公开(公告)号：US20050155205A1

公开(公告)日：2005-07-21

申请号：US10513966

申请日：2003-04-24

Applicant: Tetsuo Nanno ,  Yoichi Izumi

Inventor： Tetsuo Nanno ,  Yoichi Izumi

IPC: B29B17/02 ,  B29B17/04 ,  C08J11/06 ,  C25F1/00 ,  C25F1/02 ,  C25F5/00 ,  B32B1/00 ,  H02G1/12

CPC classification number: B29B17/04 ,  B29B17/02 ,  B29B2017/0293 ,  B29B2017/0296 ,  B29B2017/0436 ,  B29K2021/00 ,  B29K2027/06 ,  B29K2033/12 ,  B29K2069/00 ,  B29K2075/00 ,  B29K2077/00 ,  B29K2705/00 ,  B29K2705/02 ,  B29K2705/04 ,  B29K2705/06 ,  B29K2705/08 ,  B29K2705/10 ,  B29K2705/12 ,  B29L2009/003 ,  B29L2009/005 ,  B29L2031/3425 ,  B29L2031/707 ,  C25F1/00 ,  C25F5/00 ,  Y02W30/622 ,  Y02W30/625 ,  Y10T29/49755 ,  Y10T29/53274 ,  Y10T156/1158 ,  Y10T156/19

Abstract: A method for separating a metal-resin joint including the steps of: (1) immersing an article including a metal-resin joint with a counter electrode in an alkaline solution; and (2) applying a voltage over a certain time period between the metal portion of the joint and the counter electrode such that the potential of the metal portion is lower than that of a standard hydrogen electrode.

Abstract translation: 一种用于分离金属 - 树脂接头的方法，包括以下步骤：（1）将包含金属 - 树脂接合部的物品与对电极浸渍在碱性溶液中; 和（2）在接头的金属部分和对电极之间施加一段时间的电压，使得金属部分的电位低于标准氢电极的电位。

公开(公告)号：US20050150516A1

公开(公告)日：2005-07-14

申请号：US10486207

申请日：2002-05-14

Applicant: Toshiaki Fujii ,  Shin Yokoyama

Inventor： Toshiaki Fujii ,  Shin Yokoyama

IPC: H01L21/311 ,  H01L21/316 ,  C25F1/00 ,  C25F3/30

CPC classification number: H01L21/02238 ,  H01L21/31138 ,  H01L21/31658

Abstract: The present invention aims to provide processes and equipments for manufacturing semiconductors, according to which oxidation of wafer surfaces can be controlled by simple means and contaminants promoting oxidation and contaminants inviting a decreased yield of wafers can also be totally controlled. To achieve the object above, the present invention provides a process for manufacturing a semiconductor, characterized in that a substrate is treated while exposing the surface of the substrate with a negative ion-enriched gas; and an equipment for manufacturing a semiconductor comprising a gas channel through which a gas to be treated is passed; a negative ion-enriched gas generator consisting of a gas cleaner located at an upstream part of said gas channel and a negative ion generator located at a downstream part thereof: and means for supplying the resulting negative ion-enriched gas to the surface of each substrate.

Abstract translation: 本发明的目的在于提供制造半导体的工艺和设备，根据该工艺和设备可以通过简单的手段控制晶片表面的氧化，并且可以完全控制促进氧化的污染物和引起晶片产量降低的污染物。 为了实现上述目的，本发明提供一种制造半导体的方法，其特征在于，在用负离子富集气体暴露基板的表面的同时对基板进行处理; 以及用于制造半导体的设备，包括通过待处理气体的气体通道; 由位于所述气体通道的上游部分的气体清洁器和位于其下游部分的负离子发生器组成的负离子富集气体发生器和用于将所得负离子富集气体供应到每个基板的表面的装置 。

公开(公告)号：US20050139484A1

公开(公告)日：2005-06-30

申请号：US10507659

申请日：2003-03-11

Applicant: Juliana Brooks ,  Mark Mortenson ,  Bentley Blum

Inventor： Juliana Brooks ,  Mark Mortenson ,  Bentley Blum

IPC: B01D9/00 ,  B01J19/12 ,  C01B3/00 ,  C01B5/00 ,  C01B13/02 ,  C01D3/04 ,  C12N13/00 ,  C25F1/00 ,  C25F5/00

CPC classification number: C12N13/00 ,  B01D9/005 ,  B01D9/0063 ,  B01J19/121 ,  B01J19/122 ,  B01J19/127 ,  C01B3/0026 ,  C01B3/0031 ,  C01B5/00 ,  C01B13/0214 ,  C01D3/04 ,  Y02E60/327

Abstract: The invention relates to novel methods for affecting, controlling and/or directing various reactions and/or reaction pathways or systems by exposing one or more components in a holoreaction system to at least one spectral energy pattern. In a first aspect of the invention, at least one spectral energy pattern can be applied to a reaction system. In a second aspect of the invention, at least one spectral energy conditioning pattern can be applied to a conditioning reaction system. The spectral energy conditioning pattern can, for example, be applied at a separate location from the reaction vessel (e.g., in a conditioning reaction vessel) or can be applied in (or to) the reaction vessel, but prior to other reaction system participants being introduced into the reaction vessel.

