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    Methods for implanting B22Hx and its ionized lower mass byproducts
    1.
    发明授权
    Methods for implanting B22Hx and its ionized lower mass byproducts 有权
    植入B22Hx及其电离质量副产物的方法

    公开(公告)号：US07759657B2

    公开(公告)日：2010-07-20

    申请号：US12142081

    申请日：2008-06-19

    Applicant: Daniel R. Tieger ,  Patrick R. Splinter

    Inventor： Daniel R. Tieger ,  Patrick R. Splinter

    IPC: H01J37/317 ,  C23C14/14

    CPC classification number: H01L21/26513 ,  H01J2237/061 ,  H01J2237/082 ,  H01J2237/31701 ,  H01L21/2658 ,  Y10S438/918

    Abstract: Methods for implanting an ionized polyhedral borane cluster or a selected ionized lower mass byproduct into a workpiece generally includes vaporizing and ionizing a polyhedral borane cluster molecule in an ion source to create a plasma and produce ionized polyhedral borane cluster molecules and its ionized lower mass byproducts. The ionized polyhedral borane cluster molecules and lower mass byproducts within the plasma are then extracted to form an ion beam. The ion beam is mass analyzed with a mass analyzer magnet to permit selected ionized polyhedral borane cluster molecules or selected ionized lower mass byproducts to pass therethrough and implant into a workpiece.

    Abstract translation: 将离子化的多面体硼烷簇或选择的离子化的下质量副产物植入工件中的方法通常包括蒸发并离子化离子源中的多面体甲烷簇分子以产生等离子体并产生电离的多面体甲烷簇分子及其电离的较低质量副产物。 然后提取等离子体内的离子化多面体甲烷簇分子和较低质量副产物以形成离子束。 使用质量分析器磁体对离子束进行质量分析，以允许选定的离子化多面体甲烷簇分子或选定的离子化的下质量副产物通过其并植入工件中。

    METHODS FOR IMPLANTING B22Hx AND ITS IONIZED LOWER MASS BYPRODUCTS
    2.
    发明申请
    METHODS FOR IMPLANTING B22Hx AND ITS IONIZED LOWER MASS BYPRODUCTS 有权
    B22Hx的植入方法及其低质量生产的方法

    公开(公告)号：US20090314958A1

    公开(公告)日：2009-12-24

    申请号：US12142081

    申请日：2008-06-19

    Applicant: Daniel R. Tieger ,  Patrick R. Splinter

    Inventor： Daniel R. Tieger ,  Patrick R. Splinter

    IPC: A61N5/00

    CPC classification number: H01L21/26513 ,  H01J2237/061 ,  H01J2237/082 ,  H01J2237/31701 ,  H01L21/2658 ,  Y10S438/918

    Abstract: Methods for implanting an ionized polyhedral borane cluster or a selected ionized lower mass byproduct into a workpiece generally includes vaporizing and ionizing a polyhedral borane cluster molecule in an ion source to create a plasma and produce ionized polyhedral borane cluster molecules and its ionized lower mass byproducts. The ionized polyhedral borane cluster molecules and lower mass byproducts within the plasma are then extracted to form an ion beam. The ion beam is mass analyzed with a mass analyzer magnet to permit selected ionized polyhedral borane cluster molecules or selected ionized lower mass byproducts to pass therethrough and implant into a workpiece.

    Abstract translation: 将离子化的多面体硼烷簇或选择的离子化的下质量副产物植入工件中的方法通常包括蒸发并离子化离子源中的多面体甲烷簇分子以产生等离子体并产生电离的多面体甲烷簇分子及其电离的较低质量副产物。 然后提取等离子体内的离子化多面体甲烷簇分子和较低质量副产物以形成离子束。 使用质量分析器磁体对离子束进行质量分析，以允许选定的离子化多面体甲烷簇分子或选定的离子化的下质量副产物通过其并植入工件中。

    HYBRID ION SOURCE/MULTIMODE ION SOURCE
    4.
    发明申请
    HYBRID ION SOURCE/MULTIMODE ION SOURCE 有权
    混合离子源/多元素离子源

    公开(公告)号：US20090032728A1

    公开(公告)日：2009-02-05

    申请号：US12184082

    申请日：2008-07-31

    Applicant: William F. DiVergilio ,  Daniel R. Tieger ,  Michael A. Graf

    Inventor： William F. DiVergilio ,  Daniel R. Tieger ,  Michael A. Graf

    IPC: H01J27/02

    CPC classification number: H01J37/08 ,  H01J37/3171 ,  H01J2237/0827 ,  H01J2237/30472

    Abstract: A hybrid ion source, comprising a source body configured to create plasma therein, from a first material, wherein the first material comprises one of monatomic gases, small molecule gases, large molecule gases, reactive gases, and solids, a low power plasma generation component operably associated with the source body, a high power plasma generation component operably associated with the source body and an extraction aperture configured to extract ions of the ion plasma from the source body.

