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公开(公告)号：US11791124B2
公开(公告)日：2023-10-17
申请号：US17230650
申请日：2021-04-14
Applicant: Hitachi High-Technologies Corporation
Inventor： Yuta Kawamoto , Akira Ikegami , Yasushi Ebizuka , Nobuo Fujinaga
IPC: H01J37/10 , H01J37/153 , H01J37/147
CPC classification number: H01J37/153 , H01J37/10 , H01J37/1472 , H01J2237/0473 , H01J2237/1534
Abstract: An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.
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公开(公告)号：US09105446B2
公开(公告)日：2015-08-11
申请号：US14376901
申请日：2013-01-28
Applicant: Hitachi High-Technologies Corporation
Inventor： Yasushi Ebizuka , Seiichiro Kanno , Makoto Nishihara , Masashi Fujita
CPC classification number: H01J37/226 , H01J37/026 , H01J37/20 , H01J37/28 , H01J2237/0047 , H01J2237/06 , H01J2237/2007 , H01J2237/2801 , H02N13/00
Abstract: An object of the present invention is to provide a charged particle beam apparatus that effectively removes electrical charges from an electrostatic chuck.In order to achieve the above object, the charged particle beam apparatus of the present invention includes a sample chamber that maintains a space containing an electrostatic chuck mechanism (5) in a vacuum state; and in which the charged particle beam apparatus includes an ultraviolet light source (6) to irradiate ultraviolet light within the sample chamber, and a irradiation target member irradiated by the ultraviolet light; and the irradiation target member is placed perpendicular to the adsorption surface of the electrostatic chuck.
Abstract translation: 本发明的目的是提供一种有效地从静电卡盘去除电荷的带电粒子束装置。 为了实现上述目的，本发明的带电粒子束装置包括在真空状态下保持包含静电卡盘机构（5）的空间的样本室; 并且其中带电粒子束装置包括用于照射样品室内的紫外光的紫外光源和照射由紫外光照射的照射目标构件; 并且照射目标构件垂直于静电吸盘的吸附表面放置。
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公开(公告)号：US09401297B2
公开(公告)日：2016-07-26
申请号：US14626116
申请日：2015-02-19
Applicant: Hitachi High-Technologies Corporation
Inventor： Yasushi Ebizuka , Seiichiro Kanno , Masaya Yasukochi , Masakazu Takahashi , Naoya Ishigaki , Go Miya
IPC: H01J37/20 , H01L21/683 , H01J37/28 , H01J37/244
CPC classification number: H01L21/6833 , H01J37/20 , H01J37/244 , H01J37/28 , H01J2237/004 , H01J2237/2007 , H01J2237/28
Abstract: Proposed are an electrostatic chuck mechanism and a charged particle beam apparatus including a first plane that is a plane of a side in which a sample is adsorbed, a first electrode to which a voltage for generating an adsorptive power between the first plane and the sample is applied, and a second electrode that is arranged in a position relatively separated from the sample toward the first plane and through which a virtual line that is perpendicular to the first plane and contacts an edge of the sample passes, wherein the first plane is formed so that a size in a plane direction of the first plane is smaller than that of the sample.
Abstract translation: 提出了一种静电卡盘机构和带电粒子束装置，其包括作为吸附样品的一侧的平面的第一平面，在第一平面和样品之间产生吸附力的电压为第一电极 以及第二电极，其布置在与所述样品相对分离的位置朝向所述第一平面，并且通过所述第二电极垂直于所述第一平面并接触所述样品的边缘的虚拟线通过，其中所述第一平面形成为 第一平面的平面方向的尺寸小于样品的尺寸。
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公开(公告)号：US20150097123A1
公开(公告)日：2015-04-09
申请号：US14376901
申请日：2013-01-28
Applicant: Hitachi High-Technologies Corporation
Inventor： Yasushi Ebizuka , Seiichiro Kanno , Makoto Nishihara , Masashi Fujita
CPC classification number: H01J37/226 , H01J37/026 , H01J37/20 , H01J37/28 , H01J2237/0047 , H01J2237/06 , H01J2237/2007 , H01J2237/2801 , H02N13/00
Abstract: An object of the present invention is to provide a charged particle beam apparatus that effectively removes electrical charges from an electrostatic chuck.In order to achieve the above object, the charged particle beam apparatus of the present invention includes a sample chamber that maintains a space containing an electrostatic chuck mechanism (5) in a vacuum state; and in which the charged particle beam apparatus includes an ultraviolet light source (6) to irradiate ultraviolet light within the sample chamber, and a irradiation target member irradiated by the ultraviolet light; and the irradiation target member is placed perpendicular to the adsorption surface of the electrostatic chuck.
