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1.发明授权Multi-beam exposure apparatus using a multi-axis electron lens, electron lens convergencing a plurality of electron beam and fabrication method of a semiconductor device 有权使用多轴电子透镜的多光束曝光装置，会聚有多个电子束的电子透镜以及半导体装置的制造方法公开(公告)号：US06703624B2
公开(公告)日：2004-03-09
申请号：US09824874
申请日：2001-04-04
IPC分类号： H01J35153
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3177 , H01J2237/0635 , H01J2237/1205
摘要： An electron beam exposure apparatus for exposing a wafer with a plurality of electron beams includes a multi-axis electron lens having a plurality of lens openings operable to converge the electron beams independently of each other, the plurality of lens openings having different shapes.
摘要翻译： 用于使多个电子束曝光晶片的电子束曝光装置包括具有多个透镜开口的多轴电子透镜，其可操作以彼此独立地会聚电子束，所述多个透镜开口具有不同的形状。
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2.发明授权公开(公告)号：US08390201B2
公开(公告)日：2013-03-05
申请号：US12928899
申请日：2010-12-22
IPC分类号： H01J25/50
CPC分类号： H01J37/143 , B82Y10/00 , B82Y40/00 , H01J37/06 , H01J37/3174 , H01J2237/0635 , H01J2237/14
摘要： A multi-column electron beam exposure apparatus includes: multiple column cells; an electron beam converging unit in which two annular permanent magnets and electromagnetic coils are surrounded by a ferromagnetic frame, the two annular permanent magnets being magnetized in an optical axis direction and symmetrical about the optical axis, where the electromagnetic coils adjust magnetic fields of the annular permanent magnets; and a substrate provided with circular apertures through which electron beams used in the column cells pass, respectively, where the electron beam converging unit is disposed in each of the circular apertures. The two annular permanent magnets may be disposed one above the other in the optical axis direction, and the electromagnetic coils may be provided inside or outside the annular permanent magnets in their radial direction.
摘要翻译： 多列电子束曝光装置包括：多列细胞; 电子束会聚单元，其中两个环形永磁体和电磁线圈被铁磁框架包围，两个环形永磁体沿光轴方向被磁化并且围绕光轴对称，其中电磁线圈调节环形磁场 永久磁铁 以及设置有圆孔的基板，分别在列单元中使用的电子束通过其中电子束会聚单元设置在每个圆形孔中。 两个环形永久磁铁可以在光轴方向上彼此上下配置，并且电磁线圈可以设置在环形永磁体的径向内侧或外侧。
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公开(公告)号：US20080315089A1
公开(公告)日：2008-12-25
申请号：US12151500
申请日：2008-05-07
申请人： Hiroshi Yasuda , Takeshi Haraguchi , Yoshihisa Ooae , Takamasa Satoh , Yoshinori Terui , Seiichi Sakawa , Ryozo Nonogaki
发明人： Hiroshi Yasuda , Takeshi Haraguchi , Yoshihisa Ooae , Takamasa Satoh , Yoshinori Terui , Seiichi Sakawa , Ryozo Nonogaki
IPC分类号： H01J3/02
CPC分类号： H01J37/073 , H01J2237/06316 , H01J2237/06341 , H01J2237/3175
摘要： An electron gun includes an electron source configured to emit electrons. The electron source includes an electron emission region configured to emit the electrons and an electron emission restrictive region configured to restrict emission of the electrons. The electron emission restrictive region is located on a side surface of the electron source except an electron emission surface on a tip of the electron source and is covered with a different material from the electron source. The electron gun emits thermal field-emitted electrons by applying an electric field to the tip while maintaining a sufficiently low temperature to avoid sublimation of a material of the electron source. The material of the electron source may be lanthanum hexaboride (LaB6) or cerium hexaboride (CeB6). The electron emission restrictive region may be covered with carbon.
摘要翻译： 电子枪包括被配置为发射电子的电子源。 电子源包括配置为发射电子的电子发射区域和被配置为限制电子发射的电子发射限制区域。 电子发射限制区域位于电子源的除了电子源的尖端上的电子发射表面以外的电子源的侧表面上，并被与电子源不同的材料覆盖。 电子枪通过向尖端施加电场而发射热场发射的电子，同时保持足够低的温度以避免电子源的材料的升华。 电子源的材料可以是六硼化镧（LaB 6）或六硼化铈（CeB 6）。 电子发射限制区域可以被碳覆盖。
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公开(公告)号：US20080211376A1
公开(公告)日：2008-09-04
申请号：US12075067
申请日：2008-03-07
申请人： Hiroshi Yasuda , Takeshi Haraguchi
发明人： Hiroshi Yasuda , Takeshi Haraguchi
IPC分类号： H01J29/48
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J3/02 , H01J29/48 , H01J37/063 , H01J37/075 , H01J2237/06316
摘要： An electron gun having an electron source emitting electrons includes: an acceleration electrode which accelerates the electrons; an extraction electrode which has a spherical concave surface having the center on an optical axis and facing the electron emission surface, and which extracts an electron from the electron emission surface; and a suppressor electrode which suppresses electron emission from a side surface of the electron source. In the electron gun, an electric field is applied to the electron emission surface while the electron source is kept at a low temperature in such an extent that sublimation of a material of the electron source would not be caused, to cause the electron source to emit a thermal field emission electron.
