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公开(公告)号：US20110297852A1
公开(公告)日：2011-12-08
申请号：US13124063
申请日：2011-03-22
CPC分类号： G21K1/062 , B82Y10/00 , G02B5/0891 , G03F7/70891 , G03F7/70983 , G21K2201/067
摘要： A mirror is provided which may include: a substrate; a thermal diffusion layer provided on a principal surface of the substrate, the thermal diffusion layer having a higher thermal conductivity than the substrate; and a reflective layer provided on the thermal diffusion layer, the reflective layer having a lower thermal conductivity than the thermal diffusion layer.
摘要翻译： 提供了一种可以包括：基底的反射镜; 设置在所述基板的主表面上的热扩散层，所述热扩散层具有比所述基板更高的热导率; 以及设置在所述热扩散层上的反射层，所述反射层具有比所述热扩散层低的热导率。
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公开(公告)号：US20100192973A1
公开(公告)日：2010-08-05
申请号：US12688139
申请日：2010-01-15
申请人： Yoshifumi Ueno , Osamu Wakabayashi
发明人： Yoshifumi Ueno , Osamu Wakabayashi
CPC分类号： G02B27/0006 , B08B7/0042 , G02B19/0028 , G02B19/0052 , G02B19/0095 , G02B26/101 , G02B27/0955 , G02B27/20 , G03F7/70033 , G03F7/70525 , G03F7/7085 , G03F7/70916 , G03F7/70925 , G03F7/70941 , H05G2/003 , H05G2/008
摘要： An extreme ultraviolet light source apparatus that can eliminate debris adhering to a component such as optical elements provided within a chamber. The extreme ultraviolet light source apparatus includes: a chamber in which extreme ultraviolet light is generated; a target material supply unit for supplying a target material into the chamber; a driver laser unit for irradiating the target material with a driver pulse laser beam to generate plasma; a cleaning laser unit for emitting a cleaning pulse laser beam; and a control unit for controlling an irradiation position of the cleaning pulse laser beam emitted from the cleaning laser unit so as to irradiate a component provided within the chamber with the cleaning pulse laser beam to remove debris adhering to a surface of the component.
摘要翻译： 一种极紫外光源装置，其可以消除附着在诸如设置在室内的光学元件的部件的碎屑。 所述极紫外光源装置具有：产生极紫外光的室; 目标材料供应单元，用于将目标材料供应到所述室中; 用于用驱动脉冲激光束照射目标材料以产生等离子体的驱动器激光单元; 用于发射清洁脉冲激光束的清洁激光单元; 以及控制单元，用于控制从清洁激光单元发射的清洁脉冲激光束的照射位置，以便用清洁脉冲激光束照射设置在室内的部件，以去除附着在部件表面上的碎屑。
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公开(公告)号：US20100176310A1
公开(公告)日：2010-07-15
申请号：US12385835
申请日：2009-04-21
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
IPC分类号： H01J99/00
CPC分类号： G03F7/70891 , G03F7/70033 , G03F7/7085 , G03F7/70883 , H05G2/008
摘要： An EUV light source apparatus capable of easily detecting deterioration etc. of a window of an EUV light generating chamber. The EUV light source apparatus includes a driver laser, an EUV light generating chamber, a window which passes the laser beam into the EUV light generating chamber, an EUV light collector mirror, laser beam focusing optics which focuses a laser beam onto a trajectory of a target material, a temperature sensor which detects a temperature of the window, and a laser beam optics deterioration determination processing unit which determines deterioration of the window based on the temperature of the window detected by the temperature sensor when extreme ultra violet light is generated.
摘要翻译： EUV光源装置，能够容易地检测EUV光产生室的窗口的劣化等。 EUV光源装置包括驱动激光器，EUV光产生室，将激光束通入EUV光产生室的窗口，EUV聚光镜，激光束聚焦光学器件，其将激光束聚焦到 目标材料，检测窗口的温度的温度传感器，以及激光束光学劣化判定处理单元，其基于当产生极紫外光时由温度传感器检测到的窗口的温度来确定窗口的劣化。
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公开(公告)号：US20070091968A1
公开(公告)日：2007-04-26
申请号：US10554537
申请日：2004-04-16
CPC分类号： H01S3/2308 , G03F7/70025 , H01S3/083
摘要： The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.
