公开(公告)号：US20040163764A1

公开(公告)日：2004-08-26

申请号：US10786424

申请日：2004-02-25

申请人： Applied Materials, Inc.

发明人： Kenneth S. Collins ,  Michael Rice ,  John Trow ,  Douglas Buchberger ,  Craig A. Roderick

IPC分类号： H01L021/306 ,  C23C016/00

CPC分类号： H01J37/32458 ,  B01D53/22 ,  B01D53/226 ,  B01D53/268 ,  C23C16/517 ,  H01F2029/143 ,  H01J37/32082 ,  H01J37/321 ,  H01J37/32146 ,  H01J37/32165 ,  H01J37/32467 ,  H01J37/32522 ,  H01J37/32688 ,  H01J37/32706 ,  H01J37/32871 ,  H01J2237/3343 ,  H01J2237/3345 ,  H01J2237/3346 ,  H01L21/31116 ,  H01L21/6831

摘要： A plasma chamber enclosure structure for use in an RF plasma reactor. The plasma chamber enclosure structure being a single-wall dielectric enclosure structure of an inverted cup-shape configuration and having ceiling with an interior surface of substantially flat conical configuration extending to a centrally located gas inlet. The plasma chamber enclosure structure having a sidewall with a lower cylindrical portion generally transverse to a pedestal when positioned over a reactor base, and a transitional portion between the lower cylindrical portion and the ceiling. The transitional portion extends inwardly from the lower cylindrical portion and includes a radius of curvature. The structure being adapted to cover the base to comprise the RF plasma reactor and to define a plasma-processing volume over the pedestal. The structure being formed of a dielectric material of silicon, silicon carbide, quartz, and/or alumina being capable of transmitting inductive power therethrough from an adjacent antenna.

摘要翻译： 用于RF等离子体反应器的等离子体室外壳结构。 等离子体腔室结构是倒置杯形构造的单壁电介质外壳结构，并且具有延伸到中心位置的气体入口的具有基本平坦的圆锥形构造的内表面的天花板。 等离子体室外壳结构具有侧壁，当定位在反应器基座上时，具有大体横向于基座的下部圆柱形部分，以及在下部圆柱形部分和天花板之间的过渡部分。 过渡部分从下圆柱形部分向内延伸并且包括曲率半径。 所述结构适于覆盖所述基座以包括所述RF等离子体反应器并且限定所述基座上的等离子体处理体积。 该结构由硅，碳化硅，石英和/或氧化铝的电介质材料形成，其能够从相邻天线传输感应电力。

公开(公告)号：US20030014157A1

公开(公告)日：2003-01-16

申请号：US09905091

申请日：2001-07-12

申请人： Applied Materials, Inc.

发明人： Marvin L. Freeman ,  Jeffrey C. Hudgens ,  Damon Keith Cox ,  Chris Holt Pencis ,  Michael Rice ,  David A. Van Gogh

IPC分类号： G06F007/00

CPC分类号： H01L21/67259 ,  B25J9/0009 ,  B25J9/107 ,  G05B19/404 ,  G05B2219/37608 ,  G05B2219/39192 ,  G05B2219/49169 ,  G05B2219/49207 ,  H01L21/67742 ,  H01L21/67748 ,  H01L21/68 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/139

摘要： Generally, a method of determining a position of a robot is provided. In one embodiment, a method of determining a position of a robot comprises acquiring a first set of positional metrics, acquiring a second set of positional metrics and resolving the position of the robot due to thermal expansion using the first set and the second set of positional metrics. Acquiring the first and second set of positional metrics may occur at the same location within a processing system, or may occur at different locations. For example, in another embodiment, the method may comprise acquiring a first set of positional metrics at a first location proximate a processing chamber and acquiring a second set of positional metrics in another location. In another embodiment, substrate center information is corrected using the determined position of the robot.

公开(公告)号：US20020096259A1

公开(公告)日：2002-07-25

申请号：US10021195

申请日：2001-10-30

申请人： Applied Materials, Inc.

