公开(公告)号：US5969465A

公开(公告)日：1999-10-19

申请号：US53232

申请日：1998-04-01

Applicant: Armand P. Neukermans ,  Timothy G. Slater ,  Philip Downing

Inventor： Armand P. Neukermans ,  Timothy G. Slater ,  Philip Downing

IPC: B81B3/00 ,  G01C19/56 ,  G01P9/04 ,  G02B26/08 ,  G02B26/10 ,  H01L41/09 ,  H02K33/18 ,  H02K33/00

CPC classification number: B81B3/0078 ,  G02B26/0841 ,  G02B26/085 ,  G02B26/0858 ,  G02B26/0866 ,  G02B26/101 ,  H02K33/18 ,  B81B2203/0109 ,  B81C2201/0167

Abstract: An improved micromachined structure used for beam scanners, gyroscopes, etc. includes a reference member from which project a first pair of axially aligned torsion bars. A first dynamic member, coupled to and supported from the reference member by the torsion bars, oscillates in one-dimension about the torsion bar's axis. A second dynamic member may be supported from the first dynamic member by a second pair of axially aligned torsion bars for two-dimensional oscillation. The dynamic members respectively exhibit a plurality of vibrational modes each having a frequency and a Q. The improvement includes means for altering a characteristic of the dynamic member's frequency and Q. Coupling between dynamic members permits altering the second dynamic member's frequency and Q by techniques applied to the first dynamic member. Some techniques disclosed also increase oscillation amplitude or reduce driving voltage, and also increase mechanical ruggedness of the structure.

Abstract translation: 用于光束扫描器，陀螺仪等的改进的微加工结构包括参考构件，从基准构件突出出第一对轴向对准的扭杆。 通过扭力杆耦合并由参考构件支撑的第一动态构件围绕扭杆的轴线一维摆动。 第二动态构件可以由第二对轴向对准的扭杆从第一动态构件支撑，用于二维振荡。 动态构件分别表现出多个具有频率和Q的振动模式。改进包括用于改变动态构件的频率和Q的特性的装置。动态构件之间的耦合允许通过应用的技术改变第二动态构件的频率和Q 到第一个动态成员。 公开的一些技术还增加振荡幅度或降低驱动电压，并且还增加了结构的机械坚固性。

公开(公告)号：US5951601A

公开(公告)日：1999-09-14

申请号：US823224

申请日：1997-03-24

Applicant: S. George Lesinski ,  Armand P. Neukermans ,  Christopher P. Neukermans

Inventor： S. George Lesinski ,  Armand P. Neukermans ,  Christopher P. Neukermans

IPC: A61F2/02 ,  A61F2/18 ,  H04R25/00

CPC classification number: H04R25/606

Abstract: A microactuator (32) of an implantable hearing aid system (10) is secured within a casing (50) implanted into a fenestration (52) that pierces the promontory (18) of the otic capsule bone (31). The casing (50) includes a hollow sleeve (62) that has an outer surface (64) and a first end (66) that is received into the fenestration (52). The sleeve (62) also includes an inner surface (68) adapted to receive a barrel (74) of the microactuator (32). The casing (62) also includes a flange (76) that is integral with the sleeve (62) and projects outward from the outer surface (64) of the sleeve (62) about a second end (78) of the sleeve (62). Various means secure the sleeve (62) within the fenestration (52) such as screwing into the promontory (18) or clamping to the promontory (18). The casing may fasten the microactuator (32) to the casing (50) by a threaded attachment, with screws, with button-and-socket snap fasteners, or with a slotted tongue-and-groove lock. A dummy plug may replace the microactuator (32) should removal become necessary.

Abstract translation: 可植入式助听器系统（10）的微型致动器（32）固定在植入开孔（52）的壳体（50）内，该开窗（52）刺穿耳廓胶囊骨（31）的海角（18）。 壳体（50）包括具有外表面（64）和容纳在开窗（52）中的第一端部（66））的中空套筒（62）。 套筒（62）还包括适于容纳微致动器（32）的筒体（74）的内表面（68）。 外壳（62）还包括与套筒（62）成一体并从套筒（62）的外表面（64）向外突出的凸缘（76），围绕套筒（62）的第二端（78） 。 各种装置固定开窗（52）内的套筒（62），例如拧入海角（18）或夹紧到海角（18）。 外壳可以通过螺纹连接，螺钉，按钮和插座卡扣紧固件或带槽舌槽锁定将微致动器（32）固定到壳体（50）。 如果需要移除，则虚拟插头可以替代微型致动器（32）。

