Microelectronic assemblies having a cooling channel

    公开(公告)号:US11521914B2

    公开(公告)日:2022-12-06

    申请号:US16233808

    申请日:2018-12-27

    申请人: Intel Corporation

    IPC分类号: H01L23/473 H01L21/48

    摘要: Microelectronic assemblies that include a cooling channel, and related devices and methods, are disclosed herein. For example, in some embodiments, a microelectronic assembly may include a package substrate having a surface, a die having a surface, and a fluidic channel between the surface of the die and the surface of the package substrate, wherein a top surface of the fluidic channel is defined by the surface of the die and a bottom surface of the fluidic channel is defined by the surface of the package substrate. In some embodiments, a microelectronic assembly may include a package substrate having a surface; a die having a surface; and an interposer having a fluidic channel between the surface of the die and the surface of the package substrate.

    Thermal bump networks for integrated circuit device assemblies

    公开(公告)号:US11587843B2

    公开(公告)日:2023-02-21

    申请号:US16219158

    申请日:2018-12-13

    申请人: Intel Corporation

    摘要: Integrated circuit IC package with one or more IC dies including solder features that are thermally coupled to the IC. The thermally coupled solder features (e.g., bumps) may be electrically insulated from solder features electrically coupled to the IC, but interconnected with each other by one or more metallization layers within a plane of the IC package. An in-plane interconnected network of thermal solder features may improve lateral heat transfer, for example spreading heat from one or more hotspots on the IC die. An under-bump metallization (UBM) may interconnect two or more thermal solder features. A through-substrate via (TSV) metallization may interconnect two or more thermal solder features. A stack of IC dies may include thermal solder features interconnected by metallization within one or more planes of the stack.