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    Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis
    2.
    发明授权
    Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis 失效
    用于测量衬底特性或制备用于分析的衬底的方法和系统

    公开(公告)号：US08765496B2

    公开(公告)日：2014-07-01

    申请号：US12110759

    申请日：2008-04-28

    申请人： Mehran Nasser-Ghodsi ,  Mark Borowicz ,  Dave Bakker ,  Mehdi Vaez-Iravani ,  Prashant Aji ,  Rudy Garcia ,  Tzu Chin Chuang

    发明人： Mehran Nasser-Ghodsi ,  Mark Borowicz ,  Dave Bakker ,  Mehdi Vaez-Iravani ,  Prashant Aji ,  Rudy Garcia ,  Tzu Chin Chuang

    IPC分类号： H01L21/00

    CPC分类号： H01J37/317 ,  G01N1/32 ,  H01J37/244 ,  H01J37/3005 ,  H01J2237/2814 ,  H01J2237/3174 ,  H01J2237/31745

    摘要： Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis are provided. One method for measuring a characteristic of a substrate includes removing a portion of a feature on the substrate using an electron beam to expose a cross-sectional profile of a remaining portion of the feature. The feature may be a photoresist feature. The method also includes measuring a characteristic of the cross-sectional profile. A method for preparing a substrate for analysis includes removing a portion of a material on the substrate proximate to a defect using chemical etching in combination with an electron beam. The defect may be a subsurface defect or a partially subsurface defect. Another method for preparing a substrate for analysis includes removing a portion of a material on a substrate proximate to a defect using chemical etching in combination with an electron beam and a light beam.

    摘要翻译： 提供了用于测量基板的特性或准备用于分析的基板的方法和系统。 用于测量衬底的特性的一种方法包括使用电子束去除衬底上的特征的一部分以暴露特征的剩余部分的横截面轮廓。 该特征可以是光致抗蚀剂特征。 该方法还包括测量横截面轮廓的特性。 制备用于分析的基板的方法包括使用化学蚀刻与电子束结合来去除靠近缺陷的衬底上的材料的一部分。 缺陷可能是地下缺陷或部分地下缺陷。 制备用于分析的衬底的另一种方法包括使用化学蚀刻与电子束和光束组合地去除邻近缺陷的衬底上的材料的一部分。

    System for detecting anomalies and/or features of a surface
    3.
    发明授权
    System for detecting anomalies and/or features of a surface 有权
    用于检测表面的异常和/或特征的系统

    公开(公告)号：US07869023B2

    公开(公告)日：2011-01-11

    申请号：US12123393

    申请日：2008-05-19

    申请人： Guoheng Zhao ,  Stanley Stokowski ,  Mehdi Vaez-Iravani

    发明人： Guoheng Zhao ,  Stanley Stokowski ,  Mehdi Vaez-Iravani

    IPC分类号： G01N21/00

    CPC分类号： G01N21/9501

    摘要： A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam.

    摘要翻译： 使用圆柱形镜或透镜将输入的准直光束聚焦到要检查的表面上的线上，其中线基本上在聚焦束的入射平面中。 光束的图像被投影到平行于线的电荷耦合器件的阵列上，用于检测表面的异常和/或特征，其中阵列位于聚焦光束的入射平面之外。

    Fourier filters and wafer inspection systems
    6.
    发明授权
    Fourier filters and wafer inspection systems 有权
    傅立叶滤波器和晶圆检查系统

    公开(公告)号：US07345754B1

    公开(公告)日：2008-03-18

    申请号：US11228584

    申请日：2005-09-16

    申请人： Guoheng Zhao ,  Mehdi Vaez-Iravani ,  Andrew V. Hill ,  Avijit K. Ray-Chaudhuri

    发明人： Guoheng Zhao ,  Mehdi Vaez-Iravani ,  Andrew V. Hill ,  Avijit K. Ray-Chaudhuri

    IPC分类号： G01N21/00 ,  G02B27/46

    CPC分类号： G01N21/9501 ,  G01N21/4738 ,  G01N21/956 ,  G03F7/7065

    摘要： Fourier filters and wafer inspection systems are provided. One embodiment relates to a one-dimensional Fourier filter configured to be included in a bright field inspection system such that the bright field inspection system can be used for broadband dark field inspection of a wafer. The Fourier filter includes an asymmetric illumination aperture configured to be positioned in an illumination path of the inspection system. The Fourier filter also includes an asymmetric imaging aperture complementary to the illumination aperture. The imaging aperture is configured to be positioned in a light collection path of the inspection system such that the imaging aperture blocks light reflected and diffracted from structures on the wafer and allows light scattered from defects on the wafer to pass through the imaging aperture.

