利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

125 条记录 (耗时 0.027 秒)

    Apparatus for producing a molten seal in a continuous casting furnace
    72.
    发明申请
    Apparatus for producing a molten seal in a continuous casting furnace 审中-公开
    用于在连续铸造炉中生产熔融密封的装置

    公开(公告)号：US20080060783A1

    公开(公告)日：2008-03-13

    申请号：US11981135

    申请日：2007-10-31

    申请人： Michael Jacques ,  Frank Spadafora ,  Kuang-O Yu ,  Brian Martin

    发明人： Michael Jacques ,  Frank Spadafora ,  Kuang-O Yu ,  Brian Martin

    IPC分类号： B22D11/106

    CPC分类号： B22D11/07 ,  B22D11/113 ,  B22D11/117 ,  B22D11/1213

    摘要： A seal for a continuous casting furnace having a melting chamber with a mold therein for producing a metal cast includes a passage between the melting chamber and external atmosphere. As the cast moves through the passage, the cast outer surface and the passage inner surface define therebetween a reservoir for containing liquid glass or other molten material to prevent the external atmosphere from entering the melting chamber. Particulate material fed into the reservoir is melted by heat from the cast to form the molten material. The molten material coats the cast as it moves through the passage and solidifies to form a coating to protect the hot cast from reacting with the external atmosphere. Preferably, the mold has an inner surface with a cross-sectional shape to define a cross-sectional shape of the cast outer surface whereby these cross-sectional shapes are substantially the same as a cross-sectional shape of the passage inner surface.

    摘要翻译： 一种连续铸造炉的密封件，其具有用于制造金属铸件的具有模具的熔化室，其包括熔化室和外部气氛之间的通道。 当铸件通过通道时，铸造外表面和通道内表面在其间限定有用于容纳液体玻璃或其它熔融材料以防止外部气氛进入熔化室的储存器。 供给到储存器的颗粒物质通过来自铸件的热量熔化以形成熔融材料。 熔融材料在铸件通过通道时涂覆，并固化形成涂层以保护热铸件不与外部气氛反应。 优选地，模具具有横截面形状的内表面以限定铸造外表面的横截面形状，由此这些横截面形状与通道内表面的横截面形状基本相同。

    Continuous casting of reactionary metals using a glass covering
    73.
    发明申请
    Continuous casting of reactionary metals using a glass covering 有权
    使用玻璃覆盖物连续铸造反应性金属

    公开(公告)号：US20070204970A1

    公开(公告)日：2007-09-06

    申请号：US11799574

    申请日：2007-05-02

    申请人： Michael Jacques ,  Frank Spadafora ,  Kuang-O Yu ,  Brian Martin

    发明人： Michael Jacques ,  Frank Spadafora ,  Kuang-O Yu ,  Brian Martin

    IPC分类号： B22D11/07

    CPC分类号： B22D11/10 ,  B22D11/006 ,  B22D11/055 ,  B22D11/108

    摘要： A seal for a continuous casting furnace having a melting chamber with a mold therein for producing a metal cast includes a passage between the melting chamber and external atmosphere. As the cast moves through the passage, the cast outer surface and the passage inner surface define therebetween a reservoir for containing liquid glass or other molten material to prevent the external atmosphere from entering the melting chamber. Particulate material fed into the reservoir is melted by heat from the cast to form the molten material. The molten material coats the cast as it moves through the passage and solidifies to form a coating to protect the hot cast from reacting with the external atmosphere. Preferably, the mold has an inner surface with a cross-sectional shape to define a cross-sectional shape of the cast outer surface whereby these cross-sectional shapes are substantially the same as a cross-sectional shape of the passage inner surface.

    摘要翻译： 一种连续铸造炉的密封件，其具有用于制造金属铸件的具有模具的熔化室，其包括熔化室和外部气氛之间的通道。 当铸件通过通道时，铸造外表面和通道内表面在其间限定有用于容纳液体玻璃或其它熔融材料以防止外部气氛进入熔化室的储存器。 供给到储存器的颗粒物质通过来自铸件的热量熔化以形成熔融材料。 熔融材料在铸件通过通道时涂覆，并固化形成涂层以保护热铸件不与外部气氛反应。 优选地，模具具有横截面形状的内表面以限定铸造外表面的横截面形状，由此这些横截面形状与通道内表面的横截面形状基本相同。

    Exposure positioning in photolithography
    75.
    发明授权
    Exposure positioning in photolithography 有权
    光刻曝光定位

    公开(公告)号：US06962762B2

    公开(公告)日：2005-11-08

    申请号：US10318470

    申请日：2002-12-13

    申请人： Brian Martin ,  Ian Daniels

    发明人： Brian Martin ,  Ian Daniels

    IPC分类号： G03F1/00 ,  G03F7/20 ,  G03F9/00

    CPC分类号： G03F7/70616 ,  G03F1/00 ,  G03F7/70433 ,  G03F7/70475 ,  G03F7/70633

    摘要： A reticle for use in a photolithography process for exposing a photoresist layer in the production of a component which is formed from a plurality of adjacent exposed areas. The reticle includes an exposure aperture adapted to allow light to pass through the reticle, a patterned area within the exposure aperture which defines at least part of the functional design of the component, and one or more “stitching” structures located close to one or more of the edges of the exposure aperture. The “stitching” structures are arranged to create “stitching” marks on the photoresist, which can be used to determine whether the adjacent exposed areas have been accurately positioned.

