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    Membrane element sealing material holding member and membrane element
    4.
    发明授权
    Membrane element sealing material holding member and membrane element 有权
    膜元件密封材料保持构件和膜元件

    公开(公告)号：US07867394B2

    公开(公告)日：2011-01-11

    申请号：US12298299

    申请日：2007-04-20

    申请人： Yasuhiro Uda ,  Masashi Beppu ,  Hiroki Fujioka ,  Yuuji Nishida ,  Shinichi Chikura ,  Hideki Matsuda ,  Katsumi Ishii

    发明人： Yasuhiro Uda ,  Masashi Beppu ,  Hiroki Fujioka ,  Yuuji Nishida ,  Shinichi Chikura ,  Hideki Matsuda ,  Katsumi Ishii

    IPC分类号： B01D63/10 ,  B01D63/12 ,  B01D61/00

    CPC分类号： B01D63/106 ,  B01D2313/04 ,  Y02A20/131

    摘要： A membrane element sealing material holding member comprising a central opening for insertion of a center tube of spiral membrane element, peripheral orifice for flowing of a raw liquid into a membrane end portion of membrane element and outer circumferential part for holding of circular sealing material, wherein the central opening has inner circumferential surface of cylindrical form with a diameter larger than the outer diameter of the inserted center tube, and wherein at three or more positions on the inner circumferential surface, there is provided projection that has sloping face on its side of center tube insertion and is deformable at the time of insertion of center tube with an outer diameter larger than that of incircle.

    摘要翻译： 一种膜元件密封材料保持构件，包括用于插入螺旋膜元件的中心管的中心开口，用于将原液流入膜元件的膜端部的外周孔和用于保持圆形密封材料的外周部， 中心开口具有直径大于插入的中心管的外径的圆柱形的内圆周表面，并且其中在内圆周表面上的三个或更多个位置处设置有在其中心侧上具有倾斜面的突起 管插入，并且在中心管插入时具有大于外露直径的外径的变形。

    Processing unit for substrate manufacture
    5.
    发明授权
    Processing unit for substrate manufacture 有权
    用于基板制造的处理单元

    公开(公告)号：US06247245B1

    公开(公告)日：2001-06-19

    申请号：US09321542

    申请日：1999-05-28

    申请人： Katsumi Ishii

    发明人： Katsumi Ishii

    IPC分类号： F26B2106

    CPC分类号： H01L21/67757 ,  H01L21/67769 ,  H01L21/67778 ,  Y10S414/138 ,  Y10S414/14

    摘要： A processing unit for a substrate has a vertical thermal processing furnace 4 having a bottom and an opening provided at the bottom. A boat holding substrates in vertical multistairs can be placed on a first lid, and the first lid can open and close the opening of the vertical thermal processing furnace with the boat placed thereon. The processing unit also has a boat-placing portion on which the boat and another boat can be placed and a boat conveying mechanism for conveying the two boats alternatively between the boat-placing portion and the first lid. A second lid hermetically closes the opening of the vertical thermal processing furnace when the first lid opens the opening but no boat passes through the opening. The processing unit can effectively reduce the undesirable influence from the opening when the first lid is taken off from the opening and the boat is conveyed out, and can also reduce the wasted energy by preventing the fall of the temperature in the interior of the thermal processing furnace.

    摘要翻译： 用于基板的处理单元具有垂直热处理炉4，其具有设置在底部的底部和开口。 在垂直多层板上保持基板的船可以放置在第一盖上，并且第一盖可以放置在其上的船打开和关闭垂直热处理炉的开口。 处理单元还具有可以放置船和另一船的船放置部分，以及用于在船放置部分和第一盖之间交替地输送两船的船运输机构。 当第一盖打开开口但没有船通过开口时，第二盖气密地封闭垂直热处理炉的开口。 处理单元可以有效地减少当第一盖从开口取出并且船被输出时从开口的不期望的影响，并且还可以通过防止热处理的内部温度的下降来减少浪费的能量 炉。

    Wafer container and wafer aligning apparatus
    7.
    发明授权
    Wafer container and wafer aligning apparatus 失效
    晶圆容器和晶圆对准装置

    公开(公告)号：US5468112A

    公开(公告)日：1995-11-21

    申请号：US131391

    申请日：1993-10-05

    申请人： Katsumi Ishii ,  Masao Takikawa

    发明人： Katsumi Ishii ,  Masao Takikawa

    IPC分类号： H01L21/673 ,  H01L21/677 ,  G01P13/00

    CPC分类号： H01L21/68 ,  H01L21/6732 ,  H01L21/67769 ,  Y10S414/136 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

    摘要： A container for storing a plurality of semiconductor wafers comprises two end walls and two side walls. The container has a main opening through which the wafers are inserted into or withdrawn from the container and a sub-opening through which a wafer counter approaches the wafers. A plurality of slots are formed in the container to hold the wafers one by one at intervals. Each slot includes a pair of grooves which are formed in inner surfaces of both the side walls, have a V-shaped cross-section, and which divergently open toward a central portion of the container. One surface of each groove serves as a supporting surface on which a wafer is disposed substantially horizontal when the container is positioned such that the reference plane is horizontal. The supporting surfaces of the pair of grooves have a pair of converging portions which converge toward the second opening. A filling body, having an inner surface which is brought into contact with an edge portion of a wafer, is provided in each converging portion near the sub-opening. The inner surface of the filling body is determined so as to restrict a position of the wafer, such that the wafer can be positioned at the same height of the supporting surfaces of the pair of grooves.

