公开(公告)号：US5174853A

公开(公告)日：1992-12-29

申请号：US750457

申请日：1991-08-27

申请人： Yasuhide Yamaguchi ,  Yukio Nobe ,  Akiko Sugimoto

发明人： Yasuhide Yamaguchi ,  Yukio Nobe ,  Akiko Sugimoto

IPC分类号： C30B29/34 ,  C30B15/00 ,  H01S3/16

CPC分类号： H01S3/16 ,  C30B15/00 ,  C30B29/34 ,  H01S3/1623 ,  H01S3/1658

摘要： In a method for manufacturing forsterite single crystals containing tetravalent chromium as luminescent ions, the method which comprises the use of chromium dioxide or comprises the use of a sintered body obtained either by sintering in a non-reducing atmosphere chromium trioxide or a mixture of at least 30 wt. % of chromium trioxide with up to 70 wt. % of dichromium trioxide, together with other oxide materials for forsterite, or by firing in an oxidizing atmosphere a mixture of more than 70 wt. % of dichromium trioxide with less than 30 wt. % of chromium trioxide, together with other oxide materials for forsterite. This invention also relates to forsterite single crystals obtained by each of the above methods.

公开(公告)号：US20130012102A1

公开(公告)日：2013-01-10

申请号：US13634939

申请日：2010-11-22

申请人： Yasuhide Yamaguchi ,  Mikimasa Horiuchi

发明人： Yasuhide Yamaguchi ,  Mikimasa Horiuchi

IPC分类号： C09K3/14 ,  B24B37/00

CPC分类号： C09K3/1463 ,  B24B37/044 ,  C09G1/02 ,  H01L21/02024 ,  H01L29/1608

摘要： The present invention provides a polishing technique which enables polishing of silicon carbide, which is difficult to be polished, with high efficiency and high surface accuracy. The present invention relates to a polishing slurry for polishing a substrate, which comprises abrasive particles containing manganese oxide as a main component and in which the content of the abrasive particles is less than 10% by weight based on the polishing slurry. The polishing slurry of the present invention has a pH of preferably 7 or more. It is particularly preferable to use manganese dioxide as abrasive particles. The polishing slurry of the present invention is suitable for a substrate of silicon carbide.

摘要翻译： 本发明提供了一种抛光技术，其能够以高效率和高表面精度抛光难以抛光的碳化硅。 本发明涉及一种用于抛光基材的抛光浆料，其包含含有氧化锰作为主要成分的磨料颗粒，其中磨料颗粒的含量基于抛光浆料小于10重量％。 本发明的研磨浆料的pH优选为7以上。 特别优选使用二氧化锰作为磨粒。 本发明的研磨浆料适用于碳化硅基材。

公开(公告)号：US20120240479A1

公开(公告)日：2012-09-27

申请号：US13514683

申请日：2010-11-18

申请人： Toshiro Doi ,  Syuhei Kurokawa ,  Osamu Ohnishi ,  Tadashi Hasegawa ,  Yasuhiro Kawase ,  Yasuhide Yamaguchi

发明人： Toshiro Doi ,  Syuhei Kurokawa ,  Osamu Ohnishi ,  Tadashi Hasegawa ,  Yasuhiro Kawase ,  Yasuhide Yamaguchi

IPC分类号： C09K3/14 ,  H01L21/304

CPC分类号： C09K3/1463 ,  B24B37/044 ,  C09G1/02 ,  H01L21/02024 ,  H01L29/1608

摘要： The present invention provides an abrasive treatment technique capable of planarizing at an extremely high rate silicon carbide, which is thermally and chemically extremely stable and for which it is extremely difficult to efficiently perform an abrasive treatment. The present invention is a polishing slurry for silicon carbide wherein the polishing slurry includes a suspension liquid in which the pH thereof is 6.5 or more and manganese dioxide particles are suspended. The polishing slurry for silicon carbide is preferably a suspension in which manganese dioxide particles are suspended in an aqueous solution allowed to have a redox potential falling in a range enabling manganese to be present as manganese dioxide. The redox potential V of the polishing slurry preferably falls within the range specified by the following formula representing a relation between V and pH, pH being a variable: 1.014−0.591 pH≦V≦1.620−0.0743 pH

