Device for storing collectibles
    2.
    发明授权
    Device for storing collectibles 有权
    用于存储收藏品的装置

    公开(公告)号:US09079449B2

    公开(公告)日:2015-07-14

    申请号:US13389639

    申请日:2010-08-09

    申请人: Hermann Gruber

    发明人: Hermann Gruber

    IPC分类号: B65D21/032 B42F7/14

    CPC分类号: B42F7/14

    摘要: A device for storing collectibles, including a base unit having a first receiving region that receives a first object and a second receiving region that receives a collectibles storage unit. The base unit has a connecting wall connecting the first and second side walls, and two receiving elements for mounting the storage unit. The first receiving region is delimited by the first side wall, the second side wall and the connecting wall. The second receiving region, open on at least one side and separated from the first receiving region by the connecting wall, is delimited by the first receiving element, the second receiving element and the connecting wall. The storage unit includes at least two segments connectable to and separable from each other, wherein each segment has a receiving region for receiving at least one collectible and wherein at least a partial region of each segment is transparent.

    摘要翻译: 一种用于存储收藏品的装置,包括具有接收第一物体的第一接收区域的基本单元和接收收藏品存储单元的第二接收区域。 基座单元具有连接第一和第二侧壁的连接壁和用于安装存储单元的两个接收元件。 第一接收区域由第一侧壁,第二侧壁和连接壁限定。 在第一接收元件,第二接收元件和连接壁上限定第二接收区域,该第二接收区域在至少一个侧面上被连接壁与第一接收区域分开。 存储单元包括至少两个可彼此连接并可彼此分离的段,其中每个段具有用于接收至少一个可收集物的接收区域,并且其中每个段的至少一部分区域是透明的。

    Semiconductor structure and method
    4.
    发明授权
    Semiconductor structure and method 有权
    半导体结构与方法

    公开(公告)号:US07468307B2

    公开(公告)日:2008-12-23

    申请号:US11476497

    申请日:2006-06-28

    IPC分类号: H01L21/76

    摘要: A semiconductor structure includes a semiconductor layer stack includes a semiconductor substrate of a first conductivity type, a heavily-doped buried layer of a second conductivity type, and a monocrystalline semiconductor layer of a third conductivity type formed on top of the semiconductor layer and the buried layer, a contact to the buried layer, the contact formed in a contact hole, and a lateral insulation of different portions of the semiconductor structure, the insulation formed in an isolation trench. A contact to the semiconductor substrate may be formed within the isolation trench.

    摘要翻译: 半导体结构包括半导体层堆叠,其包括第一导电类型的半导体衬底,第二导电类型的重掺杂掩埋层和形成在半导体层的顶部上的第三导电类型的单晶半导体层和埋入 层,与埋层的接触,在接触孔中形成的接触以及半导体结构的不同部分的横向绝缘,所述绝缘体形成在隔离沟槽中。 可以在隔离沟槽内形成与半导体衬底的接触。

    Semiconductor structure and method
    5.
    发明申请
    Semiconductor structure and method 有权
    半导体结构与方法

    公开(公告)号:US20070018195A1

    公开(公告)日:2007-01-25

    申请号:US11476497

    申请日:2006-06-28

    IPC分类号: H01L29/74

    摘要: A semiconductor structure includes a semiconductor layer stack includes a semiconductor substrate of a first conductivity type, a heavily-doped buried layer of a second conductivity type, and a monocrystalline semiconductor layer of a third conductivity type formed on top of the semiconductor layer and the buried layer, a contact to the buried layer, the contact formed in a contact hole, and a lateral insulation of different portions of the semiconductor structure, the insulation formed in an isolation trench. A contact to the semiconductor substrate may be formed within the isolation trench.

    摘要翻译: 半导体结构包括半导体层堆叠,其包括第一导电类型的半导体衬底,第二导电类型的重掺杂掩埋层和形成在半导体层的顶部上的第三导电类型的单晶半导体层和埋入 层,与埋层的接触,在接触孔中形成的接触以及半导体结构的不同部分的横向绝缘,所述绝缘体形成在隔离沟槽中。 可以在隔离沟槽内形成与半导体衬底的接触。

    Process for the preparation of thixotropic binders, the binder
obtainable by this process and their use for the preparation of coating
and sealing compounds
    6.
    发明授权
    Process for the preparation of thixotropic binders, the binder obtainable by this process and their use for the preparation of coating and sealing compounds 失效
    用于制备触变粘合剂的方法,可通过该方法获得的粘合剂及其用于制备涂料和密封剂的用途

    公开(公告)号:US4719278A

    公开(公告)日:1988-01-12

    申请号:US026928

    申请日:1987-03-17

    CPC分类号: C08G18/7664 C08G18/10

    摘要: The present invention is directed to a process for the preparation of air drying binders containing free isocyanate groups, having thixotropic properties and prepared by reacting aromatic diamines which have at least one alkyl substituent in the ortho position to each amino group with either prepolymers or semi-prepolymers containing free isocyanate groups and based on polyisocyanate mixture of the diphenylmethane series containing at least 20% by weight of 2,4'-diisocyanatodiphenylmethane and organic polyhydroxyl compounds or mixtures of these prepolymers or semi-prepolymers with prepolymers or semi-prepolymers based on other organic polyisocyanates, provided that the mixture contains at least 3% of the prepolymers or semi-prepolymers based on polyisocyanate mixtures of the diphenylmethane series. The invention further relates to the binders produced by this process and their use for the preparation of coating and sealing compounds which harden under the influence of atmospheric moisture.

