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    Laser system
    71.
    发明申请
    Laser system 有权
    激光系统

    公开(公告)号：US20080267242A1

    公开(公告)日：2008-10-30

    申请号：US11981195

    申请日：2007-10-30

    申请人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J.W. Brown ,  Igor V. Fomenkov

    发明人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J.W. Brown ,  Igor V. Fomenkov

    IPC分类号： H01S3/225

    CPC分类号： H01S3/2333 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70583 ,  H01S3/005 ,  H01S3/08036 ,  H01S3/08059 ,  H01S3/10092 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/235 ,  H01S2301/02

    摘要： A method/apparatus may comprise operating a line narrowed pulsed excimer or molecular fluorine gas discharge laser system by using a seed laser oscillator to produce an output which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module; a laser amplification stage which may comprise a ring power amplification stage; the method of operation may the steps of: selecting a differential timing between an electrical discharge between a pair of electrodes in the first laser chamber and in the second laser chamber which at the same time keeps ASE below a selected limit and the pulse energy of the laser system output light beam of pulses essentially constant.

    摘要翻译： 方法/装置可以包括通过使用种子激光振荡器来操作线窄的脉冲准分子或分子氟气体放电激光系统，以产生可包括第一气体放电准分子或分子氟激光室的输出; 线缩小模块; 可以包括环功率放大级的激光放大级; 操作方法可以是：选择第一激光室中的一对电极与第二激光室中的一对电极之间的放电之间的差分定时，同时使ASE保持在选定的极限以下，并且脉冲能量 激光系统输出光束的脉冲基本恒定。

    Laser system
    72.
    发明申请
    Laser system 有权
    激光系统

    公开(公告)号：US20080225908A1

    公开(公告)日：2008-09-18

    申请号：US11981449

    申请日：2007-10-30

    申请人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J.W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt

    发明人： Alexander I. Ershov ,  William N. Partlo ,  Daniel J.W. Brown ,  Igor V. Fomenkov ,  Robert A. Bergstedt

    IPC分类号： H01S3/225

    CPC分类号： H01S3/2333 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70558 ,  G03F7/70583 ,  H01S3/005 ,  H01S3/08 ,  H01S3/08059 ,  H01S3/105 ,  H01S3/2251 ,  H01S3/235 ,  H01S3/2366

    摘要： An apparatus/method which may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a seed laser output light beam of pulses which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage containing an amplifying gain medium in a second gas discharge excimer or molecular fluorine laser chamber receiving the output of the seed laser oscillator and amplifying the output of the seed laser oscillator to form a laser system output comprising a laser system output light beam of pulses, which may comprise a ring power amplification stage; a seed injection mechanism.

    摘要翻译： 可以包括线变窄的脉冲准分子或分子氟气体放电激光系统的装置/方法，其可以包括种子激光振荡器，其产生包括种子激光输出的脉冲光束的输出，所述种子激光输出光束可以包括第一气体放电准分子或分子氟激光 房间 第一振荡器腔内的线窄模块; 在第二气体放电准分子或分子氟激光室中包含放大增益介质的激光放大级，其接收种子激光振荡器的输出并放大种子激光振荡器的输出，以形成激光系统输出，该激光系统输出包括激光系统输出光束 的脉冲，其可以包括环形功率放大级; 种子注射机制。

    High repetition rate laser produced plasma EUV light source
    73.
    发明申请
    High repetition rate laser produced plasma EUV light source 有权

    公开(公告)号：US20080197297A1

    公开(公告)日：2008-08-21

    申请号：US11471434

    申请日：2006-06-20

    申请人： Robert P. Akins ,  Richard L. Sandstrom ,  William N. Partlo ,  Igor V. Fomenkov ,  Thomas D. Steiger ,  John Martin Algots ,  Norbert Bowering ,  Robert N. Jacques ,  Frederick Palenschat ,  Jun Song

    发明人： Robert P. Akins ,  Richard L. Sandstrom ,  William N. Partlo ,  Igor V. Fomenkov ,  Thomas D. Steiger ,  John Martin Algots ,  Norbert Bowering ,  Robert N. Jacques ,  Frederick Palenschat ,  Jun Song

    IPC分类号： G01J3/10

    CPC分类号： B82Y10/00 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/008

    摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.

