公开(公告)号：US20190305508A1

公开(公告)日：2019-10-03

申请号：US16446662

申请日：2019-06-20

Applicant: Gigaphoton Inc.

Inventor： Takashi ONOSE ,  Osamu WAKABAYASHI

IPC: H01S3/23 ,  H01S3/108 ,  G02F1/35 ,  G02F1/355 ,  H01S3/109 ,  H01S3/067 ,  H01S3/10 ,  H01S3/11 ,  H01S3/115 ,  H01S3/16 ,  H01S3/131

Abstract: A solid state laser device includes a seed laser that outputs continuous wave laser seed light, a light intensity changeable unit that changes a light intensity thereof and outputs seed pulse light, a CW excitation laser that outputs continuous wave excitation light, an amplifier that amplifies the seed pulse light and outputs amplified light based on an amplification gain increased by the excitation light, a wavelength conversion unit that converts a wavelength of the amplified light and outputs harmonic light, and a light intensity control unit that allows the light intensity changeable unit to output the seed pulse light after a certain time elapsed from an input of an external trigger signal each time the signal is input and output suppression light that suppresses an increase of the amplification gain in a period after an output of the seed pulse light until an input of a next external trigger signal.

公开(公告)号：US20190103724A1

公开(公告)日：2019-04-04

申请号：US16208815

申请日：2018-12-04

Applicant: GIGAPHOTON INC.

Inventor： Takashi ONOSE ,  Osamu WAKABAYASHI

IPC: H01S3/094 ,  H01S3/00 ,  H01S3/11

Abstract: A laser system includes a laser device configured to output pulse laser light, and a first optical pulse stretcher including a delay optical path for stretching a pulse width of the pulse laser light. The first optical pulse stretcher is configured to change a beam waist position of circulation light that circulates through the delay optical path and is output therefrom, in an optical path axis direction according to a circulation count. When the circulation light is condensed by an ideal lens, a light condensing position of the circulation light is changed in the optical path axis direction according to the circulation count.

公开(公告)号：US20170338619A1

公开(公告)日：2017-11-23

申请号：US15672754

申请日：2017-08-09

Applicant: GIGAPHOTON INC.

Inventor： Takashi ONOSE ,  Osamu WAKABAYASHI

IPC: H01S3/10 ,  H01S3/23 ,  G02F1/37

CPC classification number: H01S3/10 ,  G02F1/37 ,  G02F2001/354 ,  G02F2201/16 ,  H01S3/0078 ,  H01S3/0092 ,  H01S3/06754 ,  H01S3/094003 ,  H01S3/09415 ,  H01S3/10015 ,  H01S3/10069 ,  H01S3/1608 ,  H01S3/1618 ,  H01S3/2251 ,  H01S3/23 ,  H01S3/2316 ,  H01S3/2375 ,  H01S3/2383 ,  H01S3/2391 ,  H01S5/06804 ,  H01S5/141

Abstract: A solid-state laser system may include a first solid-state laser unit, a second solid-state laser unit, a wavelength conversion system, a wavelength detector, and a wavelength controller. The wavelength conversion system may receive a first pulsed laser light beam with a first wavelength and a second pulsed laser light beam with a second wavelength, and output a third pulsed laser light beam with a third wavelength converted from the first and second wavelengths. The wavelength controller may control the first solid-state laser unit to vary the first wavelength on a condition that an absolute value of a difference between a value of a target wavelength and a value of the third wavelength detected by the wavelength detector is equal to or less than a predetermined value, and control the second solid-state laser unit to vary the second wavelength on a condition that the absolute value exceeds the predetermined value.

公开(公告)号：US20240391020A1

公开(公告)日：2024-11-28

申请号：US18796336

申请日：2024-08-07

Applicant: Gigaphoton Inc.

