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    GAS LASER APPARATUS
    1.
    发明申请
    GAS LASER APPARATUS 审中-公开

    公开(公告)号：US20190074655A1

    公开(公告)日：2019-03-07

    申请号：US16178382

    申请日：2018-11-01

    Applicant: Gigaphoton Inc.

    Inventor： Natsushi SUZUKI ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO

    IPC: H01S3/036 ,  B01D53/04 ,  H01S3/104 ,  H01S3/225 ,  B01D53/34 ,  B01D53/82 ,  B01D53/86 ,  B01D53/68

    Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

    GAS LASER APPARATUS
    4.
    发明申请
    GAS LASER APPARATUS 有权
    气体激光装置

    公开(公告)号：US20160248215A1

    公开(公告)日：2016-08-25

    申请号：US15145016

    申请日：2016-05-03

    Applicant: Gigaphoton Inc.

    Inventor： Natsushi SUZUKI ,  Osamu WAKABAYASHI ,  Hiroaki TSUSHIMA ,  Masanori YASHIRO

    IPC: H01S3/036 ,  H01S3/225 ,  B01D53/04 ,  H01S3/104

    CPC classification number: H01S3/036 ,  B01D53/0446 ,  B01D53/346 ,  B01D53/685 ,  B01D53/82 ,  B01D53/86 ,  B01D2251/404 ,  B01D2251/602 ,  B01D2253/108 ,  B01D2255/20753 ,  B01D2255/20761 ,  B01D2257/2027 ,  B01D2258/0216 ,  B01D2259/40003 ,  H01S3/104 ,  H01S3/225

    Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.

    Abstract translation: 气体激光装置可以包括：激光室，其通过第一控制阀连接到第一激光气体供应源，第一激光气体供应源提供含有卤素气体的第一激光气体，并通过第二控制阀连接到第二激光气体供应源， 具有比第一激光气体低的卤素气体浓度的第二激光气体; 净化塔，其从至少一部分从激光室排出的气体中除去至少一部分卤素气体和卤素化合物; 增压泵，其通过第三控制阀连接到激光室，其将通过净化塔的气体的压力升高到高于激光室的工作气体压力的气体压力; 以及控制器，其基于从所述增压泵通过所述第三控制阀向所述激光室供给的第一量的气体计算第二量的所述第一激光气体，所述第一激光气体将被供给到所述激光室并控制 基于计算第二量的结果的第一控制阀。

    LASER GAS REGENERATION SYSTEM AND LASER SYSTEM
    5.
    发明申请
    LASER GAS REGENERATION SYSTEM AND LASER SYSTEM 审中-公开

    公开(公告)号：US20190237928A1

    公开(公告)日：2019-08-01

    申请号：US16375591

    申请日：2019-04-04

    Applicant: Gigaphoton Inc.

    Inventor： Masanori YASHIRO ,  Hiroaki TSUSHIMA ,  Osamu WAKABAYASHI

    IPC: H01S3/036 ,  H01S3/097 ,  H01S3/225 ,  H01S3/104 ,  C01B7/20

    CPC classification number: H01S3/036 ,  C01B7/20 ,  H01S3/03 ,  H01S3/09705 ,  H01S3/104 ,  H01S3/2258

    Abstract: A laser gas regeneration system for an excimer laser includes a first pipe capable of supplying a laser chamber with a first laser gas, a second pipe capable of supplying the laser chamber with a second laser gas having a halogen gas concentration higher than that of the first laser gas, a third pipe allowing a gas exhausted from the laser chamber to pass therethrough, a gas refiner that refines the gas having passed through the third pipe, a branch that causes the refined gas to divide and flow into a fourth pipe and a fifth pipe, a first regenerated gas supplier that supplies the first pipe with a gas having divided and flowed into the fourth pipe, and a second regenerated gas supplier that adds a halogen gas to a gas having divided and flowed into the fifth pipe and supplies the second pipe with the halogen-added gas.

    LASER CHAMBER
    6.
    发明申请
    LASER CHAMBER 有权
    激光室

    公开(公告)号：US20160365696A1

    公开(公告)日：2016-12-15

    申请号：US15245245

    申请日：2016-08-24

    Applicant: Gigaphoton Inc.

