公开(公告)号：US07875850B2

公开(公告)日：2011-01-25

申请号：US12078516

申请日：2008-04-01

申请人： Yoshinori Nakayama ,  Yasunari Sohda ,  Keiichiro Hitomi

发明人： Yoshinori Nakayama ,  Yasunari Sohda ,  Keiichiro Hitomi

IPC分类号： H01J37/28 ,  G01N1/28 ,  G01D18/00

CPC分类号： G01N23/225 ,  H01J37/28 ,  H01J2237/20 ,  H01J2237/2826 ,  H01L23/544 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

摘要： The invention provides a standard component for calibration that enables a calibration position to be easily specified in order to calibrate accurately a scale factor in the electron-beam system, and provides an electron-beam system using it. The standard component for calibration is one that calibrates a scale factor of an electron-beam system based on a signal of secondary charged particles detected by irradiation of a primary electron beam on a substrate having a cross section of a superlattice of a multi-layer structure in which different materials are deposited alternately. The substrate has linear patterns on the substrate surface parallel to the multi-layers and are arranged at a fixed interval in a direction crossing the cross section of the superlattice pattern, and the cross sections of the linear patterns are on substantially the same plane of the superlattice cross section, so that the linear patterns enable a position of the superlattice pattern to be identified.

摘要翻译： 本发明提供了一种用于校准的标准组件，其使得能够容易地指定校准位置，以便准确地校准电子束系统中的比例因子，并提供使用该电子束系统的电子束系统。 用于校准的标准组件是基于通过在具有多层结构的超晶格的横截面的基板上照射一次电子束而检测的二次带电粒子的信号来校准电子束系统的比例因子的标准组件 其中不同的材料交替沉积。 衬底在平行于多层的衬底表面上具有线性图案，并且在与超晶格图案的横截面交叉的方向上以固定的间隔布置，并且线状图案的横截面在 超晶格截面，使得线性图案能够识别超晶格图案的位置。

公开(公告)号：US20070172967A1

公开(公告)日：2007-07-26

申请号：US11626402

申请日：2007-01-24

申请人： Souichi Katagiri ,  Yasunari Sohda ,  Masahiko Ogino

发明人： Souichi Katagiri ,  Yasunari Sohda ,  Masahiko Ogino

IPC分类号： H01L21/66

CPC分类号： G03F9/7049 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/703 ,  G03F9/7084 ,  G03F9/7088

摘要： Method of forming a pattern by a nanoimprint technique starts with preparing a mold with nanostructures on its surface. The mold is pressed against a substrate or plate coated with a resin film. The positions of alignment marks formed on the rear surface of the plate coated with the resin film are detected. Thus, a relative alignment between the mold and the plate coated with the resin film is performed.

摘要翻译： 通过纳米压印技术形成图案的方法开始于在其表面上制备具有纳米结构的模具。 将模具压在涂有树脂膜的基板或板上。 检测在涂覆有树脂膜的板的后表面上形成的对准标记的位置。 因此，执行模具和涂覆有树脂膜的板之间的相对对准。

公开(公告)号：US20060060775A1

公开(公告)日：2006-03-23

申请号：US11207710

申请日：2005-08-22

申请人： Makoto Sakakibara ,  Yoshinori Nakayama ,  Hiroya Ohta ,  Yasunari Sohda ,  Noriyuki Tanaka ,  Yasuhiro Someda

发明人： Makoto Sakakibara ,  Yoshinori Nakayama ,  Hiroya Ohta ,  Yasunari Sohda ,  Noriyuki Tanaka ,  Yasuhiro Someda

IPC分类号： G01N23/00

CPC分类号： H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  G01R19/0061 ,  H01J37/243 ,  H01J2237/30472

摘要： A technology capable of reducing the influence of the noise overlapped in a long transmission line when accurately measuring weak beam current in an electron beam writing system and capable of accurately and efficiently measuring weak beam current in a beam writing system using multiple beams is provided. With using a switch for connecting and disconnecting an electron beam detecting device and a detected signal line, the electron beam detecting device is disconnected from the detected signal line to accumulate the detected signals in the electron beam detecting device during the beam current measurement. Simultaneously with the finish of the measurement, the electron beam detecting device and the detected signal line are connected to measure the accumulated signals. Also, in order to simultaneously perform the measurement method, a plurality of electron beam detecting devices and switches are used to simultaneously measure a plurality of electron beams with high accuracy.

