Thin-Film LED Having a Mirror Layer and Method for the Production Thereof
    1.
    发明申请
    Thin-Film LED Having a Mirror Layer and Method for the Production Thereof 有权
    具有镜面层的薄膜LED及其制造方法

    公开(公告)号:US20100283073A1

    公开(公告)日:2010-11-11

    申请号:US12680714

    申请日:2008-09-04

    IPC分类号: H01L33/10 H01L33/02

    摘要: A thin-film LED comprising a barrier layer (3), a first mirror layer (2) succeeding the barrier layer (3), a layer stack (5) succeeding the first mirror layer (2), and at least one contact structure (6) succeeding the layer stack (5). The layer stack (5) has at least one active layer (5a) which emits electromagnetic radiation. The contact structure (6) is arranged on a radiation exit area (4) and has a contact area (7). The first mirror layer (2) has, in a region lying opposite the contact area of the contact structure (6), a cutout which is larger than the contact area (7) of the contact structure (6). The efficiency of the thin-film LED is increased as a result.

    摘要翻译: 一种薄膜LED,包括阻挡层(3),位于阻挡层(3)之后的第一镜层(2),在第一镜面层(2)之后的层叠体(5),以及至少一个接触结构 6)后续层叠(5)。 层叠体(5)具有至少一个发射电磁辐射的活性层(5a)。 接触结构(6)设置在辐射出口区域(4)上并且具有接触区域(7)。 第一镜层(2)在与接触结构(6)的接触区域相对的区域中具有大于接触结构(6)的接触面积(7)的切口。 结果,提高了薄膜LED的效率。

    LED chip
    3.
    发明授权
    LED chip 有权
    LED芯片

    公开(公告)号:US08530923B2

    公开(公告)日:2013-09-10

    申请号:US12922830

    申请日:2009-04-28

    IPC分类号: H01L33/38

    摘要: A light-emitting diode chip (1) with a semiconductor layer sequence (2) is described, which is contacted electrically by contacts (5) via a current spreading layer (3). The contacts (5) cover around 1%-8% of the surface of the semiconductor layer sequence (2). The contacts (5) consist for example of separate contact points (51), which are arranged at the nodes of a regular grid (52) with a grid constant of 12 μm. The current spreading layer (3) contains for example indium-tin oxide, indium-zinc oxide or zinc oxide and has a thickness in the range from 15 nm to 60 nm.

    摘要翻译: 描述了具有半导体层序列(2)的发光二极管芯片(1),其经由电流扩展层(3)由触点(5)电接触。 触点(5)覆盖半导体层序列(2)的表面的约1%-8%。 触点(5)例如由单独的接触点(51)组成,它们布置在栅格常数为12μm的规则网格(52)的节点处。 电流扩展层(3)包含例如氧化铟锡,氧化铟锌或氧化锌,其厚度在15nm至60nm的范围内。

    Led Chip
    4.
    发明申请
    Led Chip 有权
    LED芯片

    公开(公告)号:US20110114988A1

    公开(公告)日:2011-05-19

    申请号:US12922830

    申请日:2009-04-28

    IPC分类号: H01L33/38

    摘要: A light-emitting diode chip (1) with a semiconductor layer sequence (2) is described, which is contacted electrically by contacts (5) via a current spreading layer (3). The contacts (5) cover around 1%-8% of the surface of the semiconductor layer sequence (2). The contacts (5) consist for example of separate contact points (51), which are arranged at the nodes of a regular grid (52) with a grid constant of 12 μm. The current spreading layer (3) contains for example indium-tin oxide, indium-zinc oxide or zinc oxide and has a thickness in the range from 15 nm to 60 nm.

    摘要翻译: 描述了具有半导体层序列(2)的发光二极管芯片(1),其经由电流扩展层(3)由触点(5)电接触。 触点(5)覆盖半导体层序列(2)的表面的约1%-8%。 触点(5)例如分开接触点(51),它们布置在格子常数为12μm的规则网格(52)的节点处。 电流扩展层(3)包含例如氧化铟锡,氧化铟锌或氧化锌,其厚度在15nm至60nm的范围内。

    Thin Film Led Comprising a Current-Dispersing Structure
    7.
    发明申请
    Thin Film Led Comprising a Current-Dispersing Structure 有权
    包含电流分散结构的薄膜引线

    公开(公告)号:US20070278508A1

    公开(公告)日:2007-12-06

    申请号:US10587666

    申请日:2005-01-25

    IPC分类号: H01L33/00

    摘要: A thin-film LED comprising an active layer (7) made of a nitride compound semiconductor, which emits electromagnetic radiation (19) in a main radiation direction (15). A current expansion layer (9) is disposed downstream of the active layer (7) in the main radiation direction (15) and is made of a first nitride compound semiconductor material. The radiation emitted in the main radiation direction (15) is coupled out through a main area (14), and a first contact layer (11, 12, 13) is arranged on the main area (14). The transverse conductivity of the current expansion layer (9) is increased by formation of a two-dimensional electron gas or hole gas. The two-dimensional electron gas or hole gas is advantageously formed by embedding at least one layer (10) made of a second nitride compound semiconductor material in the current expansion layer (9).

    摘要翻译: 一种薄膜LED,包括在主辐射方向(15)上发射电磁辐射(19)的由氮化物化合物半导体制成的有源层(7)。 电流扩展层(9)设置在主辐射方向(15)的有源层(7)的下游,并由第一氮化物化合物半导体材料制成。 在主辐射方向(15)处发射的辐射通过主区域(14)耦合出来,并且在主区域(14)上布置有第一接触层(11,12,13)。 通过形成二维电子气体或空穴气体来增加电流膨胀层(9)的横向电导率。 二维电子气体或空穴气体有利地通过将至少一层由第二氮化物化合物半导体材料制成的层(10)嵌入到电流膨胀层(9)中而形成。

    Thin film LED comprising a current-dispersing structure
    8.
    发明授权
    Thin film LED comprising a current-dispersing structure 有权
    薄膜LED包括电流分散结构

    公开(公告)号:US08368092B2

    公开(公告)日:2013-02-05

    申请号:US10587666

    申请日:2005-01-25

    IPC分类号: H01L33/00

    摘要: A thin-film LED comprising an active layer (7) made of a nitride compound semiconductor, which emits electromagnetic radiation (19) in a main radiation direction (15). A current expansion layer (9) is disposed downstream of the active layer (7) in the main radiation direction (15) and is made of a first nitride compound semiconductor material. The radiation emitted in the main radiation direction (15) is coupled out through a main area (14), and a first contact layer (11, 12, 13) is arranged on the main area (14). The transverse conductivity of the current expansion layer (9) is increased by formation of a two-dimensional electron gas or hole gas. The two-dimensional electron gas or hole gas is advantageously formed by embedding at least one layer (10) made of a second nitride compound semiconductor material in the current expansion layer (9).

    摘要翻译: 一种薄膜LED,包括在主辐射方向(15)上发射电磁辐射(19)的由氮化物化合物半导体制成的有源层(7)。 电流扩展层(9)设置在主辐射方向(15)的有源层(7)的下游,并由第一氮化物化合物半导体材料制成。 在主辐射方向(15)处发射的辐射通过主区域(14)耦合出来,并且在主区域(14)上布置有第一接触层(11,12,13)。 通过形成二维电子气体或空穴气体来增加电流膨胀层(9)的横向电导率。 二维电子气体或空穴气体有利地通过将至少一层由第二氮化物化合物半导体材料制成的层(10)嵌入到电流膨胀层(9)中而形成。