公开(公告)号：US10042248B2

公开(公告)日：2018-08-07

申请号：US14826470

申请日：2015-08-14

申请人： Carl Zeiss SMT GmbH

发明人： Markus Degünther ,  Thomas Korb

IPC分类号： G02B17/06 ,  G03F1/84 ,  F21V8/00 ,  G21K1/06 ,  G21K7/00

CPC分类号： G03F1/84 ,  G02B6/0096 ,  G02B17/0605 ,  G21K1/067 ,  G21K7/00

摘要： An illumination optical unit for a mask inspection system is used with EUV illumination light. A hollow waveguide of the illumination optical unit serves for guiding the illumination light. The hollow waveguide has an entry opening for the illumination light and an exit opening for the illumination light. An imaging mirror optical unit, arranged downstream of the hollow waveguide serves to image the exit opening into an illumination field. This results in an illumination optical unit, the throughput of which is optimized for the EUV illumination light.

公开(公告)号：US20180211739A1

公开(公告)日：2018-07-26

申请号：US15317870

申请日：2015-06-10

申请人： The Secretary of State for Business, Innovation & Skills

发明人： Yuri Borisovich Ovchinnikov

IPC分类号： G21K1/00 ,  G21K1/06 ,  H05H3/04 ,  G01C19/02 ,  G01P15/02

CPC分类号： G21K1/006 ,  G01C19/02 ,  G01P15/02 ,  G01V7/00 ,  G21K1/06 ,  G21K1/067 ,  H05H3/04

摘要： A temporally continuous matter wave beam splitter (14) comprising a plurality of intersecting and interfering laser beam (kr, kb), which act as waveguides for a matter wave beam. The laser beams of the waveguides each have a frequency detuned below a frequency of an internal atomic transition of the matter wave. The matter wave has a wavevector which is an integral multiple of the wavevector of the laser beams within a region of intersection of the laser beams. There is also provided an atomic interferometer (200) comprising such a continuous matter wave beam splitter, and a solid state device comprising such a continuous matter wave beam splitter, which may be part of an atomic interferometer. A cold atom gyroscope, a cold atom accelerometer or a cold atom gravimeter comprising such a solid state device are also provided. There is further provided a quantum computer comprising such a solid state device, wherein atoms of the matter wave beam are in an entangled quantum state. There is also provided a method of splitting a matter wave beam, comprising introducing the matter wave beam into a first temporally continuous laser beam, the frequency of which is detuned below a frequency of an internal atomic transition of the matter wave beam; intersecting and interfering the first continuous laser beam with a second temporally continuous laser beam, the frequency of which is also detuned below the frequency of the internal atomic transition of the matter wave beam; providing the matter wave beam with a wavevector which is an integral multiple of the wavevector of the first and second laser beams within a region of intersection of the laser beams, whereby the laser beams act as waveguides for the matter wave beam.

公开(公告)号：US20180068821A1

公开(公告)日：2018-03-08

申请号：US15256692

申请日：2016-09-05

申请人： Mark F. Eaton

发明人： Mark F. Eaton

IPC分类号： H01J35/08 ,  H01J35/06 ,  H01J29/08 ,  G03F7/20

CPC分类号： H01J35/08 ,  G03F7/7005 ,  G21K1/067 ,  G21K2201/067 ,  H01J29/085 ,  H01J35/06 ,  H01J35/112 ,  H01J2235/062 ,  H01J2235/068 ,  H01J2235/086

摘要： An efficient source of EUV or SXR flux uses multiple e-beams from multiple cathodes to impact a wide anode target with a flux-generating surface to generate flux over a wide area. The conversion efficiency of e-beam power to flux power may be improved by the direction of the e-beams towards the anode target at shallow or grazing incidence angles or the use of mirrored anode surfaces which reflect EUV or SXR. The source is enclosed in a vacuum chamber and performs work such as the penetration of photoresist on a semiconductor wafer in vacuum.

公开(公告)号：US09903827B2

公开(公告)日：2018-02-27

申请号：US14420108

申请日：2013-08-09

申请人： KONINKLIJKE PHILIPS N.V.

