摘要:
Embodiments of the invention describe an apparatus and a method for treating a substrate of flat panel display is provided. In one embodiment, an inkjet printing system for a substrate of flat panel display comprises a chemical compound application assembly that applies chemical compound(s) on the substrate of flat panel display, a stage that supports the substrate of flat panel display and a stage positioning system that moves the stage, and an inkjet printing module that dispenses inkjet on the substrate of flat panel display. In another embodiment, a processing system for a substrate of flat panel display comprises a chemical compound application assembly that applies chemical compound(s) on the substrate of flat panel display wherein the chemical compound application assembly has a chemical compound applicator whose width substantially spans the width of the substrate of flat panel display, and a stage that supports the substrate of flat panel display and a stage positioning system that moves the stage. In another embodiment, a method of processing a substrate of flat panel display comprises depositing a layer comprising a chemical compound on the surface of a substrate of flat panel display by a chemical compound application assembly, whose width spans substantially the width of the substrate of flat panel display, of a processing system, and then inkjetting at least three colors on the substrate of flat panel display by an inkjet printing module of the processing system.
摘要:
A method and apparatus for depositing a dielectric material at a rate of at least 3000 Angstroms per minute on a large area substrate that has a surface area of at least about 0.35 square meters is provided. In one embodiment, the dielectric material is silicon oxide. Also provided is a large area substrate having a layer of dielectric material deposited by a process yielding a deposition rate in excess of about 3000 Angstroms per minute and a processing chamber for fabricating the same.
摘要:
A method for lifting a substrate from a susceptor. A plurality of lift pins is configured so that they support the substrate without contacting a central portion of the substrate. The processed substrate has a first dimension that is at least 500 millimeters and a second dimension that is at least 500 millimeters. Each lift pin in the plurality of lift pins is configured so that it supports the substrate from a point that is at least 120 millimeters from a center of the substrate. The plurality of lift pins is configured so that each side of the susceptor is supported by at least three lift pins. In some embodiments, a support member overlies at least a subset of the plurality of lift pins.
摘要:
A method for forming color filters for flat panel displays comprising dispensing color inks into a pre-patterned matrix using an inkjet device and curing the dispensed color inks. In one aspect, the color inks are cured in a concave configuration. In another aspect, the color inks are cured using electron beam, laser, X-ray, or other suitable high energy source.
摘要:
A method of passivation layer deposition using a cyclical deposition process is described. The cyclical deposition process may comprise alternately adsorbing a silicon-containing precursor and a reactant gas on a substrate structure. Thin film transistors, such as a bottom-gate transistor or a top-gate transistor, including a silicon-containing passivation layer, may be formed using such cyclical deposition techniques.
摘要:
Embodiments of the invention generally provide an apparatus and a method for providing a uniform thermal profile to a plurality of substrates during heat processing. In one embodiment, a cassette containing one or more heated substrate supports is moveably disposed within a heating chamber having an about uniform thermal profile therein to more uniformly heat the substrates.
摘要:
A system for processing substrates within a chamber and for cleaning accumulated material from chamber components is provided. The system includes a reactive species generator adapted to generate a reactive gas species for chemically etching accumulated material from chamber components, and a processing chamber having at least one component with a mirror polished surface which is exposed to the reactive species. Preferably to have the greatest impact on chamber cleaning efficiency, the mirror polished surface is a surface of a component such as a gas distribution plate or a backing plate, and/or is a surface of a plurality of smaller components (e.g., chamber wall liners, a gas conductance line, etc.) so as to constitute a large percentage of the surface area exposed to the reactive species. Most preferably all bare aluminum surfaces which the reactive species contacts are mirror polished.
摘要:
A method and apparatus for forming an electrochemical layer of a thin film battery is provided. A precursor mixture comprising precursor particles dispersed in a carrying medium is activated in an activation chamber by application of an electric field to ionize at least a portion of the precursor mixture. The activated precursor mixture is then mixed with a combustible gas mixture to add thermal energy to the precursor particles, converting them to nanocrystals, which deposit on a substrate. A second precursor may be blended with the nanocrystals as they deposit on the surface to enhance adhesion and conductivity.
摘要:
A substrate support and method for fabricating the same are provided. In one embodiment of the invention, a substrate support includes an electrically conductive body having a substrate support surface that is covered by an electrically insulative coating. At least a portion of the coating centered on the substrate support surface has a surface finish of between about 200 to about 2000 micro-inches. In another embodiment, a substrate support includes an anodized aluminum body having a surface finish on the portion of the body adapted to support a substrate thereon of between about 200 to about 2000 micro-inches. In one embodiment, a substrate support assembly includes an electrically conductive body having a substrate support surface, a substrate support structure that is adapted to support the conductive body and the conductive body is covered by an electrically insulative coating.