    摘要翻译： 用于存储多个半导体晶片的容器包括两个端壁和两个侧壁。 容器具有主开口，晶片通过该主开口插入或从容器中取出，以及子开口，晶片计数器通过该子开口接近晶片。 在容器中形成多个槽，以间隔地一个一个地保持晶片。 每个狭槽包括形成在两个侧壁的内表面中的一对凹槽，其具有V形横截面，并且朝向容器的中心部分向外敞开。 每个槽的一个表面用作支撑表面，当容器定位成使得参考平面是水平的时，晶片在该支撑表面上基本上水平布置。 一对槽的支撑面具有朝向第二开口会聚的一对会聚部。 在子开口附近的每个会聚部分设置有具有与晶片的边缘部分接触的内表面的填充体。 确定填充体的内表面以限制晶片的位置，使得晶片可以位于一对槽的支撑表面的相同高度处。

    Horizontal/vertical conversion transporting apparatus
    9.
    发明授权
    Horizontal/vertical conversion transporting apparatus 失效
    水平/垂直转换传送装置

    公开(公告)号：US5028195A

    公开(公告)日：1991-07-02

    申请号：US469317

    申请日：1990-01-24

    申请人： Katsumi Ishii ,  Atsushi Wada

    发明人： Katsumi Ishii ,  Atsushi Wada

    IPC分类号： B25J9/00 ,  B25J9/02 ,  B65G47/90 ,  H01L21/677 ,  H01L21/68

    CPC分类号： B25J9/02 ,  H01L21/68 ,  Y10S414/14

    摘要： A horizontal/vertical conversion transporting apparatus, wherein a mechanism for variably changing a distance between upper and lower boat hands for clamping an article therebetween is mounted on a conversion arm, the conversion arm is vertically movable along a support arm, and at the same time, the conversion arm is rotatable within the plane of vertical movement.

    摘要翻译： 一种水平/垂直转换传送装置，其中，用于可变地改变用于夹紧物品之间的上部和下部舟形手之间的距离的机构安装在转换臂上，转换臂可沿着支撑臂垂直移动，并且同时 转换臂可在垂直运动的平面内旋转。

    SEPARATION MEMBRANE UNIT AND SEPARATION MEMBRANE ELEMENT WITH SAME
    10.
    发明申请
    SEPARATION MEMBRANE UNIT AND SEPARATION MEMBRANE ELEMENT WITH SAME 审中-公开
    分离膜单元和分离膜单元

    公开(公告)号：US20120228213A1

    公开(公告)日：2012-09-13

    申请号：US13509245

    申请日：2010-06-22

    申请人： Katsumi Ishii ,  Atsushi Hiro ,  Yoshihide Kawaguchi ,  Noriaki Harada ,  Osamu Hayashi ,  Atsuko Mizuike

    发明人： Katsumi Ishii ,  Atsushi Hiro ,  Yoshihide Kawaguchi ,  Noriaki Harada ,  Osamu Hayashi ,  Atsuko Mizuike

    IPC分类号： B01D71/56 ,  B01D63/14

    CPC分类号： B01D69/12 ,  B01D63/082 ,  B01D63/14 ,  B01D71/56 ,  B01D2313/12

    摘要： A separation membrane unit is provided with two separation membranes (1) which each have a separation active layer (4) formed on one surface of a sheet-like porous base material (3) and which are superposed on each other so that the separation active layers (4) face each other. The two separation membranes (1) are folded multiple times into pleats, and as a result, folds (5) are formed alternately on one side and the other side (top side and bottom side in FIG. 4A) of the two separation membranes (1). As a result of the two separation membranes (1) being superposed on each other so that the separation active layers (4) face each other, the separation active layers (4) are not exposed, and the simple configuration can prevent the separation active layers (4) from being damaged.

    摘要翻译： 分离膜单元设置有两个分离膜（1），每个隔膜具有在片状多孔基材（3）的一个表面上形成的彼此重叠的分离活性层（4），使得分离活性层 层（4）彼此面对。 将两个分离膜（1）多次折叠成褶，结果，在两个分离膜的一侧和另一侧（图4A中的顶侧和底侧）交替地形成折痕（5） 1）。 由于两个分离膜（1）彼此叠合以使分离活性层（4）彼此面对，所以分离活性层（4）不暴露，并且简单的构造可以防止分离活性层 （4）不被损坏。