摘要翻译： 本发明涉及一种适用于半导体对准器的两级激光系统，其在利用MOPO模式的高稳定性，高输出效率和细线宽度的同时，在空间相干性方面被减少。 用于对准器的两级激光系统包括振荡级激光器（50）和放大级激光器（60）。 具有发散的振荡激光用作振荡级激光器（50），放大级激光器（60）包括由输入侧反射镜（1）和输出侧反射镜（2）构成的法布里 - 珀罗标准具共振器 ）。 谐振器被配置为稳定谐振器。
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公开(公告)号：US06879617B2
公开(公告)日：2005-04-12
申请号：US10438737
申请日：2003-05-14
申请人： Tatsuya Ariga , Kyohei Seki , Osamu Wakabayashi
发明人： Tatsuya Ariga , Kyohei Seki , Osamu Wakabayashi
CPC分类号： H01S3/10092 , H01S3/036 , H01S3/08004 , H01S3/08009 , H01S3/08059 , H01S3/134 , H01S3/225 , H01S3/2258 , H01S3/2316
摘要： The present invention relates to a two stage laser system in which a desired spectral line width can be obtained at high output even when the integrated spectral characteristic of oscillator laser does not have the desired spectral line width, comprising an oscillator laser device 10 which has discharge electrodes 2 within a laser chamber 1 filled with laser gas containing F2 and emits laser beam which is band-narrowed by means of a band narrowing module 3 arranged in a laser resonator, and an amplifier laser device 20 which has discharge electrodes 2 within a laser chamber 1 filled with laser gas containing F2 and amplifies laser pulse injected from said oscillator laser device 10. In the system, a synchronous time interval having a predetermined spectral line width exists in laser pulse from the oscillator laser 10, and the system is set such that a discharge occurs in the amplifier laser 20 within the synchronous time interval.
摘要翻译： 本发明涉及一种二阶段激光系统，其中即使当振荡器激光器的积分光谱特性不具有期望的谱线宽度时，也可以以高输出获得期望的谱线宽度，包括具有放电的振荡器激光装置10 在激光室1内的充满了含有F2的激光气体的激光器2内的电极2，并且发射通过设置在激光谐振器中的带窄化模块3而带宽化的激光束，以及在激光器内具有放电电极2的放大器激光装置20 室1充满含有F2的激光气体，并放大从所述振荡器激光装置10注入的激光脉冲。在该系统中，具有预定光谱线宽的同步时间间隔存在于来自振荡器激光器10的激光脉冲中，并且系统被设置为 在同步时间间隔内在放大器激光器20中发生放电。
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76.发明授权Arf excimer laser device, scanning type exposure device and ultraviolet laser device 有权Arf准分子激光装置，扫描型曝光装置和紫外线激光装置公开(公告)号：US06819699B1
公开(公告)日：2004-11-16
申请号：US09518639
申请日：2000-03-03
申请人： Tatsuo Enami , Osamu Wakabayashi , Katsutomo Terashima , Kiwamu Takehisa , Tsukasa Hori , Hakaru Mizoguchi
发明人： Tatsuo Enami , Osamu Wakabayashi , Katsutomo Terashima , Kiwamu Takehisa , Tsukasa Hori , Hakaru Mizoguchi
IPC分类号： H01S322
CPC分类号： H01S3/225
摘要： A buffer gas contained in a laser gas used for an ArF excimer laser mainly consists of He, and Xe is preferably added to the laser gas. Mixture piping divided by valves is disposed on piping running from a chamber to an excimer laser gas cylinder, the mixture piping and a Xe gas cylinder are connected, gas exhaust by a gas exhaust module and opening and closing of the valves are controlled by a gas controller to add a trace quantity of xenon gas to the excimer laser gas. Thus, to remedy a burst characteristic and a spike characteristic of the ultraviolet laser device by adding a trace quantity of xenon gas, the xenon gas can be supplied efficiently into the chamber without modifying existing laser gas supply equipment.
摘要翻译： 用于ArF准分子激光器的激光气体中所含的缓冲气体主要由He构成，优选将Xe添加到激光气体中。 由阀门分隔的混合管道设置在从室到准分子激光气瓶的管道上，混合管道和Xe气瓶连接，气体排气模块排气和阀门的打开和关闭由气体 控制器向准分子激光气体添加痕量的氙气。 因此，为了通过添加痕量的氙气来补偿紫外激光装置的突发特性和尖峰特性，可以将氙气有效地供应到腔室中而不改变现有的激光气体供应装置。
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公开(公告)号：US06583874B1
公开(公告)日：2003-06-24
申请号：US09680932
申请日：2000-10-10
申请人： Toru Suzuki , Osamu Wakabayashi
发明人： Toru Suzuki , Osamu Wakabayashi
IPC分类号： G01J328
CPC分类号： G01J3/1809 , G01J3/14 , G01J3/1838
摘要： A spectrometer has higher resolving power without enlarging a size of the apparatus. This spectrometer has a slit board, a mirror, a collimator lens, a holographic grating, an Echelle grating, a magnifier lens and a line sensor. The holographic grating is arranged to diffract parallel light incident from the collimator lens toward the Echelle grating. The Echelle grating is arranged to reflect the parallel light incident from the holographic grating toward the holographic grating.
