摘要:
A high purity synthetic diamond with less impurities, crystals defects, strains, etc. can be provided, in which the nitrogen content is at most 10 ppm, preferably at most 0.1 ppm and the boron content is at most 1 ppm, preferably at most 0.1 ppm or in which nitrogen atoms and boron atoms are contained in the crystal and the difference between the number of the nitrogen atoms and that of the boron atoms is at most 1.times.10.sup.17 atoms/cm.sup.3. The strain-free synthetic diamond can be produced by a process for the production of a strain-free synthetic diamond by the temperature gradient method, which comprises using a carbon source having a boron content of at most 10 ppm and a solvent metal having a boron content of at most 1 ppm and adding a nitrogen getter to the solvent metal, thereby synthesizing the diamond.
摘要翻译:可以提供具有较少杂质,晶体缺陷,应变等的高纯度合成金刚石,其中氮含量为至多10ppm,优选至多0.1ppm,硼含量为至多1ppm,优选至多0.1 ppm或其中氮原子和硼原子包含在晶体中,并且氮原子数与硼原子数之间的差异至多为1×10 17 atoms / cm 3。 无菌合成金刚石可以通过温度梯度法生产无应变合成金刚石的方法制备,该方法包括使用硼含量至多为10ppm的碳源和具有硼的溶剂金属 含量至多1ppm,并向溶剂金属中加入氮气吸收剂,从而合成金刚石。
摘要:
A method of manufacturing n-type semiconductor diamond by the present invention is characterized in producing diamond incorporating Li and N by implanting Li ions into, so that 10 ppm thereof will be contained in, single-crystal diamond incorporating 10 ppm or more N, or else, in doping single-crystal diamond with Li and N ions, by implanting the ions so that ion-implantation depths at which the post-implantation Li and N concentrations each are 10 ppm or more will overlap, and thereafter annealing the diamond in a temperature range of from 800° C. or more to less than 1800° C. to electrically activate the Li and N and restore the diamond crystalline structure. In the present invention, n-type semiconductor diamond incorporates, from the surface of the crystal to the same depth, 10 ppm or more of each of Li and N, wherein its sheet resistance is 107 Ω/□ or less.
摘要:
A colorless, transparent low defect density, synthetic type IIa diamond single crystal, in which the etch pits due to needle-shaped defects are at most 3.times.10.sup.5 pieces/cm.sup.2, and which can be applied to uses needing high crystallinity of diamond, for example, monochromators, semiconductor substrates, spectroscopic crystals in X-ray range, electronic materials, etc., is provided by a process for the production of the colorless, transparent low defect density, synthetic diamond single crystal by growing new diamond crystal on a seed crystal of diamond by the temperature gradient method which comprises using a crystal defect-free diamond single crystal, as a seed crystal of diamond, and optionally subjecting to a heat treatment in a non-oxidizing atmosphere at a low pressure and a temperature of 1100 to 1600.degree. C.
摘要翻译:无色,透明的低缺陷密度的合成IIa型金刚石单晶,其中由于针状缺陷引起的蚀刻坑最多为3×10 5个/ cm 2,并且其可以应用于需要高结晶度的金刚石,例如, 单色仪,半导体衬底,X射线范围内的分光晶体,电子材料等,通过生产无色透明低缺陷密度合成金刚石单晶的方法提供,通过在晶种上生长新的金刚石晶体 金刚石,其包括使用无晶体缺陷金刚石单晶作为金刚石的晶种,并且可选地在低压和1100至1600℃的非氧化性气氛中进行热处理。 C。
摘要:
A colorless and transparent, substantially inclusion-free diamond crystal which can be applied to decorative uses and optical parts is synthesized by a process using a temperature gradient method in an ultra-high pressure apparatus. This process comprises using, as a solvent for the growth of the crystal, at least one metal selected from the group consisting of Fe, Co, Ni, Mn and Cr (at least two metals in the case of containing Fe) and as a nitrogen getter for the removal of nitrogen in the solvent, at least one metal selected from the group consisting of Al, Ti, Zr, Hf, V, Nb and Ta in a proportion of 0.5 to 7% by weight (at most 2% by weight when using only Al) to the solvent metal.
