公开(公告)号：US20050211921A1

公开(公告)日：2005-09-29

申请号：US11128512

申请日：2005-05-12

申请人： Marco Wieland ,  Bert Kampherbeek ,  Alexander Vincent van Veen ,  Pieter Kruit

发明人： Marco Wieland ,  Bert Kampherbeek ,  Alexander Vincent van Veen ,  Pieter Kruit

IPC分类号： A61N5/00 ,  G01Q30/02 ,  G01Q30/08 ,  G03B1/00 ,  H01J37/08 ,  H01J37/30 ,  H01J37/304 ,  H01J37/317

CPC分类号： H01J3/02 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/06 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/06308 ,  H01J2237/06375 ,  H01J2237/3045

摘要： The invention relates to an electron beam exposure apparatus for transferring a pattern onto the surface of a target, comprising: a beamlet generator for generating a plurality of electron beamlets; a modulation array for receiving said plurality of electron beamlets, comprising a plurality of modulators for modulating the intensity of an electron beamlet; a controller, connected to the modulation array for individually controlling the modulators, an adjustor, operationally connected to each modulator, for individually adjusting the control signal of each modulator; a focusing electron optical system comprising an array of electrostatic lenses wherein each lens focuses a corresponding individual beamlet, which is transmitted by said modulation array, to a cross section smaller than 300 nm, and a target holder for holding a target with its exposure surface onto which the pattern is to be transferred in the first focal plane of the focusing electron optical system.

摘要翻译： 本发明涉及一种用于将图案转印到目标表面上的电子束曝光装置，包括：用于产生多个电子束的小波发生器; 用于接收所述多个电子子束的调制阵列，包括用于调制电子束的强度的多个调制器; 连接到用于单独控制调制器的调制阵列的控制器，可操作地连接到每个调制器的调节器，用于单独调整每个调制器的控制信号; 一种聚焦电子光学系统，包括静电透镜阵列，其中每个透镜将由所述调制阵列传输的相应单独的子束聚焦成小于300nm的横截面，以及用于将其曝光表面保持在其上的靶保持器 其图案将在聚焦电子光学系统的第一焦平面中转印。

公开(公告)号：US20050161621A1

公开(公告)日：2005-07-28

申请号：US10856050

申请日：2004-05-27

申请人： Marco Wieland ,  Pieter Kruit

发明人： Marco Wieland ,  Pieter Kruit

IPC分类号： H01J37/08 ,  H01J37/30 ,  H01J37/317

CPC分类号： H01J37/3007 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/045 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/1501

摘要： The invention relates to a charged-particle-optical system for a charged particle beam exposure apparatus, said system comprising: a first aperture means comprising at least a first substantially round aperture for partially shielding an emitted charged particle beam for forming a charged particle beamlet; a lens system comprising at least one lens for focussing a charged particle beamlet from said first aperture within or in the vicinity of an image focal plane of said lens; a deflector means, substantially located in said image focal plane, comprising at least one beamlet deflector for the deflection of a passing charged particle beamlet upon the reception of a control signal, and a second aperture means comprising at least one second substantially round aperture positioned in the conjugate plane of the first aperture, and said second aperture being aligned with said first aperture and said beamlet deflector for blocking said charged particle beamlet upon deflection by said beamlet deflector and to transmit it otherwise.

摘要翻译： 本发明涉及一种用于带电粒子束曝光装置的带电粒子光学系统，所述系统包括：第一孔装置，包括至少第一基本上圆形的孔，用于部分屏蔽发射的带电粒子束以形成带电粒子子束; 透镜系统，包括至少一个透镜，用于聚焦所述透镜的图像焦平面内或附近的来自所述第一孔的带电粒子束; 基本上位于所述图像焦平面中的偏转器装置包括至少一个子束偏转器，用于在接收到控制信号时偏转通过的带电粒子子束;以及第二孔装置，包括至少一个第二基本圆形的孔， 所述第一孔的共轭平面和所述第二孔与所述第一孔和所述子束偏转器对准，用于在由所述小梁偏转器偏转时阻挡所述带电粒子子束，否则传递。

公开(公告)号：US5003172A

公开(公告)日：1991-03-26

申请号：US344195

申请日：1989-04-27

申请人： Pieter Kruit ,  Arno J. Bleeker ,  John A. Venables

发明人： Pieter Kruit ,  Arno J. Bleeker ,  John A. Venables

IPC分类号： G01N23/225 ,  G01Q30/06 ,  H01J37/09 ,  H01J37/141 ,  H01J37/22 ,  H01J37/244 ,  H01J37/252 ,  H01J37/256

CPC分类号： H01J37/141 ,  H01J37/09 ,  H01J37/256 ,  H01J2237/142

摘要： An objective lens in an electron microscope is adapted to detection of Auger electrons. Using an additional lens field, preferably including the use of a VAIL lens, the electrons to be detected are spiraled to a selection space. Between the lens field and the selection space a preferably displaceable, magnetic diaphragm is arranged for the separation of lens fields.