摘要翻译： 本发明提供一种能够以极高速率碳化硅平坦化的磨料处理技术，该碳化硅在热和化学上极其稳定，极难有效地进行研磨处理。 本发明是一种用于碳化硅的抛光浆料，其中抛光浆料包括其pH为6.5以上的悬浮液和二氧化锰颗粒悬浮。 用于碳化硅的抛光浆料优选是其中二氧化锰颗粒悬浮在允许氧化还原电位落在使锰以二氧化锰存在的范围内的水溶液中的悬浮液。 抛光浆料的氧化还原电位V优选落在由下式表示的范围内，表示V和pH之间的关系，pH是可变的：1.014-0.591 pH＆NlE; V＆lt; IL; 1.620-0.0743 pH

公开(公告)号：US06939390B2

公开(公告)日：2005-09-06

申请号：US10609566

申请日：2003-07-01

申请人： Yoshiharu Toshima ,  Takao Hayashi ,  Yasuhide Yamaguchi ,  Hiroyuki Shimamura

发明人： Yoshiharu Toshima ,  Takao Hayashi ,  Yasuhide Yamaguchi ,  Hiroyuki Shimamura

IPC分类号： B22F9/24 ,  B22F1/00 ,  B22F1/02 ,  H01B1/00 ,  H01B1/02 ,  H01B1/22 ,  H01G4/008

CPC分类号： H01G4/0085 ,  H01B1/02 ,  H01B1/22 ,  Y10T428/29 ,  Y10T428/2982 ,  Y10T428/2991

摘要： Nickel powder includes, on the basis of the total number of particles, not less than 10% of particles whose particle size is not less than 1.2 times the average particle size, as determined by the SEM observation; and not less than 10% of particles whose particle size is not more than 0.8 times the average particle size, as determined by the SEM observation. The nickel powder can be prepared by, for instance, precipitating nickel particles from an aqueous solution containing a nickel salt and a hydrazine reducing agent, without forming any hydroxide of nickel as an intermediate. A conductive paste containing the nickel powder can be applied onto an internal or external electrode for electronic parts.

摘要翻译： 根据SEM观察，镍粉末基于粒子总数不少于粒径不小于平均粒径的1.2倍的粒子的10％; 和通过SEM观察确定的粒径不大于平均粒径的0.8倍的粒子的不少于10％。 镍粉可以通过例如从包含镍盐和肼还原剂的水溶液中沉淀镍颗粒而不形成任何镍的氢氧化物作为中间体来制备。 可以将含有镍粉末的导电膏施加到用于电子部件的内部或外部电极上。

公开(公告)号：US06312622B1

公开(公告)日：2001-11-06

申请号：US09699449

申请日：2000-10-31

申请人： Yoshiharu Toshima ,  Takayuki Araki ,  Yasuhide Yamaguchi

发明人： Yoshiharu Toshima ,  Takayuki Araki ,  Yasuhide Yamaguchi

IPC分类号： H01B102

CPC分类号： H01G4/0085 ,  B22F1/02 ,  H01B1/02 ,  Y10T428/2991

摘要： Composite nickel fine powder comprises metal nickel fine particles, at least one member attached to the surface of the fine particles and selected from the group consisting of oxides and double oxides containing at least one metal element selected from the group consisting of the Groups 2 to 14 of the Periodic Table and whose atomic number falls within the range of from 12 to 82, and a saturated or unsaturated fatty acid supported on the surface of the nickel fine particles provided thereon with the oxide and/or double oxide attached thereto. The composite nickel fine powder is excellent in resistance to heat shrinkage, has a high tap density, and has characteristic properties suitable for use as a material for making a conductive paste.