公开(公告)号：US5861549A

公开(公告)日：1999-01-19

申请号：US762589

申请日：1996-12-10

Applicant: Armand P. Neukermans ,  Timothy G. Slater

Inventor： Armand P. Neukermans ,  Timothy G. Slater

IPC: A44B99/00 ,  G01B7/34

CPC classification number: G01Q60/38 ,  B82Y35/00 ,  G01B7/34 ,  Y10S977/872 ,  Y10T24/44923

Abstract: A topographic head for profilometry and AFM supports a central paddle by coaxial torsion bars projecting inward from an outer frame. A tip projects from the paddle distal from the bars. The torsion bars include an integrated paddle rotation sensor. A XY stage may carry the topographic head for X and Y axis translation. The XYZ stage's fixed outer base is coupled to an X-axis stage via a plurality of flexures. The X-axis stage is coupled to a Y-axis stage also via a plurality of flexures. One of each set of flexures includes a shear stress sensor. A Z-axis stage may also be included to provide an integrated XYZ scanning stage. The topographic head's frame, bars and paddle, and the XYZ stage's stage-base, X-axis, Y-axis and Z-axis stages, and flexures are respectively monolithically fabricated by micromachining from a semiconductor wafer.

Abstract translation: 用于轮廓测量和AFM的地形头通过从外框向内突出的同轴扭力支撑中心桨。 尖端从杆的远端突出。 扭杆包括一个集成的桨式旋转传感器。 XY平台可以携带用于X和Y轴平移的地形头。 XYZ平台的固定外底座经由多个弯曲部与X轴平台连接。 X轴平台也通过多个弯曲部与Y轴平台连接。 每组挠曲件之一包括剪切应力传感器。 还可以包括Z轴平台以提供集成的XYZ扫描台。 通过从半导体晶片进行微加工，地形头的框架，杆和桨以及XYZ平台的阶段基座，X轴，Y轴和Z轴平台以及挠曲件分别单片地制造。

公开(公告)号：US5393647A

公开(公告)日：1995-02-28

申请号：US92780

申请日：1993-07-16

Applicant: Armand P. Neukermans ,  Timothy G. Slater ,  Linda E. Whittlesey ,  Sean S. Cahill

Inventor： Armand P. Neukermans ,  Timothy G. Slater ,  Linda E. Whittlesey ,  Sean S. Cahill

IPC: G01Q70/10 ,  B81C1/00 ,  C23C16/00 ,  G01Q70/14 ,  G01Q70/16 ,  H01J9/02 ,  H01J37/073 ,  H01L21/302

CPC classification number: G01Q70/16 ,  B81C1/00682 ,  B82Y35/00 ,  G01Q70/14 ,  H01J9/025 ,  B81B2201/12 ,  H01J2209/0226

Abstract: Forming micro-probe tips for an atomic force microscope, a scanning tunneling microscope, a beam electron emission microscope, or for field emission, by first thinning a tip of a first material, such as silicon. The tips are then reacted with a second material, such as atoms from an organic or ammonia vapor, at a temperature of about 1000.degree. C..+-.200.degree. C. and vacuum conditions for several minutes. Vapors such as methane, propane or acetylene will be converted to SiC or WC while ammonia will be converted to Si.sub.3 N.sub.4. The converted material will have different physical, chemical and electrical properties. For example, a SiC tip will be superhard, approaching diamond in hardness. Electrically conductive tips are suitable for field emission.

Abstract translation: 通过首先使诸如硅的第一材料的尖端变薄，形成用于原子力显微镜，扫描隧道显微镜，束电子发射显微镜或用于场发射的微探针尖端。 然后将尖端与第二种材料（例如来自有机或氨蒸汽的原子）在约1000℃±200℃的温度和真空条件下反应数分钟。 蒸气如甲烷，丙烷或乙炔将转化为SiC或WC，而氨将转化为Si3N4。 转换的材料将具有不同的物理，化学和电学性能。 例如，SiC尖端将是超硬的，接近金刚石的硬度。 导电尖端适用于场发射。

公开(公告)号：US5276498A

公开(公告)日：1994-01-04

申请号：US882047

申请日：1992-05-12

Applicant: Lee K. Galbraith ,  John L. Vaught ,  Ralph C. Wolf ,  Brian Leslie ,  Armand P. Neukermans

Inventor： Lee K. Galbraith ,  John L. Vaught ,  Ralph C. Wolf ,  Brian Leslie ,  Armand P. Neukermans

