MICROCHIP SUBSTANCE DELIVERY DEVICES HAVING LOW-POWER ELECTROMECHANICAL RELEASE MECHANISMS
    73.
    发明申请
    MICROCHIP SUBSTANCE DELIVERY DEVICES HAVING LOW-POWER ELECTROMECHANICAL RELEASE MECHANISMS 有权
    具有低功率电化学释放机制的微型物质输送装置

    公开(公告)号:US20160074323A1

    公开(公告)日:2016-03-17

    申请号:US14483278

    申请日:2014-09-11

    Abstract: Electromechanical substance delivery devices are provided which implement low-power electromechanical release mechanisms for controlled delivery of substances such as drugs and medication. For example, an electromechanical device includes a substrate having a cavity formed in a surface of the substrate, a membrane disposed on the surface of the substrate covering an opening of the cavity, and a seal disposed between the membrane and the surface of the substrate. The seal surrounds the opening of the cavity, and the seal and membrane are configured to enclose the cavity and retain a substance within the cavity. An electrode structure is configured to locally heat a portion of the membrane in response to a control voltage applied to the electrode structure, and create a stress that causes a rupture in the locally heated portion of the membrane to release the substance from within the cavity.

    Abstract translation: 提供机电物质输送装置,其实施低功率机电释放机构,用于药物和药物等物质的受控输送。 例如,机电装置包括具有形成在基板的表面中的空腔的基板,设置在覆盖空腔的开口的基板的表面上的膜,以及设置在膜与基板的表面之间的密封件。 密封件围绕空腔的开口,并且密封件和膜被构造成封闭空腔并将物质保持在空腔内。 电极结构被配置为响应于施加到电极结构的控制电压而局部加热膜的一部分,并且产生导致膜的局部加热部分中的破裂从腔内释放物质的应力。

    Silicon process compatible trench magnetic device
    75.
    发明授权
    Silicon process compatible trench magnetic device 有权
    硅工艺兼容沟槽磁性器件

    公开(公告)号:US09159778B2

    公开(公告)日:2015-10-13

    申请号:US14200503

    申请日:2014-03-07

    Abstract: A mechanism is provided for integrating an inductor into a semiconductor. A circular or other closed loop trench is formed in a substrate with sidewalls connected by a bottom surface in the substrate. A first insulator layer is deposited on the sidewalls of the trench so as to coat the sidewalls and the bottom surface. A conductor layer is deposited on the sidewalls and the bottom surface of the trench so as to coat the first insulator layer in the trench such that the conductor layer is on top of the first insulator layer in the trench. A first magnetic layer is deposited on the sidewalls and bottom surface of the trench so as to coat the first insulator layer in the trench without filling the trench. The first magnetic layer deposited on the sidewalls forms an inner closed magnetic loop and an outer closed magnetic loop within the trench.

    Abstract translation: 提供了一种用于将电感器集成到半导体中的机构。 圆形或其他闭环沟槽形成在衬底中,其侧壁通过衬底中的底表面连接。 第一绝缘体层沉积在沟槽的侧壁上以便涂覆侧壁和底表面。 导体层沉积在沟槽的侧壁和底表面上,以便涂覆沟槽中的第一绝缘体层,使得导体层位于沟槽中的第一绝缘体层之上。 第一磁性层沉积在沟槽的侧壁和底表面上,以便在沟槽中涂覆第一绝缘体层而不填充沟槽。 沉积在侧壁上的第一磁性层在沟槽内形成内闭合磁环和外封闭磁环。

    SILICON PROCESS COMPATIBLE TRENCH MAGNETIC DEVICE
    76.
    发明申请
    SILICON PROCESS COMPATIBLE TRENCH MAGNETIC DEVICE 审中-公开
    硅工艺兼容TRENCH MAGNETIC DEVICE

    公开(公告)号:US20150287773A1

    公开(公告)日:2015-10-08

    申请号:US14745713

    申请日:2015-06-22

    Abstract: A mechanism is provided for integrating an inductor into a semiconductor. A circular or other closed loop trench is formed in a substrate with sidewalls connected by a bottom surface in the substrate. A first insulator layer is deposited on the sidewalls of the trench so as to coat the sidewalls and the bottom surface. A conductor layer is deposited on the sidewalls and the bottom surface of the trench so as to coat the first insulator layer in the trench such that the conductor layer is on top of the first insulator layer in the trench. A first magnetic layer is deposited on the sidewalls and bottom surface of the trench so as to coat the first insulator layer in the trench without filling the trench. The first magnetic layer deposited on the sidewalls forms an inner closed magnetic loop and an outer closed magnetic loop within the trench.

    Abstract translation: 提供了一种用于将电感器集成到半导体中的机构。 圆形或其他闭环沟槽形成在衬底中,其侧壁通过衬底中的底表面连接。 第一绝缘体层沉积在沟槽的侧壁上以便涂覆侧壁和底表面。 导体层沉积在沟槽的侧壁和底表面上,以便涂覆沟槽中的第一绝缘体层,使得导体层位于沟槽中的第一绝缘体层之上。 第一磁性层沉积在沟槽的侧壁和底表面上,以便在沟槽中涂覆第一绝缘体层而不填充沟槽。 沉积在侧壁上的第一磁性层在沟槽内形成内闭合磁环和外封闭磁环。

Patent Agency Ranking