Abstract translation: 本发明涉及通过将一种或多种组合物暴露于至少一种光谱能量图案来影响，控制和/或指导各种反应和/或反应途径或系统的新方法。 在本发明的第一方面中，至少一种光谱能量图案可以应用于反应系统。 在本发明的第二方面，至少一种光谱能量调节模式可以应用于调理反应系统。 例如，光谱能量调节图案可以在与反应容器（例如在调节反应容器中）分开的位置处施加，或者可以应用于反应容器中（或到其中），但在其它反应系统参与者之前 引入反应容器。

公开(公告)号：US20050103266A1

公开(公告)日：2005-05-19

申请号：US10968420

申请日：2004-10-18

Applicant: Shankar Chandran ,  Scott Hendrickson ,  Gwendolyn Jones ,  Shankar Venkataraman ,  Ellie Yieh

Inventor： Shankar Chandran ,  Scott Hendrickson ,  Gwendolyn Jones ,  Shankar Venkataraman ,  Ellie Yieh

IPC: B08B9/08 ,  C23C16/44 ,  H01L21/304 ,  C25F1/00 ,  C23C16/00

CPC classification number: C23C16/4405 ,  Y10S134/902 ,  Y10S438/905

Abstract: A method and apparatus that reduces the time required to clean a processing chamber employing a reactive plasma cleaning process. A plasma is formed in an Astron fluorine source generator from a flow of substantially pure inert-source gas. After formation of the plasma, a flow of a fluorine source gas is introduced therein such that the fluorine source flow accelerates at a rate no greater than 1.67 standard cubic centimeters per second2 (scc/s2). In this fashion, the plasma contains a plurality of radicals and dissociated inert-source gas atoms, defining a cleaning mixture. The ratio of inert-source gas to fluorine source is greater than 1:1.

Abstract translation: 一种减少使用反应性等离子体清洗工艺清洁处理室所需时间的方法和装置。 在基本上纯的惰性气体气体的流中，在Astron氟源发生器中形成等离子体。 在形成等离子体之后，引入氟源气体的流动，使得氟源流以不大于1.67标准立方厘米/秒的速度加速（scc / s < 2 ）。 以这种方式，等离子体包含多个自由基和解离的惰性气体原子，限定清洁混合物。 惰性气体与氟源的比例大于1:1。

公开(公告)号：US20050081884A1

公开(公告)日：2005-04-21

申请号：US10685684

申请日：2003-10-15

Applicant: Ravikumar Ramachandran ,  David Rath

Inventor： Ravikumar Ramachandran ,  David Rath

IPC: B08B3/12 ,  C11D1/02 ,  C11D1/38 ,  C11D7/24 ,  C11D7/26 ,  C11D11/00 ,  C25F1/00 ,  H01L21/00 ,  H01L21/306

CPC classification number: H01L21/02052 ,  B08B3/12 ,  C11D1/02 ,  C11D1/38 ,  C11D7/241 ,  C11D7/261 ,  C11D11/0047 ,  H01L21/67057 ,  Y10S134/902

Abstract: The present invention provides a method cleaning of semiconductor devices through heterogeneous nucleation of cavitation bubbles. Heterogeneous nucleation is performed by applying sonic energy to a cleaning solution and a phase material in order to remove unwanted particles from semiconductor devices. A surfactant may be added to the phase material and the cleaning solution.

Abstract translation: 本发明提供了通过空化气泡的异质成核来清洗半导体器件的方法。 通过将声能施加到清洁溶液和相材料以便从半导体器件中去除不需要的颗粒来进行非均匀成核。 可以向相材料和​​清洁溶液中加入表面活性剂。

公开(公告)号：US06880560B2

公开(公告)日：2005-04-19

申请号：US10299596

申请日：2002-11-18

Applicant: Gil Ching ,  Vincent Perrut ,  Vincent Ruch ,  Gilles Fresquet

Inventor： Gil Ching ,  Vincent Perrut ,  Vincent Ruch ,  Gilles Fresquet

IPC: B01D21/00 ,  B08B3/12 ,  B08B6/00 ,  B08B7/00 ,  C25F1/00 ,  H01L21/00 ,  H01L21/02

CPC classification number: B08B7/0021 ,  B08B3/12 ,  H01L21/67051 ,  H01L21/6708 ,  Y10S134/902

Abstract: Embodiments of the invention are directed to substrate processing apparatuses and methods for processing substrates. In one embodiment, a substrate processing apparatus includes a processing chamber, a substrate holder inside of the processing chamber for holding a substrate, and a sonic box in the processing chamber for supplying sonic waves substantially perpendicularly to the substrate. The sonic box may comprises a membrane, and a transducer coupled to the membrane.

