公开(公告)号：US20120061582A1

公开(公告)日：2012-03-15

申请号：US13119594

申请日：2010-09-09

申请人： Takaaki Iwata

发明人： Takaaki Iwata

IPC分类号： H01J3/26

CPC分类号： A61N5/1068 ,  A61N5/1049 ,  A61N5/1064 ,  A61N5/1077 ,  A61N5/1079 ,  A61N2005/1087 ,  G06F19/00 ,  G16H40/20

摘要： There are provided with a respiration induction apparatus that induces respiration, based on a desired respiration waveform; a switching device that switches the orbit of a particle beam; and an irradiation apparatus that controls irradiation, in synchronization with the desired respiration waveform. A controller, which performs synchronization control of the switching device and the respiration induction apparatuses in a plurality of treatment rooms, adjusts the periods and the phases of the desired respiration waveforms of the respiration induction apparatuses in the treatment rooms so that the irradiation times synchronized with the desired respiration waveforms in the treatment rooms do not overlap with one another, and controls the switching device so as to switch the orbits of the particle beam, in accordance with the respective irradiation times of the treatment rooms.

摘要翻译： 提供了一种呼吸诱导装置，其基于期望的呼吸波形诱导呼吸; 切换装置，其切换粒子束的轨道; 以及与期望的呼吸波形同步地控制照射的照射装置。 执行多个处理室中的开关装置和呼吸感应装置的同步控制的控制器调整治疗室中的呼吸感应装置的期望呼吸波形的期间和相位，使得照射时间与 治疗室中期望的呼吸波形不彼此重叠，并且根据治疗室的相应照射时间来控制开关装置以便切换粒子束的轨道。

公开(公告)号：US20120056100A1

公开(公告)日：2012-03-08

申请号：US13298152

申请日：2011-11-16

申请人： Jerry Peijster ,  Guido de Boer

发明人： Jerry Peijster ,  Guido de Boer

IPC分类号： H01J3/26

CPC分类号： H01J37/20 ,  H01J37/3002 ,  H01J37/3174 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/20264 ,  H01J2237/20278 ,  H01J2237/20292 ,  H01J2237/3175

摘要： The invention relates to a charged particle beam lithography system comprising:a charged particle optical column arranged in a vacuum chamber for projecting a charged particle beam onto a target, wherein the column comprises deflecting means for deflecting the charged particle beam in a deflection direction,a target positioning device comprising a carrier for carrying the target, and a stage for carrying and moving the carrier along a first direction, wherein the first direction is different from the deflection direction, wherein the target positioning device comprises a first actuator for moving the stage in the first direction relative to the charged particle optical column,wherein the carrier is displaceably arranged on the stage and wherein the target positioning device comprises retaining means for retaining the carrier with respect to the stage in a first relative position.

摘要翻译： 本发明涉及一种带电粒子束光刻系统，包括：带电粒子光学柱，布置在真空室中，用于将带电粒子束投射到靶上，其中该柱包括偏转装置，用于偏转带电粒子束的偏转方向， 目标定位装置，包括用于承载目标的载体，以及用于沿着第一方向承载和移动载体的载物台，其中所述第一方向不同于所述偏转方向，其中所述目标定位装置包括用于使所述载物台移动的第一致动器 相对于带电粒子光学柱的第一方向，其中所述载体可位移地布置在所述载物台上，并且其中所述目标定位装置包括用于将所述载体相对于所述载物台保持在第一相对位置的保持装置。

公开(公告)号：US08076649B2

公开(公告)日：2011-12-13

申请号：US12716453

申请日：2010-03-03

申请人： Michihiro Sakai ,  Ryoichi Kakehi ,  Kiyoshi Hattori

发明人： Michihiro Sakai ,  Ryoichi Kakehi ,  Kiyoshi Hattori

IPC分类号： H01J37/30 ,  H01J3/26 ,  H01J37/147

CPC分类号： H01J37/1471 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1474 ,  H01J37/3045 ,  H01J37/317 ,  H01J37/3174 ,  H01J2237/1501 ,  H01J2237/24405