发明人： Gereon Vogtmeier ,  Udo Van Stevendaal

IPC分类号： G01N23/04 ,  G01N23/20 ,  A61B6/00 ,  G21K1/06 ,  A61B6/02

CPC分类号： G01N23/20075 ,  A61B6/025 ,  A61B6/4441 ,  A61B6/484 ,  A61B6/502 ,  A61B6/582 ,  A61B6/587 ,  G01N23/04 ,  G01N2223/323 ,  G21K1/067

摘要： The present invention relates to handling misalignment in differential phase contrast imaging. In order to provide an improved handling of misalignment in X-ray imaging systems for differential phase contrast imaging, an X-ray imaging system (10) for differential phase contrast imaging is provided that comprises a differential phase contrast setup (12) with an X-ray source (14), an X-ray detector (16), and a grating arrangement comprising a source grating (18), a phase grating (20) and an analyzer grating (22). The source grating is arranged between the X-ray source and the phase grating, and the analyzer grating is arranged between the phase grating and the detector. Further, the system comprises a processing unit (24), and a measurement system (26) for determining a misalignment of at least one of the gratings. The X-ray source and the source grating are provided as a rigid X-ray source unit (28). The phase grating, the analyzer grating and the detector are provided as a rigid X-ray detection unit (30). The measurement system is an optical measurement system configured to determine a misalignment between the differential phase contrast setup consisting of the X-ray source unit and the X-ray detection unit. Further, the processing unit is configured to provide a correction signal (34) based on the determined misalignment.

公开(公告)号：US09851641B2

公开(公告)日：2017-12-26

申请号：US14594466

申请日：2015-01-12

申请人： Carl Zeiss SMT GmbH

发明人： Michael Patra

IPC分类号： G03F7/20 ,  G21K1/06 ,  B82Y10/00 ,  H01S3/09 ,  H05G2/00

CPC分类号： G03F7/70058 ,  B82Y10/00 ,  G03F7/70008 ,  G03F7/70025 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/70566 ,  G21K1/062 ,  G21K1/067 ,  H01S3/0903 ,  H05G2/00

摘要： An illumination system for an EUV projection lithographic projection exposure apparatus comprises an EUV light source, which generates an output beam of EUV illumination light with a predetermined polarization state. An illumination optical unit guides the output beam along an optical axis, as a result of which an illumination field in a reticle plane is illuminated by the output beam. The light source comprises an electron beam supply device, an EUV generating device and a polarization setting device. The EUV generating device is supplied with an electron beam by the electron beam supply device. The polarization setting device exerts an adjustable deflecting effect on the electron beam for setting the polarization of the output beam. This results in an illumination system, which operates on the basis of an electron beam-based EUV light source and provides an output beam, which is improved for a resolution-optimized illumination.

公开(公告)号：US20170336334A1

公开(公告)日：2017-11-23

申请号：US15663831

申请日：2017-07-31

申请人： Sigray, Inc.

发明人： Wenbing Yun ,  Srivatsan Seshadri ,  Janos Kirz ,  Sylvia Jia Yun Lewis

IPC分类号： G01N23/207 ,  G01N23/087

CPC分类号： G01N23/2076 ,  G01N23/087 ,  G01N23/223 ,  G01N2223/04 ,  G01N2223/045 ,  G01N2223/0568 ,  G21K1/06 ,  G21K1/067 ,  G21K2201/064 ,  H01J35/08 ,  H01J35/14 ,  H01J35/18 ,  H01J2235/081 ,  H01J2235/086

摘要： An x-ray transmission spectrometer system to be used with a compact x-ray source to measure x-ray absorption with both high spatial and high spectral resolution. The spectrometer system comprises a compact high brightness x-ray source, an optical system with a low pass spectral filter property to focus the x-rays through an object to be examined, and a spectrometer comprising a crystal analyzer (and, in some embodiments, a mosaic crystal) to disperse the transmitted beam, and in some instances an array detector. The high brightness/high flux x-ray source may have a take-off angle between 0 and 15 degrees, and be coupled to an optical system that collects and focuses the high flux x-rays to micron-scale spots, leading to high flux density. The x-ray optical system may also act as a “low-pass” filter, allowing a predetermined bandwidth of x-rays to be observed at one time while excluding the higher harmonics.