Inventor： Takashi ONOSE ,  Yasuhiro KAMBA ,  Hironori IGARASHI

IPC: B23K26/0622 ,  B23K26/06 ,  B23K26/064 ,  B23K26/70

Abstract: A laser device, to be used in a laser processing system for performing laser processing by irradiating a workpiece with laser light in a gas containing oxygen includes a solid-state oscillator including a solid-state laser device configured to output laser light having a pulse width in a range of 100 ps to 1 ns both inclusive and having a center wavelength within an oscillation wavelength range of an ArF excimer laser device and outside absorption lines of oxygen, an ArF excimer amplifier configured to amplify the laser light output from the solid-state oscillator, and a first optical pulse stretcher configured to output laser light that is burst-pulsed by dividing the laser light amplified by the ArF excimer amplifier into a plurality of pulses as the laser light being caused to circulate through a delay optical path thereof.

公开(公告)号：US20170279241A1

公开(公告)日：2017-09-28

申请号：US15616163

申请日：2017-06-07

Applicant: GIGAPHOTON INC.

Inventor： Takashi ONOSE ,  Osamu WAKABAYASHI

IPC: H01S3/091 ,  H01S3/0941 ,  H01S3/094 ,  G02F1/355 ,  H01S3/06 ,  H01S3/16 ,  H01S3/107 ,  G02F1/37 ,  H01S3/067 ,  H01S3/109

CPC classification number: H01S3/0912 ,  G02F1/3534 ,  G02F1/3551 ,  G02F1/37 ,  G02F2001/3507 ,  G02F2001/354 ,  G03F7/70025 ,  H01S3/0071 ,  H01S3/0085 ,  H01S3/0092 ,  H01S3/0602 ,  H01S3/06754 ,  H01S3/094076 ,  H01S3/0941 ,  H01S3/10046 ,  H01S3/10053 ,  H01S3/107 ,  H01S3/109 ,  H01S3/1666 ,  H01S3/2251 ,  H01S3/2366 ,  H01S3/2375 ,  H01S3/2391

Abstract: A solid-state laser system may include first and second solid-state laser units, a wavelength conversion system, an optical shutter, and a controller. The first solid-state laser unit and the second solid-state laser unit may output first pulsed laser light with a first wavelength and second pulsed laser light with a second wavelength, respectively. The controller may perform first control and second control. The first control may cause the first and second pulsed laser light to enter the wavelength conversion system at a substantially coincidental timing, thereby causing the wavelength conversion system to output third pulsed laser light with a third wavelength converted from the first wavelength and the second wavelength, and the second control may prevent the first and second pulsed laser light from entering the wavelength conversion system at the coincidental timing, thereby preventing the wavelength conversion system from outputting the third pulsed laser light.

公开(公告)号：US20230311247A1

公开(公告)日：2023-10-05

申请号：US18332588

申请日：2023-06-09

Applicant: Gigaphoton Inc.

Inventor： Takashi ONOSE

IPC: B23K26/08 ,  B23K26/38

CPC classification number: B23K26/0876 ,  B23K26/083 ,  B23K26/38

Abstract: A laser machining method forms a machined portion in a machining area of a machining object by irradiating the machining area with a pulse laser beam. The laser machining method includes an irradiation process of irradiating the machining area with the pulse laser beam output from an excimer laser apparatus by guiding the pulse laser beam to part of the machining area and moving the guided pulse laser beam through irradiation spots, and a movement process of moving the machining object in a height direction of the machining object. The irradiation process is performed at a plurality of height positions on the machining object moved in the height direction in the movement process. In the irradiation process, at least part of each of the irradiation spots of the pulse laser beam overlaps another irradiation spot adjacent to the irradiation spot.

公开(公告)号：US20210242649A1

公开(公告)日：2021-08-05

申请号：US17237471

申请日：2021-04-22

Applicant: Gigaphoton Inc.

