SEMICONDUCTOR DEVICE PACKAGE
    6.
    发明申请

    公开(公告)号:US20180358290A1

    公开(公告)日:2018-12-13

    申请号:US15618084

    申请日:2017-06-08

    Abstract: A semiconductor device package includes a substrate, a first insulation layer, a support film and an interconnection structure. The substrate has a first sidewall, a first surface and a second surface opposite to the first surface. The first insulation layer is on the first surface of the substrate and has a second sidewall. The first insulation layer has a first surface and a second surface adjacent to the substrate and opposite to the first surface of the first insulation layer. The support film is on the second surface of the substrate and has a third sidewall. The support film has a first surface adjacent to the substrate and a second surface opposite to the first surface of the support film. The interconnection structure extends from the first surface of the first insulation layer to the second surface of the support film via the first insulation layer and the support film. The interconnection structure covers the first, second and third sidewalls.

    SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
    9.
    发明申请
    SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME 有权
    半导体器件及其制造方法

    公开(公告)号:US20170018550A1

    公开(公告)日:2017-01-19

    申请号:US14801730

    申请日:2015-07-16

    Abstract: A semiconductor device and a method for manufacturing the same is described. The semiconductor device includes a substrate, a first capacitor and a second capacitor. The first capacitor includes a first conductive layer, a first insulating layer and a second conductive layer. The first conductive layer is disposed on the substrate. The first insulating layer is disposed on the first conductive layer and has a first peripheral edge. The second conductive layer is disposed on the first insulating layer and has a second peripheral edge. The second capacitor includes a third conductive layer, a second insulating layer and the second conductive layer. The second insulating layer is disposed on the second conductive layer and has a third peripheral edge. The third conductive layer is disposed on the second insulating layer and has a fourth peripheral edge. The first, second, third and fourth peripheral edges are aligned with one another.

    Abstract translation: 对半导体装置及其制造方法进行说明。 半导体器件包括衬底,第一电容器和第二电容器。 第一电容器包括第一导电层,第一绝缘层和第二导电层。 第一导电层设置在基板上。 第一绝缘层设置在第一导电层上并具有第一周边边缘。 第二导电层设置在第一绝缘层上并具有第二周边。 第二电容器包括第三导电层,第二绝缘层和第二导电层。 第二绝缘层设置在第二导电层上并具有第三外围边缘。 第三导电层设置在第二绝缘层上并具有第四周边。 第一,第二,第三和第四外围边缘彼此对准。

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