摘要翻译： 光谱仪具有更高的分辨能力，而不增加设备的尺寸。 该光谱仪具有狭缝板，反射镜，准直透镜，全息光栅，Echelle光栅，放大镜和行传感器。 全息光栅布置成将从准直透镜入射的平行光衍射到Echelle光栅。 Echelle光栅布置成将从全息光栅入射的平行光反射到全息光栅。
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公开(公告)号：US06317203B1
公开(公告)日：2001-11-13
申请号：US09270656
申请日：1999-03-16
IPC分类号： G01J2100
CPC分类号： G03F7/70575 , G01M11/00
摘要： A light that radiates in the wavelength region of a narrowband laser beam is generated, this light is converted to a collimated beam after passing through a slit, and the converted light is incident on a narrowband module. The outputted light from the narrowband module is condensed, and this condensed light is incident on a light detector. A total reflection mirror is provided in a removable manner on the optical path in front of the narrowband module, the ratio between the output of the light detector in a state in which the total reflection mirror is provided on the optical path, and the output of the light detector in a state in which the total reflection mirror is removed, is determined, and the narrowband efficiency of the above-mentioned narrowband module is inspected based on the determined ratio.
摘要翻译： 产生在窄带激光束的波长区域中发光的光，该光在通过狭缝后转换为准直光束，并且转换的光入射到窄带模块上。 来自窄带模块的输出光被冷凝，并且该会聚的光入射到光检测器上。 在窄带模块前面的光路上以可移动的方式设置全反射镜，在光路上设置全反射镜的状态下的光检测器的输出与输出 确定去除全反射镜的状态下的光检测器，并且基于所确定的比率来检查上述窄带模块的窄带效率。
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公开(公告)号：US6008497A
公开(公告)日：1999-12-28
申请号：US29218
申请日：1998-02-25
CPC分类号： G03F7/70041 , B23K26/03 , B23K26/06 , B23K26/702 , G03F7/70025 , H01S3/134 , H01S3/225
摘要： A laser apparatus comprises storage means for storing a power source voltage of each pulse at the time of continuous pulse oscillation for one cycle, with each voltage correlated with an identifier which specifies the respective pulse, and output control means for, when a pulse is generated, reading from the storage means the source voltage of a pulse having the same identifier, and performing pulse oscillation on the basis of the source voltage. Thus the influence of the spiking phenomenon during a burst mode operation is eliminated as much as possible, and thereby the accuracy of laser beam machining is still more improved.
摘要翻译： PCT No.PCT / JP96 / 02820 Sec。 371日期：1998年2月25日 102（e）1998年2月25日PCT PCT 1996年9月27日PCT公布。 公开号WO97 / 11810PC。 日期1997年04月3日激光装置包括存储装置，用于在连续脉冲振荡时存储每个脉冲的电源电压一个周期，其中每个电压与指定相应脉冲的标识符相关，以及输出控制装置， 当产生脉冲时，从存储装置读取具有相同标识符的脉冲的源电压，并且基于源电压执行脉冲振荡。 因此，尽可能地消除了在突发模式操作期间的尖峰现象的影响，从而仍然进一步提高了激光束加工的精度。
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公开(公告)号：US5642374A
公开(公告)日：1997-06-24
申请号：US420132
申请日：1995-04-10
摘要： Aimed at preventing a laser light beam profile from fluctuating, and by using the fact that there is a substantially proportional relation between the beam profile and the charging voltage as well as between the beam profile and the composition or the total pressure of the laser gases, an excimer laser device comprises a laser chamber containing laser gases which are excited by initiating an electric discharge in the laser chamber to output laser light, a beam profile detector for detecting a beam profile of the output laser light, and a controller for controlling a electric discharge voltage (excitation intensity) and composition or total pressure of the prescribed types of laser gases in such a way that the beam profile is shaped as desired based on detection results of the beam profile detector. An excimer laser feedback control circuit detects the output laser beam width and controls the beam width by controlling one or more of the laser voltage, composition of the laser gas, pressure or partial pressure of the laser gas, or feed rate of a laser gas. The laser gas may comprise a halogen, buffer, or rare gas.
摘要翻译： 旨在防止激光束轮廓波动，并且通过使用光束轮廓和充电电压之间以及光束轮廓与激光气体的组成或总压力之间存在实质上成比例关系的事实， 准分子激光装置包括激光室，其包含通过在激光室中引发放电而激发的激光气体输出激光，用于检测输出激光的光束分布的光束分布检测器，以及用于控制电 放电电压（激发强度）和规定类型的激光气体的组成或总压力，使得根据光束轮廓检测器的检测结果，根据需要对光束轮廓进行成形。 准分子激光反馈控制电路通过控制激光电压，激光气体的组成，激光气体的压力或分压或激光气体的进给速率中的一个或多个来检测输出激光束宽度并控制光束宽度。 激光气体可以包括卤素，缓冲剂或稀有气体。
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