发明人： Kenneth S. Collins ,  Michael Rice ,  Farahmand E. Askarinam ,  Douglas A. Buchberger JR. ,  Craig A. Roderick

IPC分类号： C23F001/02

CPC分类号： H01J37/32458 ,  C23C16/517 ,  H01F2029/143 ,  H01J37/32082 ,  H01J37/321 ,  H01J37/32146 ,  H01J37/32165 ,  H01J37/32467 ,  H01J37/32522 ,  H01J37/32688 ,  H01J37/32706 ,  H01J37/32871 ,  H01J2237/3343 ,  H01J2237/3345 ,  H01J2237/3346 ,  H01L21/31116 ,  H01L21/6831

摘要： In a plasma reactor including a reactor chamber, a workpiece support for holding a workpiece inside the chamber during processing and an inductive antenna, a window electrode proximal a wall of the chamber, the antenna and wall being positioned adjacently, the window electrode being operable as (a) a capacitive electrode accepting RF power to capacitively coupled plasma source power into the chamber, and (b) a window electrode passing RF power therethrough from said antenna into the chamber to inductively couple plasma source power into the chamber.

摘要翻译： 在包括反应器室的等离子体反应器中，用于在处理期间将工件保持在室内的工件支撑件和感应天线，靠近室壁的窗口电极，天线和壁相邻地定位，窗口电极可操作为 （a）容纳RF功率的电容电极，以将等离子体源功率电容耦合到腔室中，以及（b）将RF功率从所述天线传递到腔室中以将等离子体源功率感应耦合到腔室中的窗口电极。

公开(公告)号：US20030091938A1

公开(公告)日：2003-05-15

申请号：US10322228

申请日：2002-12-17

申请人： Applied Materials, Inc.

发明人： Kevin Fairbairn ,  Michael Rice ,  Timothy Weidman ,  Christopher S. Ngai ,  Ian Scot Latchford ,  Christopher Dennis Bencher ,  Yuxiang May Wang

IPC分类号： G03F007/30 ,  G03F007/11 ,  G03F007/16 ,  G03F007/40 ,  G03F007/42

CPC分类号： H01L21/76829 ,  C23C16/26 ,  H01L21/0276 ,  H01L21/28035 ,  H01L21/3081 ,  H01L21/3088 ,  H01L21/31138 ,  H01L21/31144 ,  H01L21/3146 ,  H01L21/31612 ,  H01L21/32137 ,  H01L21/76802 ,  H01L21/76807

摘要： A method of forming an integrated circuit using an amorphous carbon film. The amorphous carbon film is formed by thermally decomposing a gas mixture comprising a hydrocarbon compound and an inert gas. The amorphous carbon film is compatible with integrated circuit fabrication processes. In one integrated circuit fabrication process, the amorphous carbon film is used as a hardmask. In another integrated circuit fabrication process, the amorphous carbon film is an anti-reflective coating (ARC) for deep ultraviolet (DUV) lithography. In yet another integrated circuit fabrication process, a multi-layer amorphous carbon anti-reflective coating is used for DUV lithography.

摘要翻译： 一种使用无定形碳膜形成集成电路的方法。 无定形碳膜通过热分解包含烃化合物和惰性气体的气体混合物而形成。 无定形碳膜与集成电路制造工艺兼容。 在一个集成电路制造工艺中，非晶碳膜用作硬掩模。 在另一个集成电路制造工艺中，无定形碳膜是用于深紫外（DUV）光刻的抗反射涂层（ARC）。 在又一集成电路制造工艺中，多层无定形碳抗反射涂层用于DUV光刻。

公开(公告)号：US20040199291A1

公开(公告)日：2004-10-07

申请号：US10406644

申请日：2003-04-03

申请人： Applied Materials, Inc.

发明人： Marvin L. Freeman ,  Jeffrey C. Hudgens ,  Damon Keith Cox ,  Chris Holt Pencis ,  Michael Rice ,  David A. Van Gogh

IPC分类号： G06F019/00

CPC分类号： H01L21/67259 ,  B25J9/0009 ,  B25J9/107 ,  G05B19/404 ,  G05B2219/37608 ,  G05B2219/39192 ,  G05B2219/49169 ,  G05B2219/49207 ,  H01L21/67742 ,  H01L21/67748 ,  H01L21/68 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/139

摘要： Generally, a method of determining a position of a robot is provided. In one embodiment, a method of determining a position of a robot comprises acquiring a first set of positional metrics, acquiring a second set of positional metrics and resolving the position of the robot due to thermal expansion using the first set and the second set of positional metrics. Acquiring the first and second set of positional metrics may occur at the same location within a processing system, or may occur at different locations. For example, in another embodiment, the method may comprise acquiring a first set of positional metrics at a first location proximate a processing chamber and acquiring a second set of positional metrics in another location. In another embodiment, substrate center information is corrected using the determined position of the robot.