IPC: H01L21/66 ,  G01N21/956 ,  G02B27/46 ,  G02F1/1343 ,  G01N21/00

CPC classification number: G02F1/134309 ,  G01N21/95623 ,  G02B27/46 ,  G01N2201/067

Abstract: An inspection apparatus for a light diffracting surface employs a planar array of individually addressable light valves for use as a spatial filter in an imaged Fourier plane of a diffraction pattern, with valves having a stripe geometry corresponding to positions of members of the diffraction pattern, blocking light from those members. The remaining valve stripes, i.e. those not blocking light from diffraction order members, are open for transmission of light. Light directed onto the surface, such as a semiconductor wafer, forms elongated curved diffraction orders from repetitive patterns of circuit features. The curved diffraction orders are transformed to linear orders by a Fourier transform lens. The linear diffraction orders from repetitive patterns of circuit features are blocked, while light from non-repetitive features, such as dirt particles or defects is allowed to pass through the light valves to a detector. Patterns of stripes can be recorded corresponding to the repetitive features of different integrated circuits. Different filters may be rapidly switched electronically in synchronization with a beam scanning a patterned surface inspecting different light diffracting patterns in different positions, allowing scattered or diffracted light from non-repetitive features to pass through the filter to a detector. A logical AND combination of two filters may be used so that two regions may be inspected in a single scan of the beam.

Abstract translation: 用于光衍射表面的检查装置采用独立寻址光阀的平面阵列，用作衍射图案的成像傅立叶平面中的空间滤光器，其中具有对应于衍射图案的部件的位置的条形几何形状的阀 来自这些成员的光。 剩余的阀条，即不阻挡来自衍射级构件的光的那些条纹是透光的。 指向表面的光，例如半导体晶片，从电路特征的重复图案形成细长的弯曲衍射级。 通过傅里叶变换透镜将弯曲的衍射级变换成线性阶数。 来自电路特征的重复图案的线性衍射顺序被阻止，而来自非重复特征的光（例如污物颗粒或缺陷）允许通过光阀到达检测器。 可以根据不同集成电路的重复特征对条纹进行记录。 不同的滤波器可以与扫描图案化表面的光束同步地电子快速地切换，以在不同位置检查不同的光衍射图案，允许来自非重复特征的散射或衍射光通过滤光器到检测器。 可以使用两个滤波器的逻辑AND组合，使得可以在波束的单次扫描中检查两个区域。

公开(公告)号：US5264912A

公开(公告)日：1993-11-23

申请号：US832379

申请日：1992-02-07

Applicant: John L. Vaught ,  Michael E. Fein ,  Armand P. Neukermans

Inventor： John L. Vaught ,  Michael E. Fein ,  Armand P. Neukermans

IPC: H01L21/66 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  G02B27/46 ,  G01N21/88

CPC classification number: G01N21/94 ,  G01N21/95623 ,  G02B27/46 ,  G01N21/9501

Abstract: An apparatus used to inspect patterned wafers and other substrates with periodic features for the presence of particles, defects and other aperiodic features in which a spatial filter placed in the Fourier plane is used in combination with either broadband illumination, angularly diverse illumination or both. In contrast to prior devices that direct light from a single monochromatic source through a pinhole aperture stop, embodiments are describes that illuminate a patterned substrate using (1) a single monochromatic source with a slit-shaped aperture stop for angularly diverse illumination, (2) a single broadband source with a pinhole aperture stop for broadband illumination, (3) a single broadband source with a slit-shaped aperture stop for both broadband and angularly diverse illumination, or (4) multiple sources with an aperture stop for each source for at least angularly diverse illumination. The spatial filters for these illumination systems are characterized by opaque tracks in an otherwise transmissive filter for blocking the elongated bands produced by diffraction from the periodic features on the illuminates substrate. The filter may be made photographically by exposing high contrast film placed in or near the Fourier plane to the diffracted light from a defect and particle frame substrate having only periodic features. Light scattered from the aperiodic features is able to substantially pass through the filter and be imaged onto, a CCD array, vidicon camera or TDI sensor.

