公开(公告)号：US20200249452A1

公开(公告)日：2020-08-06

申请号：US16853611

申请日：2020-04-20

申请人： Gigaphoton Inc.

发明人： Akiyoshi SUZUKI ,  Osamu WAKABAYASHI

IPC分类号： G02B19/00 ,  G02B27/09 ,  G02B5/00 ,  G02B27/30 ,  G02B26/08 ,  G01J1/42 ,  H01L21/027 ,  G03F7/20

摘要： A laser radiation system according to a viewpoint of the present disclosure includes a first optical system configured to convert a first laser flux into a second laser flux, a multimirror device including mirrors, configured to be capable of controlling the angle of the attitude of each of the mirrors, and configured to divide the second laser flux into laser fluxes and reflect the laser fluxes in directions to produce the divided laser fluxes, a Fourier transform optical system configured to focus the divided laser fluxes, and a control section configured to control the angle of the attitude of each of the mirrors in such a way that the Fourier transform optical system superimposes the laser fluxes, which are divided by the mirrors separate from each other by at least a spatial coherence length of the second laser flux, on one another.

公开(公告)号：US20240272444A1

公开(公告)日：2024-08-15

申请号：US18636475

申请日：2024-04-16

申请人： Gigaphoton Inc.

发明人： Yasufumi KAWASUJI ,  Osamu WAKABAYASHI ,  Akiyoshi SUZUKI

IPC分类号： G02B27/09 ,  B23K26/06 ,  B23K26/0622 ,  B23K26/067 ,  B23K26/324 ,  B23K26/70 ,  B23K101/36 ,  B23K103/00 ,  H01L21/48 ,  H01L23/00

CPC分类号： G02B27/0988 ,  B23K26/0622 ,  B23K26/0648 ,  B23K26/0665 ,  B23K26/067 ,  B23K26/324 ,  B23K26/705 ,  G02B27/0944 ,  H01L21/486 ,  B23K2101/36 ,  B23K2103/42 ,  B23K2103/54 ,  H01L24/16 ,  H01L2224/16227

摘要： A laser processing system includes a laser apparatus configured to output a pulse laser beam, a divergence adjuster configured to adjust a first beam divergence in a first direction of the pulse laser beam and a second beam divergence in a second direction which intersects the first direction, a measuring instrument configured to measure the first and second beam divergences of the pulse laser beam having passed through the divergence adjuster, a diffractive optical element configured to branch the pulse laser beam having passed through the measuring instrument, and a processor configured to control the divergence adjuster such that the first and second beam divergences approach respective target values based on measurement results of the first and second beam divergences by the measuring instrument.

公开(公告)号：US20230155343A1

公开(公告)日：2023-05-18

申请号：US18149986

申请日：2023-01-04

申请人： Gigaphoton Inc.

发明人： Junichi FUJIMOTO ,  Takahito KUMAZAKI ,  Akiyoshi SUZUKI

IPC分类号： H01S3/139 ,  H01S3/097 ,  H01S3/13 ,  G01B11/26 ,  G01D5/26 ,  G03F7/20

CPC分类号： H01S3/139 ,  H01S3/097 ,  H01S3/1305 ,  G01B11/26 ,  G01D5/26 ,  G03F7/7055 ,  H01S3/11

摘要： A laser apparatus includes a first optical element, a second optical element, a first actuator configured to change a first wavelength component included in a pulse laser beam by changing a posture of the first optical element, a second actuator configured to change a second wavelength component included in the pulse laser beam by changing a posture of the second optical element, a first encoder configured to measure a position of the first actuator, a second encoder configured to measure a position of the second actuator, and a processor. The processor reads a first relation and a second relation and performs control of the first actuator based on the first relation and the position of the first actuator measured by the first encoder and control of the second actuator based on the second relation and the position of the second actuator measured by the second encoder.

公开(公告)号：US20220009031A1

公开(公告)日：2022-01-13

申请号：US17487348

申请日：2021-09-28

申请人： Gigaphoton Inc.

