摘要:
A high sensitivity, organic solvent developable, high resolution photoresist composition for use in E-beam lithography is disclosed. The composition of the present invention comprises a high sensitivity, soluble, film forming photoresist composition of dendrimeric calix [4]arene derivatives and processes for forming lithographic patterns with a crosslinker selected from glycoluril derivatives capable of reacting with these dendrimer under acid catalysis, a photoacid generator and an organic solvent. The composition of the present invention is particularly useful for production of negative tone images of high resolution (less than 100 nanometers).
摘要:
The present invention provides a substrate having thereon a patterned small molecule organic semiconductor layer. The present invention also provides a method and a system for producing a substrate having thereon a patterned small molecule organic semiconductor layer. The substrate having thereon a patterned small molecule organic semiconductor layer is produced by exposing a donor substrate having thereon a small molecule organic semiconductor layer to energy to cause the thermal transfer of a small organic molecule onto an acceptor substrate.
摘要:
Disclosed are charge transfer complexes based on a polyaniline in combination with an organic electron electron acceptor. The resulting conductive polymer possesses enhanced electrical, thermal and solubility properties over known conductive polymers. Also disclosed is a charge transfer based composition of matter whose electrical conductivity, chemical and physical properties are further enhanced by doping with protonic acid. The composition is prepared by a simple method and has widespread application in the printed circuit field, and in various other devices.
摘要:
Electrically conductive and abrasion resistant polymeric compositions, methods of fabrication thereof and uses thereof are described. Admixtures of abrasion resistant materials and electrically conductive polymeric materials are formed. Many of these admixtures are light transmitting and can be used as an abrasion resistant light transmitting electrostatic discharge layers. The light transmitting discharge layer is useful as a surface coating for visual displays such as CRT screens to avoid electrostatic accumulation of dust and scratching. The compositions can be admixtures of abrasion resistant silicones, polysiloxanes, acrylates, epoxies, methacrylates, epoxyacrylates, epoxymethacrylates, styrenes and electrically conductive polymers selected from the group of substituted and unsubstituted polyanilines, polyparaphenylenevinyles, substituted and unsubstituted polythiophenes substituted and unsubstituted poly-p-phenylene sulfides, substituted and unsubstituted polyfuranes, substituted and unsubstituted polypyrroles, substituted and unsubstituted polyselenophenes, polyacetylines formed from soluble precursors, combinations thereof and blends thereof with other polymers. The compositions can be a layer of an electrically conductive polymer with an abrasion resistant layer thereover.
摘要:
A prepreg comprising a reinforcing material impregnated with a curable material. The curable material comprises a blend of a fluorine-containing cyanate and a fluorine-containing arylene ether polymer. The cyanate is a monomer having the structureN.tbd.C--O--R--[R.sup.1 ].sub.n --O--C.tbd.Nand the fluorine containing arylene ether polymer has the structureX--R--[R.sup.1 ].sub.m --Xwherein X is any group capable of reacting with a --C.tbd.N group;R is an aliphatic or aromatic group which may or may not be fluorosubstituted;R.sup.1 is an aliphatic or aromatic group which may or may not be fluoro substituted or R.sup.1 is selected from the group consisting of ether, carbonyl, sulfone, phosphine oxide and sulfide, and at least one of R or R.sup.1 must be fluoro substituted;n is 0-10; andm is 0-100.The material in the cured state comprises a fluorine-containing polycyanurate network having a plurality of discrete phases of the fluorine-containing thermoplastic polymer dispersed therein. The thermoplastic polymer phases are of submicron size.