    摘要翻译： 一种用于光刻工艺的掩模版，用于在由多个相邻的暴露区域形成的部件的制造中使光致抗蚀剂层曝光。 掩模版包括适于允许光通过掩模版的曝光孔，曝光孔内的图案区域，其限定部件的功能设计的至少一部分，以及位于接近一个或多个位置的一个或多个“缝合”结构 的曝光孔的边缘。 “缝合”结构被布置成在光致抗蚀剂上产生“缝合”标记，其可用于确定相邻曝光区域是否已经被精确定位。

    Device access controller and remote support facility for installation of cabling in a multiprocessor system
    79.
    发明授权
    Device access controller and remote support facility for installation of cabling in a multiprocessor system 失效
    设备访问控制器和用于在多处理器系统中安装电缆的远程支持设施

    公开(公告)号：US5845094A

    公开(公告)日：1998-12-01

    申请号：US661579

    申请日：1996-06-11

    申请人： Robert Beauchamp ,  Brian Martin ,  Brian Milas ,  Brian Gruttadauria ,  Michael Tehranian

    发明人： Robert Beauchamp ,  Brian Martin ,  Brian Milas ,  Brian Gruttadauria ,  Michael Tehranian

    IPC分类号： G06F11/20 ,  G06F13/00

    CPC分类号： H04L12/40032 ,  H04L41/26 ,  G06F11/1666

    摘要： A support facility for installation of interprocessor unit cabling interconnecting the processor units of a multiple processor unit system in a first network, including a second system for directing the cabling interconnections of the first system and, in each processor unit of the first system, a device access controller connected through a second network to a second system, each device access controller including a memory for storing a unique identifier, and a network controller to interconnect to a network controller of at least one other processor unit. There is a selectably settable anchor bit indicator to indicate a processor unit selected as a first processor unit of the first network, a next connection indicator connected from the device access controller, and connected from the network controller, a transmit test indicator connected from the device access controller and a receive indicator connected from the device access controller. The second system identifies the units of the first system and directs a user through the cable interconnections of the first network.

    摘要翻译： 一种用于安装互连处理器单元布线的支持设施，其将第一网络中的多处理器单元系统的处理器单元互连，包括用于引导第一系统的布线互连的第二系统，并且在第一系统的每个处理器单元中， 访问控制器通过第二网络连接到第二系统，每个设备访问控制器包括用于存储唯一标识符的存储器和与至少一个其他处理器单元的网络控制器互连的网络控制器。 存在可选择地设置的锚位指示器，以指示被选择为第一网络的第一处理器单元的处理器单元，从设备访问控制器连接并从网络控制器连接的下一个连接指示符，从该设备连接的发送测试指示符 访问控制器和从设备访问控制器连接的接收指示器。 第二系统识别第一系统的单元，并引导用户通过第一网络的电缆互连。

    CMOS input with Vcc compensated dynamic threshold
    80.
    发明授权
    CMOS input with Vcc compensated dynamic threshold 失效
    CMOS输入具有Vcc补偿动态阈值

    公开(公告)号：US5495187A

    公开(公告)日：1996-02-27

    申请号：US489242

    申请日：1995-06-12

    申请人： Brian Martin

    发明人： Brian Martin

    IPC分类号： H03K19/20 ,  H03K19/003 ,  H03K19/0948

    CPC分类号： H03K19/00384

    摘要： A CMOS inverter circuit is provided which includes a compensation circuit which modifies the input threshold of the inverter depending on changes in the supply voltage. The inverter includes a standard CMOS inverter, current boosting circuitry and a further inverter. The input of the inverter is coupled to the current boosting circuitry and the input of the further inverter. The current boosting circuitry is also coupled to one of the supply voltages. The current boosting circuitry is operative to effectively change the PMOS to NMOS ratio of the inverter to maintain a substantially constant input threshold to counter the effect of any change in supply voltage.

    摘要翻译： 提供了一种CMOS逆变器电路，其包括补偿电路，该补偿电路根据电源电压的变化修改逆变器的输入阈值。 逆变器包括标准CMOS反相器，电流升压电路和另一个逆变器。 反相器的输入端连接到电流升压电路和另一个反相器的输入端。 电流升压电路还耦合到电源电压之一。 电流升压电路用于有效地改变反相器的PMOS至NMOS比，以保持基本上恒定的输入阈值以抵消电源电压的任何变化的影响。