摘要： A charged particle beam writing apparatus includes a stage on which a target object is placed; an emitting unit configured to emit a charged particle beam to the stage side; a blocking unit arranged between the emitting unit and the stage and configured to block the charged particle beam emitted; a deflector having electrodes through which a current flows by applying a voltage and configured to deflect the charged particle beam passing between the electrodes onto the blocking unit by applying a predetermined voltage across the electrodes; an optical axis adjusting unit configured to correct optical axis deviation of the charged particle beam generated by continuously repeating irradiation (beam-ON) of the charged particle beam on a target object and blocking (beam-OFF) of the beam by applying a two-step voltage to the deflector; and a control unit configured to control the optical axis adjusting unit such that an amount of the optical axis deviation is corrected.

摘要翻译： 带电粒子束写入装置包括放置目标物体的台阶; 发射单元，被配置为向舞台侧发射带电粒子束; 布置在所述发射单元和所述台之间并且被配置为阻挡所发射的带电粒子束的阻挡单元; 具有电极的偏转器，电流通过施加电压流动，并且被配置为通过在电极两端施加预定电压来将通过电极的带电粒子束偏转到阻挡单元上; 光轴调整单元，被配置为校正通过将目标物体上的带电粒子束的连续重复照射（束ON）产生的带电粒子束的光轴偏差和通过施加二维图像来阻挡（束切断） 偏转器的阶梯电压; 以及控制单元，被配置为控制光轴调节单元，使得校正光轴偏差的量。

公开(公告)号：US08071955B2

公开(公告)日：2011-12-06

申请号：US12600266

申请日：2008-05-15

申请人： Ho Seob Kim ,  Young Chul Kim

发明人： Ho Seob Kim ,  Young Chul Kim

IPC分类号： H01J3/26 ,  H01J37/14 ,  H01J37/147

CPC分类号： H01J37/147 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1205 ,  H01J2237/152 ,  H01J2237/1532

摘要： The present invention relates, in general, to a deflector for microcolumns for generating electron beams, and, more particularly, to a deflector capable of scanning or shifting electron beams or functioning as a stigmator using a magnetic field. The deflector (100) according to the present invention includes one or more deflector electrodes. Each of the deflector electrodes includes a core (12) made of a conductor or a semiconductor, and a coil (11) wound around the core (12).

摘要翻译： 本发明一般涉及用于产生电子束的微柱偏转器，更具体地，涉及一种能够扫描或移动电子束或用作使用磁场的标称器的偏转器。 根据本发明的偏转器（100）包括一个或多个偏转器电极。 每个偏转器电极包括由导体或半导体制成的芯体（12）和缠绕在芯部（12）上的线圈（11）。

公开(公告)号：US20110278448A1

公开(公告)日：2011-11-17

申请号：US13107609

申请日：2011-05-13

申请人： Erik Syrstad

发明人： Erik Syrstad

IPC分类号： H01J49/00 ,  H01J3/26

CPC分类号： H01J49/22 ,  H01J49/486

摘要： Devices, systems, and methods for dispersive energy imaging are disclosed. The full three-dimensional velocity distribution function of a flowing particle stream may be measured and properties of the particle stream characterized. In some devices, an aperture system controls the entry of a stream of particles into the sensor where an electrostatic deflector separates the stream of particles into different species, and a detector system senses the separated species.

