摘要:
An improved memory cell layout (54) is formed including a trench cell (60) formed in a semiconductor substrate (58). The memory cell layout (54) includes a bitline (56) and a wordline (62) for storing and accessing charge. The charge is stored on a capacitor formed from a conductor (68), an insulating region (70) and a semiconductor substrate (58). Bitline (56) is primarily tangential to a trench cell (60), or may surround the periphery thereof. A wordline (62) overlies trench cell (60) and extends therein, and further may be formed of a width narrower than trench cell (60).
摘要:
The described embodiments of the present invention provide structures, and a method for fabricating those structures, which include a memory cell formed within a single trench. A trench is formed in the surface of a semiconductor substrate. The bottom portion of the trench is filled with polycrystalline silicon to form one plate of a storage capacitor. The substrate serves as the other plate of the capacitor. The remaining portion of the trench is then filled with an insulating material such as silicon dioxide. A pattern is then etched into the silicon dioxide which opens a portion of the sidewall and the top portion of the trench down to the polycrystalline capacitor plate. A contact is then formed between the polycrystalline capacitor plate and the substrate. Dopant atoms diffuse through the contact to form a source region on a sidewall of the trench. A gate insulator is formed by oxidation and a drain is formed at the surface of the trench adjacent to the mouth of the trench. Conductive material is then formed inside the open portion of the upper portion of the trench thereby forming a transistor connecting the upper plate of the storage capacitor to a drain region on the surface of the semiconductor substrate.
摘要:
The described embodiments of the present invention provide structures, and a method for fabricating those structures, which include a memory cell formed within a single trench. A trench is formed in the surface of a semiconductor substrate. The bottom portion of the trench is filled with polycrystalline silicon to form one plate of a storage capacitor. The substrate serves as the other plate of the capacitor. The remaining portion of the trench is then filled with an insulating material such as silicon dioxide. A pattern is then etched into the silicon dioxide when opens a portion of the sidewall and the top portion of the trench down to the polycrystalline capacitor plate. A contact is then formed between the polycrystalline capacitor plate and the substrate. Dopant atoms diffuse through the contact to form a source region on a sidewall of the trench. A gate insulator is formed by oxidation and a drain is formed at the surface of the trench adjacent to the mouth of the trench. Conductive material is then formed inside the open portion of the upper portion of the trench thereby forming a transistor connecting the upper plate of the storage capacitor to a drain region on the surface of the semiconductor substrate.
摘要:
BiCMOS circuits are disclosed which achieve high speed operation under a wide range of loading conditions. The circuits are capable of providing a full output voltage swing and dissipate virtually no static power. The BiCMOS circuits are implemented using both CMOS and bipolar transistors. The circuits use their output signal to control the CMOS transistors that overcome bipolar output drops for full swing operation. The same fundamental CMOS and bipolar configurations can be applied to implement complex and simple logic functions such as NAND, NOR, AND, or OR operations.
摘要:
One embodiment of the present invention includes a vertical inverter. A layer of P-type material is formed on the surface of an N+-type substrate, followed by formation of an N+ layer, a P+ layer, an N- layer, and a P+ layer. (Of course different doping configurations may be used and remain within the scope of the invention.) A trench is then etched along one side of the stack thus formed and a connector is formed to the middle P+ and N- layers. Another trench is then formed where a gate insulator and a- gate are formed. The gate serves as the gate for both the N-channel and P-channel transistors thus formed.
摘要:
DRAM cells and arrays of cell on a semiconductor substrate, together with methods of fabrication, are disclosed wherein the cells are formed in pairs or quartets by excavating a trench or two trenches through the cell elements to split an original cell into two or four cells during the fabrication. The cells include vertical field effect transistors and capacitors along the trech sidewalls with word lines and bit lines crossing over the cells.
摘要:
DRAM cells and arrays of cells on a semiconductor substrate, together with methods of fabrication, are disclosed wherein the cells are formed in pairs or quartets by excavating a trench or two trenches through the cell elements to split an original cell into two or four cells during the fabrication. The cells include vertical field effect transistors and capacitors along the trench sidewalls with word lines and bit lines crossing over the cells.
摘要:
A memory including various selectively configurable peripherals which provide on-chip low-level control features and a configuration RAM storing bits which both provide unclocked full logic-level outputs to control the selectively configurable peripherals and can also be accessed and read out. That is, each cell in the configuration RAM has two output modes: a digital continuous output, which is provided as a continuous control signal to various peripheral circuits and a selectable analog output which is used to read the information stored in the configuration RAM.
摘要:
A scheme for addressing memory cells in random access memory arrays includes bit lines divided into a plurality of segments. Each pair of bit lines has a sense amp at each end coupled to both bit lines in the pair. Word lines address memory cells coupled to each bit line of the pair. When a pair of memory cells is accessed, the bit lines are electrically divided so that one memory cell is coupled to one sense amp through one bit line, and the other memory cell is coupled to the other sense amp through the other bit line. The memory cells can be coupled to the bit lines through segment lines, with each segment line connecting a subset of the memory cells to a bit line, in order to reduce capacitances presented to the sense amps. An alternating linear array of sense amps and bit line pairs can be used to increase overall density of the memory array by allowing sense amps to access more than one bit line pair. The bit lines are addressed so that each sense amp receives data from one one bit line pair at a time. Segment lines having no currently addressed memory cells can be coupled to the sense amps in order to better balance input capacitances presented thereto. Selecting the bit line sections, segments, and memory cells in the proper order minimizes the effect of noise due to stray capacitances by causing them to appear as a common mode signal across the bit line pairs.
摘要:
Constant pulse width generator having applicability to a static random access memory (SRAM) where a constant width output pulse is desired, regardless of the address line activity, until reset, for powering up peripheral circuits of the static random access memory when an input address changes. An exclusive-NOR circuit has address inputs including the address line and the address line delayed. The constant pulse width generator comprises a monostable delayed feedback loop which is provided on the output of the exclusive-NOR circuit, with the output of the loop changing only upon receipt of a change of state from the exclusive NOR circuit, otherwise remaining stable until the delay resets the output. The output of the constant pulse width generator is a pulse as wide as the delay introduced in the address input signal.