摘要翻译： 通常，提供了一种确定机器人的位置的方法。 在一个实施例中，一种确定机器人位置的方法包括获取第一组位置度量，获取第二组位置度量并且利用第一组和第二组位置来解决由于热膨胀引起的机器人的位置 指标 获取第一和第二组位置度量可以发生在处理系统内的相同位置处，或者可以在不同位置处发生。 例如，在另一个实施例中，该方法可以包括在靠近处理室的第一位置获取第一组位置度量，并在另一位置获取第二组位置度量。 在另一个实施例中，使用所确定的机器人的位置校正基板中心信息。

公开(公告)号：US20030202092A1

公开(公告)日：2003-10-30

申请号：US10387267

申请日：2003-03-11

申请人： Applied Materials, Inc.

发明人： Iraj Sadighi ,  Jeff Hudgens ,  Michael Rice ,  Gary Wyka

IPC分类号： H04N007/18 ,  H04N009/47

CPC分类号： H01L21/67259 ,  B25J9/1692 ,  B25J9/1697 ,  G05B2219/45031 ,  H01L21/681

摘要： A vision system and method for calibrating motion of a robot disposed in a processing system is provided. In one embodiment, a vision system for a processing system includes a camera and a calibration wafer that are positioned in a processing system. The camera is positioned on the robot and is adapted to obtain image data of the calibration wafer disposed in a predefined location within the processing system. The image data is utilized to calibrate the robots motion.

公开(公告)号：US20020020499A1

公开(公告)日：2002-02-21

申请号：US09970121

申请日：2001-10-02

申请人： Applied Materials, Inc.

发明人： Kenneth S. Collins ,  Michael Rice ,  John Trow ,  Douglas Buchberger ,  Craig A. Roderick

IPC分类号： C23F001/02

CPC分类号： H01J37/32458 ,  B01D53/22 ,  B01D53/226 ,  B01D53/268 ,  C23C16/517 ,  H01F2029/143 ,  H01J37/32082 ,  H01J37/321 ,  H01J37/32146 ,  H01J37/32165 ,  H01J37/32467 ,  H01J37/32522 ,  H01J37/32688 ,  H01J37/32706 ,  H01J37/32871 ,  H01J2237/3343 ,  H01J2237/3345 ,  H01J2237/3346 ,  H01L21/31116 ,  H01L21/6831

摘要： A plasma chamber enclosure structure for use in an RF plasma reactor. The plasma chamber enclosure structure being a single-wall dielectric enclosure structure of an inverted cup-shape configuration and having ceiling with an interior surface of substantially flat conical configuration extending to a centrally located gas inlet. The plasma chamber enclosure structure having a sidewall with a lower cylindrical portion generally transverse to a pedestal when positioned over a reactor base, and a transitional portion between the lower cylindrical portion and the ceiling. The transitional portion extends inwardly from the lower cylindrical portion and includes a radius of curvature. The structure being adapted to cover the base to comprise the RF plasma reactor and to define a plasma-processing volume over the pedestal. The structure being formed of a dielectric material of silicon, silicon carbide, quartz, and/or alumina being capable of transmitting inductive power therethrough from an adjacent antenna.

摘要翻译： 用于RF等离子体反应器的等离子体室外壳结构。 等离子体腔室结构是倒置杯形构造的单壁电介质外壳结构，并且具有延伸到中心位置的气体入口的具有基本平坦的圆锥形构造的内表面的天花板。 等离子体室外壳结构具有侧壁，当定位在反应器基座上时，具有大体横向于基座的下部圆柱形部分，以及在下部圆柱形部分和天花板之间的过渡部分。 过渡部分从下圆柱形部分向内延伸并且包括曲率半径。 所述结构适于覆盖所述基座以包括所述RF等离子体反应器并且限定所述基座上的等离子体处理体积。 该结构由硅，碳化硅，石英和/或氧化铝的电介质材料形成，其能够从相邻天线传输感应电力。