摘要翻译： 公开了用于分散能量成像的装置，系统和方法。 可以测量流动颗粒流的完整三维速度分布函数，并表征粒子流的性质。 在一些装置中，孔径系统控制颗粒物流进入传感器，其中静电偏转器将颗粒流分离成不同的物种，并且检测器系统感测分离的物种。

公开(公告)号：US08058631B2

公开(公告)日：2011-11-15

申请号：US12637272

申请日：2009-12-14

申请人： Masahiko Niwayama ,  Kenji Yoneda

发明人： Masahiko Niwayama ,  Kenji Yoneda

IPC分类号： G01K1/08 ,  H01J3/26

CPC分类号： H01J37/3171 ,  H01J37/026 ,  H01J37/304 ,  H01J2237/24535 ,  H01J2237/30472 ,  H01L21/28035

摘要： A semiconductor manufacturing includes: an ion source and a beam line for introducing an ion beam into a target film which is formed over a wafer with an insulating film interposed therebetween; a flood gun for supplying the target film with electrons for neutralizing charges contained in the ion beam; a rotating disk for subjecting the target film to mechanical scanning of the ion beam in two directions composed of r-θ directions; a rear Faraday cage for measuring the current density produced by the ion beam; a disk-rotational-speed controller and a disk-scanning-speed controller for changing the scanning speed of the target film; and a beam current/current density measuring instrument for controlling, according to the current density, the scanning speed of the target film.

摘要翻译： 半导体制造包括：离子源和用于将离子束引入到晶片之间的绝缘膜之间形成的靶膜的离子束; 用于向目标膜提供用于中和离子束中的电荷的电子的洪水枪; 旋转盘，用于对目标膜进行离子束的机械扫描，所述两个方向由r-和tt组成; 方向; 用于测量由离子束产生的电流密度的后法拉第笼; 盘转速控制器和用于改变目标膜的扫描速度的盘扫描速度控制器; 以及用于根据电流密度控制目标膜的扫描速度的束电流/电流密度测量仪器。

公开(公告)号：US08030620B2

公开(公告)日：2011-10-04

申请号：US12435545

申请日：2009-05-05

申请人： Vincent M. Donnelly ,  Demetre J. Economou ,  Paul Ruchhoeft ,  Lin Xu ,  Sri Charan Vemula ,  Manish Kumar Jain

发明人： Vincent M. Donnelly ,  Demetre J. Economou ,  Paul Ruchhoeft ,  Lin Xu ,  Sri Charan Vemula ,  Manish Kumar Jain

IPC分类号： H01J3/26 ,  G21K1/08

CPC分类号： B29D11/00365 ,  B82Y30/00

摘要： A method is provided for creating a plurality of substantially uniform nano-scale features in a substantially parallel manner in which an array of micro-lenses is positioned on a surface of a substrate, where each micro-lens includes a hole such that the bottom of the hole corresponds to a portion of the surface of the substrate. A flux of charged particles, e.g., a beam of positive ions of a selected element, is applied to the micro-lens array. The flux of charged particles is focused at selected focal points on the substrate surface at the bottoms of the holes of the micro-lens array. The substrate is tilted at one or more selected angles to displace the locations of the focal points across the substrate surface. By depositing material or etching the surface of the substrate, several substantially uniform nanometer sized features may be rapidly created in each hole on the surface of the substrate in a substantially parallel manner.

摘要翻译： 提供了一种用于以基本上平行的方式产生多个基本均匀的纳米尺度特征的方法，其中微透镜阵列位于基底的表面上，其中每个微透镜包括孔，使得底部 孔对应于基板表面的一部分。 带电粒子的通量，例如所选元素的正离子束，被施加到微透镜阵列。 带电粒子的通量被聚焦在微透镜阵列的孔的底部的基底表面上的选定的焦点处。 衬底以一个或多个选定的角度倾斜，以便将焦点的位置移动穿过衬底表面。 通过沉积材料或蚀刻衬底的表面，可以以基本上平行的方式在衬底表面上的每个孔中快速产生几个基本均匀的纳米尺寸的特征。

公开(公告)号：US20110204224A1

公开(公告)日：2011-08-25

申请号：US13066932

申请日：2011-04-28

申请人： Akio Yamada ,  Takayuki Yabe

发明人： Akio Yamada ,  Takayuki Yabe

IPC分类号： H01J3/26 ,  H01J37/29

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3023 ,  H01J37/3177 ,  H01J2237/15 ,  H01J2237/30461 ,  H01J2237/30472

