摘要:
A gas introducing structure of an intake path includes a gas introducing path introducing a gas into an intake airflow in the intake path of an internal combustion engine, wherein an inner peripheral surface of the gas introducing path is made of a bottom surface appearing as a straight line at a lower side of a perpendicular cross section of the inner peripheral surface and a curved wall surface appearing as a convex curved line, connecting with each end of the straight line at an angle, at an upper side of the perpendicular cross section of the inner peripheral surface.
摘要:
A gas introducing structure of an intake path includes a gas introducing path introducing a gas into an intake airflow in the intake path of an internal combustion engine, wherein an inner peripheral surface of the gas introducing path is made of a bottom surface appearing as a straight line at a lower side of a perpendicular cross section of the inner peripheral surface and a curved wall surface appearing as a convex curved line, connecting with each end of the straight line at an angle, at an upper side of the perpendicular cross section of the inner peripheral surface.
摘要:
A gas introducing structure of an intake path includes a gas introducing path introducing a gas into an intake airflow in the intake path of an internal combustion engine, wherein an inner peripheral surface of the gas introducing path is made of a bottom surface appearing as a straight line at a lower side of a perpendicular cross section of the inner peripheral surface and a curved wall surface appearing as a convex curved line, connecting with each end of the straight line at an angle, at an upper side of the perpendicular cross section of the inner peripheral surface.
摘要:
A substrate inspection apparatus 1-1 (FIG. 1) of the present invention performs the following steps of: carrying a substrate “S” to be inspected into an inspection chamber 23-1; maintaining a vacuum in said inspection chamber; isolating said inspection chamber from a vibration; moving successively said substrate by means of a stage 26-1 with at least one degree of freedom; irradiating an electron beam having a specified width; helping said electron beam reach to a surface of said substrate via a primary electron optical system 10-1; trapping secondary electrons emitted from said substrate via a secondary electron optical system 20-1 and guiding it to a detecting system 35-1; forming a secondary electron image in an image processing system based on a detection signal of a secondary electron beam obtained by said detecting system; detecting a defective location in said substrate based on the secondary electron image formed by said image processing system; indicating and/or storing said defective location in said substrate by CPU 37-1; and taking said completely inspected substrate out of the inspection chamber. Thereby, the defect inspection on the substrate can be performed successively with high level of accuracy and efficiency as well as with higher throughput.
摘要:
The present invention is intended to provide a pharmaceutical product for inhibiting expression of at least one lipid metabolism related mRNA selected from the group consisting of Angptl4 mRNA, SCD-1 mRNA, and SREBP1c mRNA, the present invention is also intended to provide a preventive and/or therapeutic agent for various diseases based on inhibition of expression of at least one lipid metabolism related mRNA selected from the group consisting of Angptl4 mRNA, SCD-1 mRNA, and SREBP1c mRNA, and the present invention relates to an agent for inhibiting expression of at least one lipid metabolism related mRNA selected from the group consisting of Angptl4 mRNA, SCD-1 mRNA, and SREBP1c mRNA, and relates also to a preventive and/or therapeutic agent for various diseases based on the inhibition of the expression of at least one lipid metabolism related mRNA selected from the group consisting of Angptl4 mRNA, SCD-1 mRNA, and SREBP1c mRNA, the agent comprising a compound represented by Formula (I), its salt, or a solvate of any of them as an active ingredient: wherein the symbols are the same as those given in the description.
摘要:
A semiconductor device includes a substrate, an element formed on the substrate, a nitride film formed on the substrate, a anti-peel film formed on the nitride film, and a molded resin covering the anti-peel film and the element. The anti-peel film has residual compressive stress.
摘要:
A moving image encoding apparatus includes a first-step encoding section for executing a plurality of times first-step encoding by use of different quantization control variables; a code-amount estimation section for estimating, for all the quantization control variables, an amount of codes generated for each frame by making use of a plurality of results of the encoding; a code-amount allocation section for allocating an amount of codes for each frame on the basis of results of the estimation; and a second-step encoding section for executing second-step encoding on the basis of the amount of codes allocated to each frame. The first-step encoding section changes the number of times of execution of the encoding in accordance with the attribute of each frame, and omits a portion of processes contained in the coding process in the second and subsequent executions of the encoding process.
摘要:
An organic electroluminescent device is provided and has at least one organic layer between a pair of electrodes. The organic compound contains a compound represented by the following formula (I): Z1 and Z2 each represents a nitrogen-containing aromatic 6-membered ring coordinating to platinum atom at the nitrogen atom, Q represents a nitrogen-containing aromatic 5-membered ring having one or two nitrogen atoms, L1 and L2 each represents a single bond or a divalent group, and n represents 0 or 1.
摘要:
Provided is a defect inspection apparatus and an inspection (or evaluation) method with highly improved accuracy, which would not be provided by the prior art, in the defect inspection apparatus used in a manufacturing process of a semiconductor device.Provided is a method for inspecting a sample surface with a projection type electron beam inspection apparatus, comprising the steps of: forming such an irradiation area on the sample surface by an electron beam generated from an electron gun 21 that has approximately a circular or elliptical shape of a size larger than a pattern on the sample surface; irradiating the electron beam substantially onto a center of the pattern on the sample surface; and forming an image on an electron detection plane of a detector from secondary electrons emanating from the sample surface in response to the irradiation of the electron beam for inspecting the sample surface.
摘要:
A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source 25•1, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector 25•11.