Camera module
    52.
    发明授权

    公开(公告)号:US11899225B2

    公开(公告)日:2024-02-13

    申请号:US17005532

    申请日:2020-08-28

    IPC分类号: G02B7/02 G02B5/00

    CPC分类号: G02B5/003 G02B7/021

    摘要: A camera module includes: a lens module including a plurality of lenses; a housing accommodating the lens module; a reflective member disposed in front of the lens module; an image sensor module to receive light passing through the lens module; and a first light shielding plate disposed in the housing in a space between the lens module and the image sensor module.

    Stereoscopic optical system and image pickup apparatus

    公开(公告)号:US11892708B2

    公开(公告)日:2024-02-06

    申请号:US17560655

    申请日:2021-12-23

    摘要: A stereoscopic optical system includes two parallel optical systems that each include, in order from an object side to an image side, a front unit having a negative refractive power, an intermediate unit having two reflective surfaces, and a rear unit. A distance between optical axes of rear units is smaller than that between optical axes of front units in the two optical systems due to bending of an optical path by the two reflective surfaces. At least one of the intermediate unit and the rear unit has a positive refractive power. The front unit includes, in order from the object side to the image side, a first subunit consisting of one or more negative lenses disposed on the object side of a positive lens closest to an object in the front unit, and a second subunit having a positive power. A predetermined condition is satisfied.

    TRANSFER SUBSTRATE USED IN MANUFACTURE OF DISPLAY APPARATUS, DISPLAY APPARATUS, AND MANUFACTURING METHOD FOR DISPLAY APPARATUS

    公开(公告)号:US20240038940A1

    公开(公告)日:2024-02-01

    申请号:US18022300

    申请日:2020-08-20

    发明人: Hwanjoon CHOI

    IPC分类号: H01L33/50 G02B5/00

    摘要: The present invention is applicable to a technical field related to display apparatuses, and the present invention relates to a transfer substrate that transfers a phosphor onto a semiconductor light-emitting device, in which the transfer substrate may comprise: a temporary substrate; a unit phosphor structure which is provided on the temporary substrate and comprises a color filter, a phosphor stacked on the color filter, and a phosphor binder for fixing the phosphor; and a light-absorption layer, which is an inorganic layer provided between the temporary substrate and the color filter, and absorbs light to separate the unit phosphor structure from the temporary substrate.

    Privacy Films for Curved Displays
    55.
    发明公开

    公开(公告)号:US20240036238A1

    公开(公告)日:2024-02-01

    申请号:US18484302

    申请日:2023-10-10

    申请人: Apple Inc.

    摘要: A privacy film may have a light-blocking layer that is interposed between first and second transparent substrates. The light-blocking layer may have a plurality of opaque portions and a plurality of transparent portions. The opaque portions may be shaped to ensure light from the display is directed only to the primary viewer of the display. Each opaque portion of the light-blocking layer may extend along a respective longitudinal axis between the first and second transparent substrates. Privacy films used to cover curved displays may have opaque portions that extend along longitudinal axes that have different angles relative to the transparent substrates. Opaque portions in the edge of the privacy film may have longitudinal axes that are at non-perpendicular angles with respect to the transparent substrates. A privacy film for a curved display may also include a light-redirecting layer such as a prism layer or a liquid crystal layer.

    Plasmonic lithography for patterning high aspect-ratio nanostructures

    公开(公告)号:US11874480B2

    公开(公告)日:2024-01-16

    申请号:US16956334

    申请日:2018-12-20

    IPC分类号: G02B5/00 G02B1/00 G02B5/18

    摘要: A plasmonic device incorporating a special hyperbolic metamaterial (HMM) metamaterial is used for plasmonic lithography, including ultraviolet (UV) lithography. It may be a Type II HMM (ϵ∥ 0) whose tangential component of the permittivity ϵ∥ is close to zero. Due to the high anisotropy of the Type II epsilon near zero (ENZ) HMM, only one plasmonic mode can propagate horizontally with low loss in a waveguide system with ENZ HMM as its core. In certain aspects, a Type II ENZ HMM comprises alternating layers of aluminum/aluminum oxide films and the associated unusual mode of light transmission is used to expose a photosensitive layer in a specially designed lithography system. Methods for making patterns of nanofeatures via such plasmonic lithography are also provided, including as a plasmonic roller device.