    EUV light source collector lifetime improvements
    74.
    发明授权
    EUV light source collector lifetime improvements 有权
    EUV光源收集器寿命改善

    公开(公告)号：US07365349B2

    公开(公告)日：2008-04-29

    申请号：US11168190

    申请日：2005-06-27

    申请人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  Oleh Khodykin

    发明人： William N. Partlo ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  Oleh Khodykin

    IPC分类号： H01J35/20

    CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70925 ,  G21K1/062 ,  H05G2/005

    摘要： An apparatus and method for cleaning a plasma source material compound from a plasma produced EUV light source collector optic which may comprise reacting the plasma source material compound with hydrogen to form a hydride of the plasma source material from the plasma source material contained in the plasma source material compound on the collector optic. The method may further comprise initiating the reacting by introducing hydrogen into a plasma formation chamber containing the collector optic, and may further comprise removing the hydride from the collector optic, e.g., by cleaning plasma action and/or plasma source material sputtering, or other means as may be determined to be effective. An apparatus and method of extending the useful life of a plasma produced EUV light source collector coating layer may comprise in situ replacement of the material of the coating layer by deposition of the coating layer material onto the coating layer.

    摘要翻译： 一种用于从等离子体产生的EUV光源收集器光学元件清洗等离子体源材料化合物的装置和方法，其可以包括使等离子体源材料化合物与氢反应以从等离子体源中包含的等离子体源材料形成等离子体源材料的氢化物 收集器光学元件上的材料化合物。 该方法还可以包括通过将氢引入到包含收集器光学元件的等离子体形成室中来引发反应，并且还可以包括例如通过清洗等离子体作用和/或等离子体源材料溅射或其它方法从收集器光学元件中去除氢化物 可能被确定为有效。 延长等离子体产生的EUV光源集电器涂层的使用寿命的装置和方法可包括通过将涂层材料沉积到涂层上来原位置换涂层的材料。

    High repetition rate laser produced plasma EUV light source
    75.
    发明授权
    High repetition rate laser produced plasma EUV light source 有权
    高重复率激光产生等离子体EUV光源

    公开(公告)号：US07361918B2

    公开(公告)日：2008-04-22

    申请号：US11471258

    申请日：2006-06-20

    申请人： Robert P. Akins ,  Richard L. Sandstrom ,  William N. Partlo ,  Igor V. Fomenkov

    发明人： Robert P. Akins ,  Richard L. Sandstrom ,  William N. Partlo ,  Igor V. Fomenkov

    IPC分类号： H01J35/20

    CPC分类号： B82Y10/00 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/008

    摘要： An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap.

    摘要翻译： 公开了一种EUV光源装置和方法，其可以包括脉冲激光，其以所选择的脉冲重复频率提供激光脉冲，聚焦在期望的目标点火部位; 目标形成系统，以与激光脉冲重复率配合的选定间隔提供离散目标; 目标转向系统在目标地层系统和期望的目标点火站点之间; 以及目标跟踪系统，其提供关于目标形成系统和目标转向系统之间的目标移动的信息，使得目标转向系统能够将目标定向到期望的目标点火点。 该装置和方法可以包括具有中间壁的容器和具有低压阱的容器，其允许EUV光通过并且保持横跨低压阱的压差。

    LPP EUV light source
    76.
    发明授权
    LPP EUV light source 失效
    LPP EUV光源

    公开(公告)号：US07317196B2

    公开(公告)日：2008-01-08

    申请号：US10979919

    申请日：2004-11-01

    申请人： William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  David W. Myers

    发明人： William N. Partlo ,  Daniel J. W. Brown ,  Igor V. Fomenkov ,  Alexander I. Ershov ,  David W. Myers

    IPC分类号： H01J35/20

    CPC分类号： B82Y10/00 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/008

    摘要： An apparatus and method is described for effectively and efficiently providing plasma irradiation laser light pulses in an LPP EUV light source which may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target with an initial target irradiation pulse to form an EUV generating plasma having an emission region emitting in-band EUV light; a laser plasma irradiation pulse generating mechanism irradiating the plasma with a plasma irradiation pulse after the initial target irradiation pulse so as to compress emission material in the plasma toward the emission region of the plasma. The plasma irradiation pulse may comprise a laser pulse having a wavelength that is sufficiently longer than a wavelength of the initial target irradiation pulse to have an associated lower critical density resulting in absorption occurring within the plasma in a region of the plasma defined by the wavelength of the plasma irradiation pulse sufficiently separated from an initial target irradiation site to achieve compression of the emission material, and the may compress the emission region. The laser plasma irradiation pulse may produce an aerial mass density in the ablating cloud of the plasma sufficient to confine the favorably emitting plasma for increased conversion efficiency. The deposition region for the plasma irradiation pulse may be is removed enough from the initial target surface so as to insure compression of the favorably emitting plasma. A high conversion efficiency laser produced plasma extreme ultraviolet (“EUV”) light source may comprise a laser initial target irradiation pulse generating mechanism irradiating a plasma initiation target with a target irradiation pulse to form an EUV generating plasma emitting in-band EUV light; a plasma tamper substantially surrounding the plasma to constrain the expansion of the plasma.