摘要翻译： 提供了一种能够在精确测量电子束写入系统中的弱光束电流的同时减少重叠在长传输线上的噪声影响的技术，并且能够精确高效地测量使用多个光束的光束写入系统中的弱光束电流。 通过使用用于连接和断开电子束检测装置的开关和检测到的信号线，电子束检测装置与检测到的信号线断开，以在束电流测量期间将检测到的信号累积在电子束检测装置中。 在测量结束的同时，连接电子束检测装置和检测信号线来测量累积信号。 此外，为了同时进行测量方法，使用多个电子束检测装置和开关以高精度同时测量多个电子束。

公开(公告)号：US6121625A

公开(公告)日：2000-09-19

申请号：US87296

申请日：1998-05-29

申请人： Hiroyuki Ito ,  Yasunari Sohda ,  Yasuhiro Someda ,  Yoshinori Nakayama ,  Masahide Okumura ,  Hidetoshi Satoh

发明人： Hiroyuki Ito ,  Yasunari Sohda ,  Yasuhiro Someda ,  Yoshinori Nakayama ,  Masahide Okumura ,  Hidetoshi Satoh

IPC分类号： G03F7/20 ,  C08F10/02 ,  G03F1/20 ,  H01J37/147 ,  H01J37/317 ,  H01L21/027 ,  H01J37/304

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31776

摘要： In order to provide a high-speed and high accuracy cell projection exposure apparatus which increases a pattern projection number extremely, a plurality of stencil masks mounting a transferal aperture and a transmission aperture are provided and are positioned by a drive stage, the electron beam passes through a transmission aperture of other stencil masks while selecting the aperture on a stencil mask with a beam deflection device, the transmission aperture is provided for a mask transfer direction in succession, the stencil mask is moved while being transmitted with the beam, and other stencil mask transfer is executed when specified stencil mask aperture group is exposed. These operations are repeated so that all exposure processes are performed.

公开(公告)号：US5759423A

公开(公告)日：1998-06-02

申请号：US563329

申请日：1995-11-28

申请人： Yasunari Sohda ,  Yasuhiro Someda ,  Hiroyuki Itoh ,  Katsuhiro Kawasaki ,  Norio Saitou

发明人： Yasunari Sohda ,  Yasuhiro Someda ,  Hiroyuki Itoh ,  Katsuhiro Kawasaki ,  Norio Saitou

IPC分类号： G03F7/20 ,  H01J37/317 ,  H01L21/027 ,  B44C1/22 ,  H01L21/00

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31776

摘要： An electron beam writing apparatus comprises: an electron beam source for projecting an electron beam; a first mask provided with a first rectangular aperture for passing the electron beam projected by the electron beam source to shape the electron beam in a primary shaped beam having a rectangular cross section; a second mask provided with a second rectangular aperture for passing the primary shaped beam to shape the primary shaped beam in a secondary shaped beam having a rectangular cross section, and triangular apertures for passing the primary shaped beam to form a secondary shaped beam having a triangular cross section; a first electron beam deflecting system for moving the primary shaped beam on the surface of the second mask; and a second electron beam deflecting system for moving the secondary shaped beam on the surface of a workpiece on which a pattern is to be written. Each of the triangular apertures is formed in a size such that the triangular aperture can be entirely covered with a rectangular image formed by the first shaped beam on the surface of the second mask.

摘要翻译： 电子束写入装置包括：用于投射电子束的电子束源; 第一掩模，设置有第一矩形孔，用于使由电子束源投影的电子束通过，以将电子束形成为具有矩形横截面的主要形状的梁; 第二掩模，其设置有第二矩形孔，用于使主要成形梁通过，以形成具有矩形截面的次级成形梁的主要成形梁，以及三角形孔，用于使初级成形梁通过以形成具有三角形的二次成形梁 横截面; 第一电子束偏转系统，用于将第一形状光束移动到第二掩模的表面上; 以及用于在待写入图案的工件的表面上移动二次成形光束的第二电子束偏转系统。 每个三角形孔形成为使得三角形孔可以被由第二掩模的表面上的第一成形束形成的矩形图像完全覆盖的尺寸。