摘要翻译： 具有发射电子的电子源的电子枪包括：加速电子的加速电极; 提取电极，其具有在光轴上具有中心并面向电子发射表面的球形凹面，并从电子发射表面提取电子; 以及抑制来自电子源的侧面的电子发射的抑制电极。 在电子枪中，电子源被施加到电子发射表面，同时电子源保持在低温，使得不会引起电子源的材料的升华，导致电子源发射 热场发射电子。
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5.发明申请公开(公告)号：US20110148297A1
公开(公告)日：2011-06-23
申请号：US12928899
申请日：2010-12-22
CPC分类号： H01J37/143 , B82Y10/00 , B82Y40/00 , H01J37/06 , H01J37/3174 , H01J2237/0635 , H01J2237/14
摘要： A multi-column electron beam exposure apparatus includes: multiple column cells; an electron beam converging unit in which two annular permanent magnets and electromagnetic coils are surrounded by a ferromagnetic frame, each of the two annular permanent magnets being magnetized in an optical axis direction and being symmetrical about the optical axis, the electromagnetic coils disposed near the annular permanent magnets and used to adjust magnetic fields of the annular permanent magnets; and a substrate provided with circular apertures through which electron beams used in the column cells pass, respectively, the substrate having the electron beam converging unit disposed in a side portion of each of the circular apertures. The two annular permanent magnets may be disposed one above the other in the optical axis direction with same polarities facing each other, and the electromagnetic coils may be provided inside or outside the annular permanent magnets in their radial direction.
摘要翻译： 多列电子束曝光装置包括：多列细胞; 电子束会聚单元，其中两个环形永磁体和电磁线圈被铁磁框架包围，两个环形永磁体中的每一个在光轴方向上被磁化并且围绕光轴对称，电磁线圈设置在环形 永磁体，用于调整环形永磁体的磁场; 以及设置有圆孔的基板，通过该圆形孔分别通过电子束会聚单元的基板，每个圆形孔的侧面部分通过电子束。 两个环形永磁体可以沿着光轴方向一个一个地设置在彼此相同的极性上，并且电磁线圈可以设置在环形永磁体的径向内侧或外侧。
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公开(公告)号：US07919750B2
公开(公告)日：2011-04-05
申请号：US12151500
申请日：2008-05-07
申请人： Hiroshi Yasuda , Takeshi Haraguchi , Yoshihisa Ooae , Takamasa Satoh , Yoshinori Terui , Seiichi Sakawa , Ryozo Nonogaki
发明人： Hiroshi Yasuda , Takeshi Haraguchi , Yoshihisa Ooae , Takamasa Satoh , Yoshinori Terui , Seiichi Sakawa , Ryozo Nonogaki
IPC分类号： H01J29/48 , H01J37/073
CPC分类号： H01J37/073 , H01J2237/06316 , H01J2237/06341 , H01J2237/3175
摘要： An electron gun includes an electron source configured to emit electrons. The electron source includes an electron emission region configured to emit the electrons and an electron emission restrictive region configured to restrict emission of the electrons. The electron emission restrictive region is located on a side surface of the electron source except an electron emission surface on a tip of the electron source and is covered with a different material from the electron source. The electron gun emits thermal field-emitted electrons by applying an electric field to the tip while maintaining a sufficiently low temperature to avoid sublimation of a material of the electron source. The material of the electron source may be lanthanum hexaboride (LaB6) or cerium hexaboride (CeB6). The electron emission restrictive region may be covered with carbon.
摘要翻译： 电子枪包括被配置为发射电子的电子源。 电子源包括配置为发射电子的电子发射区域和被配置为限制电子发射的电子发射限制区域。 电子发射限制区域位于电子源的除了电子源的尖端上的电子发射表面以外的电子源的侧表面上，并被与电子源不同的材料覆盖。 电子枪通过向尖端施加电场而发射热场发射的电子，同时保持足够低的温度以避免电子源的材料的升华。 电子源的材料可以是六硼化镧（LaB 6）或六硼化铈（CeB 6）。 电子发射限制区域可以被碳覆盖。
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公开(公告)号：US20100019648A1
公开(公告)日：2010-01-28
申请号：US12586792
申请日：2009-09-28
IPC分类号： H01J29/54
CPC分类号： H01J37/063 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/06316 , H01J2237/06375 , H01J2237/065
摘要： An electron gun includes: an electron source; an accelerating electrode; an extraction electrode for extracting electrons from an electron emission surface of the electron source; a suppressor electrode for suppressing emission of electrons from a side surface of the electron source; and an electron beam converging unit for converging an electron beam of thermal field emission electrons emitted from the electron emission surface by applying an electric field to the electron emission surface. The electron beam converging unit is an electrostatic lens electrode which is placed between the extraction electrode and the accelerating electrode and having an opening portion in its center. A voltage is applied to the electrostatic lens electrode to converge the electron beam.
