MRAM cell having shared configuration
    1.
    发明申请
    MRAM cell having shared configuration 有权
    具有共享配置的MRAM单元

    公开(公告)号:US20060033133A1

    公开(公告)日:2006-02-16

    申请号:US11053379

    申请日:2005-02-08

    IPC分类号: H01L29/94

    CPC分类号: H01L27/228

    摘要: A magnetic memory includes two first magnetic layers each oriented over a substrate, a second magnetic layer interposing the two first magnetic layers, and two dielectric layers each contacting the second magnetic layer and interposing the second magnetic layer and one of the two first magnetic layers. Each of the first and second magnetic layers and the dielectric layers may be oriented substantially perpendicular to the substrate or at an acute angle relative to the substrate.

    摘要翻译: 磁存储器包括两个分别定向在衬底上的第一磁性层,插入两个第一磁性层的第二磁性层和与第二磁性层接触并插入第二磁性层和两个第一磁性层之一的两个电介质层。 第一和第二磁性层和电介质层中的每一个可以基本上垂直于衬底取向或相对于衬底成锐角。

    MRAM over sloped pillar
    2.
    发明申请
    MRAM over sloped pillar 有权
    MRAM倾斜柱

    公开(公告)号:US20060033136A1

    公开(公告)日:2006-02-16

    申请号:US10917585

    申请日:2004-08-13

    摘要: An apparatus including a pillar located over a substrate and having at least one sloped surface oriented at an acute angle relative to the substrate. The apparatus also includes an MRAM stack substantially conforming to the sloped surface, the MRAM stack thereby also oriented at the acute angle relative to the substrate. The MRAM stack may comprise a plurality of substantially planar, parallel layers each oriented at an acute angle relative to the substrate.

    摘要翻译: 一种装置,包括位于衬底上方的柱,并且具有相对于衬底以锐角定向的至少一个倾斜表面。 该装置还包括基本上符合倾斜表面的MRAM堆叠,因此MRAM堆叠也相对于衬底以锐角取向。 MRAM堆叠可以包括多个基本上平面的平行层,每个平行层相对于衬底以锐角取向。

    MRAM cell having shared configuration
    3.
    发明授权
    MRAM cell having shared configuration 有权
    具有共享配置的MRAM单元

    公开(公告)号:US07221584B2

    公开(公告)日:2007-05-22

    申请号:US11053379

    申请日:2005-02-08

    CPC分类号: H01L27/228

    摘要: A magnetic memory includes two first magnetic layers each oriented over a substrate, a second magnetic layer interposing the two first magnetic layers, and two dielectric layers each contacting the second magnetic layer and interposing the second magnetic layer and one of the two first magnetic layers. Each of the first and second magnetic layers and the dielectric layers may be oriented substantially perpendicular to the substrate or at an acute angle relative to the substrate.

    摘要翻译: 磁存储器包括两个分别定向在衬底上的第一磁性层,插入两个第一磁性层的第二磁性层和与第二磁性层接触并插入第二磁性层和两个第一磁性层之一的两个电介质层。 第一和第二磁性层和电介质层中的每一个可以基本上垂直于衬底取向或相对于衬底成锐角。

    MRAM over sloped pillar
    5.
    发明授权
    MRAM over sloped pillar 有权
    MRAM倾斜柱

    公开(公告)号:US07319262B2

    公开(公告)日:2008-01-15

    申请号:US10917585

    申请日:2004-08-13

    IPC分类号: H01L29/82 H01L43/00 H01L21/00

    摘要: An apparatus including a pillar located over a substrate and having at least one sloped surface oriented at an acute angle relative to the substrate. The apparatus also includes an MRAM stack substantially conforming to the sloped surface, the MRAM stack thereby also oriented at the acute angle relative to the substrate. The MRAM stack may comprise a plurality of substantially planar, parallel layers each oriented at an acute angle relative to the substrate.

    摘要翻译: 一种装置,包括位于衬底上方的柱,并且具有相对于衬底以锐角定向的至少一个倾斜表面。 该装置还包括基本上符合倾斜表面的MRAM堆叠,因此MRAM堆叠也相对于衬底以锐角取向。 MRAM堆叠可以包括多个基本上平面的平行层,每个平行层相对于衬底以锐角取向。

    Effectively water-free immersion lithography
    8.
    发明申请
    Effectively water-free immersion lithography 审中-公开
    有效无水浸渍光刻

    公开(公告)号:US20060046211A1

    公开(公告)日:2006-03-02

    申请号:US10928455

    申请日:2004-08-27

    IPC分类号: G03B27/52 G03F7/20

    CPC分类号: G03F7/70341

    摘要: A method and system is disclosed for conducting immersion photolithography. The system includes at least one lens for transmitting a predetermined radiation on a predetermined substrate with a distance between the lens and the substrate shorter than a predetermined threshold, and a fluid volume in contact with the lens on its first end, and with the substrate on its second end, wherein the fluid volume is an effectively water-free fluid.

    摘要翻译: 公开了用于进行浸没光刻的方法和系统。 该系统包括至少一个透镜,用于在预定基板上传输预定辐射,透镜和衬底之间的距离小于预定阈值,以及在其第一端上与透镜接触的流体体积,并且衬底在 其第二端,其中流体体积是有效的无水流体。

    Magnetic shielding for magnetically sensitive semiconductor devices
    10.
    发明授权
    Magnetic shielding for magnetically sensitive semiconductor devices 有权
    磁敏半导体器件的磁屏蔽

    公开(公告)号:US07183617B2

    公开(公告)日:2007-02-27

    申请号:US11060000

    申请日:2005-02-17

    IPC分类号: H01L27/14

    摘要: A magnetic shielding device is provided for protecting at least one magnetically sensitive component on a substrate according to embodiments of the present invention. The device comprises a first shield having a top portion, and one or more side portions, wherein the top and side portions along with the substrate encloses the magnetic sensitive component within for protecting the same from an external magnetic field, and wherein the magnetic shielding device contains at least two magnetic shielding materials with one having a relatively higher magnetic permeability property but lower magnetic saturation property while the other having a relatively lower magnetic permeability property but higher magnetic saturation property.

    摘要翻译: 根据本发明的实施例,提供了一种磁屏蔽装置,用于保护基板上的至少一个磁敏部件。 该装置包括具有顶部部分和一个或多个侧部部分的第一屏蔽件,其中顶部和侧部与基板一起包围磁敏部件,以便将其与外部磁场保护起来,并且其中磁屏蔽装置 包含至少两个磁屏蔽材料,具有较高磁导率性能但具有较低磁饱和性能的磁屏蔽材料,而另一种具有较低的磁导率性能但较高的磁饱和性能。