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    Device for measuring surface characteristics of a material
    2.
    发明授权
    Device for measuring surface characteristics of a material 有权

    公开(公告)号：US11125805B2

    公开(公告)日：2021-09-21

    申请号：US16518730

    申请日：2019-07-22

    Applicant: IMEC VZW

    Inventor： Kristof Paredis ,  Umberto Celano ,  Wilfried Vandervorst

    IPC: G01R31/20 ,  G01R31/26 ,  G01N27/00

    Abstract: A device is provided for electrically measuring surface characteristics of a sample. The device comprises at least one group of three electrodes: a first and second electrode spaced apart from each other and configured to be placed onto the surface of the sample, and a third electrode between the first two but isolated from these two electrodes by a one or more first insulators, wherein a second insulator further isolates the central electrode from the sample when the device is placed thereon. The three electrodes and the insulators are attached to a single or to multiple holders with conductors incorporated therein for allowing the coupling of the electrodes to power sources or measurement tools. The placement of the device onto a semiconductor sample creates a transistor with the sample surface acting as the channel. The device thereby allows the determination of the transistor characteristics of the sample in a straightforward way.

    DEVICE AND METHOD FOR TWO DIMENSIONAL ACTIVE CARRIER PROFILING OF SEMICONDUCTOR COMPONENTS
    3.
    发明申请
    DEVICE AND METHOD FOR TWO DIMENSIONAL ACTIVE CARRIER PROFILING OF SEMICONDUCTOR COMPONENTS 审中-公开

    公开(公告)号：US20190025341A1

    公开(公告)日：2019-01-24

    申请号：US16026428

    申请日：2018-07-03

    Applicant: IMEC vzw

    Inventor： Kristof Paredis ,  Umberto Celano ,  Wilfried Vandervorst ,  Oberon Dixon-Luinenburg

    IPC: G01Q60/30

    Abstract: A method of measuring an electrical characteristic of a current path is disclosed. In one aspect, the method includes a probe for scanning spreading resistance microscopy (SSRM), a test sample contacted by the probe, a back contact on the test sample, a bias voltage source and a logarithmic SSRM amplifier, when a modulation at a predefined frequency is applied to either the contact force of the probe or to the bias voltage, the device comprising electronic circuitry for producing in real time a signal representative of the electrical characteristic, according to the formula lognA=±VSSRM±logn(dV)+Vmultiplier.

    Method and tip substrate for scanning probe microscopy
    5.
    发明授权
    Method and tip substrate for scanning probe microscopy 有权

    公开(公告)号：US11112427B2

    公开(公告)日：2021-09-07

    申请号：US17069228

    申请日：2020-10-13

    Applicant: IMEC VZW

    Inventor： Thomas Hantschel ,  Hugo Bender ,  Kristof Paredis ,  Antti Kanniainen

    IPC: G01Q70/10 ,  G01Q70/14 ,  G01Q60/30

    Abstract: The disclosure is related to a method for performing SPM measurements, wherein a sample is attached to a cantilever and scanned across a tip. The tip is one of several tips present on a substrate comprising at least two different types of tips on its surface, thereby enabling performance of multiple SPM measurements requiring a different type of tip, without replacing the cantilever. The at least two different types of tips are different in terms of their material, in terms of their shape or size, and/or in terms of the presence or the type of active or passive components mounted on or incorporated in the substrate, and associated to tips of one or more of the different types. The disclosure is equally related to a substrate comprising a plurality of tips suitable for use in the method of the disclosure.

    Method for determining the shape of a sample tip for atom probe tomography
    6.
    发明授权
    Method for determining the shape of a sample tip for atom probe tomography 有权

    公开(公告)号：US10746759B2

    公开(公告)日：2020-08-18

    申请号：US16296068

    申请日：2019-03-07

    Applicant: IMEC vzw

    Inventor： Kristof Paredis ,  Claudia Fleischmann ,  Wilfried Vandervorst

    IPC: G01Q10/04 ,  G01Q10/06 ,  G01Q30/20 ,  G01Q60/24 ,  H01J37/285

    Abstract: The disclosed technology relates to a method and apparatus for correctly positioning a probe suitable for scanning probe microscopy (SPM). The probe is positioned relative to the apex region of a needle-shaped sample, such as a sample for atom probe tomography, in order to perform a SPM acquisition of the apex region to obtain an image of the region. In one aspect, the positioning takes place by an iterative process, starting from a position wherein one side plane of the pyramid-shaped SPM probe interacts with the sample tip. By controlled consecutive scans in two orthogonal directions, the SPM probe tip approaches and finally reaches a position wherein a tip area of the probe interacts with the sample tip's apex region.

    DEVICE FOR MEASURING SURFACE CHARACTERISTICS OF A MATERIAL
    7.
    发明申请
    DEVICE FOR MEASURING SURFACE CHARACTERISTICS OF A MATERIAL 审中-公开

    公开(公告)号：US20200033395A1

    公开(公告)日：2020-01-30

    申请号：US16518730

    申请日：2019-07-22

    Applicant: IMEC VZW

    Inventor： Kristof Paredis ,  Umberto Celano ,  Wilfried Vandervorst

    IPC: G01R31/26

    Abstract: A device is provided for electrically measuring surface characteristics of a sample. The device comprises at least one group of three electrodes: a first and second electrode spaced apart from each other and configured to be placed onto the surface of the sample, and a third electrode between the first two but isolated from these two electrodes by a one or more first insulators, wherein a second insulator further isolates the central electrode from the sample when the device is placed thereon. The three electrodes and the insulators are attached to a single or to multiple holders with conductors incorporated therein for allowing the coupling of the electrodes to power sources or measurement tools. The placement of the device onto a semiconductor sample creates a transistor with the sample surface acting as the channel. The device thereby allows the determination of the transistor characteristics of the sample in a straightforward way.

    METHOD AND TIP SUBSTRATE FOR SCANNING PROBE MICROSCOPY
    9.
    发明申请
    METHOD AND TIP SUBSTRATE FOR SCANNING PROBE MICROSCOPY 有权

    公开(公告)号：US20210116476A1

    公开(公告)日：2021-04-22

    申请号：US17069228

    申请日：2020-10-13

    Applicant: IMEC VZW

    Inventor： Thomas Hantschel ,  Hugo Bender ,  Kristof Paredis ,  Antti Kanniainen

    IPC: G01Q70/10 ,  G01Q70/14

    Abstract: The disclosure is related to a method for performing SPM measurements, wherein a sample is attached to a cantilever and scanned across a tip. The tip is one of several tips present on a substrate comprising at least two different types of tips on its surface, thereby enabling performance of multiple SPM measurements requiring a different type of tip, without replacing the cantilever. The at least two different types of tips are different in terms of their material, in terms of their shape or size, and/or in terms of the presence or the type of active or passive components mounted on or incorporated in the substrate, and associated to tips of one or more of the different types. The disclosure is equally related to a substrate comprising a plurality of tips suitable for use in the method of the disclosure.

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