Abstract translation: 本发明的实施例涉及用于处理衬底的衬底处理设备和方法。 在一个实施例中，基板处理装置包括处理室，用于保持基板的处理室内部的基板保持器，以及处理室中的声波箱，用于基本上垂直于基板提供声波。 声音盒可以包括膜和耦合到膜的换能器。

公开(公告)号：US20050000827A1

公开(公告)日：2005-01-06

申请号：US10490120

申请日：2002-09-26

Applicant: Kunio Matsui ,  Yoshiaki Kumamoto ,  Masataka Ishikawa

Inventor： Kunio Matsui ,  Yoshiaki Kumamoto ,  Masataka Ishikawa

IPC: A61F7/08 ,  A61F7/03 ,  C09K5/16 ,  C09K5/18 ,  F24V30/00 ,  C25F1/00

CPC classification number: A61F7/034 ,  C09K5/18 ,  F24V30/00

Abstract: A process of producing a heat generating molded article comprising the steps of making an intermediate product by a papermaking process from a raw material composition containing at least an oxidizable metal powder, a moisture retaining agent, a fibrous material, and water and incorporating an electrolyte into the resulting intermediate product.

Abstract translation: 一种制造发热成型体的方法，包括以下步骤：通过造纸方法从含有至少可氧化金属粉末，保湿剂，纤维材料和水的原料组合物制成中间产物，并将电解质并入 得到的中间产物。

公开(公告)号：US5997722A

公开(公告)日：1999-12-07

申请号：US103690

申请日：1998-06-24

Applicant: Alexandra I. Vidal ,  William G. Herbert ,  Roberto W. Vidal ,  Gary J. Maier ,  Jodie L. Morris ,  James E. McNamara ,  Gene W. O'Dell

Inventor： Alexandra I. Vidal ,  William G. Herbert ,  Roberto W. Vidal ,  Gary J. Maier ,  Jodie L. Morris ,  James E. McNamara ,  Gene W. O'Dell

IPC: C25F3/04 ,  G03G5/10 ,  C25F1/00

CPC classification number: C25F3/04 ,  G03G5/10 ,  G03G5/102

Abstract: A method for producing a photoreceptor having a substrate subjected to a surface finishing treatment to result in a finished substrate surface, wherein the method includes:(a) analyzing the finished substrate surface by performing a first surface energy reading, a first ellipsometry reading, a first x-ray diffraction reading, and a first profilometry reading;(b) removing electrochemically via an alternating voltage or alternating current a portion of the finished substrate surface, thereby resulting in a cleaned substrate surface;(c) analyzing the cleaned substrate surface by performing a second surface energy reading, a second ellipsometry reading, a second x-ray diffraction reading, and a second profilometry reading, wherein the removing step (b) is accomplished to the extent that the second surface energy reading and the second ellipsometry reading are measurably changed from the first surface energy reading and the first ellipsometry reading, but the second x-ray diffraction reading and the second profilometry reading are measurably unchanged from the first x-ray diffraction reading and the first profilometry reading; and(d) depositing a layer of the photoreceptor on the cleaned substrate surface.

Abstract translation: 一种制造感光体的方法，所述感光体具有进行了表面精加工处理以得到成品基材表面的基材，其中所述方法包括：（a）通过执行第一表面能读数，第一椭偏仪读数， 第一次x射线衍射读数和第一轮廓测量读数; （b）通过交流电压或交流电一部分完成的衬底表面电化学去除，由此导致清洁的衬底表面; （c）通过执行第二表面能读数，第二椭偏仪读数，第二x射线衍射读数和第二轮廓测量读数来分析所清洁的衬底表面，其中所述去除步骤（b）完成到第二 表面能读数和第二椭偏仪读数从第一表面能读数和第一椭偏仪读数可测量地改变，但第二x射线衍射读数和第二轮廓测量读数与第一x射线衍射读数和第 轮廓测量读数; 和（d）将感光体层沉积在清洁的基底表面上。