    摘要翻译: 本发明涉及一种制备含有游离异氰酸酯基团的空气干燥粘合剂的方法,具有触变性能,并且通过使具有至少一个邻位的至少一个烷基取代基的芳族二胺与各个氨基与预聚物或半 - 含有游离异氰酸酯基团和基于含有至少20重量%的2,4'-二异氰酸根合二苯基甲烷和有机多羟基化合物或这些预聚物或半预聚物与其它预聚物或半预聚物的混合物的二苯基甲烷系列的多异氰酸酯混合物的预聚物 有机多异氰酸酯,条件是混合物含有至少3%的基于二苯基甲烷系列的多异氰酸酯混合物的预聚物或半预聚物。 本发明还涉及通过该方法制备的粘合剂及其用于制备在大气湿气影响下硬化的涂料和密封化合物的用途。

    Process for the production of chemically resistant coatings
    7.
    发明授权
    Process for the production of chemically resistant coatings 失效
    生产耐化学腐蚀涂层的方法

    公开(公告)号:US4609572A

    公开(公告)日:1986-09-02

    申请号:US719782

    申请日:1985-04-04

    摘要: The present invention is directed to a process for applying a chemically resistant coating to a substrate which entails coating a substrate with a composition containing(a) a liquid polyisocyanate component which is present in an amount sufficient to provide an isocyanate index for said composition of at least 30,(b) a polyol component containing at least one organic polyhydroxyl compound having an alcoholic hydroxyl group content of about 0.5 to 15% by weight,(c) water in a quantity of from 20 to 60% by weight, based on the weight of component (b),(d) glycerine in a quantity of about 40 to 200% by weight, based on the weight of component (b), and(e) at least one alkaline earth metal hydroxide or oxide in a quantity of about 50 to 1000% by weight, based on the weight of the glycerine.

    摘要翻译: 本发明涉及一种将耐化学腐蚀性涂层施加到基材上的方法,该方法需要用包含(a)液体多异氰酸酯组分的组合物涂覆基材,所述组合物的量足以提供所述组合物的异氰酸酯指数 至少30,(b)含有至少一种醇羟基含量为约0.5至15重量%的有机多羟基化合物的多元醇组分,(c)20至60重量%的水,基于 组分(b),(d)基于组分(b)的重量约40至200重量%的量的甘油和(e)至少一种碱土金属氢氧化物或氧化物 约50至1000重量%,基于甘油的重量。

    Semiconductor component and methods for producing a semiconductor component
    9.
    发明授权
    Semiconductor component and methods for producing a semiconductor component 有权
    半导体元件及其制造方法

    公开(公告)号:US08637378B2

    公开(公告)日:2014-01-28

    申请号:US13156970

    申请日:2011-06-09

    IPC分类号: H01L21/763 H01L27/105

    摘要: A semiconductor component includes a semiconductor body, in which are formed: a substrate of a first conduction type, a buried semiconductor layer of a second conduction type arranged on the substrate, and a functional unit semiconductor layer of a third conduction type arranged on the buried semiconductor layer, in which at least two semiconductor functional units arranged laterally alongside one another are provided. The buried semiconductor layer is part of at least one semiconductor functional unit, the semiconductor functional units being electrically insulated from one another by an isolation structure which permeates the functional unit semiconductor layer, the buried semiconductor layer, and the substrate. The isolation structure includes at least one trench and an electrically conductive contact to the substrate, the contact to the substrate being electrically insulated from the functional unit semiconductor layer and the buried layer by the at least one trench.

    摘要翻译: 半导体部件包括半导体本体,其中形成有:第一导电类型的衬底,布置在衬底上的第二导电类型的埋入半导体层,以及布置在埋置的第三导电类型的功能单元半导体层 半导体层,其中设置有横向彼此排列的至少两个半导体功能单元。 掩埋半导体层是至少一个半导体功能单元的一部分,半导体功能单元通过渗透功能单元半导体层,埋入半导体层和基板的隔离结构彼此电绝缘。 隔离结构包括至少一个沟槽和与衬底的导电接触,与衬底的接触通过至少一个沟槽与功能单元半导体层和掩埋层电绝缘。

    Semiconductor component and methods for producing a semiconductor component
    10.
    发明授权
    Semiconductor component and methods for producing a semiconductor component 有权
    半导体元件及其制造方法

    公开(公告)号:US08476734B2

    公开(公告)日:2013-07-02

    申请号:US13156987

    申请日:2011-06-09

    IPC分类号: H01L21/763 H01L27/105

    摘要: A semiconductor component includes a semiconductor body, in which are formed: a substrate of a first conduction type, a buried semiconductor layer of a second conduction type arranged on the substrate, and a functional unit semiconductor layer of a third conduction type arranged on the buried semiconductor layer, in which at least two semiconductor functional units arranged laterally alongside one another are provided. The buried semiconductor layer is part of at least one semiconductor functional unit, the semiconductor functional units being electrically insulated from one another by an isolation structure which permeates the functional unit semiconductor layer, the buried semiconductor layer, and the substrate. The isolation structure includes at least one trench and an electrically conductive contact to the substrate, the contact to the substrate being electrically insulated from the functional unit semiconductor layer and the buried layer by the at least one trench.

    摘要翻译: 半导体部件包括半导体本体,其中形成有:第一导电类型的衬底,布置在衬底上的第二导电类型的埋入半导体层,以及布置在埋置的第三导电类型的功能单元半导体层 半导体层,其中设置有横向彼此排列的至少两个半导体功能单元。 掩埋半导体层是至少一个半导体功能单元的一部分,半导体功能单元通过渗透功能单元半导体层,埋入半导体层和基板的隔离结构彼此电绝缘。 隔离结构包括至少一个沟槽和与衬底的导电接触,与衬底的接触通过至少一个沟槽与功能单元半导体层和掩埋层电绝缘。