摘要翻译： 复合镍微粉末包含金属镍微粒，至少一个与微粒表面相连并且选自氧化物和二氧化物的组分，所述氧化物和双氧化物含有至少一种选自第2组至第14组的金属元素 的元素，其原子序数在12〜82的范围内，饱和或不饱和的脂肪酸负载在其上附着有氧化物和/或双氧化物的镍微粒表面上。 复合镍微粉末的耐热收缩性优异，具有高的振实密度，并且具有适用于制造导电浆料的特性。

公开(公告)号：US4765925A

公开(公告)日：1988-08-23

申请号：US26213

申请日：1987-03-16

申请人： Yutaka Anzai ,  Kiyoshi Yamagishi ,  Yasuhide Yamaguchi ,  Kazuo Moriya

发明人： Yutaka Anzai ,  Kiyoshi Yamagishi ,  Yasuhide Yamaguchi ,  Kazuo Moriya

IPC分类号： C30B13/00 ,  C30B15/00 ,  C30B29/22 ,  H01S3/16 ,  C30B29/00 ,  C04B35/08 ,  C04B35/44 ,  C09K11/08

CPC分类号： C30B29/22 ,  C30B13/00 ,  C30B15/00 ,  H01S3/16 ,  H01S3/1625 ,  H01S3/1633

摘要： A chrysoberyl solid laser host which comprises a chrysoberyl matrix doped with trivalent titanium ions for luminescence is described. This host ensures a lasing operation over a wide wavelength range and is highly producible and high in quality.

摘要翻译： 描述了一种包含掺杂有三价钛离子用于发光的chrysoberyl基体的金相固体激光器主体。 该主机可确保在宽波长范围内的激光工作，并具有高度可生产性和高质量。

公开(公告)号：US20120240478A1

公开(公告)日：2012-09-27

申请号：US13513917

申请日：2010-09-30

申请人： Mikimasa Horiuchi ,  Ryutaro Kuroda ,  Yasuhide Yamaguchi

发明人： Mikimasa Horiuchi ,  Ryutaro Kuroda ,  Yasuhide Yamaguchi

IPC分类号： C09K3/14

CPC分类号： B24B37/044 ,  C09G1/02 ,  C09K3/1409

摘要： The present invention provides an abrasive material capable of polishing difficult-to-polish silicon carbide at a high degree of surface precision. The present invention relates to an abrasive material including manganese dioxide particles having a non-needle-like shape possessing a ratio of the longitudinal axis to the transverse axis of the particles observed with a scanning electron microscope of 3.0 or less. The abrasive material is preferable if the average particle size DSEM of the longitudinal axis of the observed particles is 1.0 μm or less, and if the particle size D50 of the volume-based cumulative fraction of 50% in laser diffraction/scattering particle size distribution measurement is 2.0 μm or less.

摘要翻译： 本发明提供能够以高的表面精度抛光难以抛光的碳化硅的研磨材料。 本发明涉及一种研磨材料，其包含具有3.0以下扫描电子显微镜观察到的粒子的纵轴与横轴的比例的非针状的二氧化锰粒子。 如果观察粒子的纵轴的平均粒径DSEM为1.0μm以下，则优选研磨材料，如果在激光衍射/散射粒度分布测定中体积累积分数为50％的粒径D50 为2.0μm以下。

公开(公告)号：US06475949B1

公开(公告)日：2002-11-05

申请号：US09460373

申请日：1999-12-13

申请人： Yasuhide Yamaguchi ,  Masatoshi Yamazaki

发明人： Yasuhide Yamaguchi ,  Masatoshi Yamazaki

IPC分类号： B01J2300

CPC分类号： B01D53/945 ,  B01J21/04 ,  B01J23/10 ,  B01J23/63 ,  B01J35/023 ,  B01J37/0242 ,  B01J37/03 ,  Y02T10/22

摘要： The promoter includes (A) particulate aluminum oxide and (B) a double oxide of (i) cerium and (ii) at least one member selected from the group consisting of zirconium, yttrium, strontium, barium and rare earth elements, supported on the particulate aluminum oxide. A solution of (i) a water-soluble salt of cerium and (ii) a water-soluble salt of at least one member selected from the group consisting of zirconium, yttrium, strontium, barium and rare earth elements is formed. Particulate aluminum oxide is added to the solution to form a dispersion. An aqueous solution of ammonium hydrogen carbonate is added to the dispersion to obtain particulate aluminum oxide coated with a reaction product. The particulate aluminum oxide coated with the reaction product is fired. Alternatively, an aqueous solution containing (i) the water-soluble salt of cerium and (ii) the water-soluble salt of the at least one member dissolved therein is adhered onto particulate aluminum oxide. The particulate aluminum oxide provided thereon with the aqueous solution adhered thereto is brought into contact with an aqueous solution of ammonium hydrogen carbonate to cause a reaction between these solutions and to thus deposit a reaction product on the particulate aluminum oxide. The particulate aluminum oxide with the reaction product deposit is fired.