Abstract translation: 本发明的目的是提供一种有效地从静电卡盘去除电荷的带电粒子束装置。 为了实现上述目的，本发明的带电粒子束装置包括在真空状态下保持包含静电卡盘机构（5）的空间的样本室; 并且其中带电粒子束装置包括用于照射样品室内的紫外光的紫外光源和照射由紫外光照射的照射目标构件; 并且照射目标构件垂直于静电吸盘的吸附表面放置。
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Patent Agency Ranking
公开(公告)号：US20150060694A1
公开(公告)日：2015-03-05
申请号：US14379694
申请日：2013-02-20
Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
Inventor： Kazuhiro Gunji , Yasushi Ebizuka , Yuta Asaga
CPC classification number: H01J37/18 , H01J37/185 , H01J37/28 , H01J2237/18 , H01J2237/204 , H01J2237/28 , H01J2237/2801
Abstract: A charged particle beam device that appropriately maintains a throughput of the device for each of specimens different in a gas emission volume from each other is provided. A scanning electron microscope includes an electron source, a specimen stage, a specimen chamber, and an exchange chamber, and further includes a vacuum gauge that measures an internal pressure of the exchange chamber, a time counting unit that counts time taken when a measurement result by the vacuum gauge has reached a predetermined degree of vacuum, and an integral control unit that performs comparative calculation and determination based on a measurement result by the time counting unit and integral control based on a process flow. And, the integral control unit controls changing of a content of a subsequent process based on a shift of the degree of vacuum of the exchange chamber (for example, based on vacuum exhaust time in the exchange chamber when the specimen is in the exchange chamber or a variation of the degree of vacuum of the exchange chamber for a predetermined time interval when the specimen is in the exchange chamber).
Abstract translation: 提供了一种带电粒子束装置，其适当地保持每个气体排放量彼此不同的样本的装置的生产量。 扫描电子显微镜包括电子源，试样台，试样室和交换室，还包括测量交换室的内部压力的真空计，计时单元，其计算测量结果所用的时间 通过真空计已经达到预定的真空度，以及积分控制单元，其基于通过时间计数单元的测量结果和基于处理流程的积分控制进行比较计算和确定。 并且，积分控制单元基于交换室的真空度的变化来控制随后的处理的内容的变化（例如，当检体在交换室中时，基于交换室中的真空排气时间，或者 当样本在交换室中时，预定时间间隔内的交换室的真空度的变化）。
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公开(公告)号：US11784023B2
公开(公告)日：2023-10-10
申请号：US17462455
申请日：2021-08-31
Applicant: Hitachi High-Technologies Corporation
Inventor： Yuta Kawamoto , Akira Ikegami , Yasushi Ebizuka , Nobuo Fujinaga
IPC: H01J37/10 , H01J37/153 , H01J37/147
CPC classification number: H01J37/153 , H01J37/10 , H01J37/1472 , H01J2237/0473 , H01J2237/1534
Abstract: An object of the present disclosure is to provide a charged particle beam apparatus that can quickly find a correction condition for a new aberration that is generated in association with beam adjustment. In order to achieve the above object, the present disclosure proposes a charged particle beam apparatus configured to include an objective lens (7) configured to focus a beam emitted from a charged particle source and irradiate a specimen, a visual field movement deflector (5 and 6) configured to deflect an arrival position of the beam with respect to the specimen, and an aberration correction unit (3 and 4) disposed between the visual field movement deflector and the charged particle source, in which the aberration correction unit is configured to suppress a change in the arrival position of the beam irradiated under different beam irradiation conditions.
