Semiconductor contact structure
    8.
    发明授权
    Semiconductor contact structure 有权
    半导体接触结构

    公开(公告)号:US07466028B1

    公开(公告)日:2008-12-16

    申请号:US11873037

    申请日:2007-10-16

    摘要: A semiconductor device structure for a three-dimensional integrated circuit is provided. The semiconductor device structure includes: a substrate having a first surface and a second surface; a via defined in the substrate and extending from the first surface to the second surface; and a first plurality of contact structures on the first surface contacting the via. A cross section of each of the first plurality of contact structures parallel to the first surface has a first side and a second side, and a ratio of the longer side to the shorter side of the first side and the second side is more than about 2:1.

    摘要翻译: 提供了一种用于三维集成电路的半导体器件结构。 半导体器件结构包括:具有第一表面和第二表面的衬底; 通孔,其限定在所述基板中并且从所述第一表面延伸到所述第二表面; 以及在所述第一表面上接触所述通孔的第一多个接触结构。 平行于第一表面的第一多个接触结构中的每一个的横截面具有第一侧和第二侧,并且第一侧和第二侧的长边与短边的比例大于约2 :1。