摘要翻译： 电子枪包括：电子源; 加速电极; 用于从电子源的电子发射表面提取电子的提取电极; 用于抑制从电子源的侧表面发射电子的抑制电极; 以及电子束会聚单元，用于通过向电子发射表面施加电场而会聚从电子发射表面发射的热场发射电子的电子束。 电子束会聚单元是放置在提取电极和加速电极之间并且在其中心具有开口部分的静电透镜电极。 电压施加到静电透镜电极以会聚电子束。
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8.发明授权Mask inspection apparatus, mask inspection method, and electron beam exposure system 有权掩模检查装置，掩模检查方法和电子束曝光系统公开(公告)号：US07394068B2
公开(公告)日：2008-07-01
申请号：US11235727
申请日：2005-09-26
申请人： Hiroshi Yasuda , Takeshi Haraguchi
发明人： Hiroshi Yasuda , Takeshi Haraguchi
IPC分类号： H01L21/66
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/84 , H01J37/3174 , H01J2237/2817
摘要： A mask inspection apparatus includes: an electron gun for generating an electron beam; an exposure mask for shaping the electron beam into a predetermined cross-sectional shape; means for scanning the electron beam shaped by the exposure mask; means for selecting and transmitting part of the shaped electron beam, which selecting means includes a thin film having a small transmission aperture transmitting the electron beam scanned by the scanning means and includes a thick substrate having an opening larger than the small transmission aperture and a thickness greater than that of the thin film; and means for detecting the electron beam passed through the selecting means and outputting a current signal. The detecting means includes: a reflective body for reflecting the electron beam selected by the selecting means; and a detector for detecting the electron beam reflected by the reflective body.
摘要翻译： 掩模检查装置包括：用于产生电子束的电子枪; 用于将电子束成形为预定横截面形状的曝光掩模; 用于扫描由曝光掩模形成的电子束的装置; 用于选择和传送部分成形电子束的装置，该选择装置包括具有传输由扫描装置扫描的电子束的小透射孔的薄膜，并且包括具有大于小透射孔的开口的厚基底和厚度 大于薄膜; 以及用于检测通过选择装置的电子束并输出电流信号的装置。 检测装置包括：用于反射由选择装置选择的电子束的反射体; 以及用于检测由反射体反射的电子束的检测器。
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9.发明授权Multi-beam exposure apparatus using a multi-axis electron lens, fabrication method of a semiconductor device 有权使用多轴电子透镜的多光束曝光装置，半导体装置的制造方法公开(公告)号：US06787780B2
公开(公告)日：2004-09-07
申请号：US09824880
申请日：2001-04-04
IPC分类号： H01J3712
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3177 , H01J2237/0635 , H01J2237/1205
摘要： An electron beam exposure apparatus for exposing a wafer includes: a multi-axis electron lens operable to converge a plurality of electron beams independently of each other; and a lens-intensity adjuster including a substrate provided to be substantially parallel to the multi-axis electron lens, and a lens-intensity adjusting unit operable to adjust the lens intensity of the multi-axis electron lens applied to the electron beams passing through the lens openings, respectively.
摘要翻译： 用于曝光晶片的电子束曝光装置包括：可操作以彼此独立地会聚多个电子束的多轴电子透镜; 以及透镜强度调节器，其包括设置为基本上平行于所述多轴电子透镜的基板，以及透镜强度调节单元，其可操作以调节施加到通过所述多轴电子透镜的电子束的多轴电子透镜的透镜强度 镜头开口。
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10.发明授权Electron gun minimizing sublimation of electron source and electron beam exposure apparatus using the same 有权电子枪使电子源和使用其的电子束曝光装置的升华最小化公开(公告)号：US08330344B2
公开(公告)日：2012-12-11
申请号：US12586792
申请日：2009-09-28
CPC分类号： H01J37/063 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/06316 , H01J2237/06375 , H01J2237/065
摘要： An electron gun includes: an electron source; an accelerating electrode; an extraction electrode for extracting electrons from an electron emission surface of the electron source; a suppressor electrode for suppressing emission of electrons from a side surface of the electron source; and an electron beam converging unit for converging an electron beam of thermal field emission electrons emitted from the electron emission surface by applying an electric field to the electron emission surface. The electron beam converging unit is an electrostatic lens electrode which is placed between the extraction electrode and the accelerating electrode and having an opening portion in its center. A voltage is applied to the electrostatic lens electrode to converge the electron beam.
摘要翻译： 电子枪包括：电子源; 加速电极; 用于从电子源的电子发射表面提取电子的提取电极; 用于抑制从电子源的侧表面发射电子的抑制电极; 以及电子束会聚单元，用于通过向电子发射表面施加电场而会聚从电子发射表面发射的热场发射电子的电子束。 电子束会聚单元是放置在提取电极和加速电极之间并且在其中心具有开口部分的静电透镜电极。 电压施加到静电透镜电极以会聚电子束。
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