Abstract translation: 用于检查具有周期性特征的图案化晶片和其它基板用于存在颗粒，缺陷和其他非周期性特征的装置，其中放置在傅立叶平面中的空间滤波器与宽带照明，角度不同的照明或两者结合使用。 与通过针孔孔径光阑引导来自单个单色源的光的现有装置相比，描述了使用（1）具有狭缝形孔径光阑的单个单色光源来照射图案化的衬底，用于角度不同的照明，（2） 单宽带光源，具有用于宽带照明的针孔孔径光阑，（3）单宽带光源，具有狭缝形孔径光阑，适用于宽带和角度不同的照明，或（4）多个源，每个光源的孔径光阑在 最小角度多样的照明。 用于这些照明系统的空间滤波器的特征在于在另外透射的滤光器中的不透明光道，用于阻挡由照明基板上的周期特征衍射产生的细长带。 可以通过将放置在傅立叶平面中或其附近的高对比度胶片与来自仅具有周期特征的缺陷和颗粒框架基板的衍射光曝光来进行过滤。 从非周期特征散射的光能够基本上通过滤光片并被成像到CCD阵列，摄像机或TDI传感器上。

公开(公告)号：US5026437A

公开(公告)日：1991-06-25

申请号：US467976

申请日：1990-01-22

Applicant: Armand P. Neukermans ,  Josef Berger

Inventor： Armand P. Neukermans ,  Josef Berger

IPC: H01J37/28 ,  G01B7/34 ,  G01N37/00 ,  G01Q60/00 ,  G01Q70/06 ,  G01Q70/10 ,  G01Q70/14 ,  G01Q70/16 ,  H01L21/266 ,  H01L21/306 ,  H01L21/66

CPC classification number: G01Q70/16 ,  B82Y35/00 ,  G01Q70/10 ,  G01Q70/14 ,  H01L21/30604 ,  H01L21/30608 ,  Y10S438/924

Abstract: A method for fabricating a microtip, cantilevered from a base and having a controllably high aspect ratio, for use in microprobe microscopy to probe variations in materials at the atomic level. A two-layer semiconductor material structure is provided, one layer being n type and the other layer being p type. A thin pencil of ions of n type is implanted through the n type layer into the p type layer, through a small aperture in a mask layer that overlies the n type layer. The p type material is then etched away, leaving the n type ion profile and the n type layer as a cantilevered microtip. The n type semiconductor layer may be replaced by a layer of any material that resists etching by the selected etchant.

Abstract translation: 用于制造从底部悬臂并具有可控高的纵横比的微尖端的方法，用于微探针显微镜以探测原子水平的材料变化。 提供两层半导体材料结构，一层为n型，另一层为p型。 n型的一小笔离子通过n型层通过覆盖n型层的掩模层中的小孔注入p型层。 然后将p型材料蚀刻掉，留下n型离子轮廓和n型层作为悬臂微尖端。 n型半导体层可以被抵抗所选蚀刻剂的蚀刻的任何材料的层所代替。

公开(公告)号：US4898471A

公开(公告)日：1990-02-06

申请号：US248309

申请日：1988-09-19

Applicant: John L. Vaught ,  Armand P. Neukermans ,  Herman F. Keldermann ,  Franklin R. Koenig

Inventor： John L. Vaught ,  Armand P. Neukermans ,  Herman F. Keldermann ,  Franklin R. Koenig

IPC: G01N21/94 ,  G01N21/956

CPC classification number: G01N21/94 ,  G01N2021/95615 ,  G01N2021/95676 ,  G01N21/95607 ,  G01N2201/112

Abstract: A particle detection on a periodic patterned surface is achieved in a method and apparatus using a single light beam scanning at a shallow angle over the surface. The surface contains a plurality of identical die with streets between die. The beam scans parallel to a street direction, while a light collection system collects light scattered from the surface with a constant solid angle. The position of the collection system as well as the polarization of the light beam and collected scattered light may be arranged to maximize the particle signal compared to the pattern signal. A detector produces an electrical signal corresponding to the intensity of scattered light that is colelcted. A processor constructs templates from the electrical signal corresponding to individual die and compares the templates to identify particles. A reference template is constantly updated so that comparisons are between adjacent die. In one embodiment, the templates are made up of registered positions where the signal crosses a threshold, and the comparison is between corresponding positions to eliminate periodic pattern features, leaving only positions representing particles.

Abstract translation: 在使用在表面上以浅角度扫描的单个光束的方法和装置中实现周期性图案化表面上的粒子检测。 表面包含多个相同的模具，在模具之间具有街道。 光束平行于街道方向扫描，而光采集系统以恒定立体角收集从表面散射的光。 收集系统的位置以及光束和收集的散射光的偏振可以被布置成与图案信号相比最大化粒子信号。 检测器产生对应于被烧焦的散射光的强度的电信号。 处理器从对应于各个管芯的电信号构建模板，并比较模板以识别粒子。 参考模板不断更新，以便相邻模具之间进行比较。 在一个实施例中，模板由信号跨越阈值的注册位置组成，并且在相应位置之间进行比较以消除周期性图案特征，仅留下表示粒子的位置。