    Inventor： Hiroaki TSUSHIMA ,  Kouji KAKIZAKI ,  Takashi MATSUNAGA ,  Takeshi ASAYAMA ,  Hisakazu KATSUUMI ,  Hiroshi UMEDA ,  Hiroyuki IKEDA

    IPC: H01S3/036 ,  H01S3/225 ,  H01S3/038 ,  H01S3/041 ,  H01S3/04

    CPC classification number: H01S3/036 ,  H01S3/038 ,  H01S3/0384 ,  H01S3/0407 ,  H01S3/041 ,  H01S3/08004 ,  H01S3/08009 ,  H01S3/09702 ,  H01S3/09713 ,  H01S3/134 ,  H01S3/225

    Abstract: A laser chamber including a first space and a second space in communication with the first space may include: a first discharge electrode disposed in the first space; a second discharge electrode disposed in the first space to face the first discharge electrode; a fan disposed in the first space and configured to flow laser gas between the first discharge electrode and the second discharge electrode; a peaking condenser disposed in the second space; and an electrical insulating member configured to partition the first space and the second space from one another, and disposed to allow the laser gas to pass through between the first space and the second space.

    Abstract translation: 包括与第一空间连通的第一空间和第二空间的激光室可以包括：设置在第一空间中的第一放电电极; 设置在所述第一空间中以面对所述第一放电电极的第二放电电极; 风扇，设置在所述第一空间中并且被配置为使所述第一放电电极和所述第二放电电极之间的激光气体流动; 设置在所述第二空间中的峰化冷凝器; 以及电绝缘构件，其被配置为将所述第一空间和所述第二空间彼此分隔开，并且被设置成允许所述激光气体在所述第一空间和所述第二空间之间通过。

    EXCIMER LASER APPARATUS AND EXCIMER LASER SYSTEM
    7.
    发明申请
    EXCIMER LASER APPARATUS AND EXCIMER LASER SYSTEM 有权
    EXCIMER激光设备和激光激光系统

    公开(公告)号：US20160322772A1

    公开(公告)日：2016-11-03

    申请号：US15208637

    申请日：2016-07-13

    Applicant: Gigaphoton Inc.

    Inventor： Tooru ABE ,  Takeshi OHTA ,  Hiroaki TSUSHIMA ,  Osamu WAKABAYASHI

    IPC: H01S3/036 ,  H01S3/225 ,  H01S3/134 ,  H01S3/097 ,  H01S3/13

    CPC classification number: H01S3/036 ,  H01S3/08009 ,  H01S3/09702 ,  H01S3/10046 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2366

    Abstract: Problem: to suppress the number of times complete gas replacement in a laser chamber.Solution: this excimer laser apparatus may include a gas supply unit, connected to a first receptacle that holds a first laser gas containing halogen gas and a second receptacle that holds a second laser gas having a lower halogen gas concentration than the first laser gas, that supplies the first laser gas and the second laser gas to the interior of the laser chamber. Then, gas pressure control in which the gas supply unit supplies the second laser gas to the interior of the laser chamber or a gas exhaust unit partially exhausts gas from within the laser chamber, and partial gas replacement control in which the gas supply unit supplies the first laser gas and the second laser gas to the interior of the laser chamber and the gas exhaust unit partially exhausts gas from within the laser chamber sequentially, may be selectively performed.

    Abstract translation: 解决方案：该准分子激光装置可以包括气体供应单元，其连接到保持含有卤素气体的第一激光气体的第一容器和保持具有比第一激光气体低的卤素气体浓度的第二激光气体的第二容器， 将第一激光气体和第二激光气体提供给激光室的内部。 然后，其中气体供给单元将第二激光气体供给到激光室的内部的气体压力控制或者气体排出单元部分地从激光室内排出气体，并且气体供给单元提供气体供给单元 可以选择性地执行第一激光气体和到激光室内部的第二激光气体和排气单元部分地从激光室内部排出气体。

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