BATTERY WITH FRONT FACE AND REAR FACE CONTACTS

    公开(公告)号:US20200091470A1

    公开(公告)日:2020-03-19

    申请号:US16692367

    申请日:2019-11-22

    Abstract: A battery structure has structure anode and cathode contacts on a front face and on a rear face. The battery structure includes a battery having battery anode and cathode contacts only on a front face thereof. A film including a conductive layer and an insulating layer jackets the battery. The conductive layer extends over the battery anode and cathode contacts and is interrupted therebetween. Openings are provided in the insulating layer on the front and rear faces of the battery structure to form the structure anode and cathode contacts of the battery structure.

    Overvoltage protection device
    84.
    发明授权

    公开(公告)号:US10529703B2

    公开(公告)日:2020-01-07

    申请号:US15436998

    申请日:2017-02-20

    Inventor: Aurelie Arnaud

    Abstract: An electrostatic discharge protection device includes the following successive structures: a very heavily-doped semiconductor substrate of a first conductivity type; a first heavily-doped buried semiconductor layer of a second conductivity type; a first lightly-doped semiconductor layer of the second conductivity type; and a second heavily-doped layer of the first conductivity type. The device further includes, located between first heavily-doped buried semiconductor layer and the first lightly-doped semiconductor layer, a third doped layer of the first conductivity type having a thickness and a dopant atom concentration configured to form, at a junction of the first lightly-doped semiconductor layer and the third layer, a diode having a reverse punchthrough operation.

    Vertical Semiconductor Structure
    89.
    发明申请

    公开(公告)号:US20190088735A1

    公开(公告)日:2019-03-21

    申请号:US16197011

    申请日:2018-11-20

    Abstract: A diode includes upper and lower electrodes and first and second N-type doped semiconductor substrate portions connected to the lower electrode. A first vertical transistor and a second transistor are formed in the first portion and series-connected between the electrodes. The gate of the first transistor is N-type doped and coupled to the upper electrode. The second transistor has a P channel and has a P-type doped gate. First and second doped areas of the second conductivity type are located in the second portion and are separated by a substrate portion topped with another N-type doped gate. The first doped area is coupled to the gate of the second transistor. The second doped area and the other gate are coupled to the upper electrode.

    Protection of a telephone line against overvoltages

    公开(公告)号:US10148810B2

    公开(公告)日:2018-12-04

    申请号:US15045935

    申请日:2016-02-17

    Abstract: A structure protects a SLIC telephone line interface against overvoltages lower than a negative threshold or higher than a positive threshold. The structure includes at least one thyristor connected between each conductor of the telephone line and a reference potential. For all of the included thyristors, a metallization corresponding to the main electrode on the gate side is in contact, by its entire surface, with a corresponding semiconductor region. Furthermore, the gate of each thyristor is directly connected to a voltage source defining one of the thresholds.

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