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    PHOTOACID GENERATOR AND PHOTORESIST COMPRISING SAME
    61.
    发明申请
    PHOTOACID GENERATOR AND PHOTORESIST COMPRISING SAME 有权
    光电发生器和包含相同的光电发生器

    公开(公告)号：US20130084525A1

    公开(公告)日：2013-04-04

    申请号：US13630456

    申请日：2012-09-28

    Applicant: Rohm and Haas Electronic Materials LLC

    Inventor： Emad Aqad ,  Cheng-Bai Xu ,  Mingqi Li ,  Shintaro Yamada ,  William Williams, III

    IPC: C07C309/65 ,  C07C311/09 ,  C07D497/18 ,  C07D313/08 ,  C07D327/04 ,  G03F7/027 ,  C07D493/18

    CPC classification number: G03F7/30 ,  C07C309/65 ,  C07C311/09 ,  C07C2603/74 ,  C07D313/08 ,  C07D313/10 ,  C07D327/04 ,  C07D493/18 ,  C07D497/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0397 ,  G03F7/2041

    Abstract: A photoacid generator compound has the formula (I): [A-(CHR1)p]k-(L)-(CH2)m—(C(R2)2)n—SO3−Z+  (I) wherein A is a substituted or unsubstituted, monocyclic, polycyclic, or fused polycyclic C5 or greater cycloaliphatic group optionally comprising O, S, N, F, or a combination comprising at least one of the foregoing, R1 is H, a single bond, or a substituted or unsubstituted C1-30 alkyl group, wherein when R1 is a single bond, R1 is covalently bonded to a carbon atom of A, each R2 is independently H, F, or C1-4 fluoroalkyl, wherein at least one R2 is not hydrogen, L is a linking group comprising a sulfonate group, a sulfonamide group, or a C1-30 sulfonate or sulfonamide-containing group, Z is an organic or inorganic cation, p is an integer of 0 to 10, k is 1 or 2, m is an integer of 0 or greater, and n is an integer of 1 or greater. A precursor compound to the photoacid generator, a photoresist composition including the photoacid generator, and a substrate coated with the photoresist composition, are also disclosed.

    Abstract translation: 光生酸化合物具有式（I）：其中A是取代基的[A-（CHR1）p] k-（L） - （CH2）m-（C（R2）2）n-SO3-Z +（I） 或任选包含O，S，N，F或包含前述至少之一的组合的未取代的单环，多环或稠合多环C 5或更多脂环族基团，R 1是H，单键或取代或未取代的C1 -30烷基，其中当R 1为单键时，R 1与A的碳原子共价连接，每个R 2独立地为H，F或C 1-4氟烷基，其中至少一个R 2不为氢，L为 包含磺酸酯基，磺酰胺基或C1-30磺酸酯或磺酰胺的基团的连接基团，Z是有机或无机阳离子，p是0至10的整数，k是1或2，m是整数 为0以上，n为1以上的整数。 还公开了光致酸产生剂的前体化合物，包含光致酸产生剂的光致抗蚀剂组合物和涂有光致抗蚀剂组合物的基材。

    PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATION METHODS
    69.
    发明申请
    PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATION METHODS 有权

    公开(公告)号：US20220214614A1

    公开(公告)日：2022-07-07

    申请号：US17454331

    申请日：2021-11-10

    Applicant: Rohm and Haas Electronic Materials LLC

    Inventor： Emad Aqad

    IPC: G03F7/004 ,  G03F7/20 ,  G03F7/32

    Abstract: Photoacid generators comprising a moiety of formula (1): wherein: Ar1 is a substituted or unsubstituted aryl group; R1 is an alkyl or aryl group, each of which may be substituted or unsubstituted, wherein Ar1 and R1 are optionally connected together by a single bond or a divalent linking group to form a ring; Y is a single bond or a divalent group; and * is the point of attachment of the moiety to another atom of the photoacid generator. The photoacid generator compounds find particular use in photoresist compositions that can be used to form lithographic patterns for the formation of electronic devices.

    UNDERLAYER COMPOSITIONS AND PATTERNING METHODS
    70.
    发明申请
    UNDERLAYER COMPOSITIONS AND PATTERNING METHODS 有权

    公开(公告)号：US20220066321A1

    公开(公告)日：2022-03-03

    申请号：US17007903

    申请日：2020-08-31

    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

    Inventor： Joshua Kaitz ,  Sheng Liu ,  Li Cui ,  Shintaro Yamada ,  James F. Cameron ,  Emad Aqad ,  Iou-Sheng Ke ,  Suzanne M. Coley

    IPC: G03F7/11 ,  C08G8/04 ,  C09D161/06

    Abstract: An underlayer composition, comprising a polymer comprising a repeating unit of formula (1): wherein Ar is a monocyclic or polycyclic C5-60 aromatic group, wherein the aromatic group comprises one or more aromatic ring heteroatoms, a substituent group comprising a heteroatom, or a combination thereof; X is C or O; R1, R2; Ra and Rb are as provided herein; optionally, R1 and R2 can be taken together form a 5- to 7-membered ring; optionally, one of R11 to R13 can be taken together with R1 to form a 5- to 7-membered ring; wherein Ra and Rb optionally may be taken together to form a 5- to 7-membered ring; wherein one of Ra or Rb optionally may be taken together with R2 to form a 5- to 7-membered ring; and when X is O, Ra and Rb are absent.

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