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公开(公告)号：US09799486B2
公开(公告)日：2017-10-24
申请号：US14796113
申请日：2015-07-10
Applicant: Hitachi High-Technologies Corporation
Inventor： Seiichiro Kanno , Yasushi Ebizuka , Go Miya , Takafumi Miwa
CPC classification number: H01J37/21 , H01J2237/0044 , H01J2237/2007
Abstract: In a charged particle beam apparatus that applies a retarding voltage to a sample through a contact terminal and executes measurement or inspection of a surface of the sample, potential variation of the sample when changing the retarding voltage applied to the contact terminal is measured by a surface potential meter, a time constant of the potential variation of the sample is obtained, and it is determined whether execution of measurement or inspection by a charged particle beam continues or stops based on the time constant, or a conduction ensuring process between the sample and the contact terminal is executed.
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8.发明授权Charged-particle beam device for irradiating a charged particle beam on a sample 有权用于将带电粒子束照射在样品上的带电粒子束装置公开(公告)号：US09543113B2
公开(公告)日：2017-01-10
申请号：US14759241
申请日：2014-01-10
Applicant: Hitachi High-Technologies Corporation
Inventor： Yasushi Ebizuka , Seiichiro Kanno , Naoya Ishigaki , Masashi Fujita
CPC classification number: H01J37/20 , H01J37/026 , H01J37/09 , H01J37/28 , H01J2237/2007
Abstract: The present invention explains a charged-particle beam device for the purpose of highly accurately measuring electrostatic charge of a sample in a held state by an electrostatic chuck (105). In order to attain the object, according to the present invention, there is proposed a charged-particle beam device including an electrostatic chuck (105) for holding a sample on which a charged particle beam is irradiated and a sample chamber (102) in which the electrostatic chuck (105) is set. The charged-particle beam device includes a potential measuring device that measures potential on a side of an attraction surface for the sample of the electrostatic chuck (105) and a control device that performs potential measurement by the potential measuring device in a state in which the sample is attracted by the electrostatic chuck (105).
Abstract translation: 本发明解释了一种带电粒子束装置，用于通过静电卡盘（105）高度准确地测量处于保持状态的样品的静电荷。 为了达到上述目的，本发明提出一种带电粒子束装置，其特征在于，包括：静电卡盘（105），用于保持照射有带电粒子束的样品和样品室（102），所述样品室 静电吸盘（105）被设定。 带电粒子束装置包括：电位测量装置，其测量用于静电卡盘（105）的样本的吸引表面的电位;以及控制装置，其通过电位测量装置进行电位测量，其中， 样品被静电吸盘（105）吸引。
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公开(公告)号：US09245710B2
公开(公告)日：2016-01-26
申请号：US14379694
申请日：2013-02-20
Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
Inventor： Kazuhiro Gunji , Yasushi Ebizuka , Yuta Asaga
CPC classification number: H01J37/18 , H01J37/185 , H01J37/28 , H01J2237/18 , H01J2237/204 , H01J2237/28 , H01J2237/2801
Abstract: A charged particle beam device that appropriately maintains a throughput of the device for each of specimens different in a gas emission volume from each other is provided. A scanning electron microscope includes an electron source, a specimen stage, a specimen chamber, and an exchange chamber, and further includes a vacuum gauge that measures an internal pressure of the exchange chamber, a time counting unit that counts time taken when a measurement result by the vacuum gauge has reached a predetermined degree of vacuum, and an integral control unit that performs comparative calculation and determination based on a measurement result by the time counting unit and integral control based on a process flow. And, the integral control unit controls changing of a content of a subsequent process based on a shift of the degree of vacuum of the exchange chamber.
Abstract translation: 提供了一种带电粒子束装置，其适当地保持每个气体排放量彼此不同的样本的装置的生产量。 扫描电子显微镜包括电子源，试样台，试样室和交换室，还包括测量交换室的内部压力的真空计，计时单元，其计算测量结果所用的时间 通过真空计已经达到预定的真空度，以及积分控制单元，其基于通过时间计数单元的测量结果和基于处理流程的积分控制进行比较计算和确定。 并且，积分控制单元基于交换室的真空度的变化来控制后续处理的内容的变化。
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