公开(公告)号：US5650665A

公开(公告)日：1997-07-22

申请号：US735488

申请日：1996-10-23

申请人： Tomohiko Yamamoto ,  Shoichi Tanimata

发明人： Tomohiko Yamamoto ,  Shoichi Tanimata

IPC分类号： H01L23/12 ,  H01L23/02 ,  H01L25/16 ,  H05K1/02 ,  H05K1/09 ,  H05K1/11 ,  H05K1/14 ,  H05K1/18 ,  H05K3/34 ,  H05K3/36 ,  H01L23/48

CPC分类号： H01L25/16 ,  H01L25/165 ,  H05K1/0206 ,  H05K1/141 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2924/13091 ,  H01L2924/19105 ,  H01L2924/30107 ,  H05K1/0201 ,  H05K1/0218 ,  H05K1/0237 ,  H05K1/0271 ,  H05K1/092 ,  H05K1/111 ,  H05K1/181 ,  H05K2201/0352 ,  H05K2201/09381 ,  H05K2201/09663 ,  H05K2201/09781 ,  H05K2201/10166 ,  H05K3/341 ,  H05K3/3442 ,  H05K3/368

摘要： A hybrid IC device has an insulation substrate 1. Circuit patterns 2 made of a thick copper film are formed on the substrate 1. The circuit patterns 2 include terminal patterns 8. Through-holes 7 electrically connect the terminal patterns 8 to terminal patterns 81 formed on the bottom surface of the substrate 1. Active elements such as transistors and ICs and passive elements such as resistors and capacitors are mounted on the top surface of the substrate 1 and are electrically connected to the circuit patterns 2. A conductive pattern 6 made of a thick copper film or a thick silver-platinum film is formed on the bottom surface of the substrate 1. The conductive pattern 6 is used for grounding and heat radiation. The conductive pattern 6 is electrically connected to the active and passive elements via through-holes. The through-holes are usually formed Just under the active and passive elements. If the elements are transistors, the through-holes for the transistor are formed outside the orthogonal projection of the transistors on the substrate.

摘要翻译： 混合IC器件具有绝缘基板1.在基板1上形成由厚铜膜构成的电路图案2.电路图案2包括端子图案8.通孔7将端子图案8电连接到形成的端子图案81 在基板1的底表面上。诸如晶体管和IC的有源元件以及诸如电阻器和电容器的无源元件安装在基板1的顶表面上并且电连接到电路图案2.导电图案6由 在基板1的底面上形成厚铜膜或厚银 - 铂膜。导电图案6用于接地和散热。 导电图案6经由通孔电连接到有源和无源元件。 通孔通常形成在主动和被动元件的正下方。 如果元件是晶体管，则晶体管的通孔形成在衬底上的晶体管的正交投影之外。

公开(公告)号：US5229731A

公开(公告)日：1993-07-20

申请号：US744716

申请日：1991-08-14

申请人： Tomohiko Yamamoto

发明人： Tomohiko Yamamoto

IPC分类号： H03F3/24 ,  H03F3/72 ,  H03K17/687

CPC分类号： H03K17/6871 ,  H03F3/72

摘要： The power amplifying circuit embodied by the invention is composed of a single-unit circuit capable of varying own bias condition, and yet, more than two kinds of amplifying modes can selectively be activated merely by applying a single-unit power amplifying circuit. Concretely, the power amplifying circuit embodied by the invention comprises the following, a power amplifying transistor, a base-side transmission line, a resistance element connected to the base-side transmission line, the first switching element accommodating current path formed in series against the resistance element so that the first potential can be delivered to the resistance element, the second switching element which is inserted between the base-side transmission line and the second potential, and a circuit means for varying the value of a base potential of the power amplifying transistor by means of opposite switching operations performed by the first and second switching elements.