Inventor： Takashi ONOSE

IPC: H01S3/00 ,  G02B27/09 ,  G02B27/10 ,  H01S3/10 ,  H01S3/23

Abstract: A laser system including: A. a laser apparatus configured to output a pulse laser beam; B. an optical pulse stretcher including a delay optical path for expanding a pulse width of the pulse laser beam; and C. a phase optical element included in the delay optical path and having a function of spatially and randomly shifting a phase of the pulse laser beam. The phase optical element includes a plurality of types of cells providing different amounts of phase shift to the pulse laser beam and arranged irregularly in any direction.

公开(公告)号：US20190288472A1

公开(公告)日：2019-09-19

申请号：US16429434

申请日：2019-06-03

Applicant: Gigaphoton Inc.

Inventor： Takashi ONOSE

IPC: H01S3/00 ,  G02B27/09 ,  G02B27/10 ,  H01S5/00

Abstract: A laser system including: A. a laser apparatus configured to output a pulse laser beam; B. an optical pulse stretcher including a delay optical path for expanding a pulse width of the pulse laser beam; and C. a phase optical element included in the delay optical path and having a function of spatially and randomly shifting a phase of the pulse laser beam. The phase optical element includes a plurality of types of cells providing different amounts of phase shift to the pulse laser beam and arranged irregularly in any direction.

公开(公告)号：US20170244215A1

公开(公告)日：2017-08-24

申请号：US15590113

申请日：2017-05-09

Applicant: TOKYO UNIVERSITY OF SCIENCE FOUNDATION ,  GIGAPHOTON INC.

Inventor： Shuntaro WATANABE ,  Tomoharu NAKAZATO ,  Takashi ONOSE

IPC: H01S3/16

CPC classification number: H01S3/1625 ,  B23K26/0622 ,  B23K26/0624 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/083 ,  H01S3/094038 ,  H01S3/10069 ,  H01S3/10092 ,  H01S3/1305 ,  H01S3/139 ,  H01S3/1394 ,  H01S3/1636 ,  H01S3/23 ,  H01S3/2316 ,  H01S3/2325 ,  H01S3/2333 ,  H01S2301/02

Abstract: A titanium-sapphire laser apparatus may include a continuous wave oscillation laser unit, an amplification oscillator, a pulsed laser unit, an error detector, an error controller, and an optical path length corrector. The amplification oscillator may include an optical resonator and a titanium-sapphire crystal that is provided in an optical path in the optical resonator. The error detector may be provided in an optical path of leak light of seed light from the optical resonator, and may detect an optical path length error between an optical path length in the optical resonator and a positive integer multiple of a wavelength of the seed light and output an optical path length error signal. The optical path length corrector may vary the optical path length in the optical resonator on a basis of a signal resulting from adding a correction value to the optical path error signal.

公开(公告)号：US20160187788A1

公开(公告)日：2016-06-30

申请号：US14983962

申请日：2015-12-30

Applicant: Gigaphoton Inc.

Inventor： Takashi ONOSE ,  Kouji KAKIZAKI ,  Osamu WAKABAYASHI ,  Akiyoshi SUZUKI

IPC: G03F7/20

CPC classification number: G03F7/70058 ,  G03F7/7035 ,  G03F7/70408 ,  G03F7/70575

Abstract: An exposure apparatus may include a laser light source capable of varying a wavelength of a laser beam that is emitted from the laser light source, a mask on which a pattern is formed, the pattern being configured to generate diffracted light by being irradiated with the laser beam, and a controller configured to control, in accordance with a distance between the mask and a substrate, the wavelength of the laser beam that is emitted from the laser light source, wherein the mask is irradiated with the laser beam emitted from the laser light source to perform proximity exposure on a surface of the substrate.

Abstract translation: 曝光装置可以包括能够改变从激光光源发射的激光束的波长的激光源，形成有图案的掩模，该图案被配置为通过照射激光产生衍射光 光束和控制器，被配置为根据掩模和衬底之间的距离来控制从激光光源发射的激光束的波长，其中掩模被从激光发射的激光束照射 源，以在基板的表面上进行接近曝光。