Modification of pixelated photolithography masks based on electric fields
    81.
    发明授权
    Modification of pixelated photolithography masks based on electric fields 有权
    基于电场的像素化光刻掩模的修改

    公开(公告)号:US07325223B2

    公开(公告)日:2008-01-29

    申请号:US11096613

    申请日:2005-03-31

    IPC分类号: G06F17/50

    CPC分类号: G03F1/36

    摘要: Faster synthesis of photolithography mask modifications is described. In one embodiment, the invention includes synthesizing a first binary photolithography mask, developing perturbations to an estimated electric field generated by the first mask in use, and synthesizing a second binary photolithography mask by applying the perturbations to the first mask.

    摘要翻译: 描述了更快的光刻掩模修改的合成。 在一个实施例中,本发明包括合成第一二进制光刻掩模,对使用中由第一掩模产生的估计电场产生扰动,以及通过将扰动应用于第一掩模来合成第二二进制光刻掩模。

    Communication circuit and method for selecting a reference link
    84.
    发明申请
    Communication circuit and method for selecting a reference link 有权
    用于选择参考链路的通信电路和方法

    公开(公告)号:US20050079823A1

    公开(公告)日:2005-04-14

    申请号:US10683627

    申请日:2003-10-10

    摘要: A communication circuit (10) and method updates an active link set list (50) in an asynchronous wireless communication system. In one embodiment, the communication circuit (10) may be a wireless device (600) or any other suitable communication device. The communication circuit (10) includes candidate reference link determination circuitry (30) to receive an active link set update message (60) and in response, to create the candidate list of reference links (20) from the active link set list (50). The candidate reference link determination circuitry (30) creates the candidate list of reference links based on, for example, an indication in the received active link set update message (60) to retain links from the active link set list (50).

    摘要翻译: 通信电路(10)和方法更新异步无线通信系统中的主动链路集列表(50)。 在一个实施例中,通信电路(10)可以是无线设备(600)或任何其它合适的通信设备。 通信电路(10)包括用于接收活动链路组更新消息(60)的候选参考链路确定电路(30),并且响应于从主动链路集列表(50)创建参考链路(20)的候选列表, 。 候选参考链路确定电路(30)基于例如接收到的活动链路集更新消息(60)中的指示来保留来自活动链路集列表(50)的链路来创建参考链路的候选列表。

    Chemical-mechanical planarization composition having PVNO and associated method for use
    85.
    发明申请
    Chemical-mechanical planarization composition having PVNO and associated method for use 审中-公开
    具有PVNO的化学机械平面化组合物及其相关使用方法

    公开(公告)号:US20050079803A1

    公开(公告)日:2005-04-14

    申请号:US10683231

    申请日:2003-10-10

    摘要: A composition and associated method for chemical mechanical planarization (or other polishing) are described. The composition comprises an abrasive and a polyvinylpyridine-N-oxide polymer. The composition possesses high selectivities for metal and barrier material removal in metal CMP. The composition may further comprise an oxidizing agent in which case the composition is particularly useful in conjunction with the associated method for metal CMP applications (e.g., copper CMP).

    摘要翻译: 描述了用于化学机械平面化(或其它抛光)的组合物和相关方法。 组合物包含研磨剂和聚乙烯基吡啶-N-氧化物聚合物。 该组合物在金属CMP中具有很高的金属选择性和阻隔材料去除性。 组合物还可以包含氧化剂,在这种情况下,组合物特别适用于金属CMP应用的相关方法(例如,铜CMP)。

    Chemical-mechanical planarization composition with nitrogen containing polymer and method for use
    86.
    发明申请
    Chemical-mechanical planarization composition with nitrogen containing polymer and method for use 有权
    含氮聚合物的化学机械平面化组合物及其使用方法

    公开(公告)号:US20050079718A1

    公开(公告)日:2005-04-14

    申请号:US10683258

    申请日:2003-10-10

    摘要: A composition and associated method for chemical mechanical planarization (or other polishing) are described. The composition comprises an organometallic-modified colloidal abrasive and a nitrogen-containing polymer compound (e.g., a polyalkyleneimine, such as polyamidopolyethyleneimine). The composition possesses both high stability towards gelling and/or solids formation and high selectivity for metal removal in metal CMP. The composition may further comprise an oxidizing agent in which case the composition is particularly useful in conjunction with the associated method for metal CMP applications (e.g., copper CMP).

    摘要翻译: 描述了用于化学机械平面化(或其它抛光)的组合物和相关方法。 该组合物包含有机金属改性的胶体磨料和含氮高分子化合物(例如,聚亚烷基亚胺,如聚酰胺聚乙烯亚胺)。 该组合物具有对胶凝和/或固体形成的高稳定性以及金属CMP中金属去除的高选择性。 组合物还可以包含氧化剂,在这种情况下,组合物特别适用于金属CMP应用的相关方法(例如,铜CMP)。

    Detection apparatus
    90.
    发明授权
    Detection apparatus 有权
    检测装置

    公开(公告)号:US09037342B2

    公开(公告)日:2015-05-19

    申请号:US12428191

    申请日:2009-04-22

    IPC分类号: G01V5/00

    CPC分类号: G01V5/0008

    摘要: A detection apparatus comprises a freely-movable integral framework provided with front wheels and rear wheels, characterized in that, a control portion and a scan portion, and a driving mechanism driving said framework to move are provided on said framework, wherein said framework is provided with a first interface for connecting to external power, so that said detection apparatus is driven by external power via the driving mechanism to perform detection while conducting detection on site, and wherein the semitrailer for mounting the framework is provided with a second interface connectable to a traction apparatus so as to connect the detection apparatus and the traction apparatus while carrying out site-changing transportation. Said detection apparatus is not affected by the alteration of the emission standards, has low failure rate and maintenance cost, has zero emission in the detection state, and is pollution-free.

    摘要翻译: 检测装置包括设置有前轮和后轮的可自由移动的整体框架,其特征在于,在所述框架上设置有控制部分和扫描部分以及驱动所述框架移动的驱动机构,其中提供所述框架 具有用于连接到外部电力的第一接口,使得所述检测装置经由驱动机构由外部电力驱动,以在现场进行检测时执行检测,并且其中用于安装框架的半挂车设置有可连接到 牵引装置,以便在进行现场改变运输时连接检测装置和牵引装置。 所述检测装置不受排放标准变更的影响,故障率低,维护成本低,检测状态为零排放,无污染。