摘要翻译： 由本发明实现的功率放大电路由能够改变自身偏置条件的单一单元电路组成，但是通过应用单个功率放大电路，可以选择性地激活两种以上的放大模式。 具体地说，本发明实现的功率放大电路包括：功率放大晶体管，基极侧传输线，与基极侧传输线连接的电阻元件，第一开关元件容纳电流路径与 电阻元件，使得第一电位可以传递到电阻元件，插入在基极侧传输线和第二电位之间的第二开关元件和用于改变功率放大器的基极电位值的电路装置 晶体管通过由第一和第二开关元件执行的相反的开关操作。

公开(公告)号：US09159272B2

公开(公告)日：2015-10-13

申请号：US13522107

申请日：2010-11-16

申请人： Takayuki Murai ,  Kohji Fujiwara ,  Tomohiko Yamamoto

发明人： Takayuki Murai ,  Kohji Fujiwara ,  Tomohiko Yamamoto

IPC分类号： G09G5/10 ,  G09G3/36 ,  G06F3/033 ,  G09G5/08 ,  G09G5/02 ,  G05F1/00 ,  H05B37/02 ,  H05B39/04 ,  H05B41/36 ,  H01J7/24 ,  H01J13/32 ,  G09G3/34 ,  H05B33/08 ,  G02F1/1335

CPC分类号： G09G3/3426 ,  G02F2001/133601 ,  G09G3/3413 ,  G09G2320/041 ,  G09G2320/0633 ,  G09G2320/064 ,  G09G2320/0646 ,  G09G2330/021 ,  G09G2330/028 ,  G09G2330/045 ,  G09G2360/16 ,  H05B33/08 ,  H05B33/086

摘要： Specifically provided is a light emitting device for image display, wherein each of light emitting elements, a PWM control unit which PWM-controls a current to be supplied to the light emitting element, a control condition setting unit which, according to the APL of image data, determines and updatably sets the PWM limiting condition for limiting the PWM value that is the duty ratio of the PWM control, and the reference current value that is the value of the current flowing to the light emitting element in response to turn-on of the PWM control, and a PWM value calculation unit which on the basis of the image data, the PWM limit condition, and the reference current value, calculates the PWM value of each area, and the PWM control unit performs the PWM control on the basis of the reference current value and the calculated PWM value.

摘要翻译： 具体提供了一种用于图像显示的发光装置，其中每个发光元件，PWM控制要供给到发光元件的电流的PWM控制单元，根据图像的APL的控制条件设置单元 数据，确定和可更新地设置用于限制作为PWM控制的占空比的PWM值的PWM限制条件，以及作为响应于接通的流向发光元件的电流的值的参考电流值 PWM控制和PWM值计算单元，基于图像数据，PWM限制条件和基准电流值，计算每个区域的PWM值，PWM控制单元基于该PWM值进行PWM控制 的参考电流值和计算出的PWM值。

公开(公告)号：US20120299979A1

公开(公告)日：2012-11-29

申请号：US13522107

申请日：2010-11-16

申请人： Takayuki Murai ,  Kohji Fujiwara ,  Tomohiko Yamamoto

发明人： Takayuki Murai ,  Kohji Fujiwara ,  Tomohiko Yamamoto

IPC分类号： G09G5/10 ,  G09G3/36 ,  H05B37/02

CPC分类号： G09G3/3426 ,  G02F2001/133601 ,  G09G3/3413 ,  G09G2320/041 ,  G09G2320/0633 ,  G09G2320/064 ,  G09G2320/0646 ,  G09G2330/021 ,  G09G2330/028 ,  G09G2330/045 ,  G09G2360/16 ,  H05B33/08 ,  H05B33/086

摘要： Specifically provided is a light emitting device for image display, wherein each of light emitting elements, a PWM control unit which PWM-controls a current to be supplied to the light emitting element, a control condition setting unit which, according to the APL of image data, determines and updatably sets the PWM limiting condition for limiting the PWM value that is the duty ratio of the PWM control, and the reference current value that is the value of the current flowing to the light emitting element in response to turn-on of the PWM control, and a PWM value calculation unit which on the basis of the image data, the PWM limit condition, and the reference current value, calculates the PWM value of each area, and the PWM control unit performs the PWM control on the basis of the reference current value and the calculated PWM value.