摘要翻译： 促进剂包括（A）颗粒状氧化铝和（B）（i）铈的双氧化物和（ii）选自锆，钇，锶，钡和稀土元素中的至少一种，负载在 颗粒状氧化铝。 形成（i）铈的水溶性盐和（ii）选自锆，钇，锶，钡和稀土元素中的至少一种的水溶性盐的溶液。 将颗粒状氧化铝加入到溶液中以形成分散体。 向分散体中加入碳酸氢铵水溶液，得到涂覆有反应产物的颗粒状氧化铝。 涂覆有反应产物的颗粒状氧化铝被烧制。 或者，将含有（i）铈的水溶性盐和（ii）溶解在其中的至少一种的水溶性盐的水溶液粘附到颗粒状氧化铝上。 与其上附着有水溶液的颗粒状氧化铝与碳酸氢铵的水溶液接触，引起这些溶液之间的反应，从而将反应产物沉积在颗粒状氧化铝上。 将具有反应产物沉积物的颗粒状氧化铝烧制。

公开(公告)号：US06406513B2

公开(公告)日：2002-06-18

申请号：US09773908

申请日：2001-02-02

申请人： Yasuhide Yamaguchi ,  Takao Hayashi

发明人： Yasuhide Yamaguchi ,  Takao Hayashi

IPC分类号： B22F100

CPC分类号： H01G4/0085 ,  B22F1/0007 ,  B22F1/0044 ,  B22F9/24

摘要： Nickel powder herein disclosed has an average particle size, as determined by the observation with SEM, of not more than 1 &mgr;m, a particle density of not less than 8.0 g/cm3, and an average diameter of crystallites present in the nickel particles of not more than 550 Å. Moreover, a conductive paste for a multilayer ceramic capacitor comprises the foregoing nickel powder. The nickel powder and the conductive paste containing the same can control heat shrinkage while inhibiting any rapid oxidation and permit the production of a thin, uniform internal electrode for a multilayer ceramic capacitor without being accompanied by any crack formation and delamination during firing.

摘要翻译： 本文公开的镍粉具有通过SEM观察确定的不超过1μm的平均粒度，不小于8.0g / cm 3的颗粒密度和不存在于镍颗粒中的微晶的平均直径 超过550Å。 此外，用于多层陶瓷电容器的导电浆料包括上述镍粉末。 镍粉末和含有它们的导电糊剂可以控制热收缩同时抑制任何快速氧化，并允许生产用于多层陶瓷电容器的薄且均匀的内部电极，而不伴随着烧制期间的任何裂纹形成和分层。

公开(公告)号：US06503560B2

公开(公告)日：2003-01-07

申请号：US09944164

申请日：2001-09-04

申请人： Yoshiharu Toshima ,  Takayuki Araki ,  Yasuhide Yamaguchi ,  Takao Hayashi ,  Hiroyuki Shimamura

发明人： Yoshiharu Toshima ,  Takayuki Araki ,  Yasuhide Yamaguchi ,  Takao Hayashi ,  Hiroyuki Shimamura

IPC分类号： B05D700

CPC分类号： H01G4/0085 ,  B22F1/0096 ,  B22F1/02 ,  B22F2999/00 ,  C22C1/1084 ,  Y10T428/2991 ,  B22F9/04

摘要： The composite nickel fine powder includes surface-oxidized nickel fine particles and at least one member selected from the group consisting of oxides and complex oxides of at least one metal element having an atomic number ranging from 12 to 56 or 82 and belonging to Group 2 to 14 of the Periodic Table on the surface of the surface-oxidized nickel fine particles.