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    Composite focused ion beam device, and processing observation method and processing method using the same
    1.
    发明授权
    Composite focused ion beam device, and processing observation method and processing method using the same 有权
    复合聚焦离子束装置及其加工方法及处理方法

    公开(公告)号：US08269194B2

    公开(公告)日：2012-09-18

    申请号：US12733089

    申请日：2008-08-06

    申请人： Takashi Kaito ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

    发明人： Takashi Kaito ,  Junichi Tashiro ,  Yasuhiko Sugiyama ,  Kouji Iwasaki ,  Toshiaki Fujii ,  Kazuo Aita ,  Takashi Ogawa

    IPC分类号： H01J49/00

    CPC分类号： H01J37/3056 ,  G01N1/286 ,  G01N1/32 ,  G03F1/74 ,  G03F1/84 ,  H01J37/08 ,  H01J37/3005 ,  H01J2237/0805 ,  H01J2237/0807 ,  H01J2237/31745

    摘要： A composite focused ion beam device has a sample stage for supporting a sample, a first ion beam irradiation system that irradiates a first ion beam for processing the sample, and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a liquid metal ion source that generates first ions for forming the first ion beam. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. The first ion beam irradiated by the first ion beam irradiation system has a first beam diameter and the second ion beam irradiated by the second ion beam irradiation system has a second beam diameter smaller than the first beam diameter. The first and second ion beam irradiation systems are disposed relative to the sample stage so that axes of the first and second ion beams are orthogonal to a tilt axis of the sample stage.

    摘要翻译： 复合聚焦离子束装置具有用于支撑样品的样品台，照射用于处理样品的第一离子束的第一离子束照射系统和照射第二离子束以用于处理或观察样品的第二离子束照射系统 样品。 第一离子束照射系统具有产生用于形成第一离子束的第一离子的液态金属离子源。 第二离子束照射系统具有产生用于形成第二离子束的第二离子的气体场离子源。 由第一离子束照射系统照射的第一离子束具有第一光束直径，并且由第二离子束照射系统照射的第二离子束具有小于第一光束直径的第二光束直径。 第一和第二离子束照射系统相对于样品台设置，使得第一和第二离子束的轴线垂直于样品台的倾斜轴。

    Electron microscope and specimen analyzing method
    9.
    发明授权
    Electron microscope and specimen analyzing method 有权
    电子显微镜和样品分析方法

    公开(公告)号：US08664598B2

    公开(公告)日：2014-03-04

    申请号：US12931411

    申请日：2011-01-28

    申请人： Masakatsu Hasuda ,  Atsushi Uemoto ,  Toshiaki Fujii ,  Junichi Tashiro

    发明人： Masakatsu Hasuda ,  Atsushi Uemoto ,  Toshiaki Fujii ,  Junichi Tashiro

    IPC分类号： H01J37/29

    CPC分类号： G01N23/225 ,  H01J37/28

    摘要： An electron microscope has a focused ion beam column positioned relative to an electron beam column so that the focused ion beam substantially perpendicularly intersects the electron beam. A backscattered electron detector is positioned relative to the focused ion beam column so that the direction normal to a detection plane of the backscattered electron detector is substantially perpendicular to the direction of the focused ion beam. The backscattered electron detector is configured and positioned to detect backscattered electrons released in a spread of at least about 70 degrees in width from the surface of the section by irradiation of the section with the electron beam 1a.

    摘要翻译： 电子显微镜具有相对于电子束柱定位的聚焦离子束柱，使得聚焦离子束基本上垂直于电子束相交。 反向散射电子检测器相对于聚焦离子束柱定位，使得垂直于后向散射电子检测器的检测平面的方向基本上垂直于聚焦离子束的方向。 背散射电子检测器被配置和定位成通过照射具有电子束1a的部分来检测从该部分的表面以宽度至少约70度的扩散中释放的反向散射电子。