公开(公告)号：US4844617A

公开(公告)日：1989-07-04

申请号：US146046

申请日：1988-01-20

Applicant: Herman F. Kelderman ,  Michael E. Fein ,  Alan E. Loh ,  Arnold Adams ,  Armand P. Neukermans

Inventor： Herman F. Kelderman ,  Michael E. Fein ,  Alan E. Loh ,  Arnold Adams ,  Armand P. Neukermans

IPC: G01B9/04 ,  G01J3/02 ,  G01J3/18 ,  G01J3/28 ,  G02B21/00

CPC classification number: G01B9/04 ,  G01J3/02 ,  G01J3/0229 ,  G01J3/0243 ,  G01J3/0248 ,  G02B21/006 ,  G01J3/18 ,  G01J3/2803

Abstract: A confocal measuring microscope including a spectrometer and autofocus system sharing common optical elements in which the intensity of light entering the spectrometer from a particular spot on a workpiece is used to determine a focus condition for the same spot. The microscope includes at least one light source, an illumination field stop, and a microscope objective that images the stop onto a workpiece supported by a movable platform. The objective also forms an image of the illuminated portion of the object. An aperture in a second stop and intersecting the image plane passes light from part of the image to the spectrometer, while viewing optics are used to view the image. In one embodiment, a detector is placed at the zero order position, while in another embodiment a laser is placed at the zero order position. In the later embodiment an integrator circuit connected to the detector array replaces the zero order detector for measuring the total intensity of light entering the spectrometer. A best focus condition occurs when the total intensity is a maximum for a positive confocal configuration, i.e. where source and detector are on opposite sides of their respective field stops from said workpiece, and a minimum for a negative confocal configuration, i.e. where the source and workpiece are on the same side of a reflective illumination field stop with aperture. The movable platform may be scanned axially to achieve and maintain object focus as the object is scanned transversely.

Abstract translation: 共焦测量显微镜包括分光光度计和自动聚焦系统，共享共同的光学元件，其中使用从工件上的特定光点进入光谱仪的光的强度来确定同一光斑的聚焦条件。 显微镜包括至少一个光源，照明场停止器和将停止点图像到由可移动平台支撑的工件上的显微镜物镜。 该目的也形成对象的被照亮部分的图像。 在第二个停止点和与图像平面相交的孔将光从图像的一部分传递到光谱仪，而观察光学元件用于观看图像。 在一个实施例中，检测器被放置在零级位置，而在另一个实施例中，激光被放置在零级位置。 在后面的实施例中，连接到检测器阵列的积分器电路取代了用于测量进入光谱仪的光的总强度的零级检测器。 当总强度为正共焦配置的最大值时，即源和检测器位于其与所述工件相应的场停止位置的相对侧上，并且对于共焦焦配置为最小，即源和 工件位于具有孔径的反射照明场停止的同一侧。 当物体被横向扫描时，可移动平台可被轴向地扫描以实现和维持物体焦点。

公开(公告)号：US4654581A

公开(公告)日：1987-03-31

申请号：US541385

申请日：1983-10-12

Applicant: Armand P. Neukermans ,  James H. Boyden ,  Garrett A. Garrettson

Inventor： Armand P. Neukermans ,  James H. Boyden ,  Garrett A. Garrettson

IPC: H01L21/027 ,  G01B7/31 ,  G03F9/00 ,  H01L21/30 ,  G01R27/26

CPC classification number: G03F9/7053 ,  G01B7/31 ,  G03F9/7023 ,  Y10S148/102

Abstract: An aligner for aligning a mask and a wafer during photolithography of a semiconductor chip uses detection of the differential capacitance between two sets of conductive fingers on the mask and ridges on the wafer. An A.C. signal is coupled between the ridges and the fingers and the phase or amplitude of the signals is detected. An aligner utilizing multiple groups of ridges and fingers allows rotational alignment or two axis lateral alignment. An aligner having reference ledges to which the mask and the wafer are capacitively coupled allows alignment when the distance between the mask and the wafer is too great to permit meaningful capacitive coupling between the mask and the wafer to occur.

Abstract translation: 用于在半导体芯片的光刻期间对准掩模和晶片的对准器使用掩模上的两组导电指状物和晶片上的脊之间的差分电容的检测。 交流信号耦合在脊和指状物之间，并且检测信号的相位或振幅。 使用多组脊和手指的对准器允许旋转对准或两轴横向对准。 具有参考突起的对准器，掩模和晶片电容耦合到其上，当掩模和晶片之间的距离太大而不能在掩模和晶片之间产生有意义的电容耦合时就能进行对准。