    摘要翻译： 描述了一种用于在LPP EUV光源中有效且有效地提供等离子体照射激光脉冲的装置和方法，其可以包括用初始目标照射脉冲照射等离子体引发目标的激光初始靶照射脉冲发生机构以形成产生EUV的等离子体 具有发射带内EUV光的发射区域; 激光等离子体照射脉冲发生机构在初始目标照射脉冲之后用等离子体照射脉冲照射等离子体，以将等离子体中的发射材料压缩到等离子体的发射区域。 等离子体照射脉冲可以包括具有足够长于初始靶照射脉冲的波长的波长的激光脉冲，以具有相关联的较低的临界密度，从而在由等离子体的波长定义的等离子体的区域内的等离子体内发生吸收 等离子体照射脉冲从初始目标照射位置充分分离，以实现发射材料的压缩，并且可以压缩发射区域。 激光等离子体照射脉冲可以在等离子体的消融云中产生足够的空气质量密度以限制有利的发射等离子体以提高转换效率。 可以从初始目标表面去除等离子体照射脉冲的沉积区域，以确保有利地发射等离子体的压缩。 高转换效率的激光产生的等离子体极紫外（“EUV”）光源可以包括激光初始靶照射脉冲发生机构，用目标照射脉冲照射等离子体引发目标，以形成产生EUV的发射等离子体的带内EUV光; 等离子体篡改基本上围绕等离子体以约束等离子体的膨胀。

    Plasma focus light source with improved pulse power system
    79.
    发明授权
    Plasma focus light source with improved pulse power system 失效
    等离子聚焦光源具有改进的脉冲电源系统

    公开(公告)号：US06815700B2

    公开(公告)日：2004-11-09

    申请号：US10189824

    申请日：2002-07-03

    申请人： Stephan T. Melnychuk ,  William N. Partlo ,  Igor V. Fomenkov ,  I. Roger Oliver ,  Richard M. Ness ,  Norbert Bowering ,  Oleh Khodykin

    发明人： Stephan T. Melnychuk ,  William N. Partlo ,  Igor V. Fomenkov ,  I. Roger Oliver ,  Richard M. Ness ,  Norbert Bowering ,  Oleh Khodykin

    IPC分类号： H05H104

    CPC分类号： H05G2/003 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  H05G2/005 ,  H05H1/06

    摘要： The present invention provides a high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. Preferably the electrodes are configured co-axially. The central electrode is preferably hollow and the active gas is introduced out of the hollow electrode. This permits an optimization of the spectral line source and a separate optimization of the buffer gas. In preferred embodiments the central electrode is pulsed with a high negative electrical pulse so that the central electrode functions as a hollow cathode. Preferred embodiments present optimization of capacitance values, anode length and shape and preferred active gas delivery systems are disclosed. Preferred embodiments also include a pulse power system comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer. Special techniques are described for cooling the central electrode. In one example, water is circulated through the walls of the hollow electrode. In another example, a heat pipe cooling system is described for cooling the central electrode.

    摘要翻译： 本发明提供了一种高能量光子源。 一对等离子体夹紧电极位于真空室中。 该室包含工作气体，其包括贵重缓冲气体和被选择用于提供所需光谱线的活性气体。 脉冲电源在电压足够高的电压下提供电脉冲，以在电极之间产生放电，以在工作气体中产生非常高温度，高密度的等离子体夹持，从而在源或活性气体的光谱线处提供辐射。 优选地，电极被同轴配置。 中心电极优选是中空电极，并且活性气体从中空电极引出。 这允许对光谱线源进行优化和缓冲气体的单独优化。 在优选的实施例中，中心电极用高的负电脉冲脉冲，使得中心电极用作空心阴极。 本发明优选的实施例公开了电容值的优化，阳极长度和形状以及优选的活性气体输送系统。 优选实施例还包括脉冲功率系统，其包括充电电容器和包括脉冲变压器的磁压缩电路。 描述了用于冷却中心电极的特殊技术。 在一个实例中，水通过中空电极的壁循环。 在另一个实例中，描述了用于冷却中心电极的热管冷却系统。