公开(公告)号：US09105439B2

公开(公告)日：2015-08-11

申请号：US13304427

申请日：2011-11-25

申请人： Marco Jan Jaco Wieland ,  Bert Jan Kampherbeek ,  Alexander Hendrik Van Veen ,  Pieter Kruit ,  Stijn Willem Steenbrink

发明人： Marco Jan Jaco Wieland ,  Bert Jan Kampherbeek ,  Alexander Hendrik Van Veen ,  Pieter Kruit ,  Stijn Willem Steenbrink

IPC分类号： H01J37/317 ,  H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/30

CPC分类号： H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/151

摘要： The invention relates to a charged particle optical system comprising a beamlet generator for generating a plurality of charged particle beamlets, an electrostatic deflection system for deflecting the beamlets, and a projection lens system for directing the beamlets from the beamlet generator towards the target. The electrostatic deflection system comprises a first electrostatic deflector and a second electrostatic deflector for scanning charged particle beamlets over the target. The second electrostatic deflector is located behind the first electrostatic deflector so that, during operation of the system, a beamlet generated by the beamlet generator passes both of the electrostatic deflectors. During operation of the first and second electrostatic deflectors the system is adapted to apply voltages on the first electrostatic deflector and the second electrostatic deflector of opposite sign.

摘要翻译： 本发明涉及一种带电粒子光学系统，其包括用于产生多个带电粒子子束的子束发生器，用于偏转子束的静电偏转系统，以及用于将子束从小波发生器引导到目标的投影透镜系统。 静电偏转系统包括用于在靶上扫描带电粒子束的第一静电偏转器和第二静电偏转器。 第二静电偏转器位于第一静电偏转器的后面，使得在系统操作期间，由小梁发生器产生的子束通过两个静电偏转器。 在第一和第二静电偏转器的操作期间，系统适于在第一静电偏转器和相反符号的第二静电偏转器上施加电压。

公开(公告)号：US08188450B2

公开(公告)日：2012-05-29

申请号：US13050875

申请日：2011-03-17

申请人： Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

发明人： Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

IPC分类号： H01J3/14 ,  A61N5/00

CPC分类号： H01J37/12 ,  H01J37/153 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/317

摘要： The invention relates to a multiple be charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. En further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.

摘要翻译： 本发明涉及一种多带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。 该系统可以包括发散的带电粒子束部分，其中包括透镜结构。 透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。 进一步阐述，透镜与限流孔结合，相对于所述结构的透镜对准，使得由所述透镜中的所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

公开(公告)号：US08089056B2

公开(公告)日：2012-01-03

申请号：US12393049

申请日：2009-02-26

申请人： Marco Jan Jaco Wieland ,  Bert Jan Kampherbeek ,  Alexander Hendrik Van Veen ,  Pieter Kruit ,  Stijn Willem Herman Karel Steenbrink

发明人： Marco Jan Jaco Wieland ,  Bert Jan Kampherbeek ,  Alexander Hendrik Van Veen ,  Pieter Kruit ,  Stijn Willem Herman Karel Steenbrink

IPC分类号： H01J37/12 ,  H01J37/30

CPC分类号： H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/151

摘要： A charged particle multi-beamlet system for exposing a target using a plurality of beamlets. The system comprises a first plate having a plurality of holes formed in it, with a plurality of electrostatic projection lens systems formed at the location of each hole so that each electron beamlet passes through a corresponding projection lens system. The holes have sufficiently uniform placement and dimensions to enable focusing of the beamlets onto the surface of the target using a common control voltage. Preferably the electrostatic projection lens systems are controlled by a common electrical signal to focus the electron beamlets on the surface without correction of the focus or path of individual electron beamlets.

摘要翻译： 一种用于使用多个子束曝光目标的带电粒子多子束系统。 该系统包括在其中形成有多个孔的第一板，形成在每个孔的位置处的多个静电投影透镜系统，使得每个电子束通过相应的投影透镜系统。 这些孔具有足够均匀的放置和尺寸以使得能够使用公共控制电压将子束聚焦到靶的表面上。 优选地，静电投影透镜系统由公共电信号控制，以将电子束聚焦在表面上，而无需校正各个电子束的聚焦或路径。

公开(公告)号：US20110068276A1

公开(公告)日：2011-03-24

申请号：US12885380

申请日：2010-09-17

申请人： Pieter Kruit ,  Aernout Christiaan Zonnevylle

发明人： Pieter Kruit ,  Aernout Christiaan Zonnevylle

IPC分类号： G21K1/08

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/1477 ,  H01J2237/0435 ,  H01J2237/04924 ,  H01J2237/1205

摘要： The invention relates to a multiple beam charged particle optical system comprising: a charged particle source for generating a plurality of charged particle beamlets, and charged particle optics for directing the charged particle beamlets from the charged particle source towards a target, wherein each charged particle beamlet defines a beamlet centre line, said charged particle optics comprising one or more electrostatic lens arrays, each comprising two or more array electrodes for generating a plurality of electrostatic lenslets, wherein each lenslet is arranged for focusing a corresponding charged particle beamlet, and wherein each lenslet defines a lenslet optical axis, wherein at least one of said one or more electrostatic lens arrays comprises one or more off-axis electrostatic lenslets, wherein the beamlet centre line of the corresponding charged particle beamlet passes through said off-axis electrostatic lenslet at a distance from its lenslet optical axis.