公开(公告)号：US5938913A

公开(公告)日：1999-08-17

申请号：US838522

申请日：1997-04-08

Applicant: Jovan Starcevic ,  Karl Siegmund

Inventor： Jovan Starcevic ,  Karl Siegmund

IPC: C25D7/06 ,  C25D21/12 ,  C25F7/00 ,  C25F3/00 ,  C25F1/00

CPC classification number: C25D21/12 ,  C25F7/00

Abstract: Process for electrolytic treatment of continuous running material in which the material runs through an electrolytic liquid and electric potential is applied to the material. In order to guarantee freedom from differential potential in the material to be treated in any form of electrolytic treatment, the differential potential in the treated material is measured after electrolytic treatment and at least the same degree of inverse compensating potential is applied to the material. In an apparatus to implement the process, comprising at least one treatment tank to hold the electrolytic liquid and through which the material being treated is guided by means of guide rolls, as well as comprising at least one pair of electrodes to apply electric potential in the material, at least one device is included to achieve this aim and which is used to measure the differential potential of the treated material, together with at least one pair of additional electrodes connected to an adjustable rectifier, where the device for measuring the differential potential is connected to the controlling part of the rectifier.

Abstract translation: 用于电解处理连续运行材料的方法，其中材料穿过电解液体并且电势被施加到材料上。 为了确保在任何形式的电解处理中待处理的材料中不受电位的差异，在电解处理后测量处理材料中的微分电位，并且至少对材料施加相同程度的反向补偿电位。 在实施该方法的装置中，包括至少一个处理槽以保持电解液，并且被处理的材料通过该导向辊被引导，并且包括至少一对电极以在电解液中施加电势 包括至少一个装置以实现该目的并且用于测量经处理的材料的差分电位以及连接到可调节整流器的至少一对附加电极，其中用于测量差分电位的装置是 连接到整流器的控制部分。

公开(公告)号：US5858200A

公开(公告)日：1999-01-12

申请号：US862702

申请日：1997-05-23

Applicant: Tadashi Takahashi ,  Yukio Aoike ,  Tatsuo Hirayama

Inventor： Tadashi Takahashi ,  Yukio Aoike ,  Tatsuo Hirayama

IPC: B21C37/04 ,  C25F7/00 ,  D07B1/06 ,  C30B30/02 ,  C25F1/00 ,  C25F5/00

CPC classification number: C25F7/00 ,  B21C37/047 ,  Y10T428/12333 ,  Y10T428/12424 ,  Y10T428/12431 ,  Y10T428/12444 ,  Y10T428/12465 ,  Y10T428/12486 ,  Y10T428/1259

Abstract: A method of manufacturing a metallic fiber in which from a convergent extended wire, which is formed by a metallic fiber and a matrix member which is formed of a metallic material and whose dissolvability is higher than the dissolvability of the metallic fiber, the matrix member is continuously dissolved and removed by an electrolytic processing in a plurality of electrolytic tanks which are arranged in the conveying direction of the convergent extended wire, wherein: the convergent extended wire is passed through electrolytes in the plurality of electrolytic tanks, which are arranged in the shape of a gentle convex arch at the vertical direction upper side which includes the conveying passage of the convergent extended wire, the convergent extended wire is passed above a plurality of feeding devices which are provided at the outer sides of the electrolytes and which are disposed in the same arch-shape so as to correspond to the electrolytic tanks, in each of the plurality of electrolytic tanks, the metallic fiber is maintained in one of a cathode reduction area and a passivation area, or alternatively, anode current is maintained at a predetermined potential which is closer to 0, and the matrix member is anode-electrolyzed. At this time, a method of manufacturing the twine of metallic fibers, further including the step of: intertwining the convergent extended member in the unit of two to four before the electrolytic processing, while the convergent extended member is formed by a forming device in a spiral shape whose diameter is larger than the diameter of a closely-intertwined twine.

Abstract translation: 一种金属纤维的制造方法，其特征在于，从由金属纤维形成的会聚延长线和由金属材料形成的矩阵构件，其溶解性高于金属纤维的溶解性的金属纤维的矩阵构件为 通过在会聚延长线的输送方向上配置的多个电解槽中的电解处理连续地溶解除去，其中：会聚延长线穿过多个电解槽中的电解质，其形状为 在包括会聚延长线的输送通道的垂直方向上侧具有平缓的凸拱，收敛的延伸线在设置在电解质外侧的多个供给装置的上方通过， 相同的拱形，以便在多个电解中的每一个中对应于电解槽 金属纤维保持在阴极还原区域和钝化区域中的一个中，或者，阳极电流保持在更接近0的预定电位，并且基体元件被阳极电解。 此时，制造金属纤维线的方法，还包括以下步骤：在电解处理之前将会聚延伸构件缠绕在二至四单位之间，而会聚延伸构件由成形装置形成在 螺旋形的直径大于紧密缠绕的麻绳的直径。