摘要翻译： 具体提供了一种用于图像显示的发光装置，其中每个发光元件，PWM控制要供给到发光元件的电流的PWM控制单元，根据图像的APL的控制条件设置单元 数据，确定和可更新地设置用于限制作为PWM控制的占空比的PWM值的PWM限制条件，以及作为响应于接通的流向发光元件的电流的值的参考电流值 PWM控制和PWM值计算单元，基于图像数据，PWM限制条件和基准电流值，计算每个区域的PWM值，PWM控制单元基于该PWM值进行PWM控制 的参考电流值和计算出的PWM值。

公开(公告)号：US20120001964A1

公开(公告)日：2012-01-05

申请号：US13256574

申请日：2009-11-13

申请人： Takeshi Masuda ,  Kohji Fujiwara ,  Hiroshi Il ,  Tomohiko Yamamoto

发明人： Takeshi Masuda ,  Kohji Fujiwara ,  Hiroshi Il ,  Tomohiko Yamamoto

IPC分类号： G09G3/36 ,  G09G5/10

CPC分类号： G09G3/3413 ,  G09G2320/0233

摘要： In the present liquid crystal display device (1), LEDs included in a backlight (20) display a solid-blue display image in an LED lighting pattern suitable for a solid-blue display, which is stored in a lighting pattern storage portion (30) and selected by a lighting pattern selection portion (33) in accordance with a determination result by an image determination portion (32), and also display any other images, including a solid-white display image, in an LED lighting pattern suitable for a solid-white display, and therefore it is possible to reduce or eliminate display unevenness in the case where a solid-white display image is displayed, and also to reduce or eliminate display unevenness of a solid-blue display image, which is particularly noticeable.

摘要翻译： 在本液晶显示装置（1）中，包含在背光源（20）中的LED以适合于固体蓝色显示的LED照明图案显示固体蓝色显示图像，该固体蓝色显示图像存储在照明模式存储部（30 ），并且根据图像确定部分（32）的确定结果由照明模式选择部分（33）选择，并且还将包括固态白色显示图像的任何其他图像显示在适合于 因此可以减少或消除在显示固体白色显示图像的情况下的显示不均匀性，并且还可以减少或消除固体 - 蓝色显示图像的显示不均匀性，这是特别显着的。

公开(公告)号：US07952696B2

公开(公告)日：2011-05-31

申请号：US10973448

申请日：2004-10-27

申请人： Tomohiko Yamamoto

发明人： Tomohiko Yamamoto

IPC分类号： G01B9/00 ,  G01B11/02 ,  G01B11/04 ,  G01B11/08 ,  G03F9/00 ,  G03C5/00

CPC分类号： G03F7/70641

摘要： An exposure measurement apparatus is configured by including a size measurer measuring respective sizes of at least a pair of transferred patterns having mutually different optimal focus positions out of a plurality of transferred patterns formed by being transferred onto a transfer object, a difference value calculator obtaining a difference value between the size of one transferred pattern and the size of the other transferred pattern, a focus variation amount calculator calculating a focus variation amount of the transfer object using the difference value, and an exposure variation amount calculator calculating an exposure error amount of a wafer.

摘要翻译： 曝光测量装置被配置为包括尺寸测量器，该尺寸测量器测量通过转印到转印对象上形成的多个转印图案中的至少一对具有相互不同的最佳焦点位置的转印图案的尺寸，差值计算器获得 一个转印图案的尺寸与另一个转印图案的尺寸之间的差值，使用差值计算转印对象的焦点变化量的聚焦变化量计算器，以及计算曝光误差量的曝光变化量计算器 晶圆。

公开(公告)号：US07944520B2

公开(公告)日：2011-05-17

申请号：US12375860

申请日：2007-06-14

申请人： Hideki Ichioka ,  Tomohiko Yamamoto

发明人： Hideki Ichioka ,  Tomohiko Yamamoto

IPC分类号： G02F1/1333 ,  H02B1/015

CPC分类号： G02F1/133308 ,  G02F2001/133317 ,  G02F2201/503

摘要： A liquid crystal display apparatus includes a liquid crystal display panel, a backlight system, a driving circuit board for driving the liquid crystal display panel and the backlight system, and a housing for housing the foregoing members. A metal plate is provided between the backlight system and the driving circuit board, which metal plate has a plane surface on a front and back surface which is broader than the backlight system and the driving circuit board. On at least a pair of opposed edges of the metal plate, at least one of a falling portion and a rising portion is provided along the edges of the metal plate. Further, a bezel is provided between the housing and at least one of the falling portion and rising portion, which bezel is arranged so as to integrally support the metal plate and at least the liquid crystal display panel and the backlight system. Hence, a liquid crystal display apparatus and an electronic apparatus including same are provided, which liquid crystal display apparatus is capable of reducing a possibility of breakage due to load placed on a display surface of the liquid crystal display panel or an impact when dropped.

