摘要:
A combination apparatus having a scanning electron microscope includes equipment for performing any of observing, measuring and processing operations on a sample placed in a sample chamber. The sample chamber contains a focused electron beam irradiating unit apart from the components for performing the observing, measuring and processing operations. The focused electron beam irradiating unit irradiates a finely focused electron beam onto the surface of the sample for electron microscopic observation in scanning fashion. This setup allows the observing, measuring or processing equipment to combine with the scanning electron microscope without appreciably enlarging the construction of the combination apparatus.
摘要:
An atomic force microscope is provided for sensing displacement of a cantilever based on scanning tunneling microscopy. The atomic force microscope includes a cantilever moving system which allows the cantilever to be moved or slipped between an STM tip and a sample. This results in the microscope being able to carry out atomic force microscopy and tunneling microscopy without changing a single STM tip and to control the very small force between the sample and the tip to be constant.
摘要:
A surface observing apparatus for obtaining information of a specimen comprises a probe disposed in the close vicinity of the specimen, a deformable cantilever for holding the probe, a scanning mechanism for scanning a surface of the specimen with the probe and a detector for detecting displacements of the cantilever to thereby allow information of the specimen to be derived on the basis of the displacement of the cantilever. The apparatus further comprises a first detector for detecting a force acting on the probe from the displacement of the cantilever, and a second detector for measuring a change in the force acting on the probe on the basis of the displacement of the cantilever.
摘要:
In a surface topographic observation method using a scanning tunneling microscope, a probe is moved away from the surface of a sample and is moved on a plane to successively move it to points of measurement on the surface of the sample in order to obtain texture information of the sample. That is, the probe is moved on a plane completely preventing the probe tip from colliding with the surface of the sample and enabling the probe to effect scanning at high speeds.
摘要:
A surface microscope includes a device which brings a probe close to a surface of a sample to scan it therewith for producing a tunnel current between the probe and the sample to measure the superficial shape of the sample by detecting the tunnel current. A device for varying a gap between the probe and the sample, a system for detecting a variable component of the tunnel current varying, accompanied by variations in the gap by the device for varying same, a divider for calculating the ratio of the variable component of the tunnel current to the tunnel current, and a calculator for calculating tunnel barrier information, based on the quotient obtained by the divider, are combined with a display for displaying the measured superficial shape of the sample and the tunnel barrier information thus calculated.
摘要:
Utilizing rugged pattern of atomic size present on a crystalline substrate of a semiconductor such as silicon or selenium or the like, a microstructure body is produced on the substrate by forming a layer of a first element of one monolayer or less by arranging at the position of the substrate most stable in energy formed by ruggedness the atoms of the first element such as gold, silver, copper, nickel, palladium, platinum or an element of group IV and then depositing successively atoms of at least one second element of group III, group IV and group V on only at a part of the surface of the substrate on which said layer of one monolayer or less by vapor deposition, sputtering or the like.
摘要:
An apparatus for measuring physical properties of micro area which has an object to measure physical properties from a micro area on an atomic scale on the surface of a test sample such as electron spin, nuclear magnetic moment, and nuclear quadrupole moment in high sensitivity, allows the probe 2 of the atomic force microscope to approach the surface of the test sample 1, applies a magnetic field to the test sample 1 by the magnetic field generation coil 27 and the magnetic paths 22 to 26 and furthermore a high frequency electromagnetic field to the test sample 1 by the coils 16 and 17 respectively, and detects a signal from atoms existing on the surface of the test sample 1 which are resonant with the high frequency electromagnetic field by the probe 2.
摘要:
In a measuring method and a measuring apparatus which are suited for observing a dynamic physical phenomenon particularly in a microdevice, a signal for generating a physical phenomenon in a specimen is inputted to the specimen, and a signal which is caused by this dynamic physical phenomenon is detected by a probe which is close to or in contact with the specimen surface in correspondence with a signal input to the specimen on the basis of the specific time. The measuring apparatus has a scanning probe microscope with a probe (tip) which is close to or in contact with the specimen surface, a pulse voltage application control unit for applying respective pulse voltages to the specimen and probe, and a signal measuring unit for measuring a signal from the specimen detected by the probe. The measuring apparatus causes a dynamic physical phenomenon in the specimen by applying the pulse voltage to the specimen, applies a bias voltage between the probe and specimen by applying the pulse voltage to the probe, and detects the signal caused by the dynamic physical phenomenon in the specimen. Pulse voltage application to the probe is executed by the pulse voltage application control unit in correspondence with pulse voltage application to the specimen on the basis of the specific time. A dynamic physical phenomenon in a microarea of a specimen which is caused by the particle property or wave property of electrons can thus be observed.
摘要:
A digital probing type atomic force microscope (AFM) for measuring high aspect structures with high precision. A probe 21 is vibrated while moved to the vicinity of an atomic force region on a specimen surface. The position of the probe is measured when a specified atomic force is detected in the atomic force region. The probe is then moved away from the specimen surface. A servo system for maintaining a gap between the probe and specimen surface is stopped. The probe is moved to a measurement point along the specimen surface while kept away from the specimen. The vibration frequency is a frequency slightly offset from the cantilever resonance point. The atomic force is detected based on the vibration amplitude of the cantilever.
摘要:
A digital probing type atomic force microscope (AFM) for measuring high aspect structures with high precision. A probe 21 is vibrated while moved to the vicinity of an atomic force region on a specimen surface. The position of the probe is measured when a specified atomic force is detected in the atomic force region. The probe is then moved away from the specimen surface. A servo system for maintaining a gap between the probe and specimen surface is stopped. The probe is moved to a measurement point along the specimen surface while kept away from the specimen. The vibration frequency is a frequency slightly offset from the cantilever resonance point. The atomic force is detected based on the vibration amplitude of the cantilever.