    Abstract translation: 一种混合离子源，包括被配置为在其中从第一材料产生等离子体的源体，其中第一材料包括单原子气体，小分子气体，大分子气体，反应性气体和固体中的一种，低功率等离子体产生部件 可操作地与源体相关联，与源体可操作地相关联的高功率等离子体产生部件和被配置为从源体提取离子等离子体的离子的提取孔。

    Carbon implantation process and carbon ion precursor composition
    5.
    发明授权
    Carbon implantation process and carbon ion precursor composition 有权
    碳注入工艺和碳离子前驱体组成

    公开(公告)号：US08524584B2

    公开(公告)日：2013-09-03

    申请号：US13010397

    申请日：2011-01-20

    Applicant: William D. Lee ,  Daniel R. Tieger ,  Tseh-Jen Hsieh

    Inventor： William D. Lee ,  Daniel R. Tieger ,  Tseh-Jen Hsieh

    IPC: H01L21/26

    CPC classification number: H01L21/26506 ,  H01L21/823807 ,  H01L21/823814

    Abstract: Methods and carbon ion precursor compositions for implanting carbon ions generally includes vaporizing and ionizing a gas mixture including carbon oxide and methane gases in an ion source to create a plasma and produce carbon ions. The ionized carbon within the plasma is then extracted to form an ion beam. The ion beam is mass analyzed with a mass analyzer magnet to permit the ionized carbon to pass therethrough and implant into a workpiece.

    Abstract translation: 用于注入碳离子的方法和碳离子前体组合物通常包括在离子源中蒸发和电离包括碳氧化物和甲烷气体的气体混合物以产生等离子体并产生碳离子。 然后提取等离子体内的离子化碳以形成离子束。 用质量分析器磁体对离子束进行质量分析，以允许离子化碳通过并且植入工件中。

    Hybrid ion source/multimode ion source
    6.
    发明授权
    Hybrid ion source/multimode ion source 有权
    混合离子源/多模离子源

    公开(公告)号：US08193513B2

    公开(公告)日：2012-06-05

    申请号：US12184082

    申请日：2008-07-31

    Applicant: William F. DiVergilio ,  Daniel R. Tieger ,  Michael A. Graf

    Inventor： William F. DiVergilio ,  Daniel R. Tieger ,  Michael A. Graf

    IPC: H01J27/00

    CPC classification number: H01J37/08 ,  H01J37/3171 ,  H01J2237/0827 ,  H01J2237/30472

    Abstract: A hybrid ion source, comprising a source body configured to create plasma therein, from a first material, wherein the first material comprises one of monatomic gases, small molecule gases, large molecule gases, reactive gases, and solids, a low power plasma generation component operably associated with the source body, a high power plasma generation component operably associated with the source body and an extraction aperture configured to extract ions of the ion plasma from the source body.

    Abstract translation: 一种混合离子源，包括被配置为在其中从第一材料产生等离子体的源体，其中第一材料包括单原子气体，小分子气体，大分子气体，反应性气体和固体中的一种，低功率等离子体产生部件 可操作地与源体相关联，与源体可操作地相关联的高功率等离子体产生部件和被配置为从源体提取离子等离子体的离子的提取孔。

    Aromatic molecular carbon implantation processes
    7.
    发明授权
    Aromatic molecular carbon implantation processes 有权
    芳香族分子碳注入工艺

    公开(公告)号：US08350236B2

    公开(公告)日：2013-01-08

    申请号：US12685903

    申请日：2010-01-12

    Applicant: W. Davis Lee ,  Daniel R. Tieger

    Inventor： W. Davis Lee ,  Daniel R. Tieger

    IPC: H01L21/265

    CPC classification number: H01L21/26506 ,  H01J37/08 ,  H01J37/3171 ,  H01J2237/006 ,  H01L21/2658

    Abstract: Methods for implanting an aromatic carbon molecule or a selected ionized lower mass byproduct into a workpiece generally includes vaporizing and ionizing aromatic carbon molecule in an ion source to create a plasma and produce aromatic carbon molecules and its ionized lower mass byproducts. The ionized aromatic carbon molecules and lower mass byproducts within the plasma are then extracted to form an ion beam. The ion beam is mass analyzed with a mass analyzer magnet to permit selected ionized aromatic carbon molecules or selected ionized lower mass byproducts to pass therethrough and implant into a workpiece.

    Abstract translation: 将芳族碳分子或选择的离子化的下质量副产物植入工件中的方法通常包括在离子源中蒸发和离子化芳族碳分子以产生等离子体并产生芳族碳分子及其电离的较低质量副产物。 离子化的芳族碳分子和等离子体内的较低质量的副产物然后被提取以形成离子束。 使用质量分析器磁体对离子束进行质量分析，以允许选定的电离芳族碳分子或选定的离子化的下质量副产物通过其并植入工件中。

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