摘要翻译： 液晶显示装置包括液晶显示面板，背光系统，用于驱动液晶显示面板的驱动电路板和背光系统，以及用于容纳前述构件的壳体。 在背光系统和驱动电路板之间设置有金属板，该金属板在前后表面上具有比背光系统和驱动电路板更宽的平面。 在金属板的至少一对相对的边缘上，沿着金属板的边缘设置有下降部分和上升部分中的至少一个。 此外，在壳体和下降部分和上升部分中的至少一个之间设置有挡板，该挡板布置成一体地支撑金属板和至少液晶显示面板和背光系统。 因此，提供了一种液晶显示装置及其电子设备，该液晶显示装置能够降低由于放置在液晶显示面板的显示面上的负载而导致的破损的可能性，或者落下时的冲击。

公开(公告)号：US07505092B2

公开(公告)日：2009-03-17

申请号：US11216586

申请日：2005-08-31

申请人： Hideki Ichioka ,  Tomohiko Yamamoto

发明人： Hideki Ichioka ,  Tomohiko Yamamoto

IPC分类号： G02F1/1333

CPC分类号： G02F1/133308 ,  G02F2001/133311 ,  G02F2201/503

摘要： A display device includes a display panel, a first protection layer having viscoelasticity, and a second protection layer having an elastic modulus higher than first protection layer. The first protection layer covers one face of the display panel and the second protection layer is arranged on the first protection layer to cover the display panel.

摘要翻译： 显示装置包括显示面板，具有粘弹性的第一保护层和具有高于第一保护层的弹性模量的第二保护层。 第一保护层覆盖显示面板的一个面，第二保护层设置在第一保护层上以覆盖显示面板。

公开(公告)号：US20080030706A1

公开(公告)日：2008-02-07

申请号：US11639346

申请日：2006-12-15

申请人： Tomohiko Yamamoto

发明人： Tomohiko Yamamoto

IPC分类号： G03B27/54

CPC分类号： G03B27/54

摘要： Exposure for performing patterning in which micropatterns differing in pitch exist in close vicinity to one another is handled, and micropatterns are formed with high accuracy with sufficient manufacture process margins without using a photomask complicated in manufacturing process at high manufacture cost like an alternating phase shift mask. A light intensity distribution of irradiation light constituted of double pole illuminations is formed to correspond to L&S patterns. The double pole illumination is constituted of a pair of illumination modes, and the double pole illumination is constituted of a pair of illumination modes.

摘要翻译： 处理用于执行间距不同的微图案彼此紧密相连的微图案的曝光，并且以足够的制造工艺余量高精度地形成微图案，而不需要像制造成本高的制造工艺中复杂的光掩模，如交替相移掩模 。 形成由双极照明构成的照射光的光强度分布，以对应于L＆S图案。 双极照明由一对照明模式构成，双极照明由一对照明模式构成。

公开(公告)号：US20070275331A1

公开(公告)日：2007-11-29

申请号：US11529678

申请日：2006-09-29

申请人： Tomohiko Yamamoto ,  Satoru Asai

发明人： Tomohiko Yamamoto ,  Satoru Asai

IPC分类号： G03F7/20

CPC分类号： G03F7/70466

摘要： A micropattern is formed with high accuracy with a sufficient manufacture process margin without using a photomask complicated in manufacture process at high manufacture cost like an alternating phase shift mask. Double exposure is performed by using a pair of photomasks such as an ordinary chrome mask, an attenuated phase shift mask or the like which is not an alternating phase shift mask, and a pattern is transferred onto a photoresist. Here, on the occasion of performing exposure with the photomask for forming a finer pattern, double pole illumination is used as an illumination system.

摘要翻译： 在具有高制造成本的制造工艺中使用像交替相移掩模那样使用复杂的光掩模的情况下，以高精度形成具有足够的制造工艺余量的微图案。 通过使用不是交替相移掩模的普通镀铬掩模，衰减相移掩模等的一对光掩模进行双重曝光，并将图案转印到光致抗蚀剂上。 这里，在用用于形成更精细图案的光掩模进行曝光的场合，使用双极照明作为照明系统。