公开(公告)号：US07953511B1

公开(公告)日：2011-05-31

申请号：US11903354

申请日：2007-09-21

Applicant: Allan O'Brien

Inventor： Allan O'Brien

IPC: G06F19/00 ,  G06F7/00 ,  G06F17/00 ,  G06K7/10 ,  G06K15/12 ,  G21K5/10 ,  H01J37/08 ,  H01L21/00 ,  H01L21/66 ,  G01R31/26

CPC classification number: H01J37/3171 ,  G06Q50/04 ,  H01J37/304 ,  H01J2237/2482 ,  H01L21/67253 ,  H01L21/67294 ,  H01L23/544 ,  H01L2223/54413 ,  H01L2223/54433 ,  H01L2223/54453 ,  H01L2223/54493 ,  H01L2924/0002 ,  Y02P90/30 ,  H01L2924/00

Abstract: A system and method is disclosed for reducing processing errors during the fabrication of integrated circuit wafers. A 2D dot matrix wafer scribe that contains coded information is placed on a wafer. The coded information contains wafer information such as the wafer lot number. The wafer is then placed in an ion implantation system. A camera in the ion implantation system is then used to photograph the dot matrix wafer scribe on the wafer. The information about the wafer is then decoded from the photograph of the dot matrix wafer scribe. A station controller that operates the ion implantation system then uses the information from the dot matrix wafer scribe to determine whether the wafer is suitable for ion implantation. The wafer is implanted only when the information from the dot matrix wafer scribe matches information about the wafer that has been previously stored in the station controller.

Abstract translation: 公开了用于在集成电路晶片的制造期间减少加工误差的系统和方法。 包含编码信息的2D点阵晶片划片放置在晶片上。 编码信息包含诸如晶片批号的晶片信息。 然后将晶片放置在离子注入系统中。 然后使用离子注入系统中的相机拍摄晶片上的点阵晶片划片。 然后从点阵晶片划片的照片解码关于晶片的信息。 然后操作离子注入系统的站控制器使用来自点阵晶片划片的信息来确定晶片是否适于离子注入。 仅当来自点阵晶片划片的信息匹配关于先前存储在站控制器中的晶片的信息时才植入晶片。

公开(公告)号：US20100320171A1

公开(公告)日：2010-12-23

申请号：US12743550

申请日：2008-12-16

Applicant: Samuel S. Mao ,  Costas P. Grigoropoulos ,  David Hwang ,  Andrew M. Minor

Inventor： Samuel S. Mao ,  Costas P. Grigoropoulos ,  David Hwang ,  Andrew M. Minor

IPC: B82B3/00 ,  G21K5/10

CPC classification number: C23C16/047 ,  G01Q80/00 ,  G03F1/72 ,  G03F1/82 ,  G03F7/0002 ,  Y10T156/1158

Abstract: Laser-assisted apparatus and methods for performing nanoscale material processing, including nanodeposition of materials, can be controlled very precisely to yield both simple and complex structures with sizes less than 100 nm. Optical or thermal energy in the near field of a photon (laser) pulse is used to fabricate submicron and nanometer structures on a substrate. A wide variety of laser material processing techniques can be adapted for use including, subtractive (e.g., ablation, machining or chemical etching), additive (e.g., chemical vapor deposition, selective self-assembly), and modification (e.g., phase transformation, doping) processes. Additionally, the apparatus can be integrated into imaging instruments, such as SEM and TEM, to allow for real-time imaging of the material processing.