摘要： A multi-column electron beam lithography apparatus includes multiple columns, each including a mask having several aperture patterns; a selective deflector to deflect an electron beam to select an aperture pattern; a bending back deflector to bend the beam passed through the pattern back to the column optical axis; and an electron beam trajectory adjustment unit to adjust deflection efficiencies of the deflectors without the mask installed to allow the beam deflected toward any positions in a deflection region to be bent back and applied to the same position on a sample, and to adjust the deflection efficiency of the selective deflector with the mask installed to allow the beam to be deflected toward any pattern of the mask, while maintaining a relationship between the deflection efficiencies.

摘要翻译： 多列电子束光刻设备包括多个列，每个列包括具有若干孔径图案的掩模; 用于偏转电子束以选择孔径图案的选择性偏转器; 弯曲的反向偏转器，用于将通过图案的光束弯曲回列光轴; 以及电子束轨迹调整单元，用于调节偏转器的偏转效率，而不设置掩模，以允许偏转到偏转区域中的任何位置的光束被弯曲并施加到样本上的相同位置，并且调整偏转效率 的选择性偏转器，其中安装有掩模以允许光束朝向掩模的任何图案偏转，同时保持偏转效率之间的关系。

公开(公告)号：US07880147B2

公开(公告)日：2011-02-01

申请号：US12019308

申请日：2008-01-24

申请人： Peter J. Morrisroe ,  Joseph L. DeCesare

发明人： Peter J. Morrisroe ,  Joseph L. DeCesare

IPC分类号： H01J3/14 ,  H01J3/26 ,  H01J49/42 ,  H01J1/50 ,  G21K1/08 ,  H01J49/00 ,  B01D59/44

CPC分类号： H01J49/067

摘要： Novel components reduce background noise caused by secondary ions generated by metastable entity bombardment in a mass spectrometric system. Layered structures for exit electrodes and deflector plates confine secondary ions in a local low-energy well, preventing them from entering the detector.

摘要翻译： 新型组分降低了质谱系统中由亚稳态实体轰击产生的二次离子引起的背景噪声。 出口电极和偏转板的分层结构将二次离子限制在局部低能井中，防止其进入检测器。

公开(公告)号：US07868301B2

公开(公告)日：2011-01-11

申请号：US12249531

申请日：2008-10-10

申请人： Dirk Diehl

发明人： Dirk Diehl

IPC分类号： G01K1/08 ,  H01J3/14 ,  H01J3/26

CPC分类号： G21K1/087 ,  A61N5/1043 ,  A61N2005/1087 ,  G21K1/093 ,  H05H7/04

摘要： A device for deflecting a beam of electrically charged particles onto a curved particle path is provided. The device includes at least one beam guidance magnet having a coil system which has at least one coil that is curved along the particle path for the purpose of deflecting the beam onto a curved particle path, and at least one scanner magnet for variably deflecting the beam in a y,z plane at right angles to the particle path, characterized in that the device has at least one correction system which is embodied to influence the particle path in a regulated or controlled manner with the aid of electric and/or magnetic fields as a function of the position of the beam in the y,z plane. The invention also relates to a corresponding method for deflecting a beam of electrically charged particles onto a curved particle path.

摘要翻译： 提供了一种用于将带电粒子束偏转到弯曲粒子路径上的装置。 该装置包括至少一个光束引导磁体，其具有线圈系统，该线圈系统具有沿着粒子路径弯曲的至少一个线圈，用于将光束偏转到弯曲的粒子路径上，以及至少一个扫描器磁体，用于可变地偏转光束 其特征在于，所述装置具有至少一个校正系统，其被实施为借助于电场和/或磁场作为调节或控制的方式以调节或受控的方式影响所述粒子路径 光束在y，z平面上的位置的功能。 本发明还涉及用于将带电粒子的束偏转到弯曲的粒子路径上的相应方法。