公开(公告)号：US09754695B2

公开(公告)日：2017-09-05

申请号：US14665279

申请日：2015-03-23

申请人： Carl Zeiss SMT GmbH

发明人： Martin Endres

IPC分类号： G02B27/42 ,  G21K1/06 ,  G03F7/20 ,  G02B19/00 ,  H05G2/00 ,  G02B5/09 ,  G02B5/18

CPC分类号： G21K1/067 ,  G02B5/09 ,  G02B5/1838 ,  G02B5/1861 ,  G02B19/0023 ,  G02B19/0095 ,  G02B27/4233 ,  G02B27/4277 ,  G03F7/70175 ,  H05G2/008

摘要： An EUV collector transfers EUV radiation from an EUV radiation source into an illumination far field. The collector has a normal mirror collector subunit including a mirror for normal incidence, and a grazing mirror collector subunit including a mirror for grazing incidence. The arrangement of the collector subunits is such that an intensity distribution of the EUV radiation over the far field results which is composed of an inner normal mirror intensity distribution, generated by reflection at least also at the normal mirror collector subunit, and of an outer grazing mirror intensity distribution, generated by reflection at least also at the grazing mirror collector subunit. The intensity distribution, at least over a section of the far field which is greater than 40% of the total far field, deviates by less than 20% from an average intensity in the section of the far field.

公开(公告)号：US20170206995A1

公开(公告)日：2017-07-20

申请号：US15405568

申请日：2017-01-13

申请人： Berthold Baumann ,  Alexander Krämer ,  Thomas Weber ,  Josef Zeidler

发明人： Berthold Baumann ,  Alexander Krämer ,  Thomas Weber ,  Josef Zeidler

IPC分类号： G21K1/06 ,  G01N23/20

CPC分类号： G21K1/067 ,  A61B6/4035 ,  A61B6/4291 ,  A61B6/484 ,  G01N23/041 ,  G01N23/20075 ,  G21K1/06 ,  G21K2201/064 ,  G21K2201/067 ,  G21K2207/005

摘要： An apparatus for interferometric x-ray imaging includes an interference grating and a frame-like holding device. The interference grating is bendable like a leaf spring and is arranged in grooves of opposing bearings of the holding device such that the interference grating has one-dimensional concave curvature or one-dimensional convex curvature.

公开(公告)号：US09706632B2

公开(公告)日：2017-07-11

申请号：US14885267

申请日：2015-10-16

申请人： Semiconductor Manufacturing International (Shanghai) Corporation

发明人： Qiang Wu ,  Liwan Yue ,  Emily Yixie Shu

IPC分类号： H05G2/00 ,  G21K1/06 ,  G02B26/08 ,  H05G1/30 ,  G21K1/04 ,  G03F7/20

CPC分类号： H05G2/008 ,  G02B26/0816 ,  G03F7/70033 ,  G21K1/04 ,  G21K1/067 ,  H05G1/30 ,  H05G2/005 ,  H05G2/006

摘要： An extreme ultraviolet (EUV) light source is provided. The EUV light source comprises a spray nozzle array having a plurality of spray nozzles configured to spray a plurality of rows of droplets to an irradiating position; a laser source configured to generate a first laser beam and a second laser beam and cause the first laser beam and the second laser beam to alternately bombard the rows of droplets to generate EUV light with increased output power; a focusing mirror having at least two first sub-focusing mirrors and at least two second sub-focusing mirrors; and a first driving device having at least two first sub-driving device and at least two second sub-driving device, each of first driving devices driving one of the first sub-focusing mirrors and each of the second sub-driving devices driving one of the second sub-focusing mirrors.

公开(公告)号：US20170162287A1

公开(公告)日：2017-06-08

申请号：US15325958

申请日：2015-08-13

申请人： BRUKER NANO GMBH

发明人： Ulrich WALDSCHLÄGER

IPC分类号： G21K1/06 ,  G01N23/20

CPC分类号： G21K1/067 ,  G01N23/20008 ,  G01N23/20016 ,  G01N2223/33 ,  G21K7/00 ,  G21K2201/067

摘要： A method for scanning a sample by means of X-ray optics for irradiating the sample with X-rays, comprises the following steps: (a) displacing a measuring point, defined by an optical exit point of the X-ray optics, in the sample in a first scanning direction by means of swiveling the X-ray optics about a first swivel axis; (b) detecting radiation emanating from the sample at, at least, two measuring points along the first scanning direction; (c) combining measured values correlating with the detected radiation to form an overall scan.