Abstract translation: 可以非常精确地控制用于进行纳米尺度材料加工的激光辅助装置和方法，包括材料的纳米沉积，以产生尺寸小于100nm的简单和复杂结构。 在光子（激光）脉冲的近场中的光学或热能用于在衬底上制造亚微米和纳米结构。 各种激光材料加工技术可以适用于包括减法（例如，消融，机械加工或化学蚀刻），添加剂（例如化学气相沉积，选择性自组装）和修饰（例如相变，掺杂 ）进程。 此外，该装置可以集成到诸如SEM和TEM的成像仪器中，以允许材料处理的实时成像。

公开(公告)号：US07772574B2

公开(公告)日：2010-08-10

申请号：US11719320

申请日：2005-11-15

Applicant: Gerhard Stengl ,  Herbert Buschbeck ,  Robert Nowak

Inventor： Gerhard Stengl ,  Herbert Buschbeck ,  Robert Nowak

IPC: G21K5/10

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3045 ,  H01J37/3177

Abstract: In a pattern-lock system of particle-beam apparatus wherein the imaging of the pattern is done by means of at least two consecutive projector stages of the projecting system, reference marks are imaged upon registering means to determine the position of the particle-beam, at the location of an intermediary image of the reference marks produced by a non-final projector stage, with the registering means being positioned at locations of nominal positions of an intermediary imaging plane. Furthermore, to produce a scanning movement over the registering means the reference beamlets are shifted laterally by means of deflector means provided in the pattern defining means in dependence of a time-dependent electric voltage.

Abstract translation: 在粒子束装置的图案锁定系统中，其中通过投影系统的至少两个连续的投影台进行图案的成像，参考标记在登记装置上成像以确定粒子束的位置， 在由非最终投影仪舞台产生的参考标记的中间图像的位置处，其中登记装置位于中间成像平面的标称位置的位置。 此外，为了在登记装置上产生扫描运动，根据时间相关的电压，通过设置在图案定义装置中的偏转装置横向移动参考子束。

公开(公告)号：US07755657B2

公开(公告)日：2010-07-13

申请号：US10557099

申请日：2004-06-14

Applicant: Torbjorn Sandstrom ,  Hans Martinsson

Inventor： Torbjorn Sandstrom ,  Hans Martinsson

IPC: B41J2/47 ,  G21K5/10

CPC classification number: G03F7/70283 ,  G03F7/70291

Abstract: The present invention includes a method to print patterns with improved edge acuity. The method for printing fine patterns comprises the actions of: providing an SLM and providing a pixel layout pattern with different categories of modulating elements, the categories differing in the phase of the complex amplitude.

Abstract translation: 本发明包括一种打印具有改善的边缘锐度的图案的方法。 用于打印精细图案的方法包括以下动作：提供SLM并且提供具有不同类别的调制元素的像素布局图案，所述类别在复幅度的相位上不同。

公开(公告)号：US07755044B2

公开(公告)日：2010-07-13

申请号：US12047013

申请日：2008-03-12

Applicant: Toshiaki Fujii ,  Haruo Takahashi ,  Junichi Tashiro

Inventor： Toshiaki Fujii ,  Haruo Takahashi ,  Junichi Tashiro

IPC: G21K5/04 ,  G21K5/10

CPC classification number: H01J37/3056 ,  G01N1/286 ,  H01J2237/31745

Abstract: The apparatus for working and observing samples comprises a sample plate on which a sample is to be placed; a first ion beam lens barrel capable of irradiating a first ion beam over a whole predetermined irradiation range at one time; a mask that can be arranged between the sample plate and the first ion beam lens barrel, and shields part of the first ion beam; mask-moving means capable of moving the mask; a charged particle beam lens barrel capable of scanning a focused beam of charged particles in the range irradiated with the first ion beam; and detection means capable of detecting a secondarily generated substance.

Abstract translation: 用于工作和观察样品的装置包括样品板，样品板将放置在样品板上; 一次能够在整个预定照射范围内照射第一离子束的第一离子束透镜镜筒; 可以在样品板和第一离子束透镜筒之间布置的掩模，并且屏蔽第一离子束的一部分; 掩模移动装置，能够移动面罩; 带电粒子束透镜镜筒，其能够扫描在第一离子束照射的范围内的聚集的带电粒子束; 以及能够检测次要生成物质的检测装置。

公开(公告)号：US20100032588A1

公开(公告)日：2010-02-11

申请号：US12535180

申请日：2009-08-04

Applicant: Hidekazu TAKEKOSHI

Inventor： Hidekazu TAKEKOSHI

IPC: G21K5/10

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/20 ,  G03F1/68 ,  G03F1/78

Abstract: A writing apparatus includes a writing unit configured to write a first pattern onto a first mask substrate and a second pattern being complementary to the first pattern onto a second mask substrate using a charged particle beam, and an addition unit configured to add a positional deviation amount of the first pattern having been written on the first mask substrate to a writing position of the second pattern, wherein the writing unit writes the second pattern at the writing position on the second mask substrate, where the positional deviation amount of the first pattern has been added.