发明人： Satoshi TANAKA ,  Akiyoshi SUZUKI ,  Hideo HOSHINO

IPC分类号： B23K26/082 ,  B23K26/0622

摘要： Provided is a laser annealing apparatus causing laser light to be radiated to processing receiving areas arranged, out of a first direction and a second direction perpendicular to the first direction, along at least the second direction and move a batch radiation area and a workpiece in the first direction, and the laser annealing apparatus includes an energy density measuring apparatus measuring the energy density at, out of first and second ends of the batch radiation area in the second direction, at least the second end, an energy density adjusting apparatus adjusting the energy density at the first end, and a controller controlling the energy density adjusting apparatus. The energy density at the first end when (N+1)-th scanning is performed is so adjusted that the energy density at the first end in an (N+1)-th scan area approaches the energy density at the second end in the N-th scan area.

公开(公告)号：US20170302050A1

公开(公告)日：2017-10-19

申请号：US15350284

申请日：2016-11-14

申请人： Gigaphoton Inc.

发明人： Kouji KAKIZAKI ,  Masaki ARAKAWA ,  Kouji ASHIKAWA ,  Yasuhiro KAMBA ,  Akiyoshi SUZUKI ,  Osamu WAKABAYASHI

IPC分类号： H01S3/105 ,  H01S3/225 ,  H01S3/081 ,  G02B27/09 ,  H01S3/00 ,  G02B27/12 ,  H01S3/23 ,  H01S3/13

CPC分类号： H01S3/005 ,  G02B27/0955 ,  G02B27/123 ,  H01S3/0071 ,  H01S3/081 ,  H01S3/105 ,  H01S3/1305 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2253 ,  H01S3/2255 ,  H01S3/2256 ,  H01S3/2366

摘要： The laser system may include first and second laser apparatuses and a beam delivery device. The first laser apparatus may be provided so as to emit a first laser beam to the beam delivery device in a first direction. The second laser apparatus may be provided so as to emit a second laser beam to the beam delivery device in a direction substantially parallel to the first direction. The beam delivery device may be configured to bundle the first and second laser beams and to emit the first and second laser beams from the beam delivery device to a beam delivery direction different from the first direction.

公开(公告)号：US20220131335A1

公开(公告)日：2022-04-28

申请号：US17569380

申请日：2022-01-05

申请人： Gigaphoton Inc.

发明人： Akiyoshi SUZUKI ,  Hironori IGARASHI

IPC分类号： H01S3/10 ,  H01S3/225 ,  H01S5/40 ,  H01S5/00 ,  H01S3/23 ,  H01S5/12 ,  G02F1/35 ,  H01S3/16 ,  H01S3/067 ,  B23K26/06

摘要： A laser apparatus according to an aspect of the present disclosure includes a plurality of semiconductor lasers, a plurality of optical switches disposed in the optical paths of the plurality of respective semiconductor lasers, a wavelength conversion system configured to convert pulsed beams outputted from the plurality of optical switches in terms of wavelength to generate wavelength-converted beams, an ArF excimer laser amplifier configured to amplify the wavelength-converted beams, and a controller configured to control the operations of the plurality of semiconductor lasers and the plurality of optical switches, and the plurality of semiconductor lasers are each configured to output a laser beam so produced that wavelengths of the wavelength-converted beams are wavelengths at which the ArF excimer laser amplifier performs amplification and differ from the optical absorption lines of oxygen.

公开(公告)号：US20170093119A1

公开(公告)日：2017-03-30

申请号：US15379192

申请日：2016-12-14

申请人： Gigaphoton Inc.

发明人： Akiyoshi SUZUKI ,  Osamu WAKABAYASHI ,  Masaki ARAKAWA ,  Koji ASHIKAWA ,  Yasuhiro KAMBA

IPC分类号： H01S3/23 ,  H01S3/00 ,  G02B27/12 ,  B23K26/00 ,  H01L21/67 ,  H01L21/02 ,  H01L27/12 ,  H01S3/081 ,  G02B27/10

CPC分类号： H01S3/23 ,  B23K26/0006 ,  B23K26/032 ,  B23K26/0608 ,  B23K26/0622 ,  B23K26/082 ,  B23K26/352 ,  B23K26/707 ,  B23K2101/40 ,  B23K2103/50 ,  B23K2103/56 ,  G02B27/106 ,  G02B27/123 ,  G02B27/126 ,  H01L21/02532 ,  H01L21/02592 ,  H01L21/02686 ,  H01L21/67115 ,  H01L27/1285 ,  H01S3/0071 ,  H01S3/081 ,  H01S3/225 ,  H01S3/2383