摘要翻译:一种预浸料,其包含浸渍有可固化材料的增强材料。 可固化材料包括含氟氰酸酯和含氟亚芳基醚聚合物的共混物。 氰酸酯是具有结构N 3BOND C-O-R- [R 1] n -O-C 3 N N的单体,并且含氟亚芳基醚聚合物具有X-R- [R 1] m -X的结构,X是任何能够与-C 3 N N基反应的基团; R是可以是或不是氟取代的脂族或芳族基团; R1是脂族或芳族基团,其可以是或不是氟取代的,或者R1选自醚,羰基,砜,氧化膦和硫化物,并且R或R 1中的至少一个必须是氟取代的; n为0-10; m为0-100。 固化状态的材料含有分散在其中的含氟热塑性聚合物的多个离散相的含氟聚氰脲酸酯网络。 热塑性聚合物相具有亚微米尺寸。
摘要:
Disclosed is a process of effecting a change in the dielectric constant and coefficient of thermal expansion of a polyimide material, by forming a composite based on a dispersion of 2-60 wt. % of fluorinated particulate carbon material and a polyimide or polyimide precursor, and heating the dispersion to about 400.degree. C. at 65.degree.-200.degree. C./second.
摘要:
A curable material comprising a particulate filler and a blend of a fluorine-containing cyanate and a fluorine-containing arylene ether polymer. The cyanate is a monomer having the structureN.tbd.C--O--R--[R.sup.1 ].sub.n --O--C.tbd.Nand the fluorine containing arylene ether polymer has the structureX--R--[R.sup.1 ].sub.m --Xwherein X is any group capable of reacting with a --C.tbd.N group;R is an aliphatic or aromatic group which may or may not be fluorosubstituted;R.sup.1 is an aliphatic or aromatic group which may or may not be fluoro substituted or R.sup.1 is selected from the group consisting of ether, carbonyl, sulfone, phosphine oxide and sulfide, and at least one of R or R.sup.1 must be fluoro substituted;n is 0-10; andm is 0-100;The material in the cured state comprises a fluorine-containing polycyanurate network having a plurality of discrete phases of said fluorine-containing thermoplastic polymer dispersed therein wherein said thermoplastic polymer phases are of submicron size.
摘要翻译:一种包含颗粒填料和含氟氰酸酯和含氟亚芳基醚聚合物的共混物的可固化材料。 氰酸酯是具有结构N 3BOND C-O-R- [R 1] n -O-C 3 N N的单体,含氟亚芳基醚聚合物具有结构X-R- [R 1] m -X,其中X是可与-C 3 N N基反应的基团; R是可以是或不是氟取代的脂族或芳族基团; R1是脂族或芳族基团,其可以是或不是氟取代的,或者R1选自醚,羰基,砜,氧化膦和硫化物,并且R或R 1中的至少一个必须是氟取代的; n为0-10; m为0-100; 固化状态的材料包括含氟聚氰化酸盐网络,其中分散有所述含氟热塑性聚合物的多个离散相,其中所述热塑性聚合物相具有亚微米尺寸。
摘要:
An improved apparatus and process are described in which a direct negative is formed using commercially available multi-stylus recording heads. A negative precursor comprised of a transparent support and an opaque thermoplastic ink layer carried thereon, is brought into contact with an ink receiving medium comprised of a resistive layer and a thin conductive ink receiving layer thereon. Electrical currents are provided by the recording styli of the multi-stylus recording head to the resistive layer to provide sufficient heat to soften regions of the opaque ink brought into contact with the conductive layer, by which regions of said opaque ink are transferred to the ink receiving conductive layer. In this manner, a pattern of opaque ink regions is removed from the surface of said transparent support, whereby a direct negative is formed having light opaque and light transparent regions.
摘要:
An improved thermal transfer resistive ribbon usable in high resolution printing comprising a dual resistive layer formed of a first layer of low resistivity and a second layer of high resistivity, method of production thereof, use thereof and apparatus including the same.
摘要:
Electroerosion recording materials for "direct negative" and "offset master" are provided with a surface protective coating of solid conductive lubricant dispersed in a hydrophilic, crosslinked polymeric matrix. The protective films are especially useful where direct offset masters are produced without removal of non-eroded lubricant film.The recording medium of this invention provides use as a defect-free "direct negative" and/or "direct offset master", without requiring the removal of the overlayer prior to use on the printing press. The protective coatings are applied from aqueous dispersions of polymer-particulate compositions and thus avoiding the use of organic solvents.