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公开(公告)号:US3212929A
公开(公告)日:1965-10-19
申请号:US18174362
申请日:1962-03-22
Applicant: IBM
Inventor: PLISKIN WILLIAM A , CONRAD ERNEST E
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2.Method for detecting exposure of a base material through an overlying coating 失效
Title translation: 通过过度涂层检测基体材料的接触的方法公开(公告)号:US3580066A
公开(公告)日:1971-05-25
申请号:US3580066D
申请日:1969-06-19
Applicant: IBM
Inventor: PLISKIN WILLIAM A , TAYLOR JAMES E
IPC: H01L21/66 , C23F1/00 , H01L21/306 , H01L23/29 , G01N13/00
CPC classification number: H01L23/291 , H01L2924/0002 , H01L2924/00
Abstract: The method for determining the completeness of etching of an oxide from a silicon semiconductor device discloses that bare silicon surfaces are hydrophobic while clean freshly etched oxide surfaces are hydrophilic. To determine whether the silicon is exposed, and therefore free of any oxide film subsequent to etching, the device is cooled and subjected to a stream of moist gas and observed under a microscope. If the etching process by which small holes are formed is incomplete, oxide will remain in the hole and therefore a film of condensed water will form in the holes indicating incomplete etching. If the etching process has been properly completed in the holes, bare silicon will remain causing the moisture to form in small droplets. The form of the moisture can be observed through the microscope.
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3.Method of forming a glass film on an object and the product produced thereby 失效
Title translation: 在物体上形成玻璃膜的方法及其制造的产品公开(公告)号:US3212921A
公开(公告)日:1965-10-19
申请号:US14166861
申请日:1961-09-29
Applicant: IBM
Inventor: PLISKIN WILLIAM A , CONRAD ERNEST E
CPC classification number: H01L21/316 , C23C16/401 , C23D5/02 , C23D11/00 , H01B3/088 , H01C17/02 , H01G13/003 , H01L23/29 , H01L2924/0002 , Y10S148/043 , Y10S148/118 , Y10T428/23 , Y10T428/265 , H01L2924/00
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4.Method of forming a glass film on an object and the product produced thereby 失效
Title translation: 在对象上形成玻璃膜的方法及其生产的产品公开(公告)号:US3505106A
公开(公告)日:1970-04-07
申请号:US3505106D
申请日:1965-09-22
Applicant: IBM
Inventor: PLISKIN WILLIAM A , CONRAD ERNEST E
CPC classification number: H01L21/316 , C23C16/401 , C23D5/02 , C23D11/00 , H01B3/088 , H01C17/02 , H01G13/003 , H01L23/29 , H01L2924/0002 , H01L2924/00
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公开(公告)号:US3317332A
公开(公告)日:1967-05-02
申请号:US37382864
申请日:1964-06-09
Applicant: IBM
Inventor: PLISKIN WILLIAM A
CPC classification number: C03C17/28 , H01L23/3157 , H01L2924/0002 , H01L2924/00
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6.Photosensitive glass technique for forming contact holes in protective glass layers 失效
Title translation: 用于在保护玻璃层中形成接触孔的感光玻璃技术公开(公告)号:US3542550A
公开(公告)日:1970-11-24
申请号:US3542550D
申请日:1966-09-30
Applicant: IBM
Inventor: CONRAD ERNEST E , ESCH RONALD P , HALLEN ROBERT L , LEONARD RICHARD A , PLISKIN WILLIAM A
CPC classification number: H01L23/3157 , H01L21/00 , H01L23/291 , H01L23/485 , H01L2924/0002 , Y10S438/95 , H01L2924/00
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公开(公告)号:US3497407A
公开(公告)日:1970-02-24
申请号:US3497407D
申请日:1966-12-28
Applicant: IBM
Inventor: ESCH RONALD P , PLISKIN WILLIAM A
IPC: C23F1/10 , C23F1/14 , H01L21/308 , H01L21/311 , H01L23/29 , H01L23/485 , H01L7/00
CPC classification number: H01L23/291 , H01L21/31111 , H01L23/485 , H01L2924/0002 , Y10S148/043 , Y10S148/051 , Y10S148/173 , H01L2924/00
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公开(公告)号:US3243314A
公开(公告)日:1966-03-29
申请号:US22380462
申请日:1962-09-14
Applicant: IBM
Inventor: LEHMAN HERBERT S , PLISKIN WILLIAM A , RUGGLES JR RUDY L
CPC classification number: H01L21/02164 , C23C8/16 , C23C16/402 , H01B1/08 , H01B3/02 , H01B3/10 , H01L21/02216 , H01L21/02271 , H01L21/02337 , H01L21/31612 , Y10S148/003 , Y10S148/043 , Y10S148/117 , Y10S148/118 , Y10S438/958
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