公开(公告)号：US08816277B2

公开(公告)日：2014-08-26

申请号：US13386540

申请日：2010-07-26

申请人： Yasunari Sohda ,  Takeyoshi Ohashi ,  Muneyuki Fukuda ,  Toru Yamanashi

发明人： Hiromasa Yamanashi ,  Yasunari Sohda ,  Takeyoshi Ohashi ,  Muneyuki Fukuda

IPC分类号： G01N23/04 ,  G01N23/00

CPC分类号： H01J37/28 ,  G06T7/74 ,  G06T2207/10061 ,  G06T2207/30148 ,  G06T2207/30204 ,  H01J37/1478 ,  H01J2237/24578 ,  H01J2237/2611 ,  H01J2237/2817

摘要： An amount of pattern position displacement between observation images acquired by irradiating from two different directions is changed depending on beam deflection for moving an image acquisition position. In a pattern evaluation method that measures astigmatic difference or focus position displacement having a small amount of dose at a high speed using parallax caused by the tilted beam, a correction value obtained in advance by measurement is reflected in an amount of pattern position displacement between observation images obtained by irradiating from at least two different directions and generated in accordance with the amount of beam deflection for moving an image acquisition position. A processing unit calculates an amount of correction of an amount of pattern position displacement depending on beam deflection of a beam deflecting unit for moving an image acquisition position on the sample at a high speed.

摘要翻译： 通过从两个不同方向照射获取的观察图像之间的图案位置位移量根据用于移动图像获取位置的光束偏转而改变。 在使用由倾斜光束引起的视差来高速度地测量具有少量剂量的散光差异或聚焦位置位移的图案评估方法中，通过测量预先获得的校正值反映在观察之间的图案位置位移量 通过从至少两个不同方向照射而产生的并且根据用于移动图像获取位置的光束偏转量而产生的图像。 处理单元计算取决于用于在高速下移动样本上的图像获取位置的光束偏转单元的光束偏转的图案位置位移量的校正量。

公开(公告)号：US08766183B2

公开(公告)日：2014-07-01

申请号：US13058712

申请日：2009-09-10

申请人： Muneyuki Fukuda ,  Hiromasa Yamanashi ,  Yasunari Sohda

发明人： Muneyuki Fukuda ,  Hiromasa Yamanashi ,  Yasunari Sohda

IPC分类号： H01J3/12 ,  H01J37/153

CPC分类号： H01J37/153 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/221

摘要： The astigmatism control processing time is decreased to 1 second or less by improving the astigmatic difference measurement accuracy. A charged particle beam device includes: a stage on which a sample is loaded; a transport mechanism which carries the sample onto the stage; a charged particle beam optical system which irradiates the sample on the stage with a charged particle beam and detects secondary charged particles generated from the sample; and a controller which determines setup parameters for the charged particle beam optical system and controls the charged particle beam optical system. The controller registers and holds electro-optical system setup parameters for irradiation with a beam tilted from a normal line on the sample as the charged particle beam, compares observation images obtained by the tilted beam, measures the amount and direction of movement and calculates the amount of astigmatism correction from the amount of movement and the direction.

摘要翻译： 散光控制处理时间通过改善像散差测量精度而降低到1秒以下。 带电粒子束装置包括：加载样品的载物台; 将样品携带到舞台上的运送机构; 带电粒子束光学系统，其用带电粒子束照射台上的样品，并检测从样品产生的二次带电粒子; 以及控制器，其确定带电粒子束光学系统的设置参数并控制带电粒子束光学系统。 控制器注册并保持电子光学系统设置参数，用于照射来自样品上的法线的光束作为带电粒子束，比较通过倾斜光束获得的观察图像，测量移动量和移动方向， 从运动量和方向上矫正散光。

公开(公告)号：US08742342B2

公开(公告)日：2014-06-03

申请号：US13505951

申请日：2010-11-01

申请人： Nobuhiro Okai ,  Yasunari Sohda

发明人： Nobuhiro Okai ,  Yasunari Sohda

IPC分类号： H01J37/04 ,  H01J37/145 ,  H01J37/14

CPC分类号： H01J37/04 ,  H01J37/026 ,  H01J37/14 ,  H01J37/145 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/0044 ,  H01J2237/121 ,  H01J2237/153

摘要： A scanning electron microscope suppresses a beam drift by reducing charging on a sample surface while suppressing resolution degradation upon observation of an insulator sample. An electron microscope includes an electron source and an objective lens that focuses an electron beam emitted from the electron source, which provides an image using a secondary signal generated from the sample irradiated with the electron beam. A magnetic body with a continuous structure and an inside diameter larger than an inside diameter of an upper pole piece that forms the objective lens is provided between the objective lens and the sample.