摘要： A laser system may include a plurality of laser apparatuses, a beam delivery device configured to bundle pulse laser beams emitted from respective laser apparatuses of the plurality of laser apparatuses to emit a bundled laser beam, and a controller configured to control operated laser apparatuses of the plurality of laser apparatuses such that, at a change in a number representing how many laser apparatuses are operated, a beam parameter of the bundled laser beam emitted from the beam delivery device approaches a beam parameter of the bundled laser beam emitted before the change.

公开(公告)号：US20180314156A1

公开(公告)日：2018-11-01

申请号：US16028240

申请日：2018-07-05

申请人： Gigaphoton Inc.

发明人： Akiyoshi SUZUKI ,  Osamu WAKABAYASHI

IPC分类号： G03F7/20 ,  H05H13/04 ,  H01S3/09

摘要： The present invention allows more freely setting of the polarization direction of illumination light on an illumination surface of an exposure device. A beam transmission system (121) that transmits, to an exposure device (130), a linearly polarized optical beam (L) output from a free electron laser device (10) includes: an optical beam splitting unit (50) configured to split the optical beam (L) into a first optical beam (L1) and a second optical beam (L2); and a first polarization direction rotating unit (51) configured to rotate the linear polarization direction of the first optical beam (L1).

公开(公告)号：US20170149198A1

公开(公告)日：2017-05-25

申请号：US15426155

申请日：2017-02-07

申请人： GIGAPHOTON INC.

发明人： Osamu WAKABAYASHI ,  Shinji OKAZAKI ,  Akiyoshi SUZUKI

IPC分类号： H01S3/08 ,  H01S3/11 ,  G03F7/20 ,  H01S3/09

CPC分类号： H01S3/08009 ,  G02B17/0621 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70158 ,  G03F7/70558 ,  H01L21/027 ,  H01S3/005 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/08059 ,  H01S3/0903 ,  H01S3/11

摘要： There is provided a light source system that may include a free electron laser apparatus, a light concentrating mirror, and a delaying optical system. The free electron laser apparatus may include an undulator, and may be configured to output a pulsed laser light beam toward an exposure apparatus. The light concentrating mirror may be configured to concentrate the pulsed laser light beam to enter the exposure apparatus. The delaying optical system may be provided in an optical path between the undulator and the light concentrating mirror, and may be configured to delay the pulsed laser light beam to allow an amount of delay of the pulsed laser light beam to be varied depending on a position in a beam cross-section of the pulsed laser light beam.

公开(公告)号：US20160187788A1

公开(公告)日：2016-06-30

申请号：US14983962

申请日：2015-12-30

申请人： Gigaphoton Inc.

发明人： Takashi ONOSE ,  Kouji KAKIZAKI ,  Osamu WAKABAYASHI ,  Akiyoshi SUZUKI

IPC分类号： G03F7/20

CPC分类号： G03F7/70058 ,  G03F7/7035 ,  G03F7/70408 ,  G03F7/70575

摘要： An exposure apparatus may include a laser light source capable of varying a wavelength of a laser beam that is emitted from the laser light source, a mask on which a pattern is formed, the pattern being configured to generate diffracted light by being irradiated with the laser beam, and a controller configured to control, in accordance with a distance between the mask and a substrate, the wavelength of the laser beam that is emitted from the laser light source, wherein the mask is irradiated with the laser beam emitted from the laser light source to perform proximity exposure on a surface of the substrate.

摘要翻译： 曝光装置可以包括能够改变从激光光源发射的激光束的波长的激光源，形成有图案的掩模，该图案被配置为通过照射激光产生衍射光 光束和控制器，被配置为根据掩模和衬底之间的距离来控制从激光光源发射的激光束的波长，其中掩模被从激光发射的激光束照射 源，以在基板的表面上进行接近曝光。