Abstract translation: 一种写入装置，包括：写入单元，被配置为使用带电粒子束将第一图案写入第一掩模基板上，将第二图案与第一图案互补到第二掩模基板上;附加单元，被配置为将位置偏差量 已经将第一图案写入第一掩模基板到第二图案的写入位置，其中写入单元将第二图案写在第二掩模基板上的写入位置，其中第一图案的位置偏移量已经被 添加。

公开(公告)号：US07655905B2

公开(公告)日：2010-02-02

申请号：US11920132

申请日：2006-05-11

Applicant: Ken Harada ,  Tetsuya Akashi ,  Yoshihiko Togawa ,  Tsuyoshi Matsuda ,  Noboru Moriya

Inventor： Ken Harada ,  Tetsuya Akashi ,  Yoshihiko Togawa ,  Tsuyoshi Matsuda ,  Noboru Moriya

IPC: G21K5/10 ,  G01N23/00

CPC classification number: G01N23/04 ,  H01J37/023 ,  H01J37/067 ,  H01J37/20 ,  H01J37/26 ,  H01J2237/024 ,  H01J2237/1514 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/262 ,  H01J2237/317

Abstract: Charged particle beam equipment having a rotary mechanism in which shift of the observing/machining position incident to the rotary operation of the equipment having the rotary mechanism can be corrected conveniently with high precision in a plane perpendicular to the optical axis of the optical system of charged particle beam or in a slightly inclining plane. An X-Y shift incident to rotation in a plane is determined from the angular information of a rotary mechanism such as a sample holder, diaphragms or biprisms in the charged particle beam equipment, and then driving or controlling is performed to cancel the X-Y shift.

Abstract translation: 具有旋转机构的带电粒子束设备可以在垂直于带电的光学系统的光轴的平面中以高精度方便地校正入射到具有旋转机构的设备的旋转操作的观察/加工位置的偏移 粒子束或稍微倾斜的平面。 根据带电粒子束设备中的样本保持器，隔膜或双棱镜等旋转机构的角度信息确定入射到平面中的X-Y偏移，然后执行驱动或控制以消除X-Y偏移。

公开(公告)号：US07653176B2

公开(公告)日：2010-01-26

申请号：US11453545

申请日：2006-06-14

Applicant: Richard C. Smith ,  Robert W. Madden ,  James M. Connelly

Inventor： Richard C. Smith ,  Robert W. Madden ,  James M. Connelly

IPC: H01L27/146 ,  G21K5/10

CPC classification number: G01V5/0025 ,  G01N23/20 ,  G01V5/0016 ,  G21K1/02

Abstract: An angular analysis system that can be controlled to receive radiation at a defined angle from a defined focus region. The angular analysis system is used for level 2 inspection in an explosive detection system. Level 2 inspection is provided by a three-dimensional inspection system that identifies suspicious regions of items under inspection. The angular analysis system is focused to gather radiation scattered at defined angles from the suspicious regions. Focusing may be achieved in multiple dimensions by movement of source and detector assemblies in a plane parallel to a plane holding the item under inspection. Focusing is achieved by independent motion of the source and detector assemblies. This focusing arrangement provides a compact device, providing simple, low cost and accurate operation.

