Textured encapsulant surface in LED packages
    1.
    发明申请
    Textured encapsulant surface in LED packages 有权
    LED封装中纹理密封面

    公开(公告)号:US20090152573A1

    公开(公告)日:2009-06-18

    申请号:US12002429

    申请日:2007-12-14

    IPC分类号: H01L33/00 H01L21/56

    摘要: A packaged LED device having a textured encapsulant that is conformal with a mount surface on which at least one LED chip is disposed. The textured encapsulant, which can be textured using an additive or subtractive process, is applied to the LED either prior to or during packaging. The encapsulant includes at least one textured surface from which light is emitted. The textured surface helps to reduce total internal reflection within the encapsulant, improving the extraction efficiency and the color temperature uniformity of the output profile. Several chips can be mounted beneath a single textured encapsulant. A mold having irregular surfaces can be used to form multiple encapsulants over many LEDs simultaneously.

    摘要翻译: 一种封装的LED器件,其具有纹理化的密封剂,其与其上设置有至少一个LED芯片的安装表面保持一致。 可以在包装之前或期间将可以使用添加剂或减色过程进行纹理化的纹理密封剂施加到LED。 密封剂包括至少一个纹理表面,光从该表面发射。 纹理表面有助于减少密封剂内的全内反射,提高输出分布的提取效率和色温均匀性。 几个芯片可以安装在单个纹理密封剂下面。 可以使用具有不规则表面的模具同时在许多LED上形成多个密封剂。

    Methods for reducing contamination of semiconductor devices and materials during wafer processing
    7.
    发明授权
    Methods for reducing contamination of semiconductor devices and materials during wafer processing 有权
    减少晶片加工过程中半导体器件和材料污染的方法

    公开(公告)号:US07531431B2

    公开(公告)日:2009-05-12

    申请号:US11437934

    申请日:2006-05-19

    IPC分类号: H01L21/00

    摘要: Methods of processing a semiconductor structure including a metal layer in the presence of organic material include flowing an aqueous mixture including an oxidizing agent over the semiconductor structure during processing of the semiconductor structure. Processing the semiconductor structure may include sawing the semiconductor structure and/or scrubbing the semiconductor structure with pressurized water. The oxidizing agent may include a peroxide, such as hydrogen peroxide, or another oxidizing agent.

    摘要翻译: 在存在有机材料的情况下处理包括金属层的半导体结构的方法包括在半导体结构的处理期间使包含氧化剂的含水混合物流过半导体结构。 处理半导体结构可以包括锯切半导体结构和/或用加压水洗涤半导体结构。 氧化剂可以包括过氧化物,例如过氧化氢或另一种氧化剂。

    Methods for reducing contamination of semiconductor devices and materials during wafer processing
    8.
    发明申请
    Methods for reducing contamination of semiconductor devices and materials during wafer processing 有权
    减少晶片加工过程中半导体器件和材料污染的方法

    公开(公告)号:US20070269980A1

    公开(公告)日:2007-11-22

    申请号:US11437934

    申请日:2006-05-19

    IPC分类号: H01L21/44

    摘要: Methods of processing a semiconductor structure including a metal layer in the presence of organic material include flowing an aqueous mixture including an oxidizing agent over the semiconductor structure during processing of the semiconductor structure. Processing the semiconductor structure may include sawing the semiconductor structure and/or scrubbing the semiconductor structure with pressurized water. The oxidizing agent may include a peroxide, such as hydrogen peroxide, or another oxidizing agent.

    摘要翻译: 在存在有机材料的情况下处理包括金属层的半导体结构的方法包括在半导体结构的处理期间使包含氧化剂的含水混合物流过半导体结构。 处理半导体结构可以包括锯切半导体结构和/或用加压水洗涤半导体结构。 氧化剂可以包括过氧化物,例如过氧化氢或另一种氧化剂。