摘要:
An improved diamond sintered body having an excellent breakage resistance, corrosion resistance, heat resistance and wear resistance and capable of being sintered at a relatively low pressure and low temperature can be provided. The feature thereof consists in a diamond sintered body comprising 50 to 99.9 volume % of diamond and the balance of a binder phase consisting of a single or mixed phase of a compound (C) or composite (C') of at least one element (A) selected from the group consisting of rare earth elements, Group 3B, 4A, 4B and 6B elements of Periodic Table, iron group, Mn, V, alkali metals and alkaline earth metals with a phosphorus compound (B), or of the above described compound (C) or composite (C') with an oxide of (A).
摘要:
The present invention provides a diamond sintered compact having a higher strength as well as more excellent heat resistance, breakage resistance and corrosion resistance, as compared with those of the prior art, which thus can effectively be applied to tool materials for cutting or polishing of non-ferrous metals or ceramics, and edge materials of drill bits for excavating petroleum. The feature of the diamond sintered compact contains 0.1 to 30 volume % of at least one compound containing at least one element selected from the group consisting of silicon and titanium, and oxygen and the balance of diamond, for example, a titanate of a metal selected from the group consisting of iron, cobalt, nickel and manganese.
摘要:
Single-crystal diamond is composed of carbon in which a concentration of a carbon isotope 12C is not lower than 99.9 mass % and a plurality of inevitable impurities other than carbon. The inevitable impurities include nitrogen, boron, hydrogen, and nickel, and a total content of nitrogen, boron, and hydrogen of the plurality of inevitable impurities is not higher than 0.01 mass %. In order to manufacture single-crystal diamond, initially, a hydrocarbon gas in which a concentration of the carbon isotope 12C is not lower than 99.9 mass % is subjected to denitrification.
摘要:
The present invention provides a cutting tool that achieves cutting with high precision. The cutting tool of the present invention includes a cutting edge composed of a polycrystalline body including high-pressure-phase hard grains that contain one or more elements selected from the group consisting of boron, carbon, and nitrogen, the polycrystalline body being formed by subjecting a non-diamond carbon material and/or boron nitride, serving as a starting material, to direct conversion sintering under ultra-high pressure and high temperature without adding a sintering aid or a catalyst, in which letting the radius of curvature of the nose of the cutting edge of the cutting tool be R1, the sintered grains constituting the polycrystalline body have an average grain size of 1.2×R1 or less and a maximum grain size of 2×R1 or less.
摘要:
A diamond sintered body conventionally used in a cutting tool or the like includes an iron group metal element as a sintering aid, and therefore has a problem in heat resistance. A diamond sintered body not including the iron group metal, on the other hand, does not have sufficient mechanical strength to be used as a tool material, and also does not have conductivity, which makes electrical discharge machining impossible, and thus processing thereof is difficult. A diamond polycrystalline body having high heat resistance and mechanical strength and having conductivity enabling electrical discharge machining is obtained by using only an amorphous or fine graphite-type carbon material as a starting material, adding boron thereto and concurrently performing conversion into diamond and sintering in an ultra-high pressure and temperature condition.
摘要:
A cubic boron nitride sintered body has sufficient strength, hardness, heat resistance and heat dissipativity for serving as a cutting tool. A method of preparing a cubic boron nitride sintered body involves preparing a low-pressure phase boron nitride as a starting material by reducing a compound containing boron and oxygen with a compound containing nitrogen and carbon. Then, the low-pressure phase boron nitride starting material is directly converted to a cubic boron nitride sintered body by subjecting the starting material to a high temperature and a high pressure. In the obtained cubic boron nitride sintered body, the ratio I.sub.220 /I.sub.111 of X-ray diffraction intensity I.sub.220 on the (220) plane relative to X-ray diffraction intensity I.sub.111 on the (111) plane is at least 0.1.