Abstract translation: 角度分析系统，其可以被控制以从限定的聚焦区域以规定的角度接收辐射。 角度分析系统用于爆炸物检测系统的二级检查。 二级检查由三维检查系统提供，用于识别被检查物品的可疑区域。 角度分析系统集中在收集从可疑区域以规定角度散射的辐射。 聚焦可以通过源和检测器组件在平行于保持被检查物品的平面的平面中移动而在多个维度上实现。 聚焦通过源和检测器组件的独立运动来实现。 该聚焦装置提供了紧凑的装置，提供简单，低成本和准确的操作。

公开(公告)号：US20090314955A1

公开(公告)日：2009-12-24

申请号：US12478111

申请日：2009-06-04

Applicant: Hidetoshi Nishiyama ,  Mitsuru Koizumi ,  Mitsuo Suga

Inventor： Hidetoshi Nishiyama ,  Mitsuru Koizumi ,  Mitsuo Suga

IPC: G21K5/10 ,  G01N23/00

CPC classification number: G01N23/2204 ,  H01J37/20 ,  H01J37/228 ,  H01J37/28 ,  H01J2237/208 ,  H01J2237/2608 ,  H01J2237/2808

Abstract: A specimen holder is offered which can reduce the amount of chemical sprayed over a specimen consisting of cultured cells. The specimen holder has an open specimen-holding surface. At least a part of the specimen-holding surface is formed by a film and a tapering portion formed around the film. The specimen can be cultured on the specimen-holding surface of the film. The presence of the tapering portion can reduce the amount of used reagent. The specimen can be irradiated via the film with a primary beam for observation or inspection of the specimen. Consequently, the specimen, such as cells, can be well observed or inspected in vivo while the specimen is being cultured. Especially, if an electron beam is used as the primary beam, the specimen can be well observed or inspected in vivo by SEM (scanning electron microscopy).

Abstract translation: 提供样品架，可以减少由培养细胞组成的标本上喷洒的化学物质的量。 样品架具有开放的样品保持表面。 试样保持面的至少一部分由膜和形成在膜周围的锥形部分形成。 样品可以在膜的样品保持表面上培养。 锥形部分的存在可以减少使用的试剂的量。 样品可以通过膜通过初级光束照射，用于观察或检查样品。 因此，在培养样品时，可以在体内良好地观察或检查样品，例如细胞。 特别地，如果使用电子束作为主光束，则可以通过SEM（扫描电子显微镜）在体内良好地观察或检查样品。

公开(公告)号：US20090309043A1

公开(公告)日：2009-12-17

申请号：US12472072

申请日：2009-05-26

Applicant: Takashi NOBUHARA ,  Shouji Tomida ,  Hajime Shimada

Inventor： Takashi NOBUHARA ,  Shouji Tomida ,  Hajime Shimada

IPC: G21K5/10 ,  G01N23/00

CPC classification number: H01J37/20 ,  H01J37/28 ,  H01J2237/2007 ,  H01L21/6833

Abstract: An object of the present invention is to obtain a charged particle beam apparatus that includes a simplified sample positioning mechanism used with an electrostatic chuck, allow the sample to be released easily when residual attraction occurs, and enable observation throughout an entire area on an outer peripheral portion of the sample. To attain the object, the present invention provides a charged particle beam apparatus including, in a sample holding system for holding a sample, an outer peripheral part for holding the sample at the outer peripheral portion on a backside of the sample and raising and lowering the sample; a drive portion for raising and lowering the outer peripheral part; an electrostatic chuck for attracting the backside of the sample; and a part for correcting an electric field that is of substantially the same height as the peripheral portion of the sample when the sample is attracted onto the electrostatic chuck.

Abstract translation: 本发明的目的是获得一种带电粒子束装置，其包括与静电卡盘一起使用的简化的样品定位机构，当残留吸引发生时允许样品被容易地释放，并且能够在外周的整个区域上观察 部分样品。 为了实现该目的，本发明提供了一种带电粒子束装置，其包括在用于保持样品的样本保持系统中，用于将样品保持在样品背面的外周部分的外周部分，并且升高和降低 样品; 用于升高和降低外围部分的驱动部分; 用于吸引样品背面的静电吸盘; 以及当样品被吸引到静电卡盘上时用于校正与样品的周边部分基本相同高度的电场的部分。