摘要翻译： 本发明涉及一种多光束带电粒子光学系统，包括：用于产生多个带电粒子子束的带电粒子源和用于将带电粒子子束从带电粒子源引向靶的带电粒子光学器件，其中每个带电粒子子束 定义了子束中心线，所述带电粒子光学器件包括一个或多个静电透镜阵列，每个静电透镜阵列包括用于产生多个静电小透镜的两个或更多个阵列电极，其中每个小透镜被布置用于聚焦相应的带电粒子子束，并且其中每个小透镜 限定了小透镜光轴，其中所述一个或多个静电透镜阵列中的至少一个包括一个或多个离轴静电小透镜，其中相应带电粒子子束的子束中心线以一定距离穿过离轴静电透镜 从其小透镜光轴。

公开(公告)号：US07868307B2

公开(公告)日：2011-01-11

申请号：US12288877

申请日：2008-10-24

申请人： Pieter Kruit

发明人： Pieter Kruit

IPC分类号： G21K5/10 ,  H01J49/00

CPC分类号： H01J37/06 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1474 ,  H01J37/3177 ,  H01J2237/06316

摘要： A charged particle beam exposure apparatus for transferring a pattern onto a surface of a target, comprising a beam generator comprising a plurality of n changed particle sources, substantially in one plane, each source adapted for generating a charged particle beam, a first aperture array, comprising a plurality of groups of apertures, each group of apertures aligned with one source, for splitting each beam up into a plurality of beamlets m, thus resulting in a total of n×m beamlets, and a deflector array, comprising a plurality of groups of deflectors, each group of deflectors aligned with one source and one group of apertures, each deflector in a group aligned with an aperture of the corresponding group, and each group of deflectors operable for asserting a collimating influence on its corresponding beam.

摘要翻译： 一种用于将图案转印到目标表面上的带电粒子束曝光装置，包括基本上在一个平面中的多个n个改变的粒子源的束发生器，每个源适于产生带电粒子束，第一孔径阵列， 包括多组孔，每组孔与一个源对准，用于将每个束分成多个子束m，从而导致总共n×m个子束，以及包括多个组的偏转器阵列 每组偏转器与一个源和一组孔对齐，每个偏转器与组对应的孔对准，并且每组偏转器可操作以对其对应的光束进行准直影响。

公开(公告)号：US07732762B2

公开(公告)日：2010-06-08

申请号：US11572398

申请日：2005-07-21

申请人： Michiel David Nijkerk ,  Pieter Kruit

发明人： Michiel David Nijkerk ,  Pieter Kruit

IPC分类号： G01N23/00

CPC分类号： H01J37/244 ,  G01N23/2251 ,  H01J37/22 ,  H01J37/28 ,  H01J2237/1503 ,  H01J2237/2443 ,  H01J2237/2445 ,  H01J2237/2482

摘要： The invention relates to a method of inspecting a specimen surface. The method comprises the steps of generating a plurality of primary beams directed towards the specimen surface, focussing the plurality of primary beams onto respective loci on the specimen surface, collecting a plurality of secondary beams of charged particles originating from the specimen surface upon incidence of the primary beams, converting at least one of the collected secondary beams into an optical beam, and detecting the optical beam.

摘要翻译： 本发明涉及一种检查样品表面的方法。 该方法包括以下步骤：产生指向样品表面的多个主光束，将多个主光束聚焦在样品表面上的相应位置上，在发射的样品表面上收集多个源自样品表面的带电粒子的次光束 主波束，将所收集的次波束中的至少一个转换成光束，以及检测光束。

公开(公告)号：US07569833B2

公开(公告)日：2009-08-04

申请号：US11545976

申请日：2006-10-10

申请人： Pieter Kruit

发明人： Pieter Kruit

IPC分类号： H01J37/147

CPC分类号： H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

摘要： The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means.In this way, it is possible to reduce aberrations of the converging means.

摘要翻译： 本发明涉及一种用于产生多个带电粒子束的装置，包括用于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置和包括多个透镜的透镜阵列，其中所述 透镜阵列位于所述带电粒子源和所述会聚装置之间。 以这种方式，可以减小会聚装置的像差。