    摘要翻译： 提供傅立叶滤波器和晶片检测系统。 一个实施例涉及被配置为包括在明场检查系统中的一维傅立叶滤波器，使得明场检查系统可以用于晶片的宽带暗视场检查。 傅里叶滤波器包括被配置为定位在检查系统的照明路径中的非对称照明孔。 傅立叶滤波器还包括与照明孔径互补的非对称成像孔。 成像孔被配置为定位在检查系统的光采集路径中，使得成像孔口阻挡从晶片上的结构反射和衍射的光，并允许从晶片上的缺陷散射的光通过成像孔。

    Simultaneous multi-spot inspection and imaging
    7.
    发明授权
    Simultaneous multi-spot inspection and imaging 有权

    公开(公告)号：US07130039B2

    公开(公告)日：2006-10-31

    申请号：US10418352

    申请日：2003-04-17

    申请人： Mehdi Vaez-Iravani ,  Lawrence Robert Miller

    发明人： Mehdi Vaez-Iravani ,  Lawrence Robert Miller

    IPC分类号： G01N21/68

    CPC分类号： G01N21/95623 ,  G01N21/8806

    摘要： A compact and versatile multi-spot inspection imaging system employs an objective for focusing an array of radiation beams to a surface and a second reflective or refractive objective having a large numerical aperture for collecting scattered radiation from the array of illuminated spots. The scattered radiation from each illuminated spot is focused to a corresponding optical fiber channel so that information about a scattering may be conveyed to a corresponding detector in a remote detector array for processing. For patterned surface inspection, a cross-shaped filter is rotated along with the surface to reduce the effects of diffraction by Manhattan geometry. A spatial filter in the shape of an annular aperture may also be employed to reduce scattering from patterns such as arrays on the surface. In another embodiment, different portions of the same objective may be used for focusing the illumination beams onto the surface and for collecting the scattered radiation from the illuminated spots simultaneously. In another embodiment, a one-dimensional array of illumination beams are directed at an oblique angle to the surface to illuminate a line of illuminated spots at an angle to the plane of incidence. Radiation scattered from the spots are collected along directions perpendicular to the line of spots or in a double dark field configuration.

    Sample inspection system
    8.
    发明授权
    Sample inspection system 有权

    公开(公告)号：US07119897B2

    公开(公告)日：2006-10-10

    申请号：US11007729

    申请日：2004-12-07

    申请人： Mehdi Vaez-Iravani ,  Stanley Stokowski ,  Guoheng Zhao

    发明人： Mehdi Vaez-Iravani ,  Stanley Stokowski ,  Guoheng Zhao

    IPC分类号： G01N21/00

    CPC分类号： G01N21/956 ,  G01N21/47 ,  G01N21/9501

    摘要： A curved mirrored surface is used to collect radiation scattered by a sample surface and originating from a normal illumination beam and an oblique illumination beam. The collected radiation is focused to a detector. Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors to restrict detection to certain azimuthal angles.

    Inspection system for integrated applications
    9.
    发明授权
    Inspection system for integrated applications 有权
    综合应用检测系统

    公开(公告)号：US07116413B2

    公开(公告)日：2006-10-03

    申请号：US10659556

    申请日：2003-09-09

    申请人： Mehdi Vaez-Iravani

    发明人： Mehdi Vaez-Iravani

    IPC分类号： G01N21/00

    CPC分类号： G01N21/9501 ,  G01N21/474 ,  G01N21/956

    摘要： A compact surface inspection optical head is disclosed which comprises a frame with two rings of apertures therein. The first set of apertures surrounding and close to a normal direction to the surface to be inspected is connected to fibers used to collect scattered radiation useful for the detection of micro-scratches caused by chemical and mechanical polishing. Where the position of these apertures is selected to be away from patterned scattering or diffraction, these apertures and their associated fibers may be useful for anomaly detection on patterned surfaces. A second ring of apertures at low elevation angles to the surface inspected is connected to fibers to collect radiation scattered by the surface inspected for anomaly detection on patterned surfaces. This ring of apertures segments azimuthally the collection space so that the signal outputs from detectors that are saturated by the pattern diffraction or scattering may be discarded and only the outputs of unsaturated detectors are used for anomaly detection. A pair of larger apertures in the double dark field positions may be employed for anomaly detection on unpatterned surfaces. Scattered radiation passing through the two larger apertures may be collected by objectives or fiber bundles.

    摘要翻译： 公开了一种紧凑的表面检查光学头，其包括其中具有两个孔环的框架。 围绕和接近待检查表面的正常方向的第一组孔径连接到用于收集用于检测由化学和机械抛光引起的微划痕的散射辐射的纤维。 在这些孔的位置被选择为远离图案化散射或衍射的情况下，这些孔及其相关联的纤维可用于图案化表面上的异常检测。 与被检查的表面的低仰角的第二个孔环连接到纤维上以收集由被检查的表面散射的辐射以在图案化表面上的异常检测。 这个孔环以方位方式分段收集空间，从而可以丢弃由图案衍射或散射饱和的检测器的信号输出，并且仅使用不饱和检测器的输出进行异常检测。 双暗场位置中的一对较大的孔可用于未图案化表面上的异常检测。 通过两个较大孔径的散射辐射可以被物镜或纤维束收集。

    Sample inspection system
    10.
    发明申请
    Sample inspection system 有权

    公开(公告)号：US20050099621A1

    公开(公告)日：2005-05-12

    申请号：US11007729

    申请日：2004-12-07

    申请人： Mehdi Vaez-Iravani ,  Stanley Stokowski ,  Guoheng Zhao

    发明人： Mehdi Vaez-Iravani ,  Stanley Stokowski ,  Guoheng Zhao

    IPC分类号： G01N21/47 ,  G01N21/95 ,  G01N21/88

    CPC分类号： G01N21/956 ,  G01N21/47 ,  G01N21/9501

    摘要： A curved mirrored surface is used to collect radiation scattered by a sample surface and originating from a normal illumination beam and an oblique illumination beam. The collected radiation is focused to a detector. Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors to restrict detection to certain azimuthal angles.