摘要:
The present invention relates to a method and apparatus for varying the cross-sectional shape of an ion beam, as the ion beam is scanned over the surface of a workpiece, to generate a time-averaged ion beam having an improved ion beam current profile uniformity. In one embodiment, the cross-sectional shape of an ion beam is varied as the ion beam moves across the surface of the workpiece. The different cross-sectional shapes of the ion beam respectively have different beam profiles (e.g., having peaks at different locations along the beam profile), so that rapidly changing the cross-sectional shape of the ion beam results in a smoothing of the beam current profile (e.g., reduction of peaks associated with individual beam profiles) that the workpiece is exposed to. The resulting smoothed beam current profile provides for improved uniformity of the beam current and improved workpiece dose uniformity.
摘要:
The invention relates to an in-column back-scattered electron detector, the detector placed in a combined electrostatic/magnetic objective lens for a SEM. The detector is formed as a charged particle sensitive surface, preferably a scintillator disk that acts as one of the electrode faces forming the electrostatic focusing field. The photons generated in the scintillator are detected by a photon detector, such as a photo-diode or a multi-pixel photon detector. The objective lens may be equipped with another electron detector for detecting secondary electrons that are kept closer to the axis. A light guide may be used to offer electrical insulation between the photon detector and the scintillator.
摘要:
A particle beam system comprises a particle beam source 5 for generating a primary particle beam 13, an objective lens 19 for focusing the primary particle beam 13 in an object plane 23; a particle detector 17; and an X-ray detector 47 arranged between the objective lens and the object plane. The X-ray detector comprises plural semiconductor detectors, each having a detection surface 51 oriented towards the object plane. A membrane is disposed between the object plane and the detection surface of the semiconductor detector, wherein different semiconductor detectors have different membranes located in front, the different membranes differing with respect to a secondary electron transmittance.
摘要:
A charged particle beam emitting device includes at least two charged particle beam guns, each of the at least two charged particle beam guns having a separate charged particle emitter with an emitting surface for emitting a respective charged particle beam. The charged particle beam emitting device further includes an aperture element comprising at least one aperture opening and a deflector unit. The deflector unit is adapted for alternatively directing the charged particle beams of the at least two charged particle beam guns on the at least one aperture opening so that, at the same time, one of the at least two charged particle beams is directed on the aperture opening while the respective other charged particle beam of the at least two charged particle beams is deflected from the aperture opening by the deflector unit. At the same time, only one of the two charged particle beam guns is used so that the temporarily unused charged particle beam gun can be subjected to a cleaning procedure. This ensures that the emitting surfaces of both charged particle beam guns can be alternatively and frequently cleaned with minimum interruption of the operation of the charged particle beam device.
摘要:
A method of efficiently fabricating a multipole lens. The multipole lens has plural polar elements and an annular holding member. Each polar element has a held portion. The annular holding member is provided with through-holes for holding the held portions of the polar elements. A resin is injected into the through-holes in the holding member via openings formed in the holding member, the openings being in communication with the through-holes. The injected resin is cured, thus holding the held portions of the polar elements to the holding member within the through-holes.
摘要:
Particle-optical rotationally symmetrical lenses inevitably have chromatic aberration. This lens fault determines the limit of the resolution of known particle-optical apparatus at a comparatively low acceleration voltage (0.5 kV to 5 kV) of the particle beam. This lens fault cannot be eliminated by compensation by means of rotationally symmetrical fields. In order to enhance the resolution of the particle-optical apparatus nevertheless, it has already been proposed to mitigate said lens fault by means of a Wien type corrector. Such a known configuration is provided with a number of electrical and magnetic multipoles. In order to achieve easier adjustment of the various multipole fields, the pole faces (30-i) governing the multipole fields according to the invention have a specific length L=(2.pi..sup.2 n.sup.2)/(K.sub.obj.sup.2 C.sub.c,obj), in which K.sub.obj is the strength of the focusing lens to be corrected and C.sub.c,obj is the coefficient of chromatic aberration of this lens.
摘要:
An in-lens type objective lens is separated into two parts along the plane perpendicular to the direction of electron or ion orbit, so that a target sample can placed between the upper part and the lower part of the lens. Coils for the two parts are serially connected so as to work as one coil. Each of the upper and lower parts of the lens is provided with a lens positioning device. If the in-lens type objective lens is of a three-piece electrostatic type, a structure is provided which enables a target sample to be placed between a first and second electrode group and the third electrode.
摘要:
An apparatus using a charged particle beam is disclosed which includes means for generating charged particles, means for accelerating the charged particles so that the charged particles have desired kinetic energy, lens means including at least one objective lens for focusing a charged particle beam formed of the accelerated, charged particles, on the surface of a specimen, scanning means for scanning the surface of the specimen two-dimensionally with the focused beam, detection means for detecting secondary electrons, reflected electrons, X-rays and light, all of which emerge from the surface of the specimen, objective lens moving means for moving an objective lens nearest to the specimen, and deflection means linked with the objective lens moving means for deflecting the charged particle beam so that the charged particle beam carries out parallel displacement at the objective lens by an amount corresponding to the moving distance of the objective lens.
摘要:
A magnetic lens system is provided for a beam of charged particles, comprising a pair of ring-shaped permanent magnets through which the beam passes, the axes of the rings lying coaxially along the beam direction, and the two rings being axially separated and axially oppositely magnetised. A pair of separated conducting focus coils are provided one for each ring, the axes of the focus coils lying coaxially along the beam direction, each focus coil lying within its associated ring, and the focus coils being connected in series opposition to carry an adjustable direct electric current for fine focusing of the beam by the lens without rotation of the focused beam. The lens may provide the fast fine focus adjustment needed to compensate for space charge defocussing produced by changes in beam current.
摘要:
A transmission electron microscope for irradiating a sample with an electron beam and for causing an image formation lens system to enlarge the electron beam having passed through the sample so that a magnified image of the sample is formed by the electron beam. The image formation lens system includes a plurality of lens groups each having a plurality of electromagnetic lenses, and the focal length of each of the electromagnetic lenses included in at least one lens group is changed while keeping the resultant focal length of each lens group constant, to rotate the magnified image in a state that the magnification of the image is kept constant.