  H01S3/1305 ,  H01S3/1307 ,  H01S3/2232 ,  H01S3/2308 ,  H01S3/2316 ,  H05G2/003

摘要： [Problem]An extreme ultraviolet light source device in accordance with the present invention corrects an optical performance of a laser beam in an appropriate manner.[Means for Resolution]A guide laser beam that has an optical axis and a beam diameter substantially equivalent to those of a driver pulsed laser beam is introduced into an amplification system 30 that amplifies a laser beam that is output from a driver laser oscillator 20. The guide laser beam is output from a laser device 50 as a continuous light, and is introduced into a light path of the driver pulsed laser beam via a guide laser beam introduction mirror 52. A sensor 44 detects an angle (a direction) of a laser beam and a variation of a curvature of a wave front. A wave front correction controller 60 outputs a signal to a wave front correction part 34 based on a measured result of a sensor 36. The wave front correction part 34 corrects a wave front of a laser beam to be a predetermined wave front according to an instruction from the wave front correction controller 60.

摘要翻译： [问题]根据本发明的极紫外光源装置以适当的方式校正激光束的光学性能。 [分辨装置]具有光轴和与激光脉冲激光束的光束直径基本相等的光束直径的引导激光束被引入到放大从驱动激光振荡器20输出的激光束的放大系统30中。 引导激光束作为连续光从激光装置50输出，并且通过引导激光束引入反射镜52被引入到驱动脉冲激光束的光路中。传感器44检测激光束的角度（方向） 激光束和波前曲率的变化。 波前校正控制器60基于传感器36的测量结果将信号输出到波前校正部34。波前校正部34根据指令将激光束的波前校正为预定波阵面 来自波前校正控制器60。

公开(公告)号：US20120119118A1

公开(公告)日：2012-05-17

申请号：US13359315

申请日：2012-01-26

申请人： Yukio WATANABE ,  Osamu Wakabayashi ,  Junichi Fujimoto ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Hideo Hoshino

发明人： Yukio WATANABE ,  Osamu Wakabayashi ,  Junichi Fujimoto ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Hideo Hoshino

IPC分类号： G21K5/00

CPC分类号： G03F7/70975 ,  G03F7/70033

摘要： An extreme ultraviolet (EUV) light source system in which parts of an EUV light source apparatus can easily be replaced. The system includes: (i) an extreme ultraviolet light source apparatus having a chamber in which extreme ultraviolet light is generated, a target supply unit for supplying a target material into the chamber, a driver laser for irradiating the target material supplied by the target supply unit with a laser beam to generate plasma, and a collector mirror for collecting the extreme ultraviolet light radiated from the plasma to allow the extreme ultraviolet light to enter projection optics of exposure equipment; and (ii) a lifting apparatus provided to lift and move a replacement part which is a part of the extreme ultraviolet light source apparatus.

摘要翻译： EUV光源装置的一部分能够容易地更换的极紫外（EUV）光源系统。 该系统包括：（i）具有产生极紫外光的室的极紫外光源装置，用于将目标材料供应到室中的目标供给单元，用于照射由目标供给源提供的目标材料的驱动激光 具有激光束以产生等离子体的单元，以及用于收集从等离子体辐射的极紫外光的收集器镜，以允许极紫外光进入曝光设备的投影光学器件; 以及（ii）提升装置，其设置为提升和移动作为极紫外光源装置的一部分的替换部件。