摘要翻译： 扫描电子显微镜通过减少对样品表面的充电而抑制光束偏移，同时在观察绝缘体样品时抑制分辨率劣化。 电子显微镜包括电子源和物镜，其聚焦从电子源发射的电子束，其使用从照射电子束的样品产生的二次信号来提供图像。 在物镜和样品之间设置具有连续结构且内径大于形成物镜的上极片的内径的磁体。

公开(公告)号：US08478021B2

公开(公告)日：2013-07-02

申请号：US13142316

申请日：2010-01-13

申请人： Kaori Shirahata ,  Yoshinori Nakayama ,  Keiichiro Hitomi ,  Muneyuki Fukuda ,  Yasunari Sohda

发明人： Kaori Shirahata ,  Yoshinori Nakayama ,  Keiichiro Hitomi ,  Muneyuki Fukuda ,  Yasunari Sohda

IPC分类号： G06K9/00 ,  G06K9/40

CPC分类号： G01B15/00 ,  H01J37/153 ,  H01J37/21 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/1532 ,  H01J2237/216 ,  H01L22/12

摘要： In order to provide a charged beam device capable of obtaining a precise image of a sample surface pattern while improving the accuracy of automatic focus/astigmatism correction, there are provided an electron gun (1), a deflection control portion (8) which allows an electron beam to scan, a focus control portion (10) and an astigmatism correction portion (3) for the electron beam, an image processing portion (11), and a switching portion (9) which switches scan conditions when obtaining pattern information of the sample (1001) surface and scan conditions when performing the automatic focus/astigmatism correction, and a scan speed and scan procedures are switched between when obtaining the pattern information and when performing the automatic focus/astigmatism correction.

摘要翻译： 为了提供能够获得样品表面图案的精确图像的带电束装置，同时提高自动聚焦/像散校正的精度，提供了一种电子枪（1），偏转控制部分（8），其允许 电子束扫描，用于电子束的聚焦控制部分（10）和像散校正部分（3），图像处理部分（11）和切换部分（9），当获得图像信息 进行自动聚焦/像散校正时的样品（1001）表面和扫描条件，并且在获得图案信息和执行自动聚焦/散光校正时切换扫描速度和扫描程序。

公开(公告)号：US08125518B2

公开(公告)日：2012-02-28

申请号：US13139315

申请日：2009-11-24

申请人： Nobuhiro Okai ,  Yasunari Sohda

发明人： Nobuhiro Okai ,  Yasunari Sohda

IPC分类号： H04N9/47

CPC分类号： G01B15/00 ,  H01J37/222 ,  H01J37/28

摘要： Provided is a scanning electron microscope including: an image recording unit (112) which stores a plurality of acquired frame images; a correction analyzing handling unit (113) which calculates a drift amount between frame images and a drift amount between a plurality of field images constituting a frame image; and a data handling unit (111) which corrects positions of respective field images constituting the plurality of fields images according to the drift amount between the field images and superimposes the field images on one another so as to create a new frame image. This provides a scanning electron microscope which can obtain a clear frame image even if an image drift is caused during observation of a pattern on a semiconductor substrate or an insulating object.

摘要翻译： 提供一种扫描电子显微镜，包括：图像记录单元，其存储多个获取的帧图像; 校正分析处理单元，其计算帧图像之间的漂移量和构成帧图像的多个场图像之间的漂移量; 以及数据处理单元（111），其根据场图像之间的漂移量校正构成多个场图像的各个场图像的位置，并将场图像彼此叠加，从而创建新的帧图像。 这提供了即使在观察半导体衬底或绝缘物体上的图案时引起